Atmospheric pressure chemical vapour deposition of fluorine‐doped tin(IV) oxide from fluoroalkyltin precursors

Perfluoroalkytin compounds R_(4−n)Sn(R_f)_n (R = Me, Et, Bu, R_f = C₄F₉, n = 1; R = Bu, R_f = C₄F₉, n = 2, 3; R = Bu, R_f = C₆F₁₃, n = 1) have been synthesized, characterized by ¹H, ¹³C, ¹⁹F and ¹¹⁹Sn NMR, and evaluated as precursors for the atmospheric pressure chemical vapour deposition of fluorine‐doped SnO₂ thin films. All precursors were sufficiently volatile in the range 84–136 °C and glass substrate temperatures of ca 550 °C to yield high‐quality films with ca 0.79–2.02% fluorine incorporation, save for Bu₃SnC₆F₁₃, which incorporated <0.05% fluorine. Films were characterized by X‐ray diffraction, scanning electron microscopy, thickness, haze, emissivity, and sheet resistance. The fastest growth rates and highest quality films were obtained from Et₃SnC₄F₉. An electron diffraction study of Me₃SnC₄F₉ revealed four conformations, of which only the two of lowest abundance showed close F Sn contacts that could plausibly be associated with halogen transfer to tin, and in each case it was fluorine attached to either the γ‐ or δ‐carbon atoms of the R_f chain. Copyright © 2005 John Wiley & Sons, Ltd.     

From "parasitic" association reactions toward the stoichiometry controlled gas phase synthesis of nanoparticles: a theoretically driven challenge for experimentalists

In the present record a model for the gas-phase reactions during the chemical vapor deposition (CVD) processes of group 13-15 materials is presented, based on the results of extensive quantum-chemical modeling. Thermodynamic criteria have been introduced to evaluate the importance of a range of association reactions. For the organometallic and hydride derivatives, association processes are found to be favorable both thermodynamically and kinetically. Formation of high mass association products takes place under CVD conditions, including laser-assisted CVD. Structural and thermodynamic properties of the most important ring and cluster intermediates have been predicted. The stoichiometry-controlled synthesis of the 13-15 ternary alloys and nanoparticles using cluster compounds as single-source precursors is predicted to be viable. The association pathway described may be generalized to the CVD reactions of many binary materials (12-16, 13-16, 13-15, 14-15, 14-16).     

BeH2材料的制备及在ICF中的应用

 简述了BeH_{2材料的制备方法、结构形式和物理化学性质，并分析了其在惯性约束聚变(ICF)中的应用。BeH2材料主要由二叔丁基铍热解法和元素化学气相沉积法制备，其纯度(质量分数)高达99%。非晶BeH2材料的结构是一种共用氢原子作为顶点的BeH4四面体网络结构。非晶BeH2材料不仅具有铍的优点，还具有聚合物的优点，作为ICF靶可以降低瑞利-泰勒不稳定性，而且掺入高Z元素后还可以降低D-T燃料的预热。非晶BeH2材料作为烧蚀层，掺入高Z元素后可以提高激光-X光的转换效率。}     

采用旋转涂膜法制备基底生长的定向碳纳米管阵列

 采用化学气相沉积技术，利用旋转涂膜法制备催化剂基底材料，通过对涂膜过程中的角速度、旋转时间以及基底还原过程中温度的控制改变催化剂颗粒的分布状态，获得了粒径均匀分布的催化剂基底，该基底上催化剂颗粒集中分布在47～62 nm区间，再利用该基底生长出定向碳纳米管阵列。运用扫描电镜、透射电镜、拉曼光谱仪对样品进行了表征。结果表明旋转涂膜法制备的基底平整性好于普通的滴膜法，且较其它基底制备方法具有简单易控、可使催化剂均匀分散等特点。利用该基底制备的碳纳米管阵列定向性良好。     

Aligned carbon nanotubes catalytically grown on iron-based nanoparticles obtained by laser-induced CVD

Iron-based nanoparticles are prepared by a laser-induced chemical vapor deposition (CVD) process. They are characterized as body-centered Fe and Fe₂O₃ (maghemite/magnetite) particles with sizes ≤5 and 10 nm, respectively. The Fe particles are embedded in a protective carbon matrix. Both kind of particles are dispersed by spin-coating on SiO₂/Si(1 0 0) flat substrates. They are used as catalyst to grow carbon nanotubes by a plasma- and filaments-assisted catalytic CVD process (PE-HF-CCVD). Vertically oriented and thin carbon nanotubes (CNTs) were grown with few differences between the two samples, except the diameter in relation to the initial size of the iron particles, and the density. The electron field emission of these samples exhibit quite interesting behavior with a low turn-on voltage at around 1 V/μm.     

CVD金刚石薄膜探测器性能研究

通过实验测量和理论分析, 从载流子动力学角度研究了用于脉冲辐射探测的CVD金刚石薄膜探测器的适用结构、电荷收集效率和时间响应性能. 结果表明, CVD金刚石薄膜可以制成均匀型结构的探测器; 薄膜中的缺陷会降低探测器的电荷收集效率, 探测器的电荷收集效率随场强增大而增大直至饱和. 已研制的CVD金刚石探测器电荷收集时间可达719ps, 在2.5V/μm场强下达到饱和, 电荷收集效率 达60.5%; 晶格散射是影响探测器时间响应的主要因素, 选用大晶粒甚至单晶金刚石薄膜可以提高探测器时间响应.     

AACVD of WO3 thin films from W(O)(OPri)3[O(CH2)nNMe2] (n = 2, 3)

Monomeric tungsten oxo‐aminoalkoxides W(O)(OPrⁱ)₃(L) [L = O(CH₂)_nNMe₂; n = 2 (dmae, 1) and 3 (dmap, 2 )] were synthesized by alcohol exchange with [W(O)(OPrⁱ)₄]₂ and characterized spectroscopically. 1, 2 and [W(O)(OPrⁱ)₄]₂ were used as precursors for the aerosol‐assisted chemical vapour deposition of WO₃ thin films, which were characterized by glancing angle X‐ray diffraction, SEM and transmission‐reflectance measurements. Copyright © 2008 John Wiley & Sons, Ltd.