钻井泥浆泵活塞表面多场耦合电沉积Ni-TiN纳米镀层研究

采用多场耦合电沉积方法,在钻井泥浆泵活塞表面制备Ni-TiN纳米镀层.利用X射线衍射仪(XRD)、原子力显微镜(AFM)、摩擦磨损试验机对Ni-TiN纳米镀层微观组织结构和耐磨性能进行研究.XRD分析表明,在钻井泥浆泵活塞试样表面存在金属镍晶粒和TiN粒子.当复合镀液中TiN粒子为6g/L时,Ni-TiN纳米镀层中镍晶粒和TiN粒子的平均粒径分别为65.5 nm和38.6 nm.AFM分析表明,当TiN粒子浓度为6g/L时,镀层表面镍晶的平均粒径最小,其均方根表面粗糙度(RMS)为44.077 nm.摩擦磨损实验测试表明,当复合镀液中TiN粒子为6g/L时,Ni-TiN纳米镀层的磨损量和摩擦系数都最小,其最小磨损量和摩擦系数分别为34.7 mg和0.44.     

基于AR模型的Ni-TiN复合镀层TiN粒子复合量预测研究

采用超声-脉冲电沉积方法在T8钢表面制备了Ni-TiN复合镀层,采用扫描电镜和X射线光衍射仪对镀镀层物相组织结构进行检测,并建立AR模型对镀层的TiN粒子复合量进行预测.结果表明,当电流密度4 A/dm2、占空比50;、超声波功率140 W时,Ni-TiN复合镀层表面较为光滑,晶粒较为细小,组织较为均匀.XRD分析表明,Ni-TiN复合镀层中存在Ni、TiN两相,镍的衍射峰分别位于44.8°、52.2°和76.8°,TiN的衍射峰分别位于38.5°、42.8°和66.5°.AR模型对Ni-TiN复合镀层TiN粒子复合量预测能力较强,其相对误差最大值与最小值分别为2.43;及0.71;.     

脉冲占空比对Ni-TiN镀层组织及其耐磨性能的影响

采用磁场-电沉积方法在40Cr钢表面制得Ni-TiN复合镀层.利用扫描电镜(SEM)、显微硬度计、X射线衍射仪(XRD)及磨损试验机等对Ni-TiN镀层的表面形貌、显微硬度、织构和耐磨性能进行研究.结果表明,脉冲占空比为50;时,镀层表面镍晶粒平均粒径65.3 nm,且镀层中TiN粒子复合量较多.随着脉冲占空比的增加,Ni-TiN镀层的显微硬度先增加后降低.脉冲占空比为50;时,Ni-TiN镀层的显微硬度达到最大值934 Hv,其磨损量和平均摩擦系数分别为28.5 mg和0.43.     

基于BP神经网络的Ni-TiN镀层腐蚀速率预测研究

采用磁场电沉积方法在40Cr钢表面制备了Ni-TiN镀层,并在正交实验的基础上建立了BP神经网络模型对镀层腐蚀速率进行预测,最后利用扫描电镜、X射线衍射仪以及显微电子天平对镀层的表面形貌、组分以及腐蚀速率进行分析和研究.结果表明,当工艺组合为A2B2C3D1,即TiN粒子浓度6 g/L,磁场强度0.4T,占空比50;,电流密度0.5 A/dm2时,Ni-TiN镀层经腐蚀后表面较为平整,凸起状物质较少.BP神经网络模型能够较好的模拟Ni-TiN镀层腐蚀速率,腐蚀速率最小值仅为2.134 mg/m·h,因此也证明了BP神经网络的可靠性.经XRD分析,Ni-TiN镀层存在Ni、TiN两相.     

基于BP神经网络模型的Ni-TiN镀层耐磨性预测研究

采用超声电沉积方法,在C470型压缩机阀片表面制备Ni-TiN镀层.利用扫描电镜、X射线衍射仪和摩擦磨损试验机研究Ni-TiN镀层表面形貌、组织结构及耐磨性,并采用BP神经网络模型预测Ni-TiN镀层的磨损量.结果表明,BP神经网络模型的最佳结构组成为3×9×l,其预测值与实验值的拟合度R=0.99938,相对误差最大值与最小值分别为1.67;和0.63;.当TiN粒子浓度为8 g/L、超声波功率180 W、电流密度4 A/dm2时,Ni-TiN镀层表面犁沟较浅,磨损量较小.Ni-TiN镀层中存在Ni和TiN相,镍的衍射峰分别位于44.82°、52.22°和76.78°,TiN的衍射峰分别位于38.48°、42.82°和66.54°.     

基于RBF神经网络的Ni-TiN镀层耐蚀性能预测研究

采用脉冲电沉积方法在40Cr钢表面制备Ni-TiN复合镀层,并以TiN粒子浓度、电流密度以及占空比为输入层,以Ni-TiN复合镀层腐蚀量为输出层,建立RBF神经网络模型,对镀层腐蚀量进行预测研究,最后利用扫描电镜观察不同工艺参数下镀层表面形貌.结果表明,RBF神经网络对镀层腐蚀量有较强的预测能力,其预测值与实验值相对误差最小仅为0.73;;SEM分析表明,当TiN粒子浓度10 g/L,电流密度5 A/dm2,占空比60;时,Ni-TiN复合镀层经腐蚀后表面较为平整,腐蚀坑较少,耐腐蚀性能较好.     

热处理温度对Ni-P-TiN纳米镀层的结构及其摩擦学性能影响

为改善机械零件的表面性能,采用超声波辅助化学沉积方法,在45钢基体表面制得Ni-P-TiN纳米镀层,利用透射电镜、X射线衍射仪、显微硬度计、扫描电镜、摩擦磨损试验机对其进行微观组织、机械性能及摩擦学性能研究.结果表明,镀态Ni-P-TiN纳米镀层主要由大量Ni和少量TiN组成,镍晶粒和TiN粒子的平均粒径分别为95nm和42 nm.当热处理温度达到300℃时,Ni-P-TiN纳米镀层中出现Ni3P相和NiO相,其显微硬度高达951.9Hv,其平均摩擦系数为0.43.     

铁基结合剂金刚石节块性能的优化

以性能较好的铁基结合剂为基体,加入表面未镀、镀Ni和纳米Al2O3/Ni复合镀层的金刚石,用热压烧结的方法得到铁基结合剂金刚石节块,测量了金刚石铁基结合剂节块的抗弯强度和耐磨性,采用SEM和EDS对复合镀层和金刚石表面的形貌和组分进行了表征.结果表明:在金刚石表面镀覆纳米Al2O3/Ni层后,复合镀层均匀致密,晶粒细小;在热压烧结中,复合镀层能阻止金刚石的石墨化,使金刚石和基体之间有强的化学结合,所以金刚石和铁基结合剂之间的界面结合紧密,结合剂对金刚石的把持力提高,节块的抗弯强度从468.9 MPa增加到563.8 MPa,磨耗比从349升高到700.     

纳米结构TiN薄膜的制备与性能研究

利用自行研制的磁过滤等离子体设备,在室温条件下的不锈钢基底上成功地制备了性能良好的纳米结构TiN薄膜.运用原子力显微镜和X射线衍射仪对其结构和形貌进行了表征.利用纳米硬度仪测量了TiN薄膜的硬度和弹性模量.结果显示:沉积的TiN薄膜表面非常平整光滑,致密而无缺陷;硬度远高于粗晶TiN的硬度;TiN晶粒尺寸在30～50nm;沉积过程中在基底上施加的负偏压会影响纳米结构TiN薄膜的结构和性能.     

ZrO2含量对Ni-Co-ZrO2复合镀层显微硬度和耐磨性能的影响

以硫酸镍、硫酸钴和氧化锆为主要原料,采用脉冲沉积技术在Q235钢基体表面沉积了Ni-Co-ZrO2复合镀层,利用扫描电镜、能谱仪、X射线衍射仪分别观察和表征了复合镀层的显微形貌、成分组成和相结构,并对Ni-Co-ZrO2复合镀层的显微硬度和耐磨性进行了研究.结果表明:ZrO2颗粒弥散分布于Ni-Co合金中,基体与镀层界面处无孔隙、裂纹等缺陷,镀层厚度约为60μm;镀态下Ni-Co-ZrO2复合镀层基质合金为晶态结构,主要生长晶面为Ni(111)和Co (110),XRD衍射图谱呈现出低强度、大峰宽和多晶向的相结构特征.随着镀层内ZrO2颗粒含量的增加,Ni-Co-ZrO2复合镀层的显微硬度呈现先提高后降低、磨损量先减少后增加的趋势,当ZrO2含量为20 g/L时,复合镀层的硬度最高、磨损量最少,磨痕形貌呈现出轻微磨损.     

镁合金表面制备Al2O3/Ni复合涂层抗腐蚀性的研究

为了改善镁合金的抗腐蚀性,用电泳沉积法在AZ91D镁合金表面沉积两种不同比例的Al2O3/Ni复合涂层.在干燥器皿中放置12h后,放入真空烧结炉中,在300℃下保温4h.通过X射线衍射,扫描电子显微镜和能谱仪对涂层的形貌,物相和微观结构进行分析;将试样浸泡在3.5wt;的NaCl溶液中,通过电化学极化曲线和阻抗谱对涂层的抗腐蚀性进行测试.结果显示,与纯Al2O3涂层相比,Al2O3/Ni复合涂层由于添加了Ni,涂层孔隙率降低,同时降低了涂层与基底热膨胀系数的不匹配程度,提高了结合强度.在四种不同比例的涂层中,Al2O3与Ni质量比为1:3的复合涂层,表面结构更加均匀致密化,涂层的抗腐蚀性能最好.     

Effect of substrate temperature on the properties of reactively sputtered TiN/NbN multilayers

TiN/NbN multilayer coatings were deposited with various substrate temperatures by DC reactive magnetron sputtering method onto Si (111) and glass substrates. The effect of substrate temperature on the structural and optical properties of TiN/NbN multilayers was investigated by X‐ray diffraction, X‐ray photoelectron spectroscopy, Field emission scanning electron microscopy and Photoluminescence measurements. The composition was analyzed by X‐ray photoelectron spectroscopy. X‐ray diffraction results showed that the layers crystallized in cubic structure for TiN and hexagonal structure for NbN. It was found that grain size increased with increase in substrate temperature. The surface morphology of the TiN/NbN thin films showed a dense and smooth surface with substrate temperature upto 200 °C but after 300 °C, the grains became larger and coarse surface was observed. The TiN/NbN multilayer coatings exhibited the characteristic peaks centered at 180, 210 and 560 cm^‐1. Red band emission peaks were observed in the wavelength range of 700‐710 nm. (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Corrosion behavior of solid solution (Ti,Al) N as a function of Al concentration

In this work, a series of (Ti, Al) N coatings with different Al contents were deposited on 304 stainless steel substrates by Hollow Cathode Discharge (HCD) method. The coatings were grown on 304 stainless steel substrates at 400 °C. The coatings were characterized using energy dispersive X‐ray spectroscopy (EDX), X‐ray diffraction (XRD), atomic force microscopy (AFM), and microhardness test. The XRD confirmed the transition from TiN phase to (Ti, Al) N phase and then to AlN phase with increasing Al concentration in the solid solution. It was found that with increasing Al concentration the hardness of the coatings initially increased up to a maximum value of about 30 GPa at around 32 at.% of Al and then the coating hardness decreased rapidly with further increase of Al content (Al > 32 at.%). The potentiodynamic polarization analysis was carried out in 3.5 wt.% NaCl solutions to study the corrosion resistance of the coatings. From the corrosion test it can be inferred that the amount of Al atoms in the coatings plays an important role for reducing the corrosion.     

钛合金基体上TiN涂层的残余热应力分析

采用有限元方法分析TiN涂层的残余热应力,研究钛合金基体和涂层厚度对TiN涂层热应力分布的影响.结果表明:基体内以拉应力为主,涂层内以压应力为主,在明锐界面靠近自由边界处出现了剪切应力奇异场;当涂层厚度增加时,涂层的径向应力逐渐减少,而剪应力先增加随后又趋于平稳;涂层的径向应力随基体厚度增加而增加,当基体厚度超过1 mm时增加变得平缓.     

用BP神经网络模型预测Ni-Al2O3复合涂层Al2O3粒子复合量研究

运用人工神经网络技术建立一个结构为4×9×1型的BP神经网络模型,用该模型对Ni-Al2O3复合涂层中Al2O3复合量进行预测研究,并用XRD衍射仪和原子力显微镜(AFM)对Ni-Al2O3复合涂层的Al2O3复合量和立体形貌进行分析.结果表明,当隐含层数为9个时,BP神经网络的均方根误差最小(1.13;),BP神经网络的拟合相似度R=0.99937,这表明BP神经网络模型能够较好的预测涂层Al2O3复合量.当占空比60;、阴极电流密度4 A/dm2、pH值4、镀液温度55 ℃时,Ni-Al2O3复合涂层结构密实,结晶细致.     

Electrical and optical properties of titanium nitride coatings prepared by atmospheric pressure chemical vapor deposition

In order to examine the possibility for TiN coatings to be low-E, TiN coatings were deposited on the glass substrates by atmospheric pressure chemical vapor deposition using titanium tetrachloride (TiCl₄) and ammonia (NH₃) as precursors. X-ray diffraction, sheet resistance measurement, optical transmittance spectroscopy and infrared reflectance spectroscopy were carried out to determine the relationships between the preparation parameters and the microstructure, electrical and optical properties of the coatings. The results showed that the concentration of crystals increased with increasing the substrate temperature and the flow of TiCl₄, resulting in a decrease of the electrical resistivity. The optical transmittance of TiN thin films was strongly dependent on the gas flow and the substrate temperature. Under optimum conditions, continuous polycrystalline TiN coatings with FCC structure were obtained with an electrical conductivity around 34.5 Ω/□, an optical transmittance around 50% in the visible range, and an infrared reflectance higher than 50% above 3000 nm. This indicates that TiN coated glasses may be possible candidates for high IR reflectance windows.     

Characterization of ion beam sputtered ZrN coatings prepared at different substrate temperatures

Zirconium nitride (ZrN) coatings were prepared on Si (100) by single ion beam sputtering in N₂ and Ar mixture at different substrate temperatures. Structure and morphology of the ZrN coatings were analyzed using X‐ray diffraction and atomic force microscopy. Rutherford backscattering technique was utilized for the determination of composition and thickness of the coatings. Electrical properties of the ZrN coatings were determined by four point‐ probe and Hall test. The results showed that the growth of ZrN with a preferred (111) orientation was achieved. The coating thickness depended on the substrate temperature and coating surface roughly remained smooth. The resistivity of the coatings varied from 1× 10^‐3 to 14× 10^‐3 Ω cm depending on the substrate temperature. A correlation between resistivity and charge carrier density was established to explain the electrical behavior of the coatings. (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

微/纳米CVD金刚石涂层沉积工艺参数优化

通过正交实验设计工艺参数,利用热丝化学气相沉积法(HFCVD)制备金刚石涂层,采用扫描电镜、洛氏硬度计、X射线衍射仪等对金刚石涂层进行性能表征,同时进行切削试验,从而确定微米层和纳米层最佳的碳源浓度、沉积气压、热丝与基体间距.结果表明:最优微米金刚石涂层沉积工艺参数为碳源浓度2;,沉积气压3 kPa,热丝/基体间距5 mm.最优纳米金刚石涂层沉积工艺参数为碳源浓度5;,沉积气压5 kPa,热丝/基体间距8 mm.     

Effect of NH3 on the growth characterization of TiN films at low temperature

Titanium nitride (TiN) films were obtained by the atmospheric pressure chemical vapor deposition method of the TiCl₄–N₂–H₂ system with various flow rates of NH₃ at 600°C. The growth characteristics, morphology and microstructure of the TiN films deposited were analyzed by X-ray diffraction, scanning electron microscopy and transmission electron microscopy. Without NH₃ addition, no TiN was deposited at 600°C as shown in the X-ray diffraction curve. However, by adding NH₃ into the TiCl₄–N₂–H₂ system, the crystalline TiN was obtained. The growth rate of TiN films increased with the increase of the NH₃ flow rate. The lattice constant of TiN films decreased with the increase of the NH₃ flow rate. At a low NH₃ flow rate, the TiN (2 2 0) with the highest texture coefficient was found. At a high NH₃ flow rate, the texture coefficient of TiN (2 0 0) increased with the increase of the NH₃ flow rate. In morphology observation, thicker plate-like TiN was obtained when the NH₃ flow rate was increased. When the flow rate of NH₃ was 15 sccm, Moiré fringes were observed in the TiN film as determined by TEM analysis. The intrinsic strain was found in the TiN film as deposited with 60 sccm NH₃.     

不同形态的铝对激光裂解聚硅氧烷制备SiAlCO陶瓷涂层的影响

采用激光裂解含Al聚硅氧烷法制备陶瓷涂层,通过扫描电子显微镜(SEM)、X射线衍射(XRD)和X射线光电子能谱(XPS)等手段,分析了激光裂解含Al聚硅氧烷生成物的组成与结构.结果表明,Al元素的化学价态对激光裂解聚硅氧烷制备的涂层形貌有非常大的影响.在激光裂解含Al聚硅氧烷过程中,Al与聚硅氧烷中的C、O、Si发生反应产生新生陶瓷相,但加入Al粒子时生成晶态Al0.2Si0.8O2.2和非晶态Al2O3陶瓷相,加入异丙醇铝时生成非晶态的Al2O3和AlOx陶瓷相.新生陶瓷相对所制备的陶瓷涂层表面孔隙具有填补作用,使陶瓷涂层表面平整致密,孔隙、缝隙基本消失.