非均匀铁弹畴变对离面极化压电陶瓷应力强度因子的影响研究

基于文献中报道的试验结果，本文考虑非均匀的畴变过程区，它包含一个位于中心的饱和区和环绕饱和区的渐变区．为了描述外加应力引起的部分铁弹畴变，本文采用一个显式的基于最小能量原理的非均匀畴变准则．考虑离面极化的压电陶瓷，假设其初始极化矢量平行于离面方向．畴变后的电畴位于面内，具体方位由最大释放功来确定．基于非均匀畴变准则，本文给出了裂尖处非均匀畴变区几何及畴变体积分数的分布．并在静止裂纹和稳态扩展裂纹两种特殊情况下计算了铁弹畴变对裂尖处应力强度因子的影响．结果表明：(1) 静止裂纹尖端处的畴变减小了材料的起裂强度；(2) 准静态稳态裂纹附近的畴变增加了材料的断裂强度．且理论预测的R曲线渐近值与试验结果定量吻合．     

Ab initio方法研究~(40)Ca~(35)Cl分子的自旋轨道耦合效应和跃迁性质

本文研究了~(40)Ca~(35)Cl分子低态的自旋轨道耦合分裂以及获得更精确的光谱常数和更高的激发态.以从头算理论为基础,使用多参考组态相互作用方法获得了该分子的势能曲线和自旋轨道分裂,之后求解径向一维薛定谔方程获得光谱常数.得到了~(40)Ca~(35)Cl分子7个Λ-S低电子态的势能曲线和永久偶极矩,以及A~2Π→~2Σ~+,1~2Δ和C~2Π→~2Σ~+,1~2Δ跃迁的跃迁偶极矩,得到的光谱常数(不管是考虑了自旋轨道耦合(SOC)还是没有考虑SOC)与实验值非常符合,且要好于之前的理论计算结果 .值得注意的是,目前的计算还首次得到了C~2Π→~2Σ+,1~2Δ跃迁的跃迁性质,为之后实验观察~(40)Ca~(35)Cl分子的高激发态光谱和跃迁性质提供有益的理论参考.     

自旋涨落与非常规超导配对

铜氧化物高温超导、铁基高温超导、重费米子超导和k-型层状有机超导等超导体的超导态都与磁性有序态相邻,且超导能隙在动量空间一般存在变号.因此,这些超导体的超导机理被认为有别于常规BCS超导中的电子交换声子导致的各向同性s-波配对.在这些非常规超导中,自旋涨落被认为是导致电子形成库珀对的主要起源之一.本文主要以铜基和铁基高温超导为例简要综述非常规超导中的自旋序和自旋涨落性质,二维哈伯徳模型中超导的起因及在解释铜基和铁基高温超导配对对称性的应用,以及与非常规超导紧密相关的中子自旋共振模性质和理论解释.我们认为,尽管磁性和超导性的相互影响已经过多年研究,但仍是当前一个富有挑战的活跃研究领域.     

Theoretical Study of Interesting Fine-Structure Splittings Based on a Scenario for Precise Calculations

Based on the multi-configuration Dirac-Fock self-consistent field method, a scenario has been presented to calculate the fine-structure energy levels of C^2＋ and Si^2＋ excited states （31 D2 and 33D1,2,3）. The Breit interactions and quantum electrodynamics corrections are added as perturbations. The present calculation results are found to be in excellent agreement with the experimental data. By means of the precise calculation procedure, we elucidate that four competitive mechanisms influence the interesting fine-structure splittings in C^2＋ and Si^2＋, such as spin-orbit interactions, relativistic corrections of exchange interactions, the Breit interactions and electron correlation effects. Furthermore, the mechanism of relativistic correction of exchange interactions has been studied clearly. We elucidate that the inner shell 2p1/2,3/2 orbitals are essential to relativistic corrections of exchange interactions which are crucial for the final anomalous fine-structure splittings.     

Thermal Entanglement of an XY Two-Qutrit Spin Chain with Dzialoshinski-Moriya Interaction

The effect of Dzialoshinski-Moriya （DM） interaction on thermal entanglement of an XY two-qutrit spin chain is investigated. We find that DM interaction and the anisotropy parameter can enhance quantum thermal entanglement to a maximal value individually. However, when both of them take large values, the entanglement is not enhanced, but is destroyed. Our analysis will shed some light on the understanding of the effect of the DM interaction on thermal entanglement of an XY two-qutrit spin chain.     

Recent results for single meson production from the Crystal-Barrel/TAPS experiment at ELSA

The present focus of the CBELSA/TAPS experiment is on meson-photoproduction off the nucleon using polarized photons and polarized targets. Here first preliminary results on the reactions γp → pπ and γp → pπ for both circularly and linearly polarized photons and a longitudinally polarized target are presented. Preliminary results for the beam asymmetry ∑ and the double polarization observable G have been extracted for both reactions using the linear polarization data. From the circular polarization data the observable E has been determined. Due to the near 4π angular coverage of the detector system these results cover almost the full solid angle.     

Polaron in Bose-Einstein-Condensation System

We consider the motion of an impurity in a Bose-Einstein condensate system at T = 0 K with the contact interaztions for boson-boson and boson-impurity. Under the forward-scattering approximation, we obtain a Fr6hlich-like Hamiltonian for this system, which means that a polaron can be formed. The effective mass, the phonon number and the energy to form a polaron are obtained. We also discuss the validity of the forwardscattering approximation for this system.     

Theoretical Analysis of Interference Nanolithography of Surface Plasmon Polaritons without a Match Layer

Interference nanolithography techniques based on long-range surface plasmon polaritons （LR-SPP） are hardly ever achieved by experiments at present. One key reason is that suitable liquid materials are difflcult to find as the match layer connects the metal film and the resist. We redesign a Kretschmann-Raether structure for interference lithography. A polymer layer is coated under the metal film, and an air layer is placed between the polymer layer and the resist layer. This design not only avoids the above-mentioned question of the match layer, but also can form a soft contact between the polymer layer and the resist layer and can protect the exposure pattern. Simulation results confirm that a device with an appropriately thick polymer layer can form high intensity and contrast interference fringes with a critical dimension of about λ/7 in the resist. In addition, the fabrication of the device is very easy.