一种新颖的磁控溅射纯Cr薄膜结构区域模型

磁控溅射成膜过程中,基于溅射中性原子对基片表面微区的轰击效应Ec11和各种轰击离子对基片微区表面的轰击效应Ec22两个能量因子建立了磁控溅射纯Cr薄膜的结构区域模型,研究发现磁控溅射系统中较高的离子流密度显著影响着薄膜的微观结构,且可在较低的相对温度下促进完全致密薄膜结构的形成.     

氢气对AlN薄膜择优取向的作用机制

采用脉冲反应磁控溅射方法在Si衬底上沉积了(100)和(002)择优取向的AlN薄膜,随着溅射功率的降低或氢气浓度的增加,放电电压下降,沉积粒子能量降低,薄膜由(002)取向逐渐向(100)取向转变.在溅射气氛中加入氢气后,薄膜中的氧含量降低,表面形貌与表面粗糙度均随着择优取向的改变发生变化.溅射功率及氢气浓度对AlN薄膜择优取向的影响规律表明,氢气主要是通过降低沉积粒子的能量和在衬底表面产生吸附两种作用方式来影响AlN薄膜的择优取向.     

溅射温度对ITO/Ag/ITO多层复合薄膜的结构和光电性能的影响

本文采用直流磁控溅射分层溅射制备了氧化铟锡(ITO)/银(Ag)/ITO多层复合薄膜。系统研究了溅射温度对ITO/Ag/ITO多层复合薄膜的结构和光电性能影响。采用ITO(m(In₂O₃)∶m(SnO₂)=9∶1;直径60 mm)靶材和Ag(纯度99.999%;直径60 mm)靶材分层溅射,使ITO薄膜和Ag薄膜依次沉积在钠-钙玻璃基片上。结果表明,溅射温度对该薄膜的形貌和结构具有显著的影响。在中间Ag薄膜和顶层ITO薄膜的溅射温度均为120 ℃时,薄膜表面晶粒形貌由类球形转变为菱形,此时薄膜方阻为3.68 Ω/Sq,在488 nm处透射率为88.98%,且品质因数为0.03 Ω^-1,实现了低方阻高可见光透射率ITO/Ag/ITO多层复合薄膜的制备。     

不同磁控溅射方式制备的C掺杂h-BN薄膜微观结构与导电性研究

采用中频双极脉冲(IFBP)和射频(RF)磁控溅射分别在(100)取向的单晶Si衬底上沉积C掺杂h-BN(h-BN:C)薄膜,随后在95;Ar+5;H2混合气氛中进行700℃退火处理,对其结构、化学组成、元素的化学价态、表面形貌以及导电性进行了分析研究.结果表明:两种溅射方法均成功在Si基片上制备出致密连续的h-BN:C薄膜,其电阻率可低至2.9×104～2.5×105Ω·cm.对比发现两种制备方法中IFBP磁控溅射具有较快沉积速率,制备出的h-BN:C薄膜结构更稳定,结晶性更好;而RF磁控溅射制备的h-BN:C薄膜经700℃退火处理后形成了层状结构.在溅射气氛中掺入一定量H2对提高h-BN:C薄膜稳定性极为重要,而沉积后的低温退火处理更可提高其结晶性和稳定性.     

AlN薄膜择优取向生长机理及制备工艺

不同择优取向的AlN薄膜具有不同的物理化学性质和应用,其择优取向生长机理主要包括热力学的"能量最小化"理论和动力学的"选择进化"理论.在众多的制备方法中,通过控制工艺参数可以沉积出不同择优取向的A1N薄膜,各工艺参数对其择优取向的影响取决于沉积粒子到达衬底前携带能量的大小,它们引起的各晶面生长速率的竞争,其结果表明,择优取向晶面是该沉积条件下生长速率最快的晶面.在诸多工艺参数中,靶基距、离子束轰击是控制AlN薄膜择优取向的最重要工艺参数,靶基距增大容易得到(100)晶面择优取向的AlN薄膜,而一定范围内离子束轰击能量和轰击角度的增大会促进(002)晶面择优取向生长.     

磁控溅射气体参数对氧化铟薄膜特性的影响

采用射频磁控溅射法生长氧化铟薄膜,研究了溅射气压和溅射气体对氧化铟薄膜结构及光电特性的影响.X射线衍射结果表明制得的薄膜为立方结构的多晶体,随着溅射气压的升高,薄膜晶粒尺寸变大.1 Pa下沉积的氧化铟薄膜具有最大的迁移率和最小的载流子浓度,分别为15.2 cm2/V·s和1.19×1019cm-3.用O2溅射的氧化铟薄膜载流子浓度降至4.39×1013cm-3,在红外区(1.5～5.5μm)的平均透射率为85;,高于Ar溅射的薄膜,这可能是由于O2的加入减少了氧空位,降低了载流子浓度,使得自由载流子对红外光的吸收减弱.     

偏压对磁控溅射沉积立方氮化硼薄膜的影响

合适的衬底偏压是物理气相沉积制备cBN的必须条件,本文采用基于蒙特卡洛方法的SRIM软件对PVD过程中离子轰击衬底进行了分析,并进行了相关的实验研究.仿真与实验结果显示,随着离子轰击能量的增加,离子轰击深度和范围扩大,有利于cBN的成核与生长,但是过大的轰击能量会导致薄膜表面N与B元素的不匹配以及薄膜立方相的下降.同时,在PVD气氛中适量添加N2可以弥补薄膜表面N元素的损失,有利于提高立方相含量.     

中频对向靶磁控溅射制备超薄ZnO薄膜及其在太阳电池中的应用

中频溅射制备ZnO薄膜可改善射频磁控溅射方式中沉积速率过慢的缺点.对于多层薄膜的制备,对向靶的设计可使样品避开等离子体直接轰击,减少基底薄膜的损伤.本文采用这项技术制备厚度约为50nm的ZnO薄膜,通过调整工作压强、溅射功率、氧氩比等工艺条件,制备出均匀致密,结晶质量高,电阻率在102～103Ω·cm之间,可见光区透过率达到90;的ZnO薄膜.将其应用到CIGS太阳电池中发现,具有50nm厚度的ZnO层的CIGS太阳电池的性能较无ZnO层的太阳电池都有了很大提高.     

用MOCVD法在玻璃和Si(100)基片上制备TiO2薄膜

采用大气开放式金属有机化合物化学气相沉积方法(AP-MOCVD),以四异丙醇钛(TTIP)为原料,在不同的实验条件下分别在Si(100)和玻璃基片上制备TiO2薄膜.当气化室温度为140℃,基片温度为350℃时,玻璃基片上生长的薄膜XRD谱中只出现了锐钛矿相(200)晶面的衍射峰,表明此时薄膜高度取向,在Si(100)基片上生长的TiO2薄膜也有取向性.通过SEM观察高度取向的TiO2薄膜表面出现四边形的微结构.     

溅射功率对脉冲磁控溅射沉积Cu2O薄膜结构和光学性能的影响

利用脉冲磁控溅射制备技术,采用单质金属铜靶作为溅射靶,在氧气(O2)和氩气(Ar)的混合气氛下,在石英玻璃衬底上制备了Cu2O薄膜.研究了溅射功率对脉冲反应磁控溅射沉积法在室温下对生长Cu2O薄膜结构、表面形貌及光学性能的影响.结果表明,在O2、Ar流量比(O2/Ar)为30∶80的气氛条件下,在60～90 W的溅射功率范围内可获得＜ 111＞取向的Cu2O薄膜;薄膜的表面粗糙度的均方根值随溅射功率的增加而增大;薄膜的光谱吸收范围为300 ～670 nm,不同溅射功率下制备的薄膜均在430 nm附近出现明显的带边吸收,其光学带隙(Eg)在2.15～2.53 eV之间变化.     

Ion-beam-induced radiation applied to investigations of thin surface layers on glass substrates

Radiation induced during ion-beam bombardment of solids by energetic ions consists mainly of characteristic lines of the spectra of excited free atoms or ions sputtered from the target. These characteristic lines can be applied for analysis of the material under investigation. A simple apparatus is described for the investigations at glass surfaces and thin film systems. Changes of concentration of a single constituent are indicated in the intensity versus time plots recorded for a single characteristics line of this constituent by changes of the intensity qualitatively. In-depth changes of the real concentration can be obtained quantitatively from the recorded intensity changes by calibration. The in-depth resolution is of the order of some tens of angstroms. The method was applied to investigate interdiffusion between the Si of a thin SiO₂ surface layer and of Pb and B within the substrate glass. Extensive investigations of the intensity/time plots obtained from Na₂ O-containing glass surface layers or bulk glasses illustrate the influence on the results due to the special disintegration processes caused by a beam of ions at the bombarded surface.     

Observation of band structure on amorphous silicon surface and performance of solar cells with controlled band offsets on hetero-junctions

Control of band offsets on hetero-junctions is important to achieve a higher efficiency amorphous silicon-based solar cell. It is expected to improve cell's properties of Voc and FF by suppressing band offsets on the junction. The configuration of conduction band level (Ec), valence band level (Ev) and Fermi level (Ef) based on vacuum level governs the formation of band offset on the junction. We show that the configuration of the band structure on the surface of amorphous Si thin film is deposited by plasma-CVD equipment with a VHF power supply. Ec and Ev were obtained from ionization energy and energy band gap observed by ultraviolet photoemission spectroscopy and optical measurement, respectively. Ef was measured as work function by means of Kelvin probe method. As a result, it is found that shifts of energy levels originate from change of bonding characteristics in the amorphous Si network. This phenomenon is peculiar to amorphous Si-based materials. The results indicate that the upper shift of Ec and Ev are effective in suppressing band offsets on the hetero-junction. We show the performance of solar cells with controlled band offsets on hetero-junctions and discuss the possibility of higher Voc and FF by employing amorphous Si-based materials.     

Identification of the dynamics of plasma‐induced damage in a CuInSe2 thin film by fractal processing

A planar ionization system for rapid visualization and recording the resistance inhomogeneity and photoconductivity distribution in a chalcopyrite‐type semiconductor (CuInSe₂) copper‐indium‐diselenide film is studied. A part of the discharge energy is transferred to the electrodes of the system by the bombardment of the electrode surface due to an electron‐ion flow. This process leads to the sputtering mechanism of the electrode surface material. It is shown that the plasma‐induced damage (PID) in a CuInSe₂ thin film was primarily due to the effectiveness of sputtering and physico‐chemical interactions in the discharge gap during the transition from Townsend to the glow type. At the same time a nondestructive method is suggested for the analysis of the dynamics of PID in the CuInSe₂ thin film by fractal processing in the planar ionization system. Some properties of the device have been evaluated, such as a relative change of the resistance inhomogeneity is determined by a relative change of discharge light emission (DLE) intensity when a current is passed through an ionization cell. For the quantitative analysis of the change in the dynamic feature of PID of CuInSe₂ thin films, fractal dimension analysis was used following the records of the DLE intensity. The quality of the film was analyzed using both the profile and spatial distributed DLE intensities data showing the surface inhomogeneity and damage in the thin film as function of time. Thus, by using fractal concept, the order of the surface damage and the quality of the CuInSe₂ as function of time can be assessed exactly and the size and location of the surface inhomogeneities in thin film to be ascertained. (© 2006 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

离子轰击增强金刚石膜与Si衬底结合力的进一步研究

由于金刚石与Si有较大的表面能差,利用化学气相沉积(CVD)制备金刚石膜时,金刚石在镜面光滑的Si表面上成核困难,而负衬底偏压能够增强金刚石在镜面光滑Si表面上的成核,表明金刚石核与Si表面的结合力也得到增强.本文分析衬底负偏压引起的离子轰击对Si表面产生的影响之后,基于离子轰击使得Si衬底表面产生了微缺陷(凹坑)增大了金刚石膜与Si衬底结合的面积,理论研究了离子轰击对金刚石膜与Si衬底结合力的影响.     

High quality nanocrystalline silicon thin film fabricated by inductively coupled plasma chemical vapor deposition at 350 °C

High quality nanocrystalline silicon (nc-Si) film was deposited by inductively coupled plasma chemical vapor deposition (ICP-CVD) without substrate RF bias at 350 °C. The nc-Si with a dense crystalline structure of the columnar type grew from the bottom to the top of the nc-Si film. A troublesome incubation layer did not exist at the bottom of the fabricated nc-Si film. A grain size of 40 nm was measured by using a SEM image. When a RF bias of 100 and 200 W was applied to the substrate to induce ion bombardment on the substrate, the crystalline structure and grains were not observed and a-Si deposition became dominant. The transition from nc-Si deposition into a-Si deposition can be attributed to ion bombardment which prevents nucleation and crystal growth at the surface of deposition. This shows that the reduction of ion bombardment can be a key factor to fabricate high quality nc-Si film. By using ICP-CVD with no substrate RF bias, ion bombardment can be reduced, while the density of plasma is kept high, so that high quality nc-Si can be fabricated due to the enhancement of crystalline growth on the surface.     

Formation and behavior of surface layers on electron emission glasses

The thermochemical reduction of thin surface layers on multicomponent lead-silicate glasses is fundamental to their use in electron multiplier and microchannel plate devices. These surface layers can exhibit a specific conductivity as high as 10⁻² (Ω cm)⁻¹ and secondary electron yields up to 3.5. However, due to the complex processing used in the fabrication of the devices, a basic understanding of the chemical and structural surface characteristics responsible for these properties has not been established. Moreover, the effects of prolonged electron bombardment upon the chemical characteristics of the surface have not been extensively investigated, nor related to any associated degradation of the electron emission properties.

In this study, the clean fracture surfaces of these glasses were investigated. The effects of hydrogen reduction, chemical etching, and prolonged electron bombardment were determined. Ion-scattering spectroscopy (ISS) was used for its monolayer sensitivity, especially to alkali species, while secondary ion mass spectroscopy (SIMS) provided depth profiles. The hydrogen profile created by the reduction could also be obtained with SIMS. X-ray photoelectron spectroscopy (XPS) was employed selectively to examine changes in the oxidation state of the surface species.

It was found that the hydrogen reduction of these glasses creates a thin 20–50 nm silica-rich surface layer. The layer of reduced lead atoms is beneath this zone, and is visible to depths of the order 5 μm, but the hydrogen profiles which are found in these surfaces extend only 0.5 μm in depth. The electron bombardment of these surfaces leads to a decrease in concentration of alkali and lead in the surface monolayer, and to a change in the hydrogen profile. The cross-section for this bombardment-induced change in the surface composition correlates with the reported gain degradation in microchannel plate devices.     

Growth instabilities in the deposition of amorphous films

It is proposed that during the atom-by-atom deposition of a film, the attractive forces between the oncoming atoms and those deposited become important in determining the growth of the film when surface diffusion and many atom rearrangement processes are suppressed (precisely the conditions that lead to the formation of amorphous films). The trajectories of the oncoming atoms are distorted in such a way that the formation and growth of surface irregularities are favored. Since the deflection depends inversely upon the incident kinetic energy of the atoms, sputtered films should be smoother than evaporated films for equal substrate temperatures. It is also argued that this mechanism can lead to the formation of voids.     

射频磁控溅射制备纳米TiO2薄膜的表征和亲水性能

采用射频磁控溅射TiO2陶瓷靶的方法在硅和石英衬底上制备纳米TiO2薄膜,并经950℃退火1h.通过X射线衍射(XRD)、原子力显微镜(AFM)、紫外可见光谱(UV-Vis)和接触角仪对薄膜相结构、表面形貌、光学性能和亲水性能进行表征.结果表明,与950℃退火1h相比,未退火薄膜是无定形结构并呈现较高的光致亲水性能.退火薄膜是锐钛矿和金红石混合相,其中锐钛矿相质量分数是11.34％.未退火和950℃退火1h的薄膜样品的能隙分别是3.03 eV和3.11 eV.未退火薄膜具有较高的光致亲水性能主要归因于其较低的光学能隙.退火薄膜的热致亲水性能与其相结构、表面清洁度和粗糙度有关.     

Synthesis and epitaxial growth of CdTe films by neutral and ionized beams

The growth of CdTe thin films has been studied by epitaxial processes on the cleavage surface of rock salt in vacuum, using electron microscopic and electron diffraction techniques. The crystallinity and structure of the films depend largely upon the intensities and species of the incident beams. The use of two beams effused separately from the Knudsen cells resulted in the growth of films of good crystallinity when the intensity ratio N_Cd : N_Te was 10 : 1. The epitaxial relationships were studied over the range of substrate temperatures between room temperature and 350°C. The co-existence of α-hexagonal and β-cubic modifications of CdTe and their proportions in the film were revealed as a function of the growth processes and substrate temperature. If two beams were ionized by electron bombardment inside the cells and were incident upon the substrate by applying a dc voltage between source and substrate, the epitaxial temperature can be lowered to near room temperature, giving good epitaxy. The epitaxial relationships in the CdTe/NaCl system have been studied.     

SiC衬底上β-Ga2O3薄膜生长及p-SiC/n-β-Ga2O3异质结光伏特性

本文采用脉冲激光沉积(PLD)技术在p型4H-SiC衬底上,制备出沿(403)择优生长的β-Ga₂O₃薄膜。结果表明,衬底生长温度对β-Ga₂O₃薄膜的形貌、结构、组分,以及生长机理都有重要影响。当生长温度由300 ℃升高至500 ℃时,薄膜结晶质量随生长温度升高而提高,当温度进一步升高到600 ℃时,薄膜结晶质量变差,这是由于在相对低温(500 ℃以下)阶段,生长温度越高,沉积在衬底上原子的动能越大,越容易迁移,使得β-Ga₂O₃薄膜主要按照二维生长模式进行生长,薄膜结晶质量提高,表现为随着生长温度升高,粗糙度降低。但当温度上升到600 ℃时,由于4H-SiC衬底和β-Ga₂O₃薄膜之间的热膨胀系数存在差异,导致薄膜生长由主要以二维生长模式向三维岛状演变。基于p-4H-SiC/n-β-Ga₂O₃构筑的异质结太阳电池,其标准测试条件下光电转换效率达到3.43%。