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141.
The radical co‐ and terpolymerization of 4‐[(α,β,β‐trifluorovinyl)oxy]bromo benzene (TFVOBB) with 1,1‐difluoroethylene (or vinylidene fluoride, VDF, or VF2), hexafluoropropene (HFP), perfluoromethyl vinyl ether (PMVE), and chlorotrifluroroethylene (CTFE) is presented. Although TFVOBB could be thermocyclodimerized, it could not homopolymerize under radical initiation. TFVOBB could be copolymerized in solution under a radical initiator with VDF or CTFE comonomers, while its copolymerization with HFP or PMVE were unsuccessful. The terpolymerization of TFVOBB with VDF and HFP, or VDF and PMVE, or VDF and CTFE also led to original fluorinated terpolymers bearing bromoaromatic side‐groups. The conditions of co‐ and terpolymerization were optimized in terms of the nature of the radical initiators, and of the nature of solvents (fluorinated or nonhalogenated). Various monomer concentrations in the co‐ and terpolymers were assessed by 19F and 1H‐NMR spectroscopy. The thermal and physico chemical properties were also studied. © 2004 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 42: 5077–5097, 2004  相似文献   
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It has been shown by the19F NMR method that the relative polarities of nitrogenelement bonds in 2-(4-fluorophenyl)benzimidazole and its PhHg and PPh3Au derivatives increase in the order N-H19F NMR. It has been found that these reactions occur by a bimolecular associative mechanism and that the N-H bond is substantially less reactive than the N-Hg and N-Au bonds, which have identical reactivities within the limits of sensitivity of the method used.Translated fromIzvestiya Akademii Nauk. Seriya Khimicheskaya, No. 8, pp. 1574–1580, August, 1995.This work was carried out with financial support from the Russian Foundation for Basic Research (Project No. 93-03-5528).  相似文献   
145.
Trichloroethylene has been found to act as a rate enhancing co-factor in the liquid phase, tantalum (V) halide catalyzed, fluorine-for-chlorine exchange reaction of 1,2-dichloro-1,1-difluoroethane (R-132b) to 2-chloro-1,1,1-trifluorethane (R-133a). Several trifluoromethyl substituted benzenes have also been found to be rate-enhancing solvents.  相似文献   
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 利用内径为57 mm的压缩气炮,在撞击速度为0.2~1.2 km/s(相应的靶中压力为3~15 GPa)范围内进行对称碰撞实验,以研究TC4(Ti-Al6-V4)钛合金在一维应变冲击压缩条件下的绝热剪切现象。对回收得到的受冲击样品,在扫描电镜(SEM)下进行细观金相分析。结果指出,一维应变冲击压缩条件下,TC4钛合金中绝热剪切带产生的对称碰撞速度阈值为500 m/s(相当于样品中的压力为5.87 GPa);主剪切带与冲击方向约为45°角,带上有圆形和椭圆形两种孔洞且随碰撞速度的增大而增多和长大,这是典型的韧性损伤特征。随碰撞速度增大,产生与主剪切带成15°角的支剪切带。这些与理论预言相符。X射线能谱分析结果指出,剪切带内材料发生了(α+β)→β相的转变,是典型的相变带。剪切带的温度估算与实验提供的信息吻合。  相似文献   
148.
The utility of fluoride salts as potential base in a va-riety of synthetic reactions has been recognized in re-cent years.1 However, low solubility of fluoride salts in ordinary solvents hampers their wide applications in organic synthesis. On the other hand, there has been increasing use of inorganic solid supports as catalysts for many years2 resulting in higher selectivity, milder reaction conditions and easier work-up. Especially po-tassium fluoride-coated alumina (KF-alumina) has been a …  相似文献   
149.
Synthesis of ZnAl2O4/α-Al2O3 complex substrates and growth of GaN films   总被引:1,自引:0,他引:1  
With the solid phase reaction between pulsed-laser-deposited (PLD) ZnOfilm and α-Al2O3 substrate, ZnAl2O4/α-Al2O3 complex substrates were synthesized. X-ray diffraction (XRD) spectra show that as the reaction proceeds, ZnAl2O4 changes from the initial (111)-oriented single crystal to poly-crystal, and then to inadequate (111) orientation. Corresponding scanning electron microscope (SEM)images indicate that the surface morphology of ZnAl2O4 transforms from uniform islands to stick structures, and then to bulgy-line structures. In addition, XRDspectra present that ZnAl2O4 prepared at low temperature is unstable at the environment of higher temperature. On the as-obtained ZnAl2O4/α-Al2O3 substrates, GaN films were grown without any nitride buffer using light-radiation heating low-pressure MOCVD (LRH-LP-MOCVD). XRD spectra indicate that GaN film on this kind of complex substrate changes from c-axis single crystal to poly-crystal as ZnAl2O4 layer is thickened. For the single crystal GaN, its full width at half maximum (FWHM) of X-ray rocking curve is 0.4°. Results indicate that islands on thin ZnAl2O4 layer can promote nucleation at initial stage of GaN growth, which leadsto the (0001)-oriented GaN film.  相似文献   
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