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排序方式: 共有1998条查询结果,搜索用时 156 毫秒
11.
Influence of buffer layer thickness on the structure and optical properties of ZnO thin films 总被引:1,自引:0,他引:1
A series of ZnO thin films were deposited on ZnO buffer layers by DC reactive magnetron sputtering. The buffer layer thickness determination of microstructure and optical properties of ZnO films was investigated by X-ray diffraction (XRD), photoluminescence (PL), optical transmittance and absorption measurements. XRD results revealed that the stress of ZnO thin films varied with the buffer layer thickness. With the increase of buffer layer thickness, the band gap edge shifted toward longer wavelength. The near-band-edge (NBE) emission intensity of ZnO films deposited on ZnO buffer layer also varied with the increase of thickness due to the spatial confinement increasing the Coulomb interaction between electrons and holes. The PL measurement showed that the optimum thickness of the ZnO buffer layer was around 12 nm. 相似文献
12.
We report on the lattice-mismatched growth of step-graded InxAl1−xAs buffer layers on GaAs (0 0 1) substrates by molecular beam epitay (MBE). The approach to growing highly lattice-mismatched epilayers is to interpose a buffer layer between the substrate and the active layer. Two samples G30 and G40 with active layer compositions, respectively, x = 0.46 and x = 0.41, are studied by photoluminescence (PL). At low temperature, the PL spectra show a large broadened band whose energy and intensity depend on the active layer composition. The step-graded layer compositions improved the crystalline quality of these structures and increase the active layer PL band intensity. 相似文献
13.
Do Young Kim Ji Sim Jung Young Rae Jang Kun Ho Yoo Jin Jang 《Physica E: Low-dimensional Systems and Nanostructures》2003,16(3-4):400
We studied the growth of nanocrystalline silicon (nc-Si) thin film exhibiting a strong room temperature photoluminescence (PL) at 1.81–2.003 eV. The amorphous silicon was crystallized by Ni silicide mediated crystallization (Ni SMC) and then Secco-etched to exhibit the PL. The PL peak energy and intensity increase with increasing the metal density on the a-Si because of the reduction in the grain size down to 2 nm. The photoluminescence energy and peak intensity depend strongly on the Secco etch time because the grain size is reduced by etching the grain boundaries. 相似文献
14.
Reduction of dislocation density and improvement of optical quality in ZnO layers by MgO-buffer annealing 总被引:1,自引:0,他引:1
Hiroki Goto Hisao Makino Agus Setiawan Takuma Suzuki Chihiro Harada Tsutomu Minegishi Meoung-Whan Cho Takafumi Yao 《Current Applied Physics》2004,4(6):637-639
Optical properties of ZnO thin films with/without MgO-buffer annealing were investigated by low and room temperature photoluminescence measurements. The ZnO films were grown on c-sapphire substrates by plasma-assisted molecular-beam epitaxy employing a thin MgO-buffer layer. Dislocation density of ZnO layer was reduced from 5.3 × 109 to 1.9 × 109 cm−2 by annealing MgO-buffer prior to the growth of ZnO. The intensity of free exciton emission from the sample with MgO-buffer annealing was almost twice of that from the sample without annealing, while the deep level emission from the sample with MgO-buffer annealing was about 1/3 of that without annealing. The MgO-buffer annealing improves optical quality of overgrown ZnO films. 相似文献
15.
A. V. Novikov D. N. Lobanov A. N. Yablonsky Yu. N. Drozdov N. V. Vostokov Z. F. Krasilnik 《Physica E: Low-dimensional Systems and Nanostructures》2003,16(3-4):467
The dependence of photoluminescence spectra of structures with GeSi/Si(0 0 1) self-assembled nanoislands on growth temperature has been investigated. It was shown that the redshift of the island-related photoluminescence peak with a decrease of the growth temperature is associated with suppression of Si diffusion in the islands and an increase of Ge content in them. For the first time a photoluminescence signal from SiGe islands was observed at energies much lower than the Ge band gap. The energy position of the island-related photoluminescence peak is well described by the model of optical transition, which is indirect in real space. The photoluminescence signal at 1.55 μm from GeSi/Si(0 0 1) self-assembled islands was obtained up to room temperature. 相似文献
16.
P. Pellegrino B. Garrido C. García R. Ferr J. A. Moreno J. R. Morante 《Physica E: Low-dimensional Systems and Nanostructures》2003,16(3-4):424
The ability of surface passivation to enhance the photoluminescence (PL) emission of Si nanocrystals in SiO2 has been investigated. Silicon precipitation in implanted samples takes place in a time scale of few minutes at 1100°C. For longer annealing at the same temperature, the PL intensity of the Si nanocrystals increases and eventually reaches saturation, while it correlates inversely with the amount of Si dangling bonds at the Si–SiO2 interface (Pb centers), as measured by electron spin resonance. This combined behavior is independent on the silica matrix properties, implantation profiles and annealing atmosphere and duration. The observation that the light emission enhancement is directly related to the annealing of Pb centers is confirmed by treatment in forming gas. This mild hydrogenation at much lower temperature (450°C) leads to a complete passivation of the Pb defects, increasing at the same time the PL yield and the lifetime. 相似文献
17.
Electrodeposition was used to deposit Cu2O thin films on ITO substrates. Photoresponse of the film clearly indicated n-type behavior of Cu2O in photoelectrochemical cells. The temperature dependence of photoluminescence (PL) revealed that the spectra consist of donor-acceptor pair emissions and the recombination between electrons bound to donors and free holes. We observed that the dominant intrinsic defect, oxygen vacancies, creates a donor energy level at 0.38 eV below the bottom of the conduction band. As a result, this donor level acts as a center for both PL emissions and to produce n-type conductivity in the electrodeposited Cu2O films. In addition, an acceptor energy level at 0.16 eV from the top of the valence band was observed. 相似文献
18.
Unintentionally doped and zinc-doped indium nitride (U-InN and InN:Zn) films were deposited on (0 0 0 1) sapphire substrates by radio-frequency reactive magnetron sputtering, and all samples were then treated by annealing to form In2O3 films. U-InN and InN:Zn films have similar photon absorption characteristics. The as-deposited U-InN and InN:Zn film show the absorption edge, ∼1.8-1.9 eV. After the annealing process at 500 °C for 20 min, the absorption coefficient at the visible range apparently decreases, and the absorption edge is about 3.5 eV. Two emission peaks at 3.342 eV (371 nm) and 3.238 eV (383 nm) in the 20 K photoluminescence (PL) spectrum of In2O3:Zn films were identified as the free-exciton (FE) or the near band-to-band (B-B) and conduction-band-to-acceptor (C-A) recombination, respectively. 相似文献
19.
In this paper, nitridation process of GaAs (1 0 0) substrates was studied in-situ using X-ray photoelectron spectroscopy (XPS) and ex-situ by means of electrical method I-V and photoluminescence surface state spectroscopy (PLS3) in order to determine chemical, electrical and electronic properties of the elaborated GaN/GaAs interfaces.The elaborated structures were characterised by I-V analysis. The saturation current IS, the ideality factor n, the barrier height ΦBn and the serial resistance RS are determined.The elaborated GaN/GaAs structures are also exhibited a high PL intensity at room temperature. From the computer-aided analysis of the power-dependent PL efficiency measurements (PLS3 technique), the value of the interface state density NSS(E) close to the mid-gap was estimated to be in the range of 2-4 × 1011 eV−1 cm−2, indicating a good electronic quality of the obtained interfaces.Correlation among chemical, electronic and electrical properties of the GaN/GaAs interface was discussed. 相似文献
20.
N. V. Gaponenko A. V. Mudryi O. V. Sergeev M. Stepikhova L. Palmetshofer W. Jantsch J. C. Pivin B. Hamilton A. S. Baran A. I. Rat''ko 《Journal of luminescence》1998,80(1-4):399-403
Sol–gel derived Fe2O3 films containing about 10 wt% of Er2O3 were deposited on porous silicon by dipping or by a spin-on technique followed by thermal processing at 1073 K for 15 min. The samples were characterized by means of PL, SEM and X-ray diffraction analyses. They exhibit strong room-temperature luminescence at 1.5 μm related to erbium in the sol–gel derived host. The luminescence intensity increases by a factor of 1000 when the samples are cooled from 300 to 4.2 K. After complete removal of the erbium-doped film by etching and partial etching the porous silicon, the erbium-related luminescence disappears. Following this, luminescence at 1.5 μm originating from optically active dislocations (“D-lines”) in porous silicon was detected. The influence of the conditions of synthesis on luminescence at 1.5 μm is discussed. 相似文献