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设计了808 nm高功率GaAsP/InGaAlP/GaAs半导体激光器,采用无铝张应变量子阱和非对称宽波导结构,通过优化金属有机物气相沉积(LP-MOCVD)生长条件,提高了外延材料的生长质量,有效提升了激光器转化效率和输出功率。制作了200μm条宽、1500μm腔长的激光器器件,室温连续条件(CW)测试其阈值电流为650 mA,斜率效率高达到1.35 W/A,输出功率在11 W以上,激射波长808.5 nm@5A,水平和垂直发散角分别为8°和30°,较小的发散角有效的提高了输出光功率密度。 相似文献
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为改善940 nm大功率InGaAs/GaAs半导体激光器输出特性,通过模拟计算了非对称波导层及限制层结构的光场分布,并参照模拟制作了非对称结构半导体激光器器件。采用低压金属有机物气相沉积(LP-MOCVD)生长技术,获得了低内吸收系数的高质量外延材料,通过实验数据计算得到激光器材料内吸收系数仅为0.44mm~(-1)。进而通过管芯工艺制作了条宽100μm、腔长2000μm的940 nm半导体激光器器件。25℃室温10 A直流连续(CW)测试镀膜后器件阈值电流251 mA,斜率效率1.22 W/A,最大输出功率达到9.6 W,最大光电转化效率超过70%。 相似文献
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In order to improve the characteristics of the general broad-waveguide 808-nm semiconductor laser diode （LD）, we design a new type quantum well LD with an asymmetric cladding structure. The structure is grown by metal organic chemical vapor deposition （MOCVD）. For the devices with 100-ttm-wide stripe and 1000-/zm-long cavity under continuous-wave （CW） operation condition, the typical threshold current is 190 mA, the slope efficiency is 1.31 W/A, the wall-plug efficiency reaches 63%, and the maximum output power reaches higher than 7 W. And the internal absorption value decreases to 1.5 cm^-1. 相似文献
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In order to improve the characteristics of the general broad-waveguide 808-nm semiconductor laser diode (LD),we design a new type quantum well LD with an asymmetric cladding structure.The structure is grown by metal organic chemical vapor deposition (MOCVD).For the devices with 100-μm-wide stripe and 1000-μm-long cavity under continuous-wave (CW) operation condition,the typical threshold current is 190 mA,the slope efficiency is 1.31 W/A,the wall-plug efficiency reaches 63%,and the maximum output power reac... 相似文献
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