Ordered Mesoporous Thin Films of Rutile TiO2 Nanocrystals Mixed with Amorphous Ta2O5

Ordered mesoporous thin films of composites of rutile TiO₂ nanocrystals with amorphous Ta₂O₅ are fabricated by evaporation‐induced self‐assembly followed by subsequent heat treatment beyond 780 °C. Incorporation of selected amounts of Ta₂O₅ (20 mol %) in the mesoporous TiO₂ film, together with the unique mesoporous structure itself, increased the onset of crystallization temperature which is high enough to ensure the crystallization of amorphous titania to rutile. The ordered mesoporous structure benefits from a block‐copolymer template, which stabilizes the mesostructure of the amorphous mixed oxides before crystallization. The surface and in‐depth composition analysis by X‐ray photoelectron spectroscopy suggests a homogeneous intermixing of the two oxides in the thin film. A detailed X‐ray absorption fine structure measurement on the composite film containing 20 mol % Ta₂O₅ and heated to 800 °C confirms the amorphous nature of the Ta₂O₅ phase. Photocatalytic activity evaluation suggests that the rutile nanocrystals in the synthesized ordered mesoporous thin film possess good ability to assist the photodegradation of rhodamine B in water under illumination by UV light.     

Substrate temperature influenced physical properties of silicon MOS devices with TiO2 gate dielectric

DC reactive magnetron sputtering technique was employed for deposition of titanium dioxide (TiO₂) films. The films were formed on Corning glass and p‐Si (100) substrates by sputtering of titanium target in an oxygen partial pressure of 6×10^?2 Pa and at different substrate temperatures in the range 303 – 673 K. The films formed at 303 K were X‐ray amorphous whereas those deposited at substrate temperatures ≥ 473 K were transformed into polycrystalline nature with anatase phase of TiO₂. Fourier transform infrared spectroscopic studies confirmed the presence of characteristic bonding configuration of TiO₂. The surface morphology of the films was significantly influenced by the substrate temperature. MOS capacitor with Al/TiO₂/p‐Si sandwich structure was fabricated and performed current–voltage and capacitance–voltage characteristics. At an applied gate voltage of 1.5 V, the leakage current density of the device decreased from 1.8 × 10^?6 to 5.4 × 10^?8 A/cm² with the increase of substrate temperature from 303 to 673 K. The electrical conduction in the MOS structure was more predominant with Schottky emission and Fowler‐Nordheim conduction. The dielectric constant (at 1 MHz) of the films increased from 6 to 20 with increase of substrate temperature. The optical band gap of the films increased from 3.50 to 3.56 eV and refractive index from 2.20 to 2.37 with the increase of substrate temperature from 303 to 673 K. Copyright © 2012 John Wiley & Sons, Ltd.     

Comparison of optical and structural properties of nanostructure TiO2 thin film doped by Sn and Nb

The thin films of TiO₂ doped by Sn or Nb were prepared by sol–gel method under process control. The effects of Sn and Nb doping on the structural, optical and photo-catalytic properties of applied thin films have been studied by X-ray diffraction (XRD) high resolution transmission electron microscopy and UV–Vis absorption spectroscopy. Surface chemical state of thin films was examined by atomic X-ray photoelectron spectroscopy. XRD results suggest that adding impurities has a great effect on the crystallinity and particle size of TiO₂. Titania rutile phase formation in thin film was promoted by Sn⁴⁺ addition but was inhibited by Nb⁵⁺ doping. The activity of the photocatalyst was evaluated by photocatalytic degradation kinetics of aqueous methylene blue under UV and Visible radiation. The results show that the photocatalytic activity of the Sn-doped TiO₂ thin film have a larger degradation efficiency than Nb-doped TiO₂ under visible light, but under UV light photocatalytic activity of the Nb-doped TiO₂ thin film is better.     

掺杂二氧化锡的二氧化钛的光学性质及其光催化特性

二氧化钛多相催化是一种极具前途的环境污染深度净化技术。 本文以钛酸四丁酯和四氯化锡为原料,无水乙醇为溶剂,采用溶胶-凝胶法制备了掺杂二氧化锡的二氧化钛薄膜和复合氧化物粉体。通过测量薄膜的吸收光谱推算光学能隙,结果发现掺杂样品的光学能隙比纯二氧化钛样品有所变小。随着热处理温度的提高,掺杂和纯二氧化钛样品的光学能隙都略微降低。X-射线衍射分析表明,复合氧化物粉体的热处理温度对样品的晶体结构和光催化性能有重要影响。以掺杂二氧化锡5 % 摩尔比的样品与纯二氧化钛对照,500 ℃以下热处理样品以锐钛矿结构为主,600 ℃热处理样品为锐钛矿与金红石相共存,并显示了较好的光催化性能。透射电子显微镜观察显示,同样600 ℃热处理,掺杂样品要比纯二氧化钛具有更小的颗粒尺寸。在700 ℃热处理的样品中,掺杂样品只存在金红石相而纯二氧化钛样品中仍存有锐钛矿相。用阿伦尼乌斯经验关系式推测的晶粒生长的活化能,纯二氧化钛47.486 kJ.mol, 掺杂5 % 摩尔比的复合氧化物样品33.103 kJ.mol。以亚甲基蓝为降解物质,考察了掺杂量和热处理温度对样品的光催化性能。     

Electrochromic properties of sputtered TiO2 thin films

TiO₂ thin films were deposited on ITO/Glass substrates by the rf magnetron sputtering in this study. The electrochromic properties of TiO₂ films were investigated using cyclic voltammograms (CV), which were carried out on TiO₂ films immersed in an electrolyte of 1 M LiClO₄ in propylene carbonate (PC). As- deposited TiO₂ thin film was amorphous, while the films post-annealed at 300~600°C contained crystallized anatase and rutile. With the increase of the annealing temperature, the surface roughness of film increased from 1.232 nm to 1.950 nm. Experimental results reveal that the processing parameters of TiO₂ thin films will influence the electrochromic properties such as transmittance, ion-storage capacity, inserted charge, optical density change, coloration efficiency and insertion coefficient.     

A new method for deposition nitrogen‐doped TiO2 nanofibers with mixed phases of anatase and rutile

A new method for deposition nitrogen‐doped TiO₂ nanofibers films was proposed. By using atmospheric pressure plasma jet generated by dual‐frequency power sources, the morphologies of these TiO₂ films were investigated by scanning electron microscopy. The structures of these films were characterized by X‐ray diffraction and Raman Shift Spectroscopy. The elemental composition of these films [Colour figure can be viewed at wileyonlinelibrary.com ] were characterized by means of X‐ray photoelectron spectroscopy. The optical absorption of these films were studied by UV‐vis absorbance spectra. These results indicated that the nitrogen‐doped nanofibers TiO₂ films have mixed phases of anatase and rutile. They also display narrow band gap. The I‐V characteristics curves exhibited good conductivity ability. Optical emission spectroscopy (OES) was measured to analyze the active group.     

Effect of calcination temperature on the microstructure of porous TiO<Subscript>2</Subscript> film

To obtain porous TiO₂ film, the precursor sol was prepared by hydrolysis of Ti isopropoxide and then complexed with trehalose dihydrate. The porous TiO₂ film was fabricated by the dip-coating technique on glass substrates using this solution. The TiO₂ film was calcined at 500 °C. The maximum thickness of the film from one-run dip-coating was ca. 740 nm. The film was composed of nanosized particle and pores. The porosity of the TiO₂ film was increased by addition of trehalose dihydrate to the sol. The porous TiO₂ films were calcined at different temperatures. The effects of calcination temperature on the microstructure of the porous TiO₂ film were investigated. The porous film prepared from sol containing trehalose still kept the porous structure after calcination at 950 °C. The phase transition temperature of the film from anatase to rutile was shifted from 650 to 700 °C by addition of trehalose to the sol.     

Photocurrent Enhancement of Dye‐Sensitized Solar Cells owing to Increased Dye‐Adsorption onto Silicon‐Nanoparticle‐Coated Titanium‐Dioxide Films

The inverse‐micellar preparation of Si nanoparticles (Nps) was improved by utilizing sodium naphthalide. The Si Nps were subsequently functionalized with 4‐vinylbenzoic acid for their attachment onto TiO₂ films of dye‐sensitized solar cells (DSSCs). The average diameter of the COOH‐functionalized Si (Si? COOH) Nps was 4.6(±1.7) nm. Depth profiling by secondary‐ion mass spectrometry revealed that the Si Nps were uniformly attached onto the TiO₂ films. The number of Ru^II dye molecules adsorbed onto a TiO₂ film that was treated with the Si? COOH Nps was 42 % higher than that on the untreated TiO₂ film. As a result, DSSCs that incorporated the Si? COOH Nps exhibited higher short‐circuit photocurrent density and an overall energy‐conversion efficiency than the untreated DSSCs by 22 % and 27 %, respectively. This enhanced performance, mostly owing to the intramolecular charge‐transfer to TiO₂ from the dye molecules that were anchored to the Si? COOH Nps, was confirmed by comparing the performance with two different Ru^II–bipyridine dyes (N719 and N749).     

Synthesis of Mixed-Phase TiO<Subscript>2</Subscript> Nanopowders Using Atmospheric Pressure Plasma Jet Driven by Dual-Frequency Power Sources

Mixed-phase TiO₂ nanopowders with different ratios of anatase and rutile have been successfully synthesized using atmospheric pressure plasma jet driven by dual-frequency power sources. The crystal structures of the TiO₂ nanopowders were characterized by X-ray diffraction, SAED, HRTEM, and Raman shift spectroscopy. These results indicated that samples possessed anatase and rutile structure, in addition, the crystallinity of the TiO₂ nanopowders increased and the chlorine contamination decreased with discharge RF power increasing. The photocatalytic activity of the TiO₂ nanopowders was evaluated by decomposition methylene blue solution. The TiO₂ nanopowders which were produced at the discharge RF power of 110 W had the highest photocatalytic activity. Optical emission spectroscopy (OES) was used to detect various excited species in the plasma jet. The results indicate that the various RF power significantly changes the intensities of emission lines (Ar, Ar⁺, Ti, Ti⁺, Ti²⁺, Ti³⁺ and O), which results in the TiO₂ nanopowders a mixture of anatase and rutile phases. The nonequilibrium chemical composition could be formed in one step without anneal. It may have potential applications for synthesizing nanosized particles of high crystallinity by reactive nonthermal plasma processing.     

Fabrication of TiO2 Grating with Composites of Azobenzene Polymer and TiO2 Nanoparticles

We have used the formation of surface relief gratings (SRG) on azobenzene polymers to manipulate TiO₂ nanoparticles and to fabricate TiO₂ nanoparticle gratings. Suspensions of an azobenzene polymer (PDO3) and TiO₂ were used to spin coat thin films on glass slide substrates. By interfering coherent light from an Argon laser on the surface of the PDO3‐TiO₂ composite films, SRGs were fabricated. Atomic force microscopic images of the SRGs show TiO₂ nanoparticles dispersed throughout the sample, and in particular, at the peaks of the SRG after oxygen plasma treatment. The lateral forces acting on the azobenzene polymer during the SRG fabrication drag the TiO₂ nanoparticles. These results indicated that it is feasible to create TiO₂ nanoparticle gratings with the composites.     

Axis‐Oriented,Continuous Anatase Titania Films with Exposed Reactive {100} Facets

Homogeneous TiO₂ single crystals with high exposure of {100} reactive facets were constructed as a seed monolayer on transparent conductive substrates with the desired orientation of reactive facets. A secondary growth process was subsequently carried out on the monolayer seed film to form an axis‐oriented continuous reactive film. Performing secondary growth with different precursors led to optimized conditions for high‐performance photoelectrochemical activity of anatase TiO₂ films. Experimental techniques such as UV/Vis absorption spectroscopy, X‐ray diffraction, high‐resolution SEM, and photoelectrochemistry were used to characterize the structural, optical, and photoelectrochemical properties of the as‐synthesized films. As a photoanode in a photoelectrochemical cell, the axis‐oriented reactive film shows a maximum photocurrent density of 0.3 mA cm^?2, as opposed to 0.075 mA cm^?2 for non‐axis‐oriented (randomly oriented) TiO₂ film.     

Preparation of Titanium Oxide Layer on Silica Glass Substrate with Titanium Naphthenate Precursor

Nanocrystalline TiO₂ thin films on silica glass substrates were prepared by using a naphthenic acid precursor. As-deposited thin films were heat treated at 500, 600, 700 and 800^∘C for 30 min in air. The TiO₂ thin films were analyzed by High Resolution X-ray diffraction, ultra violet—visible—near infrared spectrophotometer, field emission—scanning electron microscope and scanning probe microscope. After annealing at 600 and 700^∘C, the XRD patterns consist of only anatase peaks of TiO₂ film. Rutile(110) peak begins to appear at an annealing temperature of 800^∘C. Relative high transmittance at visible range was obtained for all films except the film annealed at 800^∘C. Optical band gap, E_g, is in the range between 3.53 and 3.78 eV except the TiO₂ film annealed at 500^∘C. The best hydrophilicity was achieved with a high-temperature annealing.     

Preparation of polycrystalline Ti-Al-O films by magnetron sputtering ion plating: constitution, structure and morphology

Ti-Al-O layers were deposited on Si-<100> wafers at 500 °C by means of reactive magnetron sputtering ion plating (R-MSIP). An Al-target was sputtered in rf-mode and a Ti-target in dc-mode simultaneously by an oxygen/argon plasma. The influence of the Al- and Ti-sputter powers on composition, structure, and morphology of the Ti-Al-O layers and the binding states of the components were investigated. The analysis with EPMA, XPS, AES and TEM yielded the following results: Ti-Al-O coatings with different Ti, Al, and O contents in the range of TiO₂ to Al₂O₃ were grown. TEM structure analysis revealed: the pure TiO₂ film consisted of the tetragonal phases rutile and anatase; the two structures were found in the titanium-rich Ti-Al-O film, too, but with significant smaller lattice constants. The aluminium-rich Ti-Al-O film displayed the same cubic structure of γ-Al₂O₃ as determined for the pure Al₂O₃ film, but the lattice constant is significant lower. Evaluation of the TEM pattern of the film with a Ti/Al ratio of 0.8 indicates a hexagonal structure with lattice constants similar to those of κ′-Al₂O₃. All films are nanocrystalline and not textured. Received: 24 June 1996 / Revised: 27 December 1996 / Accepted: 4 January 1997     

总气压与Ar/O2流量比对直流对向靶磁控溅射TiO2薄膜光催化性能的影响

采用对向靶磁控溅射法在不同气压和Ar/O₂流量比条件下, 以氟化SnO₂ (FTO)导电玻璃为基底制备了多晶TiO₂薄膜. 台阶仪测量结果显示所制备TiO₂薄膜的平均厚度约为200 nm. 随着溅射气压的升高, TiO₂薄膜由锐钛矿与金红石混晶结构转变为纯锐钛矿结构. 分别采用场发射扫描电镜(FESEM)和原子力显微镜(AFM)分析了不同气压和Ar/O₂流量比对TiO₂薄膜表面形貌的影响, 结果显示TiO₂薄膜的表面粗糙度随溅射总气压和Ar/O₂流量比的增加而增大. 以初始浓度为100×10^-6 (体积分数)的异丙醇(IPA)气体为目标物检测所制备TiO₂薄膜的光催化性能, 并分析该气相光催化反应的机理, 在紫外照射条件下异丙醇先氧化为丙酮再被氧化为CO₂.当总溅射气压为2.0 Pa、Ar/O₂流量比为1:1时, 溅射所得TiO₂薄膜具备最优光催化活性并可在IPA降解反应中保持较高的催化活性和稳定性.     

钌配合物敏化La3+掺杂纳米多孔TiO2电极的光电性能研究

在染料敏化太阳能电池中,TiO2膜和敏化剂决定着电池的总体效率和机械性能。本文以4-甲基吡啶为原料,经过偶联、氧化、配位和配体交换反应合成了cis-RuL2(SCN)2, (L=2,2’-联吡啶-4,4’-二羧酸),通过溶胶-凝胶法制备了TiO2膜。为了提高TiO2膜的光电性能,将不同浓度的La(NO3)3 (0.1%、0.3%、0.5%和0.7%) 加入到溶胶中,采用cis-RuL2(SCN)2将掺杂前后的TiO2膜进行敏化。利用X射线衍射仪、原子力显微镜和X射线光电子能谱对所得薄膜进行结构表征。结果表明,当La离子的浓度为0.5%时,太阳能电池的效率最高,短路电流和开路电压比未掺杂的分别提高了0.54 mA/cm2和30.41 mV。     

Photocatalytic Activity of TiO2 Nanofibers with Doped La Prepared by Electrospinning Method

La‐TiO₂ nanofibers are prepared by a sol‐gel assisted electrospinning method. The structure and morphology of La‐TiO₂ nanofibers are characterized by X‐ray diffraction (XRD) and scanning electron microscopy (SEM). XRD analysis shows that the weight percentage of anatase and rutile in the 1.5 mol% La‐TiO₂ nanofibers calcined at 600 °C is about 8:2, which is similar to P‐25. The XRD data of La‐TiO₂ nanofibers with different La content shows that La³⁺ dopant has a great inhibition on TiO₂ phase transformation. The photocatalytic activity of the as‐prepared La‐TiO₂ nanofibers is evaluated by photocatalytic decolorization of Methylene Blue (MB) aqueous solution. The results show that the 1.5 mol% La‐TiO₂ nanofibers calcined at 600 °C exhibit high photocatalytic activity, indicating that 600 °C and 1.5 mol% are the appropriate calcination temperature and optimal molar ratio of La to Ti, respectively.     

Preparation of TiO<Subscript>2</Subscript> nanofibers immobilized on quartz substrate by electrospinning for photocatalytic degradation of ranitidine

The photocatalytic activity of TiO₂ nanofibers immobilized on quartz substrates was investigated by evaluating the decomposition of organic pollutants. TiO₂ nanofibers were synthesized by electrospinning the Ti-precursor/polymer mixture solution, followed by hot-pressing for enhancing the adhesion of TiO₂-nanofiber films to the substrates. TiO₂ started to crystalize in the anatase form at 500 °C and reached the optimal photocatalytic anatase/rutile phase ratio of 70:30 at a calcination temperature of 600 °C. The TiO₂-nanofiber film was demonstrated to be an efficient photocatalyst by ranitidine decomposition under UV illumination and was proven to have a comparable photocatalytic activity with the well-known Degussa P25 nanoparticulate photocatalyst and excellent recyclability during 10 cycles of photocatalytic operation, indicating no loss of TiO₂ nanofibers during photocatalytic operations.     

Photocatalytic Nanocomposite Films Fabricated by Layer‐by‐Layer Self‐assembly of TiO2 Nanoparticles and Lignosulfonates

Photocatalytic multilayer nanocomposite films composed of anatase TiO₂ nanoparticles and lignosulfonates (LS) were fabricated on quartz slides by the layer‐by‐layer (LBL) self‐assembly technique. X‐ray photoelectron spectroscopy (XPS), UV‐vis spectroscopy and atomic force microscopy (AFM) were used to characterize the TiO₂/LS multilayer nanocomposite films. Moreover, the photocatalytic properties (decomposition of methyl orange and bacteria) of multilayer nanocomposite films were investigated. XPS results indicated that the intensities of titanium and sulfur peaks increased with the LBL deposition process. A linear increase in absorbance at 280 nm was found by UV‐Vis spectroscopy, suggesting that stepwise multilayer growth occurs on the substrate and this deposition process is highly reproducible. AFM images showed that quartz slide was completely covered by TiO₂ nanoparticles when a 10‐bilayer multilayer film was formed. The decomposition efficiency of methyl orange by TiO₂/LS multilayer films under the same UV irradiation time increased linearly with the number of TiO₂ layers, and the results of decomposition of bacteria under UV irradiation showed that TiO₂/LS multilayer nanocomposite films exhibited excellent decomposition activity of bacteria (Escherichia coil).     

Photoinduced charge property of Ag‐TiO2 films and its relationships with photocatalytic activity under visible illumination

In this article, TiO₂ films were synthesized by traditional spin coating method. To improve their photocatalytic activities, we deposited silver on these films by photodeposition. These films also were characterized by several testing techniques, such as X‐ray diffraction, ultraviolet–visible diffuse reflection spectrum, XPS, Raman spectroscopy (Raman), surface photovoltage spectroscopy, and SEM. The activity of different films was evaluated for degrading rhodamine B solution under visible illumination. The effects of AgNO₃ solution concentration on photoinduced charge property and photocatalytic activity were investigated. The results show that the Ag‐TiO₂ film immersed in 10^?3 mol·L^?1 AgNO₃ solution exhibits higher activity, which is in good agreement with the characterization results. The weaker the surface photovoltage spectroscopy signal, the higher the photocatalytic activity. Moreover, the activity of some films is higher than that of international Degussa P‐25 TiO₂ under visible illumination. Copyright © 2012 John Wiley & Sons, Ltd.     

Surface chemistry and optical property of TiO2 thin films treated by low-pressure plasma

The low temperature RF plasma treatment was used to control the surface chemistry and optical property of TiO₂ thin films deposited by RF magnetron sputtering with a very good uniformity at 300 °C substrate heating temperature. The XRD pattern indicates the crystalline structure of the film could be associated to amorphous structure of TiO₂ in thin film. The plasma treatment of TiO₂ film can increase the proportion of Ti³⁺ in Ti2p and decrease in carbon atoms as alcohol/ether group in C1s at the surface. The optical transmittance of the film was enhanced by 50% after the plasma treatment. The surface structure and morphology remain the same for untreated and low-pressure plasma-treated films. Therefore, increase in the optical transmission could be due to change in surface chemistry and surface cleaning by plasma treatment.