GaAs纳米线及GaAs/In_xGa_(1-x)As/GaAs纳米线径向异质结构的无催化选区生长的实验研究

利用无催化选区金属有机化学气相沉积(SA-MOCVD)法在GaAs(111)B衬底上分别制备了GaAs纳米线和GaAs/InxGa1-xAs/GaAs纳米线径向异质结构.系统地研究了生长条件对GaAs纳米线生长的影响.实验结果显示,GaAs纳米线的形貌和长度依赖于生长温度、AsH3的分压以及SiO2掩膜表面的圆孔直径.因此可以通过调节以上因素来得到高质量的GaAs纳米线.并且发现扩散是影响无催化选区生长GaAs纳米线的主要机理.微区光致发光谱(μ-PL)表明,GaAs/InxGa1-xAs/GaAs纳米线径向异质结构被成功合成,室温(300 K)下它的发光波长为913 nm.这些结果对于GaAs纳米线及其异质结构制备的进一步研究及其在光电子器件中的应用具有很好的参考价值.     

底部反射增强的GaAs纳米线径向p-i-n结阵列太阳能电池

提出了一种基于底部反射增强的GaAs纳米线径向p-i-n结阵列的太阳能电池,利用有限差分时域法和有限元方法对其光谱吸收和光伏性能进行了研究.结果 表明,将聚合物和衬底之问的SiO2替换为低折射率的MgF2介质层,不仅显著降低了衬底的吸收损耗,还显著提高了纳米线阵列在整个波长范围内对光的吸收率.此外,通过优化i区厚度和纳米线长度,可将太阳能电池的光电转换效率提升至13.9％.该研究为实现低成本、高性能的纳米太阳能电池提供了一条可行途径.     

Stacking-faults-free zinc blende GaAs/AlGaAs axial heterostructure nanowires during vapor-liquid-solid growth

Pure zinc blende structure GaAs/AlGaAs axial heterostructure nanowires (NWs) are grown by metal organic chemical vapor deposition on GaAs(111) B substrates using Au-catalyzed vapor-liquid-solid mechanism.Al adatom enhances the influence of diameters on NWs growth rate.NWs are grown mainly through the contributions from the direct impingement of the precursors onto the alloy droplets and not so much from adatom diffusion.The results indicate that the droplet acts as a catalyst rather than an adatom collector.     

多波长飞秒激光激发下GaAs纳米线SHG特性研究

本文基于有限元法研究了直立生长于GaAs衬底的GaAs纳米线的光场响应和光场增强性质. 实验使用多个波长的飞秒激光脉冲激发GaAs纳米线, 测得了较高效率的二次谐波信号, 并首次使用宽带超连续飞秒脉冲 (1000–1300 nm) 在纳米线上获取了宽带、无杂散荧光噪声的二次谐波信号. 这种高效的二次谐波产生过程主要归因于纳米结构引起的局域场增强效应. 本文阐明了GaAs纳米线的二次谐波倍频特性, 这些结果对于其在纳米光学中的光器件、 光集成等领域的进一步研究和实际应用具有很好的参考价值. 关键词： GaAs纳米线 二次谐波 飞秒激光     

Growth and characterization of GaAs/InxGa1-xAs/GaAs axial nanowire heterostructures with symmetrical heterointerfaces

We report on the Au-assisted vapour-liquid-solid （VLS） growth of GaAs/InxGal xAs/GaAs （0.2 ≤ x ≤1） axial double-heterostructure nanowires on GaAs （ 111 ） B substrates via the metal-organic chemical vapor deposition （MOCVD） technique. The influence of the indium （In） content in an Au particle on the morphology of nanowires is investigated systematically. A short period of pre-introduced In precursor before the growth of InxGal xAs segment, coupled with a group III precursor interruption, is conducive to obtaining symmetrical heterointerfaces as well as the desired In/Ga ratio in the InxGa1-xAs section. The nanowire morphology, such as kinking and tapering, are thought to be related to the In composition in the catalyst alloy as well as the VLS growth mechanism.     

5-氨基-5,6,7,8-四氢-2(1H)-喹啉酮的简便合成

改进了合成5-氨基-5,6,7,8-四氢-2(1H)喹啉酮(5)的方法。以环己二酮为原料,通过亚胺化,Michael反应-环化反应,成肟反应和碱性条件下镍铝合金催化还原共四步反应合成了5,总收率19.6%,其结构经1HNMR,IR和MS确证。     

利用表面修饰调制GaAs纳米线的电子结构

采用第一性原理的密度泛函方法,研究了利用表面修饰来调制GaAs纳米线的电子结构.在计算中考虑了几种不同的表面钝化材料(H、F、Cl、Br和I)对GaAs纳米线电子结构的影响.计算结果表明,不同的原子修饰GaAs纳米线时对其能带结构的调制主要取决于它们对纳米线表面态的饱和能力.表面修饰不仅可以调节GaAs纳米线的能隙大小,而且也可以调制其能隙类型.GaAs纳米线的电子结构由表面效应和量子限制效应共同来决定.使用不同材料修饰表面的GaAs纳米线的能隙随直径的变化幅度并不相同.表面修饰为实现同种直径和同种结构的GaAs纳米线的能带工程提供了一种新的途径.     

Growth and characterization of straight InAs/GaAs nanowire heterostructures on Si substrate

Vertical InAs/GaAs nanowire (NW) heterostructures with a straight InAs segment have been successfully fabricated on Si (111) substrate by using AlGaAs/GaAs buffer layers coupled with a composition grading InGaAs segment. Both the GaAs and InAs segments are not limited by the misfit strain induced critical diameter. The low growth rate of InAs NWs is attributed to the AlGaAs/GaAs buffer layers which dramatically decrease the adatom diffusion contribution to the InAs NW growth. The crystal structure of InAs NW can be tuned from zincblende to wurtzite by controlling its diameter as well as the length of GaAs NWs. This work helps to open up a road for the integration of high-quality III-V NW heterostructures with Si.     

Growth and characterization of GaAs/In_χGa_(1-χ)As/GaAs axialnanowire heterostructures with symmetrical heterointerfaces

We report on the Au-assisted vapour-liquid-solid(VLS) growth of GaAs/InxGa1-xAs/GaAs(0.2 ≤ x ≤ 1) axial double-heterostructure nanowires on GaAs(111) B substrates via the metal-organic chemical vapor deposition(MOCVD) technique.The influence of the indium(In) content in an Au particle on the morphology of nanowires is investigated systematically.A short period of pre-introduced In precursor before the growth of InxGa1-xAs segment,coupled with a group III precursor interruption,is conducive to obtaining symmetrical heterointerfaces as well as the desired In/Ga ratio in the InxGa1-xAs section.The nanowire morphology,such as kinking and tapering,are thought to be related to the In composition in the catalyst alloy as well as the VLS growth mechanism.     

Fabrication and electrical properties of axial and radial GaAs nanowire pn junction diode arrays

We report on the fabrications and characterizations of axial and radial Ga As nanowire pn junction diode arrays.The nanowires are grown on n-doped Ga As（111）B substrates using the Au-catalyzed vapor–liquid–solid mechanism by metal–organic chemical vapor deposition（MOCVD）. Diethyl–zinc and silane are used as p- and n-type dopant precursors,respectively. Both the axial and radial diodes exhibit diode-like J–V characteristics and have similar performances under forward bias. Under backward bias, the axial diode has a large leakage current, which is attributed to the bending of the pn junction interface induced by two doping mechanisms in Au-catalyzed nanowires. The low leakage current and high rectification ratio make the radial diode more promising in electrical and optoelectronic devices.