非对称电极和绒面结构对晶硅电池暗Ⅰ～Ⅴ特性的影响

利用有限差分法求解半导体器件基本方程的方法,通过改变栅线电极和衬底掺杂浓度,研究了织构结构和非对称电极对晶硅电池暗Ⅰ～Ⅴ特性的影响。结果表明:衬底掺杂浓度决定了织构结构晶硅电池的pn结性质,并对其暗Ⅰ～Ⅴ特性曲线产生具有重要影响;栅线电极覆盖绒面金字塔比率相同时,晶硅电池的暗Ⅰ～Ⅴ特性曲线将出现相同的分区特性,且理想因子随绒面金字塔的增加而微幅增加;栅线电极与电池底面电极构成二极管的理想因子,随金字塔周期数增加而增大,是决定晶硅电池暗Ⅰ～Ⅴ特性曲线性质的关键因素;当衬底掺杂浓度大于等于1×10~(17)时,暗Ⅰ～Ⅴ特性曲线可分成三个变化区域;当衬底掺杂浓度小于1×10~(17)时,暗Ⅰ～Ⅴ特性曲线可分成四个变化区域;同一偏压下,衬底掺杂浓度越高,暗电流越小。此外,利用pn结处于不同偏压下的总电流密度分布,详细分析了不同区域形成的物理机制。     

基于暗I-V特性曲线对晶硅电池杂质和缺陷性质研究

暗I-V特性曲线是一种有效监测晶硅电池内部杂质和缺陷性质的表征手段.本文利用有限差分法较系统地研究了杂质和缺陷性质对暗I-V特性曲线的影响,并给出了利用暗I-V特性曲线判断晶硅电池内部杂质和缺陷类型和分布的基本准则,结果表明:在大于0.75 V的正向偏压区域,暗I-V特性曲线的明显变化可作为判断为由晶硅电池体内杂质和缺陷引起;在0.1 V~0.75 V的正向偏压区域,暗I-V特性曲线的理想因子分区性质可作为晶硅电池体内和表面杂质和缺陷的依据.     

基于暗Ⅰ-Ⅴ特性曲线对晶硅电池杂质和缺陷性质研究

暗Ⅰ-Ⅴ特性曲线是一种有效监测晶硅电池内部杂质和缺陷性质的表征手段。本文利用有限差分法较系统地研究了杂质和缺陷性质对暗Ⅰ-Ⅴ特性曲线的影响,并给出了利用暗Ⅰ-Ⅴ特性曲线判断晶硅电池内部杂质和缺陷类型和分布的基本准则,结果表明:在大于0.75 V的正向偏压区域,暗Ⅰ-Ⅴ特性曲线的明显变化可作为判断为由晶硅电池体内杂质和缺陷引起;在0.1 V~0.75 V的正向偏压区域,暗Ⅰ-Ⅴ特性曲线的理想因子分区性质可作为晶硅电池体内和表面杂质和缺陷的依据。     

利用AFORS-HET对P型HIT太阳电池的模拟优化

运用模拟软件AFORS-HET对TCO/a-Si∶ H(n)/a-Si∶ H(i)/c-Si(p)/Ag结构的异质结(HIT)太阳电池进行仿真,分析其光伏输出特性随发射层掺杂浓度、晶硅衬底掺杂浓度、透明导电氧化物薄膜(TCO)的选择以及TCO功函数的变化规律.结果显示,当发射层掺杂浓度大于1.0×1020 cm-3,晶硅衬底掺杂浓度大于1.2×1016 cm3,以ZnO为TCO层且ZnO的功函数低于4.4 eV时,电池的开路电压、短路电流密度、填充因子及电池转换效率达到最优值,光电转换效率最高达到19.18;.     

绒面ZnO/Si异质结太阳能电池的初步研究

以p型单晶硅<100>作为衬底材料,通过化学腐蚀法得到硅绒面表面结构,采用喷雾热解法沉积掺Al的ZnO薄膜于绒面硅上,结合微电子光刻、磁控溅射和真空蒸镀等工艺制作上、下表面电极,于400 ℃氮气氛围下快速退火合金,得到Ag/Ti/n-ZnO/p-Si/Al异质结太阳能电池.对电池样品进行了原子力显微镜、霍尔效应测试、X射线衍射谱、电流电压特性等分析.得到电池最佳性能为:开路电压V_(oc)=355 mV,短路电流I_(sc)=36 mA,填充因子FF=0.41,电池效率达到5.2;.绒面异质结构有效降低了电池表面的光反射,相对增加了p-n结的有效面积,电池效率得到一定程度的提高.ZnO与Si界面之间SiO_2层的存在是目前影响电池效率的主要因素.     

p型掺杂晶体硅的低温液相(001)外延生长研究

为寻求以低成本制备n型太阳电池的pn结,进行了Al-17.6wt;Si合金熔体中(001)n型单晶硅衬底上液相外延生长p型掺杂硅实验.所用方法为垂直浸渍法,实验了过冷恒温生长与回熔处理后连续冷却生长两种模式,过程中体系以流动高纯氩保护.对所得外延生长晶体结构、形貌及所得pn结开路电压进行了分析和测定.结果显示,合金熔体中硅晶体(001)液相外延生长能够实现,但一般呈离散分布的金字塔型岛状生长;只有衬底回熔处理后原位连续降温生长模式可获得连续外延薄膜,之后在其上出现岛状生长,呈现Stranski-Krastanov生长模式.所得连续外延薄膜形成的pn结开路电压比恒温生长所得的提升约100 mV;连续外延薄膜形成后期出现的岛状生长使开路电压明显下降;生长速度提高会使连续降温外延生长pn结开路电压略有降低.     

平面发射极与绒面发射极银-硅接触的对比研究

比较了平面发射极与绒面发射极表面通过丝网印刷烧结形成的银-硅接触.通过TLM测试发现,平面发射极与绒面发射极的银-硅接触电阻率平均值分别为4.4 mΩ·cm2和1.1 mΩ·cm2,平面发射极银-硅接触电阻率比绒面的高很多.绒面具有更大的相对表面积是一个较为直观的原因.通过SEM观察发射极剖面,发现金字塔顶部区域的掺杂较重,结深从顶峰到谷底沿着金字塔的[111]晶面逐渐减小;通过SEM观察银电极与硅表面的接触界面,总结分析银-硅接触的电流传输机制.然后将银电极块从硅表面剥离,用SEM和EDS观察露出的发射极表面,发现银结晶沉积体在平面上的分布很不均匀而在绒面上的分布较为均匀,密度也大很多,并且银结晶沉积体在掺杂较重的金字塔顶部密度更大.根据电流的传输机制分析得出,银结晶沉积体分布的这种差异性导致了平面发射极银-硅接触电阻率比绒面的高.     

隧穿结对柔性衬底非晶硅/微晶硅叠层太阳电池特性的影响

采用等离子体化学气相沉积(PECVD)方法在不锈钢柔性衬底上制备了不同厚度的硅基p+/n+隧穿结,应用于非晶硅/微晶硅叠层太阳电池,分析了其对太阳电池电学和光学特性的影响.发现p+层厚度增加后,电池的开路电压提高,短路电流密度减小;随着n+层厚度的变化,电池的短路电流密度和填充因子均存在一个最佳值.将优化后的p+/n+隧穿结分别应用于不锈钢衬底和聚酰亚胺衬底的非晶硅/微晶硅叠层太阳电池,分别获得了9.95;(AM0,1353 W/m2)和9.87;(AM0,1353 W/m2)的光电转换效率.     

HIT太阳电池衬底形貌修饰及其应用研究

在HIT太阳电池非晶硅沉积过程中,单晶硅衬底的绒面金字塔沟壑处易发生外延生长,影响电池输出性能.采用碱性体系(NaClO溶液)对硅片进行绒面形貌修饰,在NaOH的各向异性刻蚀和NaClO的氧化作用下,金字塔结构由尖锐的四面体向较圆滑的“锥形”转变,尤其金字塔底部变得平滑.随着形貌修饰时间的增加,样品表面平均反射率呈线性增大,从未修饰样品的12.48;升高至13.79;,钝化后硅片少子寿命显著提升,绒面形貌修饰有效改善了界面钝化质量,中长波外量子效率提升,从而实现电池电性能的提升.样品绒面形貌修饰45 min后,开路电压从656.3 mV升高至699.8 mV,转换效率提高1.8;.此外,研究了反应温度对表面形貌修饰及HIT太阳电池性能的影响,基于70℃、10; NaClO溶液、45 min的绒面修饰条件下制备的HIT太阳电池转换效率达到最高,为12.02;.     

晶体硅金字塔绒面结构圆化对其光反射率和非晶硅薄膜钝化效果的影响

(001)晶体硅金字塔绒面结构圆化有提高光反射率与提高非晶硅薄膜钝化效果的相互矛盾的双重作用,定量了解它们对优化非晶硅/晶体硅异质结太阳电池的绒面结构圆化程度很有必要.本文以表面粗糙度Rz相对下降百分数定量表征晶体硅衬底表面金字塔绒面结构圆化程度DR,研究了DR值对等离子体化学气相沉积氢化本征非晶硅薄膜钝化效果的改善作用,发现除圆化初期效果异常高以外,二者之间基本呈线性正比关系;相对改善作用随钝化膜变薄而显著提高.同时测定了DR值对金字塔绒面光反射率的影响,发现反射率基本随DR值线性增大.典型结果为:6;绒面结构圆化程度下,金字塔绒面的光反射率绝对值提高3;;其表面7 nm厚的氢化本征非晶硅薄膜可达到使硅片少数载流子寿命相对未圆化绒面样品提高260;.     

A review of measurement of thermophysical properties of silicon melt

Measurements of thermophysical properties of Si melt and supplementary study of X-ray scattering/diffraction by the authors' group were reviewed. The values obtained differed variously from those of literature. Density was 2–3% larger, surface tension 20–30% smaller, viscosity up to 40% larger, electrical conductivity 8% smaller, spectral emissivity more or less in good agreement with literature values, and thermal diffusivity a few percent larger. An anomalous density jump was found near the melting point. Surface tension and viscosity also showed anomaly. A strange time-dependent change of density was observed over 3 h after melting. X-ray analyses suggested a slight change in local atom ordering, but showed no sign of cluster formation. An addition of 0.1 at% gallium caused the density jump to disappear, while that of boron caused no change. An EXAFS study of the former melt indicated a strong interaction between Ga and Si atoms as if molecules of GaSi₃ existed. The implications of the measured properties are a possibility of soft-turbulence in an Si melt in a relatively large crucible, a more complicated manner of intake of oxygen depleted molten Si from the free surface region to underneath the growing crystal, and a relaxation of the melt after melting arising from trapped gas species.     

电子显微分析在表征纳米晶体化学组分中的应用

纳米材料的化学组分及含量影响其光、电、声、热、磁等物理性能,电子显微分析是表征纳米晶体化学组分的重要方法之一.本文综述了X-射线能谱(EDS)、X-射线波谱(WDS)、电子能量损失谱(EELS)和选区电子衍射(SAED)等现代电子显微分析技术在表征纳米晶体化学组分、形貌、尺寸和结构等方面的应用及其研究进展,并比较了这些分析方法存在的差异,提出了其应用中存在的不足及今后的研发方向.     

原位氮化法制备TiN纳米粉体

用溶胶凝胶法合成的纳米TiO2粉体作为原料,将该粉体在氨气中进行原位氮化制备了TiN纳米粉体.用XRD,TEM,化学分析等手段对合成的TiN纳米粉体的物相组成、形貌、成分进行了分析.实验分析表明:在1000℃和1100℃下分别氮化5h,可以制备粒径大约为40nm和80nm的TiN粉体,其TiN的含量分别为95.40;和98.37;;而在1000℃条件下氮化时间减少到2h时,TiN的含量仅为58.36;.氮化温度和氮化时间是合成纳米TiN的重要因素,提高合成温度和延长氮化时间均可形成纯度较高的TiN纳米粉体,但延长氮化时间更有利于获得粒径小的氮化钛粉体.     

On the influence of structural features of DNA on the possibility of metabolic transfer of electrons

Abstract

A fragment of a DNA molecule is considered as one of the channels of metabolic electron transfer. The heterogeneity of the complementary chains is effectively taken into account. This made it possible to find the speed of the electron injected into the DNA conduction band and the current density that it creates. Estimates of electron mobility in nucleic acid chains are made. They were an order of magnitude smaller than that of typical semiconductors. For the specific conductivity of nucleic acid chains, estimates provide a conductivity of one to two orders of magnitude lower than in graphite.     

Mesomorphism Dependence on the Position of Substitution of a Pair of Esters

A novel homologous series of ethylene derivatives of thermotropic liquid crystals has been synthesized. The methoxy to octyloxy derivatives are nematogenic, the decyloxy to tetradecyloxy derivatives are smectogenic, in addition to nematogenic, and the hexadecyloxy homologue is smectogenic only. All the members of the series are enantiotropically mesogenic. Thermotropic behavior was determined by an optical polarizing microscope equipped with a heating stage and Differential Scanning Calorimetry (DSC) study. Analytical and spectral data confirm the molecular structures of homologues (infrared, nuclear magnetic resonance, mass spectra, X-ray, and DSC data). Textures of the nematic phase are threaded or Schlieren and that of smectic phase are focal conic fan-shaped of smectic A or C. Transition curves of the phase diagram behave in a normal manner except one or two deviations from the normal trend. The mesophase range (Sm+N) varies from 3°C to 44°C. The average thermal stability for smectic is 93°C and that for nematic 117.4°C. The LC behavior of the novel series is compared with a structurally similar known series.     

PEG聚合度对氧化铝造粒粉的性能影响

为制备适用于干压成型的氧化铝造粒粉,研究了PEG聚合度对氧化铝造粒粉微观形貌、流动性和松装密度的影响.结果表明PEG的聚合度对氧化铝浆料粘度影响显著,PEG2000-6000是较为理想的粘结剂选择,造粒粉的流动性与环境温度及湿度相关.采用正交实验设计,以造粒粉的流动性和松装密度为评价指标,对PEG聚合度、粘结剂添加量和固含量进行了优选,其影响顺序为PEG聚合度＞固含量＞粘结剂添加量.以优选参数PEG6000、添加量为4wt;、固含量为80wt;,制备了性能优良的氧化铝喷雾造粒粉.     

前驱物合成条件对锰锌铁氧体结构和性能的影响

采用共沉淀-热处理工艺合成了尖晶石型锰锌铁氧体粉末,利用正交试验优化了制备工艺。利用X射线衍射仪(XRD)扫描电子显微镜(SEM)和振动样品磁强计(VSM)对粉体的显微结构和静磁性能进行了研究。结果表明:热处理温度为1350℃、保温时间为3.5 h、进料比为1.5时,若前驱物的pH值为6,制备的样品的主晶相为锰锌铁氧体;若前驱物的pH值为7 9,则形成单相尖晶石型锰锌铁氧体,样品的饱和磁化强度先增大后减小,矫顽力逐渐增大。pH值为7时,配方为Fe∶Mn∶Zn=68.4816∶17.1368∶14.381,进料比为1.5,滴加时间为40 min,反应温度为50℃,不加表面活性剂时得到的样品具有较高的饱和磁化强度。     

Effect of alumina on enthalpy of mixing of mixed alkali silicate glasses

The enthalpy of mixing of mixed alkali (Na₂O and K₂O) silicate glasses containing various concentrations of alumina was determined using an ion-exchange equilibrium method. For glasses with a constant alkali concentration, the enthalpy of mixing was found to become less negative with alumina addition. Consistent with our previous results on the enthalpy of mixing of alumina-free mixed alkali silicate glasses, the magnitude of enthalpy of mixing exhibited a good correlation with the molar volume mismatch of the corresponding two single alkali glasses as well as with the extent of conductivity mixed alkali effect, e.g. excess activation energy of conductivity, ΔE. The reduction of the magnitude of the enthalpy of mixing with alumina addition can be attributed to the reduction of non-bridging oxygen and ionic field strength. Combining the present results with results obtained earlier, the magnitude of the enthalpy of mixing for all mixed alkali (Na₂O and K₂O) silicate glasses with and without alumina was expressed by a simple function of a modified Tobolsky parameter, which takes into account the alkali concentration and the difference in cation-to-effective anion distances. The enthalpy of mixing data of the mixed alkali glasses was then compared with reported experimental data on the conductivity of mixed alkali aluminosilicate glasses. What appears to be conflicting experimental data can be understood in terms of the magnitude of the enthalpy of mixing and we can conclude that the mixed alkali effect is closely correlated with the negative enthalpy of mixing.     

近化学计量比铌酸锂晶体组分测定与缺陷观察

采用助熔剂提拉法生长得到近化学计量比LiNbO3晶体.用多种方法测定了晶体组分,结果表明生长得到的晶体中[Li2O]含量为49.80;摩尔分数;对晶体缺陷的研究表明晶体质量有待提高,并分析了晶体中出现包裹物的原因.     

Mechanisms of chemical vapor deposition of silicon

The distribution in the silicon epitaxial growth from SiCl₄ and hydrogen are observed in situ by IR absorption spectroscopy. Two methods are used complementarily, one is IR spectroscopy of reactants extracted from the reactor by a fine quartz tube which is not disturbing the reactions, and gives knowledge about the local distribution, the other is direct IR spectroscopy of hot reactants in the reactor which is useful to ascertain the results at the real high temperature situation. The intermediate species are SiHCl₃, SiH₂Cl₂ which is estimated from the induced emission bands at 500 and 570 cm^-1. HCl is a dominant waste product and contributes to reverse reactions. To investigate the reaction, HCl is intentionally injected into the reacting gas. This kind of injection method may also be very effective to analyze the reactions using other reactants such as SiCl₄, SiHCl₃ and SiH₂Cl₂.