Pt/Au/n-InGaN肖特基接触的电流输运机理

基于热电子发射和热电子场发射模式,利用I-V方法研究了Pt/Au/n-InGaN肖特基接触的势垒特性和电流输运机理,结果表明,在不同背景载流子浓度下,Pt/Au/n-InGaN肖特基势垒特性差异明显.研究发现,较低生长温度制备的InGaN中存在的高密度施主态氮空位（V_N）缺陷导致背景载流子浓度增高,同时通过热电子发射模式拟合得到高背景载流子浓度的InGaN肖特基势垒高度和理想因子与热电子场发射模式下的结果差别很大,表明V_N缺陷诱发了隧穿机理并降低了肖特基势垒高度,相应的隧穿电流显著增大了肖特基势垒总的输运电流,证实热电子发射和缺陷辅助的隧穿机理共同构成了肖特基势垒的电流输运机理.低背景载流子浓度的InGaN肖特基势垒在热电子发射和热电子场发射模式下拟合的结果接近一致,表明热电子发射是其主导的电流输运机理.     

GaAs纳米线及GaAs/In_xGa_(1-x)As/GaAs纳米线径向异质结构的无催化选区生长的实验研究

利用无催化选区金属有机化学气相沉积(SA-MOCVD)法在GaAs(111)B衬底上分别制备了GaAs纳米线和GaAs/InxGa1-xAs/GaAs纳米线径向异质结构.系统地研究了生长条件对GaAs纳米线生长的影响.实验结果显示,GaAs纳米线的形貌和长度依赖于生长温度、AsH3的分压以及SiO2掩膜表面的圆孔直径.因此可以通过调节以上因素来得到高质量的GaAs纳米线.并且发现扩散是影响无催化选区生长GaAs纳米线的主要机理.微区光致发光谱(μ-PL)表明,GaAs/InxGa1-xAs/GaAs纳米线径向异质结构被成功合成,室温(300 K)下它的发光波长为913 nm.这些结果对于GaAs纳米线及其异质结构制备的进一步研究及其在光电子器件中的应用具有很好的参考价值.     

Growth and characterization of GaAs/InxGa1-xAs/GaAs axial nanowire heterostructures with symmetrical heterointerfaces

We report on the Au-assisted vapour-liquid-solid （VLS） growth of GaAs/InxGal xAs/GaAs （0.2 ≤ x ≤1） axial double-heterostructure nanowires on GaAs （ 111 ） B substrates via the metal-organic chemical vapor deposition （MOCVD） technique. The influence of the indium （In） content in an Au particle on the morphology of nanowires is investigated systematically. A short period of pre-introduced In precursor before the growth of InxGal xAs segment, coupled with a group III precursor interruption, is conducive to obtaining symmetrical heterointerfaces as well as the desired In/Ga ratio in the InxGa1-xAs section. The nanowire morphology, such as kinking and tapering, are thought to be related to the In composition in the catalyst alloy as well as the VLS growth mechanism.     

利用表面修饰调制GaAs纳米线的电子结构

采用第一性原理的密度泛函方法,研究了利用表面修饰来调制GaAs纳米线的电子结构.在计算中考虑了几种不同的表面钝化材料(H、F、Cl、Br和I)对GaAs纳米线电子结构的影响.计算结果表明,不同的原子修饰GaAs纳米线时对其能带结构的调制主要取决于它们对纳米线表面态的饱和能力.表面修饰不仅可以调节GaAs纳米线的能隙大小,而且也可以调制其能隙类型.GaAs纳米线的电子结构由表面效应和量子限制效应共同来决定.使用不同材料修饰表面的GaAs纳米线的能隙随直径的变化幅度并不相同.表面修饰为实现同种直径和同种结构的GaAs纳米线的能带工程提供了一种新的途径.     

Growth and characterization of straight InAs/GaAs nanowire heterostructures on Si substrate

Vertical InAs/GaAs nanowire (NW) heterostructures with a straight InAs segment have been successfully fabricated on Si (111) substrate by using AlGaAs/GaAs buffer layers coupled with a composition grading InGaAs segment. Both the GaAs and InAs segments are not limited by the misfit strain induced critical diameter. The low growth rate of InAs NWs is attributed to the AlGaAs/GaAs buffer layers which dramatically decrease the adatom diffusion contribution to the InAs NW growth. The crystal structure of InAs NW can be tuned from zincblende to wurtzite by controlling its diameter as well as the length of GaAs NWs. This work helps to open up a road for the integration of high-quality III-V NW heterostructures with Si.     

Growth and characterization of GaAs/In_χGa_(1-χ)As/GaAs axialnanowire heterostructures with symmetrical heterointerfaces

We report on the Au-assisted vapour-liquid-solid(VLS) growth of GaAs/InxGa1-xAs/GaAs(0.2 ≤ x ≤ 1) axial double-heterostructure nanowires on GaAs(111) B substrates via the metal-organic chemical vapor deposition(MOCVD) technique.The influence of the indium(In) content in an Au particle on the morphology of nanowires is investigated systematically.A short period of pre-introduced In precursor before the growth of InxGa1-xAs segment,coupled with a group III precursor interruption,is conducive to obtaining symmetrical heterointerfaces as well as the desired In/Ga ratio in the InxGa1-xAs section.The nanowire morphology,such as kinking and tapering,are thought to be related to the In composition in the catalyst alloy as well as the VLS growth mechanism.     

Fabrication and electrical properties of axial and radial GaAs nanowire pn junction diode arrays

We report on the fabrications and characterizations of axial and radial Ga As nanowire pn junction diode arrays.The nanowires are grown on n-doped Ga As（111）B substrates using the Au-catalyzed vapor–liquid–solid mechanism by metal–organic chemical vapor deposition（MOCVD）. Diethyl–zinc and silane are used as p- and n-type dopant precursors,respectively. Both the axial and radial diodes exhibit diode-like J–V characteristics and have similar performances under forward bias. Under backward bias, the axial diode has a large leakage current, which is attributed to the bending of the pn junction interface induced by two doping mechanisms in Au-catalyzed nanowires. The low leakage current and high rectification ratio make the radial diode more promising in electrical and optoelectronic devices.     

利用表面修饰调制GaAs纳米线的电子结构

采用第一性原理的密度泛函方法,研究了利用表面修饰来调制GaAs纳米线的电子结构. 在计算中考虑了几种不同的表面钝化材料（H、F、Cl、Br 和I）对GaAs纳米线电子结构的影响. 计算结果表明,不同的原子修饰GaAs 纳米线时对其能带结构的调制主要取决于它们对纳米线表面态的饱和能力. 表面修饰不仅可以调节GaAs纳米线的能隙大小,而且也可以调制其能隙类型. GaAs纳米线的电子结构由表面效应和量子限制效应共同来决定. 使用不同材料修饰表面的GaAs纳米线的能隙随直径的变化幅度并不相同. 表面修饰为实现同种直径和同种结构的GaAs纳米线的能带工程提供了一种新的途径.