ZrCuSiAs型锰基化合物ThMnSbN中的化学压力效应

采用固相反应法合成了一种Zr Cu Si As型准二维层状锰基化合物Th Mn Sb N.基于X射线粉末衍射的结构精修显示,该化合物属于P4/nmm空间群.其晶胞参数为a=4.1731?, c=9.5160?.电输运测量显示,该化合物电阻率随温度下降缓慢上升,且在16 K附近出现电阻率异常.与此同时,该材料的磁化率在同一温度附近出现异常,显示出类似磁性相变的行为.进一步的比热测量中没有观察到磁相变导致的比热异常.另外,低温下的比热分析显示,该材料的电子比热系数为γ=19.7 m J·mol^–1·K^–2,远高于其他同类锰基化合物.该结果与电输运测量中观察到的低电阻率行为相符,暗示Th Mn Sb N中费米面附近存在可观的电子态密度.基于对一系列Zr Cu Si As型化合物晶体结构细节的比较,分析了含有萤石型Th₂N₂层的系列化合物中导电层所受化学压力的不同作用形式.     

In插入层对硅衬底外延InN晶体质量和光学特性的影响

在Si（111）衬底上分别预沉积0,0.1,0.5,1 nm厚度的In插入层后,采用等离子辅助分子束外延法制备了纤锌矿结构的InN材料,结合X射线衍射（XRD）、扫描电子显微镜（SEM）、吸收谱及光致发光谱研究了不同厚度的In插入层对外延InN晶体质量和光学特性的影响。XRD和SEM的测试结果表明,在Si衬底上预沉积0.5 nm厚的In插入层有利于改善外延InN材料的形貌,提高材料的晶体质量。吸收谱和光致发光谱测试表明,0.5 nm厚In插入层对应的InN样品吸收边蓝移程度最小,光致发射谱半峰宽最窄,并且有最高的带边辐射复合发光效率。可见,引入适当厚度的InN插入层可以改善Si衬底上外延InN材料的晶体质量和光学特性。     

Topological Dirac surface states in ternary compounds GeBi2Te4, SnBi2Te4 and Sn0.571Bi2.286Se4

Using high-resolution angle-resolved and time-resolved photoemission spectroscopy, we have studied the low-energy band structures in occupied and unoccupied states of three ternary compounds GeBi₂Te₄, SnBi₂Te₄ and Sn_0.571Bi_2.286Se₄ near the Fermi level. In previously confirmed topological insulator GeBi₂Te₄ compounds, we confirmed the existence of the Dirac surface state and found that the bulk energy gap is much larger than that in the first-principles calculations. In SnBi₂Te₄ compounds, the Dirac surface state was observed, consistent with the first-principles calculations, indicating that it is a topological insulator. The experimental detected bulk gap is a little bit larger than that in calculations. In Sn_0.571Bi_2.286Se₄ compounds, our measurements suggest that this nonstoichiometric compound is a topological insulator although the stoichiometric SnBi₂Se₄ compound was proposed to be topological trivial.     

In插入层对硅衬底外延InN晶体质量和光学特性的影响

在Si(111)衬底上分别预沉积0,0.1,0.5,1 nm厚度的In插入层后,采用等离子辅助分子束外延法制备了纤锌矿结构的InN材料,结合X射线衍射(XRD)、扫描电子显微镜(SEM)、吸收谱及光致发光谱研究了不同厚度的In插入层对外延InN晶体质量和光学特性的影响。XRD和SEM的测试结果表明,在Si衬底上预沉积0.5 nm厚的In插入层有利于改善外延InN材料的形貌,提高材料的晶体质量。吸收谱和光致发光谱测试表明,0.5 nm厚In插入层对应的InN样品吸收边蓝移程度最小,光致发射谱半峰宽最窄,并且有最高的带边辐射复合发光效率。可见,引入适当厚度的InN插入层可以改善Si衬底上外延InN材料的晶体质量和光学特性。     

Low-temperature synthesis of apatite-type La_(9.33)Ge_6O_(26) as electrolytes with high conductivity

In the present study,high-quality apatite-type La_(9.33)Ge_6O_(26) powders are successfully synthesized by a facile moltensalt synthesis method(MSSM) at low temperatures,using Li Cl,Li Cl/Na Cl mixture(mass ratio 1:1) as molten salt,respectively.Experimental results indicate that the optimal mass ratio between reactant and molten salt is 1:2,and Li Cl/Na Cl mixed molten-salt is more beneficial for forming high-quality La_(9.33)Ge_6O_(26) powders than Li Cl individual molten-salt.Comparing with the conventional solid-state reaction method(SSRM),the synthesis temperature of apatitetype La_(9.33)Ge_6O_(26) powders using the MSSM decreases more than 350?C,which can effectively avoid Ge loss in the preparation process of precursor powders.Furthermore,the powders obtained by the MSSM are homogeneous,nonagglomerated and well crystallized,which are very favorable for gaining dense pellets in the premise of avoiding Ge loss.On the basis of high-quality precursor powders,the dense and pure ceramic pellets of La_(9.33)Ge_6O_(26) are gained at a low temperature of 1100?C for 2 h,which exhibit higher conductivities(σ850?C(Li Cl)= 2.3 × 10~(-2) S·cm~(-1),σ850 ?C(Li Cl/Na Cl) = 4.9 × 10~(-2) S·cm~(-1)) and lower activation energies(Ea(Li Cl)= 1.02 e V,Ea(Li Cl/Na Cl)= 0.99 e V) than that synthesized by the SSRM.