GaN Films Grown on Si （111） Substrates Using a Composite Buffer with Low Temperature A1N Interlayer

A GaN interlayer between low temperature （LT） A1N and high temperature （PIT） A1N is introduced to combine HT AIN, LT A1N and composition-graded A1GaN as a novel buffer layer for GaN films grown on Si （111） substrates. The crystal quality, surface morphology and strain state of the GaN film with this new buffer are compared with those of GaN grown on a conventional buffer structure. By changing the thickness of LT A1N, the crystal quality is optimized and the crack-free GaN film is obtained. The in-plane strain in the GaN film can be changed from tensile to compressive strain with the increase in LT A1N thickness.     

Direct observation of the carrier transport process in InGaN quantum wells with a pn-junction

A new mechanism of light-to-electricity conversion that uses InGaN/GaN QWs with a p-n junction is reported.According to the well established light-to-electricity conversion theory,quantum wells(QWs) cannot be used in solar cells and photodetectors because the photogenerated carriers in QWs usually relax to ground energy levels,owing to quantum confinement,and cannot form a photocurrent.We observe directly that more than 95% of the photoexcited carriers escape from InGaN/GaN QWs to generate a photocurrent,indicating that the thermionic emission and tunneling processes proposed previously cannot explain carriers escaping from QWs.We show that photoexcited carriers can escape directly from the QWs when the device is under working conditions.Our finding challenges the current theory and demonstrates a new prospect for developing highly efficient solar cells and photodetectors.