Giant Magneto-Impedance of Co50Ni22Ga28 Alloy with High Chemical Ordering

The microstructure of CosoNi22Ga28 ribbon with the L10 structure is examined. The band-like morphology is observed. These bands with the width in a range of 40-200 nm appear along the transverse direction of the ribbon. The giant magnetoimpedance （GMI） effect in this alloy is measured. The results show that Co5oNi22Ga28 exhibits a sharp peak of the GAI effect. The maximum GAH ratio up to 360% is detected. The GMI effect measured versus temperature shows large jumps of the magnetoimpedance amplitude at the reversal martensitic transformation temperature 240℃ and Curie temperature 375℃C respectively. The jump ratios of the magnetoimpedance amplitude examined at these temperatures are about 5 and 10, respectively.     

快冷Fe_(71)Al_(29)合金中的两个内耗峰

用一个计算机控制的倒扭摆研究了快冷Fe71 Al2 9合金中的两个内耗峰 .在快冷的Fe71 Al2 9样品中分别在 180℃(P1 ) ,340℃ (P2 )和 5 10℃ (P3)出现了内耗峰 ,而在慢冷的Fe71 Al2 9样品中只发现了P3峰 .快冷样品中的P1 和P2峰在从 6 5 0℃冷却下来的测量过程中或在 35 0℃经过较长时间的时效后消失 ,其峰高随时效时间的增加而下降 ,直至消失 .P1 和P2 峰都有弛豫特征 ,它们的激活能分别为 :H1 =1.0 3± 0 .0 8eV(P1 峰 ) ;H2 =1.6 4± 0 .0 5eV(P2 峰 ) .P1 峰被认为是无序合金中Al原子在四面体点阵内的最近邻运动所引起 ,P2 峰则是无序合金中Al原子在四面体点阵内的次近邻运动所引起     

记录媒体用薄膜材料及相关靶材的技术和发展

 信息化时代随着计算机技术的普及来到我们面前,其突出表现是信息总量和信息交换的剧增,因此,发展海量存储技术日趋重要。随着信息及计算机技术的不断发展,对其作为主要工具的记录媒体的需求越来越大,要求越来越高。记录媒体中大多数磁盘、磁光盘、光盘是以相关靶材磁控溅射而成的,因此,为满足信息记录媒体的高密度化、小型化和低价格化,需要对其相关靶材的成分、制造工艺、性能和溅射工艺做进一步研究。目前,随着新材料的开发和记录媒体的发展,磁光盘、光盘用靶材市场在不断增长。尤其近几年CD、VCD、DVD市场的迅速扩大,其相关靶材的前景也日益被看好。     

高应变率下U-Nb合金的断裂组织特征

利用内部爆炸加载方法对U-Nb合金进行爆破试验，对爆破试验产生的破片进行回收，并对U-Nb合金破片进行一些微观检测分析，从而初步研究在爆炸加载下U-Nb合金的微观断裂机制。     

Compression Behaviour of Ni77P23 Amorphous Alloy up to 30.5 GPa

The compression behaviour of Ni77P23 amorphous alloy is investigated at room temperature in a diamond-anvil cell instrument using in-situ high pressure energy dispersive x-ray diffraction with a synchrotron radiation source. The equation of state is determined by fitting the experimental data according to the Birch-Murnaghan equation. It is found that the structure of Ni77P23 amorphous alloy is stable under pressures up to 30.5 GPa. Within the pressure range from zero to the experimental one, the pressure-induced structural relaxation is reversible.     

Total Dose Radiation Tolerance of Phase Change Memory Cell with GeSbTe Alloy

Phase change memory （PCM） cell array is fabricated by a standard complementary metal-oxide-semiconductor process and the subsequent special fabrication technique. A chalcogenide Ge2Sb2Te5 film in thickness 50hm deposited by rf magnetron sputtering is used as storage medium for the PCM cell. Large snap-back effect is observed in current-voltage characteristics, indicating the phase transition from an amorphous state （higher resistance state） to the crystalline state （lower resistance state）. The resistance of amorphous state is two orders of magnitude larger than that of the crystalline state from the resistance measurement, and the threshold current needed for phase transition of our fabricated PCM cell array is very low （only several μA）. An x-ray total dose radiation test is carried out on the PCM cell array and the results show that this kind of PCM cell has excellent total dose radiation tolerance with total dose up to 2 ×10^6 rad（Si）, which makes it attractive for space-based applications.     

侵彻环境下两种钨合金的细观响应特性

本文实验发现具有较大密度和较高速度的93W钨合金长杆模拟弹的穿靶深度反而比密度较小，速度较低的90W钨合金长杆弹的穿靶深度小．针对这一现象，本文从两种材料在侵彻环境下的细观响应特性的差异上给出了有实验根据的合理分析，结论是90W在侵彻环境下较易于形成绝热剪切带，从而在弹头部发生“自锐化”效应所致．     

Fe-V-N稀合金中空位复合体特性的研究(Ⅱ)

本文利用离散变分法,集团模型和三维数值弛豫技术,研究了Fe-V-N稀合金中V-N-空位复合体的几何构型,正电子湮没特性和电子结构。根据正电子湮没寿命实验的结果和总能量极小原理,确定了V和N在V-N-空位复合体中的最佳占据位置。分析了V-N-空位复合体的成键特性和电荷转移情况。 关键词：     

基片温度对坡莫合金薄膜结构和磁电阻的影响

用磁控溅射方法制备了系列坡莫合金Ni80Fe20薄膜。利用X射线衍射、扫描电子显微镜和原子力显徽镜分析了薄膜的结构、晶粒取向、薄膜厚度、截面结构和表面形态。用4点探测技术测量了薄膜的电阻和磁电阻。结果表明：随衬底温度的升高，晶粒明显长大。膜内的缺陷和应力显著减小，而且增强了薄膜晶粒的[111]择优取向。结果表明，薄膜电阻率显著减小，而磁电阻显著增大。