Fabrication of surface-patterned ZnO thin films using sol–gel methods and nanoimprint lithography

Surface-patterned ZnO thin films were fabricated by direct imprinting on ZnO sol and subsequent annealing process. The polymer-based ZnO sols were deposited on various substrates for the nanoimprint lithography and converted to surface-patterned ZnO gel films during the thermal curing nanoimprint process. Finally, crystalline ZnO films were obtained by subsequent annealing of the patterned ZnO gel films. The optical characterization indicates that the surface patterning of ZnO thin films can lead to an enhanced transmittance. Large-scale ZnO thin films with different patterns can be fabricated by various easy-made ordered templates using this combination of sol–gel and nanoimprint lithography techniques.     

Nanofabrication of electrode arrays by electron-beam and nanoimprint lithographies

The fabrication of ordered nanoelectrode arrays using both electron-beam lithography and nanoimprint lithography is described. Arrays of nanoelectrodes with varying individual electrode diameters were produced and characterised electrochemically. Whilst both methods are highly reproducibile, nanoimprint lithography has the potential to produce devices rapidly and at low-cost. To our knowledge, this is the first report where nanoimprint lithography is employed for the production of nanoelectrode arrays for electroanalytical sensors.     

Interface segregating fluoralkyl-modified polymers for high-fidelity block copolymer nanoimprint lithography

Block copolymer (BCP) lithography is a powerful technique to write periodic arrays of nanoscale features into substrates at exceptionally high densities. In order to place these features at will on substrates, nanoimprint offers a deceptively clear path toward high throughput production: nanoimprint molds are reusable, promote graphoepitaxial alignment of BCP microdomains within their topography, and are efficiently aligned with respect to the substrate using interferometry. Unfortunately, when thin films of BCPs are subjected to thermal nanoimprint, there is an overwhelming degree of adhesion at the mold-polymer interface, which compromises the entire process. Here we report the synthesis of additives to mitigate adhesion based on either PS or PDMS with short, interface-active fluoroalkyl chains. When blended with PS-b-PDMS BCPs and subjected to a thermal nanoimprint, fluoroalkyl-modified PS in particular is observed to substantially reduce film adhesion to the mold, resulting in a nearly defect-free nanoimprint. Subsequent lithographic procedures revealed excellent graphoepitaxial alignment of sub-10 nm BCP microdomains, a critical step toward lower-cost, high-throughput nanofabrication.     

Biomimetic antireflective hierarchical arrays

We report a simple method for the fabrication of biomimetic antireflective hierarchical arrays based on the combination of self-assembled polymer spheres and nanoimprint lithography (NIL). The hierarchical structures are fabricated by creating nanopillars on the microscale round protrusion arrays, which are similar to natural mosquito eyes consisting of combined micro- and nanostructures. The hierarchical arrays dramatically suppress the surface reflection from visible to near-infrared regions with an angle of incidence of up to 70°.     

Patterning biomolecules with a water-soluble release and protection interlayer

We report on a general lithography method for high-resolution biomolecule patterning with a bilayer resist system. Biomolecules are first immobilized on the surface of a substrate and covered by a release-and-protection interlayer of water-soluble polymer. Patterns can then be obtained by lithography with a spin-coated resist layer in a conventional way and transferred onto the substrate by reactive ion etching. Afterward, the resist layer is removed by dissolution in water. To demonstrate a high-resolution patterning, soft UV nanoimprint lithography has been used to produce high-density dot arrays of poly-(L-lysine) molecules on a glass substrate. Both fluorescence images and cell proliferation behaviors on such a patterned substrate have shown evidence of improved stability of biomolecule immobilization comparing to that obtained by microcontact printing techniques.     

Polybenzoxazine as a mold-release agent for nanoimprint lithography

One of the most important tasks remaining to be resolved in nanoimprint lithography is the elimination of the resist sticking to the mold during demolding. Previously, the main approach was to apply a thin layer of fluorinated alkyl silane mold-release agent on the surface on the mold; however, this involves complicated steps and high costs. The low surface free energy material polybenzoxazine provides an efficient mold-release agent for silicon molds that is easier to process, costs less, and has no side reactions.     

On the mechanism of low-pressure imprint lithography: capillarity vs viscous flow

Dominant mechanisms in low-pressure imprint lithography processes have been identified for the regimes that are definable in terms of applied pressure, temperature, and mold material characteristics. Capillarity is found to be the dominant mechanism at high temperature and low pressure when stiff, hard molds are used. In the case of flexible thin-film ( approximately 20 microm) molds, both the capillarity and the viscous flow are involved. Both mechanisms are operative in the initial stage of the imprinting, but the capillarity takes over as time progresses.     

Three-dimensional colloidal crystal-assisted lithography for two-dimensional patterned arrays

In this paper, we report our recent work on preparing two-dimensional patterned microstructure arrays using three-dimensional colloidal crystals as templates, namely, colloidal crystal-assisted lithography. Two alternative processes are described and involved in colloidal crystal-assisted lithography. One is based upon imprinting the polymer films with three-dimensional silica colloidal crystals, and the other is based upon chemically depositing Ag microstructures on Au substrates covered by polymer colloidal crystals. By varying the experimental conditions in the colloidal crystal-assisted lithography process, we can intentionally control the morphologies of the resulting microstructures. The resultant Ag-coated Au substrates can be used as surface-enhanced Raman scattering substrates, and they would provide an ideal system for the mechanism study of surface-enhanced Raman scattering. We expect that colloidal crystal-assisted lithography will be a versatile approach which can be applied to patterning other materials such as functional molecules, polymers, oxides, and metals.     

Nanoimprint Lithography-Directed Self-Assembly of Bimetallic Iron–M (M=Palladium,Platinum) Complexes for Magnetic Patterning

Self-assembly of d⁸ metal polypyridine systems is a well-established approach for the creation of 1D organometallic assemblies but there are still challenges for the large-scale construction of nanostructured patterns from these building blocks. We describe herein the use of high-throughput nanoimprint lithography (NIL) to direct the self-assembly of the bimetallic complexes [4′-ferrocenyl-(2,2′:6′,2′′-terpyridine)M(OAc)]⁺(OAc)⁻ (M=Pd or Pt; OAc=acetate). Uniform nanorods are fabricated from the molecular self-organization and evidenced by morphological characterization. More importantly, when top-down NIL is coupled with the bottom-up self-assembly of the organometallic building blocks, regular arrays of nanorods can be accessed and the patterns can be controlled by changing the lithographic stamp, where the mold imposes a confinement effect on the nanorod growth. In addition, patterns consisting of the products formed after pyrolysis are studied. The resulting arrays of ferromagnetic FeM alloy nanorods suggest promising potential for the scalable production of ordered magnetic arrays and fabrication of magnetic bit-patterned media.     

薄层软刻蚀法制备PMMA微图案结构

对现有的软刻蚀方法提出了改进,让其与压印技术及毛细力刻蚀技术相结合形成一种薄层软刻蚀技术,并以这种技术制备出PMMA薄膜微图案化结构.在30 mm/h的拉膜速度以及弹性印章表面图形深度确定不变的情况下,PMMA流体能够完全填充到弹性印章的微通道中,SEM和光学显微镜照片证明得到的PMMA微图案是相互分离的.因此,薄层软刻蚀技术可以克服普通微模塑方法制备分离图形困难和纳米压印技术中需要使用巨大机械压力的缺点.     

Nanoimprint Lithography‐Directed Self‐Assembly of Bimetallic Iron–M (M=Palladium,Platinum) Complexes for Magnetic Patterning

Self‐assembly of d⁸ metal polypyridine systems is a well‐established approach for the creation of 1D organometallic assemblies but there are still challenges for the large‐scale construction of nanostructured patterns from these building blocks. We describe herein the use of high‐throughput nanoimprint lithography (NIL) to direct the self‐assembly of the bimetallic complexes [4′‐ferrocenyl‐(2,2′:6′,2′′‐terpyridine)M(OAc)]⁺(OAc)^? (M=Pd or Pt; OAc=acetate). Uniform nanorods are fabricated from the molecular self‐organization and evidenced by morphological characterization. More importantly, when top‐down NIL is coupled with the bottom‐up self‐assembly of the organometallic building blocks, regular arrays of nanorods can be accessed and the patterns can be controlled by changing the lithographic stamp, where the mold imposes a confinement effect on the nanorod growth. In addition, patterns consisting of the products formed after pyrolysis are studied. The resulting arrays of ferromagnetic FeM alloy nanorods suggest promising potential for the scalable production of ordered magnetic arrays and fabrication of magnetic bit‐patterned media.     

Fabrication of multicolor patterns with a single dye species on a polymer surface

Multicolored patterns can be fabricated by evaporating a single dye species on a prepatterned polymer substrate. The ratios of dye to polymer are different on protrusion and recess areas of the prepatterned surface, which can result in different aggregates and emissions. The polymer substrate was prepatterned using nanoimprint lithography (NIL) without any further process. This method may provide a facile route for fabricating large-area multicolored patterns.     

Plasmonic films based on colloidal lithography

This paper reviews recent advances in the field of plasmonic films fabricated by colloidal lithography. Compared with conventional lithography techniques such as electron beam lithography and focused ion beam lithography, the unconventional colloidal lithography technique with advantages of low-cost and high-throughput has made the fabrication process more efficient, and moreover brought out novel films that show remarkable surface plasmon features. These plasmonic films include those with nanohole arrays, nanovoid arrays and nanoshell arrays with precisely controlled shapes, sizes, and spacing. Based on these novel nanostructures, optical and sensing performances can be greatly enhanced. The introduction of colloidal lithography provides not only efficient fabrication processes but also plasmonic films with unique nanostructures, which are difficult to be fabricated by conventional lithography techniques.     

Cross-linked and chemically functionalized polymer supports by reactive reversal nanoimprint lithography

A new format of polymer support having cross-linked polymeric micro- and nanoarrays has been fabricated via reactive reversal nanoimprint lithography. Reactive reversal nanoimprint lithography is a relatively simple method to imprint highly cross-linked and chemically tunable polymers. An array of chloromethyl-functionalized cross-linked polystyrene has been imprinted on hard (silicon) and soft (polymer) substrates, and a model esterification reaction is demonstrated. The imprints have been found to be relatively stable under both static and dynamic stability tests carried out in various organic solvents. The chemical functionality is evenly distributed over the imprinted array. This method of fabricating polymer supports offers a high degree of freedom in terms of the choice of chemical functionality, the types of polymer matrix, and the size of the polymer support. The functional polymer support has potential applications for chemical and biological assays.     

Nanopatterned Electrochromic Conjugated Poly(terthiophene)s via Thermal Nanoimprint Lithography of Precursor Polymer

Polyterthiophene nanostructures consisting of periodic nanolines were prepared using the precursor polymer approach in conjunction with nanoimprint lithography. Precursor polynorbornylenes consisting of terthiophene side chains were prepared from their corresponding norbornylene monomers via ring opening metathesis polymerization. A copolymer consisting of terthiophene norbornylene and acetate norbornylene repeat units with a 50:50 composition exhibited a glass transition temperature of 52°C. Nanolines of percursor polynorbornylene were prepared by thermal nanoimprint lithography. The nanoimprinted precursor polymer was then converted to conjugated conductive polymer via chemical and electrochemical oxidation of the terthiophene side units. Nanoimprinted lines of conductive polyterthiophene exhibited high electrochromic contrast at 437 nm.     

Athermal and Soft Multi-Nanopatterning of Azopolymers: Phototunable Mechanical Properties

Imprinting nanopatterns on flexible substrates has diverse applications in advanced fabrication. However, the traditional thermal nanoimprint lithography (T-NIL) often causes shrinkage upon cooling. Here, a simple yet versatile method is introduced to fabricate multiple nanopatterns on a flexible substrate coated with an azopolymer by combining athermal nanoimprint lithography (AT-NIL) and photolithography. The azopolymer has various mechanical properties upon photoirradiation: 1) phototunable glass-transition temperatures (T_g) and concomitantly photoinduced switch from glassy plastic to viscoplastic polymer; 2) prominent modulation of viscoplasticity under light illumination at different wavelengths. Regionally selective multiple nanopatterns are conveniently fabricated, presenting angle-dependent structural color images on poly(ethylene terephthalate) (PET) substrates. The flexible, athermal and multiple nanopatterning method has the potential for on-demand fabrication of complex nanopatterns.     

Fabrication of hierarchical structures by unconventional two-step imprinting

We present a simple sequential imprinting lithography method to fabricate micro/nanoscale hierarchical structures. This method involves hot embossing and capillary force lithography with two stamps of different microscales, which avoids using nanoscale stamps. By varying the experimental conditions in the capillary force lithography process, the morphology of the resulting structures can be controlled. This method may provide a facile and low-cost route for fabricating large area patterns of hierarchical structures.     

Fluorinated organic-inorganic hybrid mold as a new stamp for nanoimprint and soft lithography

In this paper, we fabricated a fluorinated organic-inorganic hybrid mold using a nonhydrolytic sol-gel process which can produce a crack-free mold without leaving any trace of solvent. No special chemical treatment of a release layer is needed because the fluorinated hybrid mold has fluorine molecules in the backbone. The other advantages of the hybrid mold are thermal stability over 300 degrees C. The hybrid mold produced from UV nanoimprint lithography (UV-NIL) was used as a mold for the next UV-NIL and soft lithography without requiring use of an antisticking layer. Various nanometer scale patterns including sub-100 nm patterns could be obtained from the hybrid mold. Nanopatterning processes using this low-cost mold are useful because they preserve the expensive original master.     

Athermal and Soft Multi‐Nanopatterning of Azopolymers: Phototunable Mechanical Properties

Imprinting nanopatterns on flexible substrates has diverse applications in advanced fabrication. However, the traditional thermal nanoimprint lithography (T‐NIL) often causes shrinkage upon cooling. Here, a simple yet versatile method is introduced to fabricate multiple nanopatterns on a flexible substrate coated with an azopolymer by combining athermal nanoimprint lithography (AT‐NIL) and photolithography. The azopolymer has various mechanical properties upon photoirradiation: 1) phototunable glass‐transition temperatures (T_g) and concomitantly photoinduced switch from glassy plastic to viscoplastic polymer; 2) prominent modulation of viscoplasticity under light illumination at different wavelengths. Regionally selective multiple nanopatterns are conveniently fabricated, presenting angle‐dependent structural color images on poly(ethylene terephthalate) (PET) substrates. The flexible, athermal and multiple nanopatterning method has the potential for on‐demand fabrication of complex nanopatterns.     

Patterning Layered Polymeric Multilayer Films by Room‐Temperature Nanoimprint Lithography

Summary: Polyelectrolyte multilayer films of poly(acrylic acid) (PAA)/poly(allylamine hydrochloride) (PAH) and PAH/poly(sodium 4‐styrenesulfonate) (PSS) based on electrostatic interactions as a driving force are patterned by room‐temperature nanoimprint lithography (RT‐NIL). Under an imprinting pressure of 40 bar for 8 min, well‐defined pattern structures with a line width of ≈330 nm and a separation of ≈413 nm are achieved. Meanwhile, hydrogen‐bonding‐directed multilayer films of poly(vinyl pyrrolidone) (PVPON)/poly(methyl acrylic acid) (PMAA) and poly(4‐vinylpyridine)/PAA can also be patterned in a similar way by RT‐NIL. The successful imprinting of these films originates from the high compressibility and fluidity of the layered polymeric films under high pressure.

SEM image of an imprinted (PAH/PAA)*20 film on silicon wafer.