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We clarify the effect of the stress in GaN templates on the subsequent AIlnGaN deposition by simply growing 150nm AIInGaN on a 30μm GaN template (sample 1) prepared by hydride vapor phase epitaxy and a 2.3μm thin control GaN template (sample 2) prepared by metalorganic chemical vapor deposition. X-ray diffraction and secondary iron mass spectroscopy measurements reveal the stress states (tensile stress and full relaxed for samples 1 and 2, respectively) and compositions (Al0.169In0.01 Ga0.821N, Al0.171In0.006 Ga0.823N for samples 1 and 2, respectively) of AlInGaN. By carefully eliminating other possible factor, as template surface roughness, it is concluded that different stress states of AlInGaN should stem from different stress states of GaN templates.  相似文献   
2.
Graphene on gallium nitride(GaN) will be quite useful when the graphene is used as transparent electrodes to improve the performance of gallium nitride devices. In this work, we report the direct synthesis of graphene on GaN without an extra catalyst by chemical vapor deposition. Raman spectra indicate that the graphene films are uniform and about 5–6 layers in thickness. Meanwhile, the effects of growth temperatures on the growth of graphene films are systematically studied, of which 950℃ is found to be the optimum growth temperature. The sheet resistance of the grown graphene is 41.1Ω/square,which is close to the lowest sheet resistance of transferred graphene reported. The mechanism of graphene growth on GaN is proposed and discussed in detail. XRD spectra and photoluminescence spectra indicate that the quality of GaN epi-layers will not be affected after the growth of graphene.  相似文献   
3.
半导体照明是21世纪初兴起的产业,也是我国第三代半导体材料成功产业化的第一个突破口,技术发展日新月异,是国际高科技领域竞争的焦点之一。目前,我国半导体照明产业已经形成了完整的产业链,功率白光LED、硅基LED和全光谱LED等核心技术同步国际,紫外LED、可见光通讯、农业光照和光医疗等创新应用走在世界前列。介绍了我国在半导体照明方面的研究进展,回顾了相关产业的发展情况,并对未来进行了展望。  相似文献   
4.
AlGaN基深紫外LED由于具有高调制带宽和小芯片尺寸,在紫外光通信领域受到越来越多的关注.本研究通过改变生长AlGaN量子垒层的Al源流量,生长了三种具有不同量子垒高度的深紫外LED,研究了量子垒高度对深紫外LED光电特性和调制特性的影响.研究发现,随着量子垒高度的增加,深紫外LED的光功率出现先增加后减小的趋势,量...  相似文献   
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吴奎  魏同波  蓝鼎  郑海洋  王军喜  罗毅  李晋闽 《中国物理 B》2014,23(2):28504-028504
Wafer-scale SiO2 photonic crystal (PhC) patterns (SiO2 air-hole PhC, SiO2-pillar PhC) on indium tin oxide (ITO) layer of GaN-based light-emitting diode (LED) are fabricated via novel nanospherical-lens lithography. Nanoscale polystyrene spheres are self-assembled into a hexagonal closed-packed monolayer array acting as convex lens for expo- sure using conventional lithography instrument. The light output power is enhanced by as great as 40.5% and 61% over those of as-grown LEDs, for SiO2-hole PhC and SiO2-pillar PhC LEDs, respectively. No degradation to LED electrical properties is found due to the fact that SiO2 PhC structures are fabricated on ITO current spreading electrode. For SiO2- pillar PhC LEDs, which have the largest light output power in all LEDs, no dry etching, which would introduce etching damage, was involved. Our method is demonstrated to be a simple, low cost, and high-yield technique for fabricating the PhC LEDs. Furthermore, the finite difference time domain simulation is also performed to further reveal the emission characteristics of LEDs with PhC structures.  相似文献   
6.
Thick GaN films of high quality are directly grown on wet-etching patterned sapphire in a vertical hydride vapour phase epitaxy reactor. The optical and structural properties of GaN films are studied using scanning electronic microscopy and cathodoluminescence. Test results show that initial growth of hydride vapour phase epitaxy GaN occurs not only on the mesas but also on the two asymmetric sidewalls of the V-shaped grooves without selectivity. After the two-step coalescence near the interface, the GaN films near the surface keep on growing along the direction perpendicular to the long sidewall. Based on Raman results, GaN of the coalescence region in the grooves has the maximum residual stress and poor crystalline quality over the whole GaN film, and the coalescence process can release the stress. Therefore, stress-free thick GaN films are prepared with smooth and crack-free surfaces by this particular growth mode on wet-etching patterned sapphire substrates.  相似文献   
7.
Thick GaN films with high quality are directly grown on sapphire in a home-built vertical hydride vapour phase epitaxy (HVPE) reactor. The optical and structural properties of large scale columnar domains near the interface are studied using cathodoluminescence and micro-Raman scattering. These columnar domains show a strong emission intensity due to extremely high free carrier concentration up to 2 × 10^19 cm^-3, which are related with impurities trapped in structural defects. The compressive stress in GaN film clearly decreases with increasing distance from interface. The quasi-continuous columnar domains play an important role in the stress relaxation for the upper high quality layer.  相似文献   
8.
Phonons are the primary heat carriers in non-metallic solids. In compositionally heterogeneous materials, the thermal properties are believed to be mainly governed by the disrupted phonon transport due to mass disorder and strain fluctuations, while the effects of compositional fluctuation induced local phonon states are usually ignored.Here, by scanning transmission electron microscopy electron energy loss spectroscopy and sophisticated calculations, we identify the vibrational properties of in...  相似文献   
9.
紫外光通信在激光雷达、战术通信、航空航天内部安全通讯和片上集成通信等领域有着重要应用前景。传统的紫外光通信LED光源的调制带宽窄、输出光功率低和制造工艺复杂等缺点限制了它在长距离、高速率通信和片上集成通信领域的广泛应用。实验表明,增加单个器件发光面积可提升光输出功率,但增加的器件电容对带宽提升是不利的,因此紫外光通信LED未来的重要研究方向是提升并优化带宽的同时增加器件的光功率密度。UVC Micro-LED器件有着光提取效率高、时间常数小、载流子寿命短、调制速率快及工作电流密度高等出色性能,因此在通讯领域受到科研界和工业界的广泛青睐。本文总结了紫外LED、特别是UVC MicroLED的相关研究进展,并重点介绍了它们在光通信及其片上集成互联方面的应用。研究发现,对UVC MicroLED及其阵列制备与性能提升加强研究,是未来提升自由空间和片上互联紫外通信系统性能的最佳解决方案之一。  相似文献   
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