高纯钛的辉光放电质谱法多元素分析

采用辉光放电质谱法(GD-MS)测定高纯钛中Mg、Al、Cr、Fe、V、Mn、Co、Ni、Cu、Zn、As、Sn、Sb、Ta、W、Pb、Bi等痕量杂质元素,并对GD-MS工作参数及条件进行了优化。主要元素与内标校正ICP-MS法定量分析的结果一致,对结果差异的原因进行分析,论述了Element GD辉光放电质谱仪在痕量杂质元素分析方面的优势。     

GDMS法和ICP-MS法测定太阳能级多晶硅中杂质元素含量

采用辉光放电质谱法(GD-MS)测定太阳能级多晶硅中B,P,Fe,Co,Ni,Cu,Zn等痕量杂质元素,并优化和选择了GD-MS工作参数。考察了在半定量分析的情况下,GD-MS测定痕量杂质的精密度。结果表明,GD-MS对B,P,Na,Al,K,Ca,Fe,Ni,Cu,Co,Zn等元素测定结果的RSD都小于30%。用ICP-MS法进行验证,检出限0.14~2.85 ng/mL,RSD为1.6%~12%,加标回收率85.2%~125%。     

辉光放电质谱法在高纯材料分析中的应用

高纯材料是现代高新技术发展的基础,在电子、光学和光电子等尖端科学领域发挥着重要作用。采用固体样品直接分析的辉光放电质谱法(GDMS),在高纯金属、高纯半导体材料的痕量和超痕量杂质分析中有着非常广泛的应用。综述了GDMS法对高纯金属、高纯半导体材料进行的元素分析,并对分析过程中工作参数、溅射时间、干扰峰等因素的影响进行了阐述。同时,也详述了应用GDMS法对高纯金属钛、镉,高纯半导体硅,分别进行的痕量杂质元素分析,结果显示放电稳定性良好,典型元素含量的相对标准偏差均在较为理想范围内。GDMS应用前景广泛,未来,GDMS将在除固体样品之外的其他样品类型的分析领域中发挥重要作用。     

辉光放电质谱法测定高纯材料中痕量硫杂质

准确测定并控制材料中杂质元素含量是发挥高纯材料性能不可或缺的环节。辉光放电质谱法(GDMS)是准确、快速、高灵敏分析高纯材料中痕量及超痕量硫的理想方法。对GDMS分析高纯铜和镍基高温合金中痕量硫的质谱干扰进行了讨论,优化了放电电流和放电电压,采用多种标准物质对硫的相对灵敏度因子(RSF)进行了校准和验证,并与二次离子质谱法(SIMS)进行分析结果比对,验证了GDMS定量分析结果的准确性和可靠性。     

辉光放电质谱法测定纯锡中24种杂质元素和锡记忆效应的消除

采用辉光放电质谱法(GDMS)测定了纯锡中24种杂质元素,分析方法为无标定量分析。分析前纯锡样品须依次用乙醇、水及乙醇冲洗以除去表面的灰尘颗粒,凉干后用于分析。本工作对辉光放电过程中的三项关键因素,即辉光放电电压、放电电流及放电气流三者在辉光放电溅射/电离时的相互关系及其对总离子流强度的影响进行了试验和讨论,并确定了仪器在最佳状态时辉光放电的优化条件为:放电电压590V,放电电流30mA,放电气流450mL·min~(-1)。为排除各元素测定中质谱(MS)干扰的影响,选择了在不同的分辨模式(中/高)下用相对丰度较高、干扰较少的质量数进行分析。所测定元素测定结果的相对标准偏差(n=5)均小于15%。各元素的检出限(3s)为0.003～0.174μg·g~(-1)之间。本方法所得测定结果与电感耦合等离子体原子发射光谱法(ICP-AES)或电感耦合等离子体质谱法(ICP-MS)的测定结果基本一致。经试验,通过更换GDMS的阳极帽、导流管、采样锥和透镜等4种耗材,可完全消除锡的记忆效应。     

直流辉光放电质谱法测定多晶硅中关键杂质元素的相对灵敏度因子

采用直流辉光放电质谱(dc-GD-MS)测定多晶硅中关键杂质元素的相对灵敏度因子(RSF).标样制作过程中主要是在连续通入氩气条件下将固定量的非标准多晶硅样品熔化,向硅熔体中均匀掺入浓度范围为1～30 μg/g的关键杂质元素(如B和P),采用快速固化法制成标样;再将制成的标准样品加工成一系列适合GD-MS扁平池(Flat Cell)的片状样品(20 mm×20 mm×2mm).采用二次离子质谱法(SI-MS)对标准样品中关键掺杂元素进行多次定量测定,取平均值作为关键杂质元素的精确含量.优化一系列质谱条件后,运用GD-MS对标样中关键掺杂元素的离子强度进行多次测定,计算平均结果,得到未校正的表观浓度,利用标准曲线法计算出关键杂质元素的相对灵敏度因子.     

电感耦合等离子体质谱法测定高纯铌中20种痕量杂质元素北大核心CSCD

高纯铌样品0.050 0g中加入适量的水,缓慢加入1mL氢氟酸和2mL硝酸,低温加热使其溶解,冷却至室温,用水定容至100mL。采用电感耦合等离子体质谱法测定所得溶液中20种痕量杂质元素,以内标法定量。结果表明:20种元素的检出限(3s)为0.005～0.20μg·g-1,回收率为95.0%～110%。按所提出方法分析铌锭样品,所得结果与辉光放电质谱法所得结果相符。     

辉光放电质谱法测定超高纯铜溅射靶材中痕量杂质元素及其相对灵敏度因子的求取北大核心CSCD

通过选择合适的同位素及分辨率,提出了辉光放电质谱法(GDMS)测定超高纯铜溅射靶材中39种痕量杂质元素的分析方法。对辉光放电过程中的参数进行了优化,条件如下:放电气体流量为450 mL·min^(-1),放电电流为2.00 mA,预溅射时间为20 min。由于高纯铜的GDMS标准样品极难获得,为提高痕量杂质元素的检测准确度,在现有的标准样品条件下,利用高纯铜标准样品只获得了与基体匹配的21种杂质元素的相对灵敏度因子(RSF),其余18种杂质元素的RSF只能按照仪器自带的标准RSF进行计算。参照美国材料与试验协会的标准ASTM F1593-08(2016)的TypeⅢ中的第2种方法计算33种杂质元素的检出限,而其他6种主要杂质元素因其含量高于仪器噪声水平而无法用此法得到检出限。用GDMS对超高纯铜溅射靶材样品进行了检测,主要杂质元素为硅、磷、硫、氯、铁、银,检出量为0.015~0.082μg·g^(-1),杂质总量小于1μg·g^(-1)。除锌、碲、金的检出限在10 ng·g^(-1)级外,其余元素的检出限能够达到ng·g^(-1)级,其中钍、铀的检出限甚至达到了0.1 ng·g^(-1)级,说明方法能够满足GB/T 26017-2010中的6N(99.9999%)超高纯铜溅射靶材的检测要求。     

辉光放电质谱法测定核级石墨粉中痕量杂质

建立了直流辉光放电质谱法(DC-GDMS)测定核级石墨粉中痕量杂质元素的方法。用一定的压力将石墨粉镶嵌在高纯铟片上,形成一个直径约为5 mm的圆形石墨薄层,用铟片辅助石墨粉放电,实现了粉状样品直接检测。优化的实验条件为放电电流0.8 mA,放电电压1.2 kV,放电气体流速0.437 mL/min。用石墨粉标准样品(19J T61029)单点校准了仪器相对灵敏度因子,消除基体效应,实现15个关键杂质元素定量分析。方法检出限为5.0 ng/g,在单侧0.05显著性水平下,利用Student's t检验,方法测定结果t值均小于临界值,与标准值无显著性差异。相对标准偏差(RSD)均小于10%。本方法与电感耦合等离子体光谱法测定结果比较,相对误差在2.4%~17.4%之间。     

高纯硅中痕量元素分析方法研究进展

综述了从1980-2012年间测定高纯硅中痕量元素分析方法的研究进展。高纯硅中痕量元素的主要分析方法包括红外光谱法、原子发射光谱法、原子吸收光谱法、X射线荧光光谱法、极谱法、离子探针与离子色谱法、二次离子质谱法、辉光放电质谱法、电感耦合等离子体质谱法等;并对高纯硅中痕量元素的分析方法进行了展望(引用文献59篇)。     

Determination of trace elements and correction of mass spectral interferences in superalloy analyzed by glow discharge mass spectrometry

Mass spectral interference was investigated systematically during the determination of trace elements in superalloy by glow discharge mass spectrometry (GD-MS); moreover the main mass spectral interference and interference level of isotopes were provided in detail. According to the mass spectral interference of elements, different methods were selected for interference correction. The effects of mass spectral interference were removed efficiently by using correction methods such as selecting isotopes without interference, matching sample matrices and deducing interference with multivariable linear regression. The determination results of three superalloy samples show that trace elements such as B, Mg, Ga, As, Ag, In, Sn, Sb, Te, Tl, Pb and Bi were determined successfully after interference correction.     

Enhancement of intensities in glow discharge mass spectrometry by using mixtures of argon and helium as plasma gases

Glow discharge mass spectrometry (GD-MS) is an excellent technique for fast multi-element analysis of pure metals. In addition to metallic impurities, non-metals also can be determined. However, the sensitivity for these elements can be limited due to their high first ionization potentials. Elements with a first ionization potential close to or higher than that of argon, which is commonly used as discharge gas in GD-MS analysis, are ionized with small efficiency only. To improve the sensitivity of GD-MS for such elements, the influence of different glow-discharge parameters on the peak intensity of carbon, chlorine, fluorine, nitrogen, phosphorus, oxygen, and sulfur in pure copper samples was investigated with an Element GD (Thermo Fisher Scientific) GD-MS. Discharge current, discharge gas flow, and discharge gas composition, the last of which turned out to have the greatest effect on the measured intensities, were varied. Argon–helium mixtures were used because of the very high potential of He to ionize other elements, especially in terms of the high energy level of its metastable states. The effect of different Ar–He compositions on the peak intensity of various impurities in pure copper was studied. With Ar–He mixtures, excellent signal enhancements were achieved in comparison with use of pure Ar as discharge gas. In this way, traceable linear calibration curves for phosphorus and sulfur down to the μg kg⁻¹ range could be established with high sensitivity and very good linearity using pressed powder samples for calibration. This was not possible when pure argon alone was used as discharge gas. This contribution is based on a presentation given at the Colloquium for Analytical Atomic Spectroscopy (CANAS ’07) held March 18–21, 2007 in Constance, Germany.     

Analysis of high purity arsenic by spark-source mass spectrometry

Very low (μg kg^?1 concentrations of most elemental impurities are determined in an arsenic matrix by spark-source mass spectrometry when working with a cut ion-sensitive plate. The mass spectrum of arsenic is relatively simple and the lines for almost all analytically important ions are interference free, at the mass resolution used (ca. 4000). In order to have semi-quantitative results at least, one element should be accurately determined by an independent technique, such as atomic absorption spectrometry. The measurements are then semi-quantitative.     

电感耦合等离子体质谱法测定手机壳套中14种可迁移元素

建立电感耦合等离子体质谱法测定手机壳套中14种可迁移元素含量的方法。样品经人工模拟汗液溶液振荡处理,使14种特定元素迁移至模拟溶液中,然后进行微波消解,采用电感耦合等离子体质谱法对消解液进行测定。14种元素在各自的质量浓度范围内具有良好的线性关系,相关系数均大于0.999,方法检出限为0.004~0.400μg/L。样品加标回收率为88.2%~99.5%,测定结果的相对标准偏差为2.5%~9.3%(n=5)。该方法操作简便,灵敏度高,线性范围广,定量准确,适用于手机壳套中14种可迁移元素含量的测定。     

Calibration of double focusing Glow Discharge Mass Spectrometry instruments with pin-shaped synthetic standards

Calibration of two commercially available glow discharge double focusing mass spectrometers, the VG 9000 and Element GD, is described using synthetic pin standards pressed from solution doped copper and zinc matrices. A special pressing die was developed for this purpose and optimal results were obtained with the highest possible pressures, i.e., 95 kN·cm^? 2. This calibration approach permits the determination of trace element mass fractions down to μg·kg^? 1 with small uncertainties and additionally provides traceability of the GD-MS results in the most direct manner to the SI (International System of Units). Results were validated by concurrent measurements of a number of compact copper and zinc certified reference materials. The impact of the sample pin cross-section (circular or square) was investigated with the use of a new pin-sample holder system for the Element GD. The pin-sample holder was designed by the manufacturer for pin-samples having circular cross-section; however, samples with square pin cross-section were also shown to provide acceptable results. Relative Sensitivity Factors for some 50 analytes in copper (VG 9000, Element GD) and zinc matrices (VG 9000) are presented. The field of applicability of GD-MS may be considerably extended via analysis of pin geometry samples based on their ease of preparation, especially with respect to the accuracy and traceability of the results and the enhanced number of analytes which can be reliably calibrated using such samples.     

Certified sediment reference materials for trace element analysis from the National Metrology Institute of Japan (NMIJ)

Two types of sediment reference material (NMIJ 7302-a and 7303-a) for trace elements analysis have been prepared and certified by the National Metrology Institute of Japan in the National Institute of Advanced Industrial Science and Technology (NMIJ/AIST). The original materials were collected from a bay near industrial activity in Kyushu (NMIJ CRM 7302-a; marine sediment) and from Lake Biwa (NMIJ CRM 7303-a; lake sediment). The sediment materials were air-dried, sieved, homogenized, packaged in 1000 glass bottles (60 g each), and radiation sterilized. Certification of these CRM for trace elements was conducted by NMIJ, where each element was determined by at least two independent analytical techniques. Isotope-dilution inductively coupled plasma mass spectrometry (ICP–MS) was applied for certification of all the elements except mono-nuclide elements such as As and Co. Other techniques such as ICP–MS with quadrupole mass spectrometry and sector-field mass spectrometry, inductively coupled plasma atomic emission spectrometry (ICP–AES), and atomic absorption spectrometry (AAS), were also used. Certified values have been provided for 14 elements (Sb, As, Cd, Cr, Co, Cu, Pb, Hg, Mo, Ni, Se, Ag, Sn, and Zn) in both CRM.     

固体进样-石墨炉原子吸收法测定农产品中重金属元素含量

采用直接固体进样-石墨炉原子吸收光谱法(SS-GFAAS)测定农产品中镉、铅、铜和铬重金属元素含量.通过标准物质、质控样品和电感耦合等离子体质谱法比对试验验证,各元素方法检出限均低于25 pg.方法操作简单、对环境友好、重复性好、结果准确、检出限低,满足农产品检测要求.