Dynamics of gold clusters on amorphous carbon films induced by annealing in a transmission electron microscope

The change of the size distribution of Au clusters induced by annealing was studied in situ by transmission electron microscopy. Starting from statistically distributed Au clusters on a thin amorphous carbon film, “islands” are formed within a few months storage at room temperature, which consist of Au clusters with sizes <4 nm embedded in a thin Au film. These islands cover originally areas with sizes around 25 × 70 nm². If the temperature is increased in the transmission electron microscope two different processes can be clearly distinguished that lead to the coarsening of the cluster size distribution: cluster coalescence and (contactless) Ostwald ripening. The degree and rate of the coarsening are found to depend on the underlying surface (Au film or amorphous carbon) and the exposure to the high-flux high-energy electron beam, which can be estimated to lead to high-temperature excursions in a cluster on a 10⁻¹² s time scale. The experimental findings are confirmed by Monte-Carlo simulations using the many-body Gupta potentials in order to calculate the Au/Au interaction. Moreover, the results of MC simulations suggest an electron-beam induced formation of a “quasi-two-dimensional gas” of small highly mobile Au species on the Au film, which promotes Ostwald ripening.     

CoPt(FePt)-C纳米复合膜的结构与磁性

用磁过滤脉冲真空电弧沉积方法制备了CoPt(FePt) C纳米复合薄膜，并在不同温度下进行了退火处理，研究了薄膜中碳的含量以及退火温度对薄膜结构与磁性能的影响.制备态薄膜经过足够高的温度退火后，x射线衍射和磁力显微镜分析发现，在碳基质中生成了面心四方相的CoPt(FePt)纳米颗粒.对于特定组分为Co24Pt31C45和Fe43Pt35C22的薄膜，矫顽力以及颗粒尺寸都随退火温度的升高而增大，当退火温度为700℃时，Co24Pt31C45薄膜的矫顽力为21×105A/m，晶粒尺寸为17nm;当退火温度为650℃时，Fe43Pt35C22相应值分别为28×105A/m和105nm. 关键词： 磁记录材料 磁性薄膜 CoPt FePt纳米复合薄膜     

PT-PEK-c电光聚合物薄膜的厚度和介电性质

研制了新的PT-PEK-c电光聚合物薄膜材料,用准波导耦合m线方法测量了PT-PEK-c电光聚合物薄膜的厚度,并测量了该聚合物薄膜在1×10²Hz到1×10⁷Hz频率范围内的室温介电常数.测量结果为:厚度d=2.328±0.315μm,在10KHz下,介电常数ε_r＝4023±0.063,介电损耗tanδ＝0.003.     

Glycine oligomerization on silica and alumina

Oligomerization of glycine (gly) and diglycine (gly₂) on silica and alumina was observed in experiments simulating wetting-drying cycles at 80°C. Glycine produces less than 1% total yield of gly₂ and diketopiperazine (DKP) after one week. In experiments starting from gly₂, more than 10% DKP is formed. Formation of higher oligomers (gly₃–gly₆) proceeded as well, with 3.8% and 5.1% total yields on silica and alumina surfaces respectively.     

有机薄膜电致发光器件载流子注入和传输性质的研究

制备了不同电极、不同厚度、以8-羟基喹啉铝螯合物(Alq3)为发光层的有机薄膜电致发光(TFEL)器件。分析了它们的电流密度-电压关系。不同阳极器件的电流变化很大,而改变阴极时电流密度的变化较小,说明电流以空穴为主。根据不同阴极器件的电致发光效率的比较,说明电子是决定器件电致发光效率的少数载流子。从不同厚度的器件的结果讨论了载流子的传输性质,认为在ITO/Alq3/Al器件中的电流符合陷阱限制的空间电荷电流.     

非均匀晶化Bi和Ba代替DyIG膜的法拉第效应研究

报道了快速循环晶化Ｂｉ和Ｂａ代替ＤｙＩＧ磁光膜的实验结果，发现在累加退火时间小于３分钟时（温度６５０～６８０℃）膜内部存在非晶区域和沿厚度晶化不均匀现象。导出晶相与非晶相界面法拉第角计算公式。计算结果表明，界面效应导致膜整体法拉第效应减弱。     

退火温度对a-Se0.70Ge0.15Sb0.15薄膜的结构和光学性质的影响

研究了退火温度对Se0.70Ge0.15Sb0.15薄膜的影响.通过热蒸发技术,在300K温度下将大块无定形Se0.70Ge0.15Sb0.1s沉积在石英和玻璃衬底上.研究发现,未经过退火处理的薄膜结构和在300K,1.33×10-5Pa下退火1小时后的薄膜结构都是无定形结构,而在同样气压470K温度下退火1小时的薄膜有结晶现象.通过在300 2 500nm范围内垂直入射光方向上透射率和反射率的测试,研究了薄膜的一些光学参数,如消光系数(k),折射系数(n)和吸收系数(a).研究发现,n和k同热处理温度有关.通过光学数据的分析,得到了不同条件下薄膜的间接带隙宽度(Enong),未经过热处理薄膜的Enong是1.715±0.021eV,300K下退火薄膜的Enong是1.643±0.021eV,470K下退火的Enong是1.527±0.021eV.退火温度降低了带隙宽度Enong,但增加了带尾eo这种效应可以根据Mott和Davis提出的多晶体系中态密度来解释.     

液相性质对制备硫化物纳米级粒子化膜的影响

研究氯化锌浓度，溶液酸碱度，离子强度等底液性质及反应温度对化学反应法在不溶膜上制备纳米级硫化锌粒子化膜的影响，得出了一些规律并加以初步的解释。     

电镜样品的激光镀膜技术

非导电的样品用扫描电镜进行观测时需要对样品进行镀膜处理以获得清晰的图像, 本文介绍应用脉冲激光沉积(PLD)技术对非导电样品的表面进行镀膜处理的方法和实验装置及实验结果.     

等离子体聚合四丁基锡薄膜的制备和结构

研究了Ａｒ和Ａｒ／Ｏ＿２混合气携带四丁基锡的等离子体聚合规律和膜的组成、结构，分别得到低碳氢含量的金属Ｓｎ和ＳｎＯ＿ｘ共混膜。