首页 | 本学科首页   官方微博 | 高级检索  
     检索      


Effect of substrate temperature on the properties of reactively sputtered TiN/NbN multilayers
Authors:B Subramanian  R Ananthakumar  M Jayachandran
Abstract:TiN/NbN multilayer coatings were deposited with various substrate temperatures by DC reactive magnetron sputtering method onto Si (111) and glass substrates. The effect of substrate temperature on the structural and optical properties of TiN/NbN multilayers was investigated by X‐ray diffraction, X‐ray photoelectron spectroscopy, Field emission scanning electron microscopy and Photoluminescence measurements. The composition was analyzed by X‐ray photoelectron spectroscopy. X‐ray diffraction results showed that the layers crystallized in cubic structure for TiN and hexagonal structure for NbN. It was found that grain size increased with increase in substrate temperature. The surface morphology of the TiN/NbN thin films showed a dense and smooth surface with substrate temperature upto 200 °C but after 300 °C, the grains became larger and coarse surface was observed. The TiN/NbN multilayer coatings exhibited the characteristic peaks centered at 180, 210 and 560 cm‐1. Red band emission peaks were observed in the wavelength range of 700‐710 nm. (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
Keywords:multilayers  magnetron Sputtering  XRD  microstructure
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号