MALDI/FTMS中碰撞衰减机理对准确质量校正的影响

Collisional　damping　affects　the　relationship　between　ion　mass　and　effective　cyclotron　frequency　in　Fourier transform mass spectrometry. The exact mass calibration equation（m/z=A/f＋（mneutral/m^^＋mneutral）k＋B/f（f＋（mneutral/m^^＋mneutralk））was therefore derived from the characteristic equation of system model, force=m（dv/dt）=qE-qv×B0-ξv,a frictional damping force）, in which k is amended by the shift of observed frequency of matrix ion or other known ion in external calibration. The mass obtained by the amended calibration equation is therefore immune to collisional damping and space-charge effects on mass accuracy. The relative errors of ion mass measured were all less than 2×10^-6.     

Limit of detection estimator for second-order bilinear calibration

A new approach is developed for estimating the limit of detection in second-order bilinear calibration with the generalized rank annihilation method (GRAM). The proposed estimator is based on recently derived expressions for prediction variance and bias. It follows the latest IUPAC recommendations in the sense that it concisely accounts for the probabilities of committing both types I and II errors, i.e. false positive and false negative declarations, respectively. The estimator has been extensively validated with simulated data, yielding promising results.     

多元分辨校正模型与方法研究—无机多组份分析

系统研究了各种多元分辨校正模型、方法及其应用，以模拟体系、病态体系有态体系为对象，考察了它们的多元校正能力与多元分辨效果，给我机多组份分析态体系实例。     

一种用于中药纯化过程的近红外光谱分析新方法

针对中药大孔吸附树脂纯化过程缺乏在线检测分析手段等问题，提出基于光纤 近红外透射光谱的过程分析新方法．以黄连提取物为例，采用HPLC分析测定值作参 比，用偏最小二乘算法建立了近红外透射光谱校正模型，并成功地用于预测黄连生 物碱在大孔树脂纯化过程中的洗脱曲线．本方法实时、快速，可同时测定洗脱物中 盐酸小檗碱、盐酸巴马亭、盐酸药相碱和黄连总生物碱的浓度．预测精度满足工业 过程分析要求，为提高中药质量分析水平提供了新的途径．     

Calorimetric study of the immersion heats of lead(II) and chromium(VI) from aqueous solutions of Colombian coffee husk

Summary This work shows the result of the study of the Pb(II) and Cr(VI) ions adsorption by means of a Calvet type calorimeter of heat conduction that can operate at 150şC. The calorimeter was electrically calibrated to establish its sensitivity and reproducibility, obtaining K=12.95±0.05 W V^-1 and chemically it was examined with tris-(hydroxymethyl)-aminomethane (THAM)-HCl system, obtaining ΔH= -30.91±0.03 kJ mol^-1. The activated carbon sample obtained from coffee husk and the calorimetric results obtained were related to other techniques used to perform this type of studies.     

Estimation of the uncertainty of mass measurements from in-house calibrated analytical balances

The uncertainty evaluation of mass measurements when using “in-house” calibrated analytical balances is revisited according to the Guide to the expression of Uncertainty Measurement (GUM). The calibration of analytical balances is discussed according to the guidelines of several bodies such as ASTM, UKAS and DKD/PTB. The remainder components of uncertainty can be estimated from the balance data sheet specifications.     

凝胶渗透色谱法测定聚丙烯腈共聚物分子量中宽分布校正法的应用

应用宽分布校正法对凝胶渗透色谱(GPC)进行了校正，将校正曲线用于聚丙烯腈(PAN)共聚物分子量的计算。对扣除色谱峰扩展效应前后的测试结果与乌氏粘度法测得的数据进行比较。结果表明，应用宽分布校正法时，必须扣除色谱峰扩展效应，才能得到较为准确的测试结果。     

Interference-free determination of Sudan dyes in chilli foods using second-order calibration algorithms coupled with HPLC-DAD

This paper presents a new method for the determination of Sudan dyes contained in hot chilli samples. The method employs second-order calibration algorithms to handle the recorded data. The second-order calibration algorithms are based on the popular parallel factor analysis (PARAFAC), alternating trilinear decomposition (ATLD) and self-weighted alternating trilinear decomposition (SWATLD), respectively. These chemometric methodologies have the second-order advantage, which is the ability to get accurate concentration estimates of interested analytes even in the presence of uncalibrated interfering components. The results on a set of spiked chilli test shows that low contents of Sudan I and Sudan II in complex chilli mixtures can be accurately determined using the new method. The sample preparation was based on solvent extraction, and internal standard was not required. Quantification was carried out with simple mobile phase.     

Calibration coefficient of a heat-flow DSC; Part II. Optimal calibration procedure

One-point (Mettler) and many-point (Netzsch) heat flow calibration of a DSC is discussed. It is shown that the two types of calibration are the alternative extremes between quick but rough procedure and time-consuming but accurate one. One-point calibration compares a typical function k(T) at the melting point of indium with the measured value for particular DSC and multiplies k(T) by a scaling factor. Many-point calibration is based on general mathematical procedure, namely fitting a set of experimental values of sensitivity to a polynomial. The polynomial coefficients are evaluated by the method of least squares. Based on the relationship between the sensitivity of a thermocouple and calibration coefficient of a DSC sensor made from it, two-point heat flow calibration is suggested. This is an optimal calibration procedure, for the relationship contains only two unknown coefficients. An example of how to perform the two-point calibration with Netzsch-Proteus Software is described in the Appendix.     

Development of B‐doped Si multiple delta‐layer reference materials for SIMS profiling

B‐doped Si multiple delta‐layers (MDL) were developed as certified reference materials (CRM) for secondary ion mass spectrometry (SIMS) depth profiling analysis. Two CRMs with different delta‐layer spacing were grown by ion beam sputter deposition (IBSD). The nominal spacing of the MDL for shallow junction analysis is 10 nm and that for high energy SIMS is 50 nm. The total thickness of the film was certified by high resolution transmission electron microscopy (HR‐TEM). The B‐doped Si MDLs can be used to evaluate SIMS depth resolution and to calibrate the depth scale. A consistency check of the calibration of stylus profilometers for measurement of sputter depth is another possible application. The crater depths measured by a stylus profilometer showed a good linear relationship with the thickness measured from SIMS profiling using the calibrated film thickness for depth scale calibration. The sputtering rate of the amorphous Si thin film grown by sputter deposition was found to be the same as that of the crystalline Si substrate, which means that the sputtering rate measured with these CRMs can be applied to a real analysis of crystalline Si. Copyright © 2005 John Wiley & Sons, Ltd.