CoPt(FePt)-C纳米复合膜的结构与磁性

用磁过滤脉冲真空电弧沉积方法制备了CoPt(FePt) C纳米复合薄膜，并在不同温度下进行了退火处理，研究了薄膜中碳的含量以及退火温度对薄膜结构与磁性能的影响.制备态薄膜经过足够高的温度退火后，x射线衍射和磁力显微镜分析发现，在碳基质中生成了面心四方相的CoPt(FePt)纳米颗粒.对于特定组分为Co24Pt31C45和Fe43Pt35C22的薄膜，矫顽力以及颗粒尺寸都随退火温度的升高而增大，当退火温度为700℃时，Co24Pt31C45薄膜的矫顽力为21×105A/m，晶粒尺寸为17nm;当退火温度为650℃时，Fe43Pt35C22相应值分别为28×105A/m和105nm. 关键词： 磁记录材料 磁性薄膜 CoPt FePt纳米复合薄膜     

金属颗粒-半导体膜Cu:CdS的制备及结构研究

利用磁控溅射产生金属Cu团簇，同时蒸发半导体介质CdS，将Cu团簇包埋在CdS介质中，制备出金属颗粒 半导体膜．团簇大小可通过改变溅射气压控制．用TEM研究了嵌埋团簇的结构．分析表明：CdS很好地包埋了Cu团簇，都呈多晶结构；团簇尺寸在5—20nm，Cu晶格发生了膨胀，膨胀量在7%左右 关键词：     

硅团簇Si+n(n=1-3)注入Si单晶性质的研究

利用硅团簇Si+n(n=1-3)注入Si单晶, 在Si单晶内形成一些单空位和双空位, 通过其光吸收谱观察到了带电状态为V02的双空位缺陷, 以及团簇效应对缺陷的影响, 正电子湮灭及TRIM程序模拟计算都表明团簇效应的存在.     

Preparation of graphene on SiC by laser-accelerated pulsed ion beams

Laser-accelerated ion beams (LIBs) have been increasingly applied in the field of material irradiation in recent years due to the unique properties of ultra-short beam duration, extremely high beam current, etc. Here we explore an application of using laser-accelerated ion beams to prepare graphene. The pulsed LIBs produced a great instantaneous beam current and thermal effect on the SiC samples with a shooting frequency of 1 Hz. In the experiment, we controlled the deposition dose by adjusting the number of shootings and the irradiating current by adjusting the distance between the sample and the ion source. During annealing at 1100 ℃, we found that the 190 shots ion beams allowed more carbon atoms to self-assemble into graphene than the 10 shots case. By comparing with the controlled experiment based on ion beams from a traditional ion accelerator, we found that the laser-accelerated ion beams could cause greater damage in a very short time. Significant thermal effect was induced when the irradiation distance was reduced to less than 1 cm, which could make partial SiC self-annealing to prepare graphene dots directly. The special effects of LIBs indicate their vital role to change the structure of the irradiation sample.     

高品质6英寸N型4 H-SiC单晶生长研究

PVT法生长SiC单晶生长腔的温场分布是影响晶体质量的重要因素.采用数值模拟研究了保温层和坩埚结构以及线圈位置对6英寸SiC晶体生长温场的影响,优化出了适合高品质6英寸SiC晶体生长温场分布,在此条件下生长无裂纹的6英寸N型4H-SiC晶体.用高分辨率X射线衍射、拉曼光谱和缺陷检测系统对所加工的SiC衬底片的质量进行了表征.测试结果表明,晶型为单一的4H-SiC,微管密度小于1 cm-2,电阻率范围为0.02～0.022Ω·cm,X射线摇摆曲线半高宽为21.6″.     

Ag对CoPt/Ag纳米复合膜的结构与磁性的影响

采用直流磁控溅射的方法制备了一系列(CoPt/Ag)_n多层膜，然后在不同温度下 进行了退火处理，并对其结构和磁性做了初步的表征，研究了Ag的含量以及薄膜中每一单元 厚度与总厚度对退火后薄膜的结构以及磁性能的影响.结果表明，膜厚较薄时(大约20 nm)有 利于薄膜沿(001)取向生长，Ag的加入不但能够抑制CoPt晶粒的过分长大还可以诱导薄膜的( 001)取向，使退火后的薄膜在垂直于膜面方向上的矫顽力大大增强.对于特定组分为Co ₄₀Pt₄₃Ag₁₇的薄膜，经600℃退火后已经显示了明显的(001) 取向，垂直于膜面方向上的矫顽力为5.6×10⁵ A/m，饱和磁化强度为0.65T, 并 且磁滞回线具有很好的矩形度，剩磁比(s)为0.95. 关键词： 磁记录材料 磁性薄膜 CoPt/Ag纳米复合膜     

Irradiation effect of yttria-stabilized zirconia by high dose dual ion beam irradiation

Yttria-stabilized zirconia （YSZ） is irradiated with 2.0-MeV Au2＋ ions and 30-keV He＋ ions. Three types of He, Au, Au ＋ He （successively） ion irradiation are performed. The maximum damage level of a sequential dual ion beam implanted sample is smaller than single Au ion implanted sample. A comparable volume swelling is found in a sequential dual ion beam irradiated sample and it is also found in a single Au ion implanted sample. Both effects can be explained by the partial reorganization of the dislocation network into weakly damaged regions in the dual ion beam implanted YSZ. A vacancy-assisted helium trapping/diffusion mechanism in the dual ion beam irradiated condition is discussed. No phase transformation or amorphization behavior happens in all types of ion irradiated YSZ.     

嵌埋式InP团簇光学吸收性质的研究

利用双束共蒸发的方法制备InP∶CaF₂复合膜，InP以团簇的形式嵌埋在绝缘介质CaF₂中，团簇大小可通过改变携带气压和蒸发电流来控制.样品的TEM结果表明：InP嵌埋团簇呈多晶结构，团簇尺寸10nm左右.研究了该复合膜的线性光吸收性质，半导体InP团簇表现出明显的量子效应，其吸收边随着团簇尺寸的减小发生了蓝移. 关键词：     

核材料辐照损伤协同效应的研究北大核心CSCD

通过拉曼光谱、沟道背散射、原子力显微镜、透射电子显微镜、红外光谱等一系列测试手段对Zr O2,Si C和ODS钢三种核材料的多束辐照行为进行表征,研究离子束的协同效应对核材料辐照损伤的影响。Zr O2双束辐照肿胀和损伤是两个单束辐照的线性叠加,Si C双束同时辐照的拉曼光谱比双束先后辐照有更大的主峰半高宽的变化,ODS钢的三束辐照有最大的肿胀和硬化。综合分析得出双束同时辐照比先后辐照具有更明显的协同效应,三束辐照ODS钢的损伤最严重,比三个单束损伤之和大,Si离子与He,H的协同效应最明显。多束辐照能较好地模拟实际反应堆中的辐照环境。这些研究结果对于核材料在实际反应堆中的中子辐照行为具有一定的参考意义。