Effect of Pretreatment of TaN Substrates on Atomic Layer Deposition Growth of Ru Thin Films

The polycrystalline ruthenium films are grown on TaN substrates by atomic layer deposition （ALD） using bis（cyclopentadienyl） ruthenium [RuCp2] and oxygen as ruthenium precursor and reactant respectively at a deposition temperature of 330℃. The low-energy Ar ion bombardment and Ru pre-deposition are performed to the underlying TaN substrates before ALD process in order to improve the Ru nucleation. X-ray diffraction, x-ray photoelectron spectroscopy, scanning electron microscopy and atomic force microscopy are carried out to characterize the properties of ALD Ru films. The results show that the nucleation density of Ru films with Ar^＋ bombardment to the underlying TaN substrates is much higher than that of the ones without any pretreatment. The possible reasons are discussed.     

带弹簧支撑超静定结构位移的简化计算方法

针对带有弹性支撑的超静定结构的位移计算问题, 对利用虚功原理得到的位移计 算一般公式进行了进一步推导, 提出了该类结构位移的简化计算方法. 文中计算公式表达形 式简洁, 且与一般刚性支撑超静定结构的位移计算方法一致. 通过与有限元分析结果的对比, 证明了该公式的正确性.     

分光光度法快速测定玉米叶片中的叶绿素

以玉米叶片为材料,利用双波长双光束紫外可见分光光度计,用最大决定系数增量回归算法,研究了叶片叶绿素a、b及SPAD值同时、快速测量方法.结果表明,用3个波长点建立的模型可以达到良好的预测效果,预测叶绿素a、b及SPAD值的相关系数分别为0.9919、0.9816和0.9757;标准差分别为1.52、0.43和1.96;预测相对标准差分别为4.64%、5.50%和4.88%.同时研究了仪器波长误差和带宽变化对测定结果的影响, 发现波长偏移超过0.2 nm,误差快速增大,且波长向长波方向偏移时对测量的影响要大于向短波方向偏移的影响;仪器带宽变大,预测误差也就越大.