利用光学多通道分析仪与分光光度计测定叶绿素的紫外-可见光区吸收光谱

应用分析化学中常用的吸光光度法,通过光学多通道分析仪和紫外-可见分光光度计对叶绿素提取液和叶绿素晶体分别进行了紫外-可见光区吸收光谱的探测,并对其吸收曲线进行了分析和研究.根据实验结果对文献中的一些数据进行了讨论.     

乙烯和丙烯的等离子体聚合及聚合物结构的研究

<正> 文献[1—3]曾报导过应用等离子体聚合方法制备有机聚合物薄膜,为掌握等离子体聚合物的性能,进而扩展其用途,对其结构进行研究具有一定的意义。Kobayashi等研究了用内部电极等离子体装置制备的聚乙烯的结构,并指出其为交联结构,他们用同样装置研究了单体流量对丙烯聚合膜淀积速率的影响。我们用较简单的外部电容耦合式聚合装置,研究了在辉光区中乙烯和丙烯的聚合规律,并应用元素分析、红外光谱和X射线衍射法研究了聚合物的结构。     

GRAFT COPOLYMERIZATION OF ACRYLAMIDE ONTO POLYPROPYLENE FILMS BY PLASMA TECHNIQUE

The graft copolymerization of acrylamide onto polypropylene (PP) Film was carried out by using a capacitively coupled rf plasma apparatus with external plate electrodes. The relationship between the surface structure of the Ar plasma-treated PP films and the extent of grafting of acrylamide on the films was studied through observing the effects of discharge power and exposure time on the relative content of free-radical on the film surface. Meanwhile, the wettability and surface energy of the PP film were measured.     

辉光放电处理聚四氟乙烯：Ⅲ.PTFE表面结构的XPS表征

Yasuda等在用XPS研究离子体处理后的PTFE表面结构时,得到一个包络的C_(1s)峰。本文对此进行探讨。 PTFE膜先在蒸馏水中浸泡1小时,再用热异丙醇洗涤5分钟,然后用去离子水清洗三     

乙烯在N_2中的等离子体聚合

一、引言应用等离子体聚合方法以制备有机聚合物薄膜,在一些综合报道中已有所评介。一般说来,在等离子体中所形成的聚合物薄膜是高度交联和不溶的,而且在化学上也是极其惰性和稳定的。在辉光放电中使用清洗好的基片,通常可获得粘附于基片上性能优异的薄膜。 Yasuda等研究在等离子体中聚合物的淀积分布和某些有机化合物的等离子体聚合反应时,曾报道     

乙烯基三甲基硅烷等离子体聚合物膜的结构与性能

采用外部电极电容耦合高频等离子体装置对乙烯基三甲基硅烷(VTMS)进行等离子体聚合。用IR、XPS、PGC/MS、X-ray、ESR和元素分析等方法对聚合物结构进行表征,并推断聚合反应历程。应用TG研究聚合物的热性能。通过X-ray证实聚合物为非晶结构。在无添加气体存在时聚合,XPS测试结果表明产物中有氧嵌入,且聚合物的C/Si比总的说来比单体的C/Si比低。TG的测试结果表明聚合物膜具有优良的热稳定性。     

ESR STUDY OF PLASMA-TREATED POLYTETRAFLUOROETHYLENE FILMS

The plasma treatment of polytetrafluoroethylene (PTFE) films was carried out in a capacitively coupled reactor with external electrodes. The free radicals generated in the process of treatment were detected by ESR techniques. The ESR spectra tended to indicate that the free radicals of the pLasma-treated PTFE film sample were turned into peroxy radicals on exposure to air. The extrema separation (W) of the ESR spectrum of the peroxy radical increased with the lowering temperature and underwent a sudden change within the temperature range of 170 to 190K. The ESR spectrum observed at 77K was quite different from that observed at room temperature. Finally, the effects of treatment time, input power and system pressure on radical concentration of the treated samples were studied. The attenuation of the peroxy radical at room temperature was also investigated.