| 辉光放电处理聚四氟乙烯：Ⅲ.PTFE表面结构的XPS表征 |
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| 引用本文： | 周茂堂,王世才.辉光放电处理聚四氟乙烯：Ⅲ.PTFE表面结构的XPS表征[J].应用化学,1990,7(6):82-84. |
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| 作者姓名： | 周茂堂 王世才 |
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| 作者单位： | 中国科学院长春应用化学研究所，中国科学院长春应用化学研究所，中国科学院长春应用化学研究所 长春 130022，长春 130022，长春 130022 |
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| 摘 要： | Yasuda等在用XPS研究离子体处理后的PTFE表面结构时,得到一个包络的C_(1s)峰。本文对此进行探讨。 PTFE膜先在蒸馏水中浸泡1小时,再用热异丙醇洗涤5分钟,然后用去离子水清洗三
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| 关 键 词： | 聚四氟乙烯 等离子体处理 XPS 表面结构 |
| 收稿时间： | 1989-12-21 |
PLASMA TREATMENT OF POLYTETRAFLUOROETHYLENE Ⅲ.XPS CHARACTERIZATION OF THE TREATED SURFACE |
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| Zhou Maotang,Wang Shicai,Chen Jie Changchun Institute of Applied Chemistry,Academia Sinica,Changchun.PLASMA TREATMENT OF POLYTETRAFLUOROETHYLENE Ⅲ.XPS CHARACTERIZATION OF THE TREATED SURFACE[J].Chinese Journal of Applied Chemistry,1990,7(6):82-84. |
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| Authors: | Zhou Maotang Wang Shicai Chen Jie Changchun Institute of Applied Chemistry Academia Sinica Changchun |
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| Institution: | Zhou Maotang,Wang Shicai,Chen Jie Changchun Institute of Applied Chemistry,Academia Sinica,Changchun 130022 |
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| Abstract: | The surface modification of polytetrafluoroethylene film by exposuring to argon plasmawas carried out and the structure of the surface was investigated by x-ray photoelectronspectroscopy (XPS). The broad, overlaping C_1s peak in XPS spectrum was considered to beformed from 284.6(CH), 286.6(CO), 287.9(C = O), 289.0(CF) and 292.3 eV(CF_2). It isfound that, along with oxygen, nitrogen was also introduced into the surface structure ofPTFE upon plasma treatment. |
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| Keywords: | polytetrafluooethylene plasma treatment XPS surface structure |
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