Design and preparation of multilayer optical coatings for laser crystal Nd：YVO4 and KTP

Design and preparation of multilayer optical coatings are investigated on laser crystal Nd：YVO4, YVO4, and frequency doubling crystal KTP substrate. Multilayer optical coatings are deposited on one surface of the crystals using the ion beam sputtering technique, and the other surface is coated with a single SiO2 as protective layer. For the YVO4 crystal after coating, the reflectivity at 1 064 and 532 nm are greater than 99.9% and 99.8%, respectively, and the transmissivity at 808 nm is greater than 91.5%. For the KTP crystal after coating, the reflectivity at 1064 nm is greater than 99.95%, and the transmissivity at 532 nm is greater than 99.5%. After thermal annealing, the transmissivity can be improved. The obtained coated crystals can be used in high Dower solid-state lasers.     

光学薄膜特性的锥角效应数值分析

建立非平行光入射多层膜的模型,给出了在圆形光束锥角入射时的薄膜特性表达式,对三类典型光学薄膜即多腔滤光片、非偏振分光薄膜和非偏振截止滤光薄膜的特性进行了数值实验。研究结果表明:随着光束入射锥角的增加,多腔滤光片的影响是中心波长向短波方向移动,透射率下降和通带形状退化;非偏振分光薄膜的s和p偏振透射率增加,宽带波纹度增加;非偏振截止滤光薄膜的通带透射率出现周期振荡,s偏振的通带波纹度大于p偏振,通带波纹度总体具有增加的趋势,过渡区的陡度具有变大的趋势。     

金属氧化物薄膜光学常数计算物理模型应用研究

采用离子束溅射(IBS)方法制备了HfO₂和Ta₂O₅两种金属氧化物薄膜,通过测量薄膜的椭偏参数,使用非线性最小二乘法反演计算获得薄膜的光学常数。 在拟合过程中,采用L₈(27)正交表设计了8组反演计算实验,在初始选定Cauchy模型后,对HfO₂薄膜拟合影响最大的为表面层模型,对Ta₂O₅薄膜拟合影响最大的为折射率梯度模型。 确定了不同物理模型对拟合函数MSE的影响权重和拟合过程中模型选择的次序,按照确定的模型选择次序拟合,最后加入弱吸收模型反演计算两种薄膜的光学常数,反演计算的MSE相对初始MSE可下降79%和39%,表明拟合过程模型选择物理意义明确,具有广泛的应用价值。 在500 nm处,Ta₂O₅薄膜的折射率梯度大于HfO₂薄膜, 而HfO₂薄膜消光系数大于Ta₂O₅薄膜。 表明Hf金属与Ta金属相比容易氧化形成稳定的氧化物,HfO₂薄膜的吸收要高于Ta₂O₅薄膜。     

Study on optical anisotropy properties of SiO2 films with different thermal annealing temperatures

SiO2 films are deposited on Si substrates by an ion beam sputtering technique and continuously annealed in a quartz culture dish in air at various annealing temperature ranging from 20 to 750 ℃ with a step of 100 ℃ for a fixed time of 24 h. The effects of thermal treatment on optical anisotropy properties of SiO2 films are investigated by spectroscopic ellipsometry. When the annealing temperature is 550℃, the optical anisotropy properties of SiO2 film is minimum. The obtained results indicate that the optical anisotropy properties of SiO2 films can be improved by a proper thermal annealing process.     

Aging effect of optical properties on low loss antireflection coatings for laser optics

For high precise laser systems like laser gyro, gravitational waves interferometers, the optical components which lie in the cavity or laser path need to control the total loss, scattering, reflection, absorption, and so on. Low loss high-reflection （HR） and antireflection （AR） coating mirrors are their key components and their aging optical properties are the most important performance parameters for long operating lifetime. Low loss AR coatings on quartz substrates for He-Ne laser are designed and manufactured by ion beam sputtering （IBS） technology. Ta205 and SiO2 are used as high and low refractive index materials and the obtained total optical loss of AIR coating is less than 50 ppm. Aging optical properties of AR coatings are investigated as a function of time placed in the air. When the placed time exceeds 40 days, optical properties tend to be stabilization. The obtained results indicate that the prepared low loss AR coatings have good stability of optical properties and can be applied for high precise laser systems.     

基底和膜层-基底系统的赝布儒斯特角计算(英文)

对基底和膜层-基底系统的赝布儒斯特角进行了数值计算.结果显示:当基底的消光系数小于0.01时,基底的赝布儒斯特角主要是由折射率决定;当基底的消光系数大于0.1时,基底的赝布儒斯特角不仅与折射率有关,而且还与消光系数有关,随着消光系数发生后周期性变化.研究表明:单层膜-基底系统的赝布儒斯特角主要由膜层的物理厚度、折射率、基底的光学常量所决定;在HfO2-硅和HfO2-融石英基底系统中,赝布儒斯特角随着入射光波长和膜层厚度的变化呈现准周期性规律变化,可能是由入射光在膜层的干涉效应引起的.     

Optical constants of aluminum films prepared by electron beam evaporation

The metal aluminum （Al） is widely used because it has high reflectivity from the ultraviolet to the infrared band. But the new deposited Al films is exposed to the atmosphere, it forms transparent Al2O3 films on its surface at once. In this letter, the Al films is deposited on the quartz substrate by electron beam evaporation. The effect of Al films oxidation on refractive index and extinction coefficient is investigated by spectroscopic ellipsometry （SE）. The optical constants of Al films change with the increase of oxidation time. The two parameters become stable when these films are exposed in air more than 2 days.     

Microstructure and optical properties of Ge films prepared by ion beam assisted deposition

Germanium （Ge） films are prepared on BK7 glass and multispectral zinc sulfide （m-ZnS） substrates by ion beam assisted deposition （IBAD）. The effects of substrate temperature, deposition rate, and ion energy on the microstructure and optical properties of the films are investigated. It can be concluded that Ge film deposited with higher rate or ion energy has more optical absorption, while ion energy below 150 eV helps to reduce film absorption. Film refractive index increases with film deposition rate and bombardment ion energy while it is below 300 eV. And higher growth rate or bombardment ion energy can weaken film diffraction intensity.