多孔硅表面钝化对其发光性能的影响

报道多孔硅（PS）的表面钝化对其光致发光（PL）和电致发光（EL）的影响。PL和EL谱表明,经钝化处理的PS的PL和EL强度明显增强,且发光峰位较大蓝移;存放实验表明,经钝化处理的PS的PL和EL发光强度和发光峰位具有较好的稳定性;I～V曲线显示,经钝化处理的PS发光器件具有较低的启动电压。这些结果表明：用钝化处理的方法是提高PS的PL和EL强度和稳定性及改善其器件性能的有效途径。     

N掺杂对非晶C薄膜的电子结构与光学性质的影响

用直流磁控溅射法制备了非晶C薄膜及N掺杂非晶C(a-C∶N)薄膜,用紫外-可见分光光谱仪、椭圆偏振仪、俄歇电子能谱(AES)等对薄膜进行了检测。结果表明：随源气体中N气含量的增加,透过率和折射率变小, 而光学带隙先增大后减小; 当薄膜中N的含量很少,N的掺入对sp3杂化C起稳定作用,使得薄膜光学带隙E_g增大。而较高量N的掺入抑制了sp3杂化C的形成,提高了薄膜中sp2键含量,使得薄膜光学带隙变小。参数D定义为俄歇电子能谱(AES)中最大正峰和最低负峰之间的距离,用俄歇电子能谱中的D值来计算薄膜的sp2键的百分含量,俄歇电子能谱(AES)表征也表明：较高量的N的掺入抑制了sp3杂化C的形成。所以应该考虑在较低N分压条件下掺N来改善非晶C薄膜的光学性能。     

填充碳纳米管/石墨的复合型电磁波屏蔽膜

介绍一种填充碳纳米管／石墨的复合型电磁波屏蔽膜的组成、制备及其对耐老化性能,实验发现：当碳纳米管／石墨的配比为1／7－1／2、有机聚合物／导电填料的配比为29．6／70．4－32．4／67．6时,该屏蔽具有最佳的电性能、屏蔽性能和加工性能,且在一定条件下具有负的温度系数。用多层结构模型讨论了该屏蔽膜的导电性,并与铜、镍、危险性膜的屏蔽特性进行了比较。     

多孔硅的表面碳膜钝化

报道对多孔硅（ＰＳ）进行碳膜（ＣＦ）钝化处理的结果。红外吸收光谱表明,经钝化处理样品的表面由Ｓｉ－Ｃ、Ｓｉ－Ｎ和Ｓｉ－Ｏ键所覆盖;荧光我谱表明,经钝化处理的样品较未处理的样品发光强度提高４￣４．５倍,且发光峰位明显蓝移;存放实验显示,经钝化处理的样品发光强度稳定、发光峰位不变。这些结果表明正丁胺可以在多孔硅表面形成优良的钝化碳膜,是一种十分有效的多孔硅后处理途径。     

提高多孔硅传感特性的一种新方法(英文)

研究了多孔硅(PS)吸附有机溶剂分子后对多孔硅荧光谱的淬灭效应。结果表明:淬灭多孔硅发光的有机溶剂分子是极性分子,有机溶剂分子的极性不同对多孔硅发光的淬灭程度也不同,且有些有机溶剂分子吸附氧化多孔硅比吸附多孔硅引起的发光淬灭具有更好的可逆性和选择性;用含有胺基的正丁胺(CH3CH2CH2CH2-NH2)作碳源,用射频辉光放电等离子系统在多孔硅表面沉积c n膜对多孔硅进行钝化处理后发现:其电致发光强度明显增强,发光峰位兰移,且在大气中存放60天后,其电致发光谱强度基本不衰减,峰位不再移动。经钝化处理的器件较未经处理的器件具有小的串联电阻Rs和低的驱动电压。这为提高多孔硅的传感特性提供了一种新方法。     

Efficient visible electroluminescence from porous silicon diodes with low driven voltage

By using n-butylamine as carbon resource, diamond-like carbon film (DLCF) was deposited on the p-n porous silicon (PS) surface by means of a radio-frequency glow discharge plasma system. Electroluminescent (EL) spectra show that EL intensity of the passivated PS diodes increases by 4.5 times and 30-nm blue-shift of EL peak occurs compared with the diodes without treatment and both of them are stable     

An Electroluminescence Delay Time Model of Bilayer Organic Light-Emitting Diodes

Based on the mechanism of injection, transport and recombination of the charge carriers, we develop a model to calculate the delay time of electroluminescence （EL） from bilayer organic light emitting diodes. The effect of injection, transport and recombination processes on the EL delay time is discussed, and the relationship between the internal interface barrier and the recombination time is revealed. ＂]~he results show that the EL delay time is dominated by the recombination process at lower applied voltage and by the transport process at higher applied voltage. When the internal interface barrier varies from 0.15 eV to 0.3 eV, the recombination delay time increases rapidly~ while the internal interface barrier exceeds about 0.3eV~ the dependence of the recombination delay time on applied voltage is almost undiversified, which may serve as a guideline for designing of a high-speed EL response device.     

温度和电压对双层有机发光二极管复合效率的影响

提出了双层有机电致发光二极管ITO/PPV/PBD/Ca复合的理论模型。计算并讨论了温度和电压对其复合效率的影响：在电压为6～7.5 V时,复合效率随温度变化出现两个峰值,但随着电压升高,两峰值相互靠拢,当电压达到9 V时,峰值位置重叠,我们认为这一现象除了浅缺陷能级和深缺陷能级贡献的结果以外,还由于复合区域发生变化引起的。该模型较好地解释了有关实验现象。     

多孔硅镶嵌正丁胺/激光染料复合膜的荧光谱

The photoluminescence (PL) of the compound films made by implanting n-butylamine/ Rhodamine into the porous silicon films was studied. Comparison and discussion of the difference of PL of the compound films and the dyes were carried out. The PL of the compound films with different substrates was measured.     

基于三层模型的多孔硅发光谱双峰结构的研究

基于Litovchenko提出的多孔硅三层模型和在此基础上由Li等人提出的多孔硅三层发光模型,利用半导体异质结理论导出了多孔硅芯部与夹层中载流子浓度、非平衡载流子数目、扩散电流密度、夹层与芯部发光强度的比值等关系式.结果表明:当Egint＞Egcore时,在0.2 eV＜ΔEv+ΔEc＜0.26 eV范围内发光谱将出现双峰,并在ΔEv+ΔEc＞0区域发光峰位不断向高能移动,发生蓝移现象;当Egint＜Egcore时,尽管芯部由于量子限制效应仍将导致发光峰蓝移,但芯部的发光相对夹层的发光相当弱,这时多孔硅发光谱呈现单峰.此模型定量地解释了多孔硅发光峰的蓝移起源于多孔硅量子限制效应,而发光出现发光双峰和发光峰位钉扎是由夹层物质决定,说明了多孔硅的发光存在多种发光机制.