基于AFM纳米氧化技术的金纳米粒子定点组装

二维纳米粒子矩阵列在纳米电子器件^[1,2]、表面增强喇曼活性基底^[3,4]、刻蚀掩模^[5]等领域具有广泛的应用前景。在这些纳米粒子阵列为内部,纳米粒子的排布是随机、无序的。这一缺点已经妨碍了纳米粒子阵列在上述领域中的进一步应用。基于此,人们开始关注纳米粒子的可控组装。传统的光刻技术^[6]、微接触印刷技术^[7]以及生物分子模板技术^[8]都被用来实现纳米粒子在固体表面上的可控组装,本实验室在纳米粒子的合成及可控组装方面也进行了研究^[7,9,11]。本文力图精确控制单个纳米粒子在基底表面上的组装位置。利用AFM纳米氧化技术。在硅表面构建了纳米级的化学图形化表面,通过不同的化学官能团,如甲基、氨基对金纳米粒子亲和性质的差异,实现了纳米粒子在固体表面的定点组装。     

利用DPN技术直接构建磁性纳米图形

在纳米尺度下构建有序的磁性模板和图形是当前的研究热点之一 [1,2 ] .这种模板在生物样品的分离[1] 、磁电子学研究和信息存储 [2 ] 等领域具有重要意义 .目前 ,光刻 [3] 、微触点印刷 [4 ] 和自组装 [5] 等多项技术已被用来构建各种纳米模板 .1 999年 ,美国西北大学 Mirkin小组 [6 ]发明的 Dip- pen纳米刻蚀技术 (简称 DPN技术 )更在可控组装方面显示出巨大优越性 .这项技术是在一定驱动力作用下 ,使吸附在原子力显微镜 ( AFM)针尖上的分子“墨水”逐渐转移到基底表面上 ,实现纳米模板的可控构建 .与传统技术相比 ,DPN技术可在纳米尺…     

量子点光刻技术及其显示应用

量子点显示器件具有高光谱纯度、宽色域、高亮度等优势,被认为是显示行业未来的一个重要发展方向。发展量子点高精度光刻图案化技术对实现其在显示领域的应用具有重要的意义。本文阐述了量子点光刻技术的最新进展,主要包括光刻胶辅助剥离光刻和直接光刻技术。在直接光刻技术方面,着重介绍混入光刻胶光刻和配体工程光刻,并对图案化的量子点发光层在光致发光和电致发光中的应用进展进行评述。同时,介绍量子点光刻中存在的问题并展望其在超高分辨率显示领域的应用前景。     

聚酰亚胺LB膜真空热解制备β-SiC膜的STM观察

扫描隧道显微镜 ( STM)是一种基于量子隧道效应对样品进行高分辨无损测试的表面测试技术 [1] ,它可以在原子水平上反映表面分子或原子的排列分布情况 ,在物理、化学、生物和微电子界受到高度的重视 .STM技术以及其后发展起来的原子力显微镜 ( AFM)特别适合 LB膜的研究 ,能直观地反映出 LB膜中分子排列的微观结构以及表面缺陷 [2 ,3] .我们曾通过真空热解沉积在单晶硅片上的聚酰亚胺L B膜制得了准单晶β- Si C超薄膜 [4～ 6 ] .本文利用 STM技术对聚酰亚胺 LB膜以及由它真空热解而成的 Si C膜的表面形态结构进行了初步观察和分析 .…     

酞菁铜阴阳离子分子沉积(MD)膜润湿性研究

酞菁及其衍生物等大环平面分子具有良好的化学稳定性和优异的光电性能 [1,2 ] ,利用酞菁进行模拟生物光合作用的研究 ,以期实现新的光电转换技术 ,近年来已引起人们的广泛重视[3～ 5] .分子沉积(MD)超薄膜[6～ 8] 是以阴阳离子间静电相互作用为成膜驱动力 ,通过相反离子体系的单层交替沉积制备的层状有序超薄膜 .分子沉积技术广泛应用在固体表面改性和生物传感技术等领域 ,沉积分子的物理化学性质是影响其应用的主要因素 .本文通过紫外 -可见光谱跟踪了酞菁铜阴阳离子 MD膜的均匀沉积 ,并根据酞菁 MD膜表面接触角的变化 ,探讨分子端基的…     

二维平面细胞微图案化技术及其生物学应用

可以控制细胞粘附形状、大小的方法统称为细胞图案化技术.这些方法结合微纳米制备、表面化学、电化学和光化学等手段可以动态控制细胞的粘附、迁移、分化及其相互作用,为细胞生物学研究提供了一个新平台.本文介绍了二维平面细胞图案化的各种方法,并对其优缺点进行了总结,评述了细胞图案化技术在细胞生物学基础研究、组织工程以及基于细胞的生物传感器领域的应用.     

探针体在蛋白质大分子上Langmuir吸附聚集及应用──蛋白质/荧光桃红B(PB)结合反应研究

蛋白质化学是生物化学家当今感兴趣的前沿研究领域. 研究小分子(离子)在生物大分子上的聚集形式以及机理, 帮助人们弄清其污染物及毒物在生物大分子上的结合, 在病理分析、临床检测以及基因变异有重要意义. 常用光谱分析方法包括分光光度法[1～6]、荧光法[7,8]和共振光散射光谱技术(RRS)等[9～12]. 但是, 大分子与探针分子间的结合机理仍存在一些尚未解决的问题[13,14]. 蛋白质分子由于复杂的立体构象形成弱微静电场[15,16], 在其作用下, 带电荷的小分子以单分子层形式被吸附到微相电场表面.     

2-巯基喹啉包裹的金纳米颗粒的制备及其电化学性质

纳米材料特有的尺寸效应、量子效应和表面效应使其具有许多异于常规材料的性质 ,在催化、生物传感器、微电子器件和磁性材料等诸多领域都有广泛的应用前景 [1] .已有专家预言 ,与纳米材料相关的技术将在新世纪经济发展中起主导作用 ,对其研究是目前科学研究中的热点 .金纳米颗粒是目前研究得最多的金属纳米材料体系 .传统的金纳米颗粒的制备方法以溶胶 -凝胶法为主 [2～ 4 ] ,所制备的金纳米颗粒的粒径较大 (一般大于 1 0 nm) ,粒径分布不均匀 ,易于团聚 ,因而限制了其应用 .为了解决上述问题 ,Brust等 [5]将硫醇化合物在金属表面的自组装…     

193-nm光刻中的光致抗蚀剂

当今世界处于信息时代,电子信息产业日新月异地飞速发展着,计算机的影响已遍及每一个经济领域和人们生活的每一个方面.微电子技术作为新技术革命的主角,已成为衡量一个国家经济实力和科技进步的重要标志^[1,2].微电子技术的不断发展得益于半导体与集成技术的不断提高,光刻技术和光致抗蚀剂是微电子技术中的核心技术和关键材料.     

表面富集季胺盐的交联聚苯乙烯微球合成与表征及其溶胀行为研究

在聚合物微球表面引入不同的基团 (如亲水性的羟基或羧基 ) ,可以改善聚合物微球的稳定性甚至生物相容性[1～ 4] ;利用表面基团可以把无机半导体微粒和功能有机分子以及生物分子引入聚合物微球[5～ 8] ,赋予聚合物微球特殊的性能 ,使其广泛应用于涂料、光电功能材料和生物医用材料等领域[9～ 15] .其中 ,表面带有阳离子的聚合物微球在絮凝剂、胶粘剂、水性涂料等方面已经得到广泛研究[16～ 2 0 ] .通常阳离子聚合物微球可以根据不同的需要利用常规乳液聚合、核壳乳液聚合等方法来合成 .亲水性和疏水性单体进行的无皂乳液聚合[2 1] ,因其能在…     

Template-assisted patterning of nanoscale self-assembled monolayer arrays on surfaces

We report a general, simple, and inexpensive approach to pattern features of self-assembled monolayers (SAMs) on silicon and gold surfaces using porous anodic alumina films as templates. The SAM patterns, with feature sizes down to 30 nm and densities higher than 10(10)/cm(2), can be prepared over large areas (>5 cm(2)). The feature dimensions can be tuned by controlling the alumina template structure. These SAM patterns have been successfully used as resists for fabricating gold and silicon nanoparticle arrays on substrates by wet-chemical etching. In addition, we show that arrays of gold features can be patterned with 10-nm gaps between the dots.     

Controlling film morphology in conjugated polymer:fullerene blends with surface patterning

We study the effects of patterned surface chemistry on the microscale and nanoscale morphology of solution-processed donor/acceptor polymer-blend films. Focusing on combinations of interest in polymer solar cells, we demonstrate that patterned surface chemistry can be used to tailor the film morphology of blends of semiconducting polymers such as poly-[2-(3,7-dimethyloctyloxy)-5-methoxy-p-phenylenevinylene] (MDMO-PPV), poly-3-hexylthiophene (P3HT), poly[(9,9-dioctylflorenyl-2,7-diyl)-co-benzothiadiazole)] (F8BT), and poly(9,9-dioctylfluorene-co-bis-N,N'-(4-butylphenyl)-bis-N,N'-phenyl-1,4-phenylendiamine) (PFB) with the fullerene derivative, [6,6]-phenyl-C(61)-butyric acid methyl ester (PCBM). We present a method for generating patterned, fullerene-terminated monolayers on gold surfaces and use microcontact printing and Dip-Pen Nanolithography (DPN) to pattern alkanethiols with both micro- and nanoscale features. After patterning with fullerenes and other functional groups, we backfill the rest of the surface with a variety of thiols to prepare substrates with periodic variations in surface chemistry. Spin coating polymer:PCBM films onto these substrates, followed by thermal annealing under nitrogen, leads to the formation of structured polymer films. We characterize these films with Atomic Force Microscopy (AFM), Raman spectroscopy, and fluorescence microscopy. The surface patterns are effective in guiding phase separation in all of the polymer:PCBM systems investigated and lead to a rich variety of film morphologies that are inaccessible with unpatterned substrates. We demonstrate our ability to guide pattern formation in films thick enough to be of interest for actual device applications (up to 200 nm in thickness) using feature sizes as small as 100 nm. Finally, we show that the surface chemistry can lead to variations in film morphology on length scales significantly smaller than those used in generating the original surface patterns. The variety of behaviors observed and the wide range of control over polymer morphology achieved at a variety of different length scales have important implications for the development of bulk heterojunction solar cells.     

Patterning phase separation in polymer films with dip-pen nanolithography

We report a rapid-prototyping method for controlling nanoscale phase separation and pattern formation in conjugated polymer blend films using Dip-Pen Nanolithography (DPN). We use DPN to generate patterned alkylthiol monolayers with feature sizes down to 50 nm on gold surfaces and show how such patterns can nucleate the formation of lateral domains in blends of poly-3-hexylthiophene (P3HT) and polystyrene (PS) cast from solution. We show that this process can be used to probe phase nucleation at heterogeneous surface sites ranging in size from 50 to 750 nm, and that polymer features smaller than 150 nm in diameter can be achieved. We anticipate this method will be useful for studying polymer film responses to nanoscale surface fluctuations as well as for correlating nanoscale phase separation with optoelectronic processes in organic films used in light-emitting diode and photovoltaic devices.     

Modulating the pattern quality of micropatterned multilayer films prepared by layer-by-layer self-assembly

Patterned multilayer films composed of poly(allylamine hydrochloride) (PAH) and poly(sodium 4-styrenesulfonate) (PSS) were prepared using dip and spin self-assembly (SA) methods. A silicon substrate was patterned with a photoresist thin film using conventional photolithography, and PAH/PSS multilayers were then deposited onto the substrate surface using dip or spin SA. For spin SA, the photoresist on the substrate was retained, despite the high centrifugal forces involved in depositing the polyelectrolytes (PEs). The patterned multilayer films were formed by immersing the PE-coated substrates in acetone for 10 min. The effect of ionic strength on the pattern quality in dip and spin multilayer patterns (line-edge definition and surface roughness of the patterned region) was investigated by increasing the salt concentration in the PE solution (range 0-1 M). In dip multilayer patterns, the presence of salt increased the film surface roughness and pattern thickness without any deformation of pattern shape. The spin multilayer patterns formed without salt induced a height profile of about 130 nm at the pattern edge, whereas the patterns formed with high salt content (1 M) were extensively washed off the substrates. Well-defined pattern shapes of spin SA multilayers were obtained at an ionic strength of 0.4 M NaCl. Multilayer patterns prepared using spin SA and lift-off methods at the same ionic strength had a surface roughness of about 2 nm, and those prepared using the dip SA and lift-off method had a surface roughness of about 5 nm. The same process was used to prepare well-defined patterns of organic/metallic multilayer films consisting of PE and gold nanoparticles. The spin SA process yielded patterned multilayer films with various lengths and shapes.     

Direct electrochemical nanopatterning of polycarbazole monomer and precursor polymer films: ambient formation of thermally stable conducting nanopatterns

The direct nanopatterning of polycarbazole on ultrathin films of a "precursor polymer" and monomer under ambient conditions is reported. In contrast to previous reports on electrochemical dip-pen nanolithography using monomer ink or electrolyte-saturated films in electrostatic nanolithography, these features were directly patterned on spin-cast films of carbazole monomer and poly(vinylcarbazole) (PVK) under room temperature and humidity conditions. Using a voltage-biased atomic force microscope (AFM) tip, electric-field-induced polymerization and cross-linking occurred with nanopatterning in these films. Different parameters, including writing speed and bias voltages, were studied to demonstrate line width and patterning geometry control. The conducting property (current-voltage (I-V) curves) of these nanopatterns was also investigated using a conducting-AFM (C-AFM) setup, and the thermal stability of the patterns was evaluated by annealing the polymer/monomer film above the glass transition (T(g)) temperature of the precursor polymer. To the best of our knowledge, this is the first report in which thermally stable conducting nanopatterns were drawn directly on monomer or polymer film substrates using an electrochemical nanolithography technique under ambient conditions.     

Solution-based assembly of conductive gold film on flexible polymer substrates

Conductive films of gold were assembled on flexible polymer substrates such as Kapton and polyethylene using a solution-based process. The polymer substrates were modified by using argon plasma and subsequent coupling of silanes with amino- or mercapto- terminal groups. These modified surfaces were examined by X-ray photoelectron spectroscopy and contact angle measurements. Colloidal gold was assembled onto the silane-modified surface from solution. The gold particles are attached to the surface by covalent interactions with the thiol or amine group. Formation of a conductive film is achieved by increasing the coverage of gold by using a "seeding" method to increase the size of the attached gold particles. Field emission scanning electron microscopy was used to follow the growth of the film. The surface resistance of the films, measured using a four-point probe, was about 1 Omega/sq.     

Fabrication of submicron scale patterned plastic thin film fluidic devices with controllable thickness

We present a soft-lithography based method to fabricate plastic thin film fluidic devices on glass and plastic substrates. Principles of soft-lithography and spin casting were used to generate the films. The thickness of these films is controllable and the patterns we have generated have submicron scale dimensions. By using commercially available compact disc (CD) components as molds, we have been able to generate parallel line and cross patterns on these thin films. These patterned films could be lifted from the substrates and further folded into rolls.     

Directed growth of poly(isobenzofuran) films by chemical vapor deposition on patterned self-assembled monolayers as templates

This paper describes a method to direct the formation of microstructures of poly(isobenzofuran) (PIBF) by chemical vapor deposition (CVD) on chemically patterned, reactive, self-assembled monolayers (SAMs) prepared on gold substrates. We examined the growth dependence of PIBF by deposition onto several different SAMs each presenting different surface functional groups, including a carboxylic acid, a phenol, an alcohol, an amine, and a methyl group. Interferometry, Fourier transform infrared (FT-IR) spectroscopy, X-ray photoelectron spectroscopy (XPS), gel permeation chromatography (GPC), and optical microscopy were used to characterize the PIBF films grown on the various SAMs. Based on the kinetic and the spectroscopic analyses, we suggest that the growth of PIBF is surface-dependent and may follow a cationic polymerization mechanism. Using the cationic polymerization mechanism of PIBF growth, we also prepared patterned SAMs of 11-mercapto-1-undecanol (MUO) or 11-mercaptoundecanoic acid (MUA) by microcontact printing (microCP) on gold substrates as templates, to direct the growth of the PIBF. The directed growth and the formation of microstructures of PIBF with lateral dimensions of 6 microm were investigated using atomic force microscopy (AFM). The average thickness of the microstructures of PIBF films grown on the MUO and the MUA patterns were 400 +/- 40 nm and 490 +/- 40 nm, respectively. SAMs patterned with carboxylic acid salts (Cu2+, Fe2+, or Ag+) derived from MUA led to increases in the average thickness of the microstructures of PIBF by 10%, 12%, or 27%, respectively, relative to that of control templates. The growth dependence of PIBF on the various carboxylic acid salts was also investigated using experimental observations of the growth kinetics and XPS analyses of the relative amount of metal ions present on the template surfaces.     

Functionalization and patterning of reactive polymer brushes based on surface reversible addition and fragmentation chain transfer polymerization

We present the synthesis of reactive polymer brushes prepared by surface reversible addition–fragmentation chain transfer polymerization of pentafluorophenyl acrylate. The reactive ester moieties can be used to functionalize the polymer brush film with virtually any functionality by simple post‐polymerization modification with amines. Dithiobenzoic acid benzyl‐(4‐ethyltrimethoxylsilyl) ester was used as the surface chain transfer agent (S‐CTA) and the anchoring group onto the silicon substrates. Reactive polymer brushes with adjustable molecular weight, high grafting density, and conformal coverage through the grafting‐from approach were obtained. Subsequently, the reactive polymer brushes were converted with amino‐spiropyrans resulting in reversible light‐responsive polymer brush films. The wetting behavior could be altered by irradiation with ultraviolet (UV) or visible light. Furthermore, a patterned surface of polymer brushes was obtained using a lithography technique. UV irradiation of the S‐CTA‐modified substrates leads to a selective degradation of S‐CTA in the exposed areas and gives patterned activated polymer brushes after a subsequent RAFT polymerization step. Conversion of the patterned polymer brushes with 5‐((2‐aminoethyl)amino)naphthalene‐1‐sulfonic acid resulted in patterned fluorescent polymer brush films. The utilization of reactive polymer brushes offers an easy approach in the fabrication of highly functional brushes, even for functionalities whose introduction is limited by other strategies. © 2012 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem, 2012     

Microstencils for the patterning of nontraditional materials

A microfabrication technique that uses a photolithographically patterned film as a microstencil has been developed. This microstencil has a bilayer structure comprised of parylene and SU-8 films with thicknesses from 4 to 100 microm. The parylene layer enables the microstencil to be mechanically peeled from hydrophilic substrates. Since no chemicals are required to release the microstencil, this technique can be used to pattern chemically and biologically sensitive materials. The amount of material deposited can be automatically controlled by the height of the SU-8 structures or externally controlled by spin coating or other thin film deposition techniques. This patterning method is very versatile and has been used to pattern features as small as 25 by 25 microm on silicon, glass, and polymer substrates. As an initial demonstration, we have patterned wax, cells, proteins, sol, and CYTOP.