离子束溅射制备Si/Ge多层膜及红外吸收性能研究

采用离子束溅射方法在Si衬底上制备Si/Ge多层膜.通过改变生长温度、溅射速率等因素得到一系列Si/Ge多层膜样品.通过X射线衍射、拉曼散射、原子力显微分析(AFM)等表征方法研究薄膜结构与生长条件的关系.在小束流(10mA)、室温条件下制备出界面清晰、周期完整的Si/Ge多层膜.通过红外吸收谱的测量发现薄膜样品具有较好的红外吸收性能.     

缓冲层厚度对Ge/Si多层膜的影响

采用离子束溅射技术,通过改变Si缓冲层厚度,在p型Si衬底生长了一系列的Ge/Si多层膜样品.利用Raman光谱、X射线小角衍射以及原子力显微镜等分析测试技术,研究了多层薄膜的结晶、膜层结构、表面形貌等性质.结果表明:通过引入缓冲层,在一定程度上可以提高颗粒的结晶性;随着缓冲层逐渐沉积,来自界面态的影响有了明显的减弱,且多层膜结构的生长得到有效改善.红外吸收光谱实验表明多层膜的吸收特性与其周期结构密切相关,因此可以通过改变缓冲层厚度的方法,实现对多层薄膜红外吸收特性的调制.     

沉积温度和生长停顿对离子束溅射生长Ge/Si多层膜的影响

采用离子束溅射技术生长了一系列Ge/Si多层膜,研究了沉积温度和生长停顿对Ge/Si多层膜结晶性和界面结构的影响.通过对Raman峰峰位、峰强度比值和X射线小角衍射等方面的研究,发现综合控制沉积温度和生长停顿能够得到结晶性和界面都相对理想的多层膜.这为改善Ge/Si多层膜的离子束溅射生长提供了一种有效的方法.     

用磁控溅射和退火方法制备多层锗纳米晶

以Si为衬底,SiO2+Ge为复合靶,用超晶格方法(SiO2+Ge层和SiO2 + GeO2层交替生长)和磁控溅射技术制备镶嵌于Si/Ge氧化膜中的多层Ge纳米晶.X射线衍射(XRD)结果表明:退火样品中有Ge纳米晶生成.Ge纳米晶的声子限域效应引起Raman散射谱的Ge-Ge振动峰向低频移动.X射线光电子能谱(XPS)分析表明Ge主要以Ge0和Ge4+形式分别存在于所制备的超晶格中的SiO2+Ge层和SiO2+GeO2层中.透射电子显微镜(TEM)研究表明,Ge纳米晶被限制在SiO2+Ge层中且结晶性好.实验结果说明,相比于通常的单层介质膜方法,用该超晶格方法极大地提高了Ge纳米晶的密度,尺寸和空间分布的均匀性.     

Fe/Si多层膜亚层厚度比对β-FeSi2薄膜结构和表面形貌的影响

采用射频磁控溅射方法,在Si(111)和石英衬底上制备了Fe/Si亚层厚度比不同的多层膜.多层膜的总厚度为252 nm,Fe/Si亚层厚度比分别为1 nm/3.2 nm、2 nm/6.4 nm和20 nm/64 nm.在850 ℃, Ar气气氛中退火2 h后,Si衬底上的多层膜完全生成了β-FeSi2相.但石英衬底上同样Fe/Si亚层厚度比的多层膜除了生成β-FeSi2相,还生成了少量的ε-FeSi相.通过增加Si亚层的厚度至Fe/Si亚层厚度比为2 nm/7.0 nm,在石英衬底上也获得了单相的β-FeSi2薄膜, 其光学带隙为0.87 eV,表面均方根粗糙度为2.34 nm.     

非晶Cr/Ge多层膜的磁性和电性能研究

采用射频磁控溅射的方法制备了非晶[Crx/Ge10-x]20(x=0.1,0.3,0.5,0.8,1.1,1.6,2.7)多层膜.随着Cr层厚度增加,Ge层厚度减小,室温下薄膜磁性由抗磁性转变为铁磁性,同时样品出现了反常霍尔效应.扣除Ge层的抗磁性,制备态的[Cr2.7/Ge7.3]20的饱和磁化强度Ms可达33 emu/cm3.提出了磁性起源于Cr原子层间耦合的模型,薄膜的低温电阻导电机理属于自旋依赖电子变程跃迁机制.     

As40Se60硫系玻璃基底薄膜制备与应力分析

硫系玻璃是一类优秀的红外光学镜片材料，但其热膨胀系数较大，与Si、Ge等红外光学材料相比，硫系玻璃镜片在镀膜过程中产生的残余应力较大，镀膜后面形变化较大。研究膜层中应力并优化应力的控制方法，可以提高薄膜的力学性能。本文通过测量在As₄₀Se₆₀硫系玻璃上镀膜前后基底的变化量来研究基底上不同材料膜层的残余应力情况，同时使用ANSYS软件对As₄₀Se₆₀/ZnS/Ge/ZnS/Ge/ZnS/YbF₃/ZnS红外光学镜片膜系结构的热应力进行理论计算与仿真，验证了模型的合理性。分析了膜系结构中热应力在轴向与径向分布情况，结果显示：轴向热应力主要集中在膜层部分，表面膜层的热应力最大；径向热应力呈均匀分布，在边缘发生突降。分析了最外层保护膜的热应力与沉积温度、相邻膜层、不相邻膜层和基底的关系，结果表明：沉积温度在110℃到200℃的范围内，保护膜的热应力与沉积温度成正比；相邻膜层和不相邻膜层的厚度和材料均不影响保护膜的热应力；基底的厚度会对保护膜的热应力产生影响。     

Ge在Si(100)-2×1表面化学吸附的第一性原理研究

应用密度泛函理论,构造了具有非对称二聚体结构的Si(100)-2×1重构表面,在系统研究了其表面结构及特性的基础上,计算了Ge在不同吸附位置的表面吸附能,以及吸附前后的表面投影态密度.计算结果表明:Ge原子在基位(pedestal)吸附最稳定.另外,在吸附Ge原子之后,我们得到了一个具有完整对称性的特殊Si原子二聚体结构.此结构中相邻的两个二聚体链互相平行且分别与Si表面平行,每对二聚体Si原子呈对称分布.     

超薄全局应变硅薄膜的应变弛豫研究

采用Ge浓缩法制备了高质量超薄绝缘体上锗硅(SiGe-on-insulator,SGOI)材料,然后在SGOI上通过超高真空化学气象沉积(UHVCVD)法外延了厚度为15 nm的超薄全局应变硅单晶薄膜,使用电子束光刻和反应离子刻蚀在样品上制备了一组纳米级尺寸不等的应变硅线条和应变硅岛,并利用TEM、SEM、Raman等分析手段表征样品.实验结果表明,本文制备的应变硅由于其直接衬底超薄SiGe层的低缺陷密度和应力牵制作用,纳米图形化的应变Si弛豫度远小于文献报道的无Ge应变硅或者具有Ge组分渐变层SiGe衬底的应变Si材料.     

两步法溅射中缓冲层厚度对Ge薄膜质量的影响

采用低温缓冲层技术制备Ge薄膜,利用AFM和Raman光谱研究缓冲层厚度对低温Ge缓冲层残余应变弛豫的影响.实验结果显示:随着缓冲层厚度的增加,残余应变弛豫度增大.在30 nm厚的低温Ge缓冲层上生长800nm厚的Ge外延层.Ge薄膜具有良好的结晶性,表面粗糙度RMS为2.06 nm.     

Deposition of microcrystalline Ge films using hot-wire technique without toxic gases

To investigate the deposition of Ge films without toxic gas such as germane, we have studied the Ge films prepared by the hot-wire technique, which utilize the reaction between a Ge target and hydrogen atoms generated by the hot-wire decomposition of H₂ gas. The films deposited on Si substrate were microcrystalline Ge films and the mean crystallite size of the films increased from 13.3 to 24.8 nm with increasing the substrate temperature from 300 to 500 °C. Moreover, the deposition rate of Ge films deposited on Si substrate was higher than that of Ge films deposited on Corning 1737 substrate. It was found that the substrate temperature and the kind of substrate are key parameters for the preparation of microcrystalline Ge films by the hot-wire technique.     

Microcrystalline silicon–germanium thin films prepared by the chemical transport process using hydrogen radicals

We propose microcrystalline silicon–germanium (μc-SiGe) as a bottom cell material of triple-junction solar cells in order to improve the conversion efficiency of thin film solar cells. The μc-SiGe thin films were prepared by the chemical transport process using Si and Ge targets exposed to hydrogen radicals. We successfully produced highly photosensitive μc-SiGe films with relatively low Ge composition by increasing the gas pressure, and observed the photovoltaic effect in pin solar cell structures. However, it was difficult to produce μc-SiGe films with higher Ge composition. We found that a small amount of argon introduction into the chemical transport process enables us to increase Ge composition at the high pressure. Moreover, the argon introduction seems effective to maintain the electrical properties in relatively high Ge composition. The results suggest that the μc-SiGe thin films prepared by the chemical transport process are one of the candidates for new photovoltaic materials.     

Growth chemistry of nanocrystalline silicon and germanium films

We report on the growth of nanocrystalline Si:H and Ge:H films. The films were grown using plasma deposition and hot wire chemical growth techniques. Conditions such as pressure, temperature and hydrogen dilution were systematically varied. It is shown that excessive hydrogen dilution during growth leads to smaller grains in nanocrystalline Si and Ge. Films with very large grains (56 nm) could be obtained using hot wire growth techniques under appropriate conditions of growth. From the data, it is concluded that the natural growth direction for the films is 〈2 2 0〉, and that excessive bonded hydrogen leads to smaller grains.     

Formation of Ge nanoislands before the completion of a wetting layer in the Ge/Si(1 1 1) system

The formation of Ge nanoislands directly on Si(1 1 1) surface before the completion of a wetting layer was studied by scanning tunneling microscopy and Raman scattering spectroscopy. The mechanism of the wetting layer formation in the Ge/Si(1 1 1) system depends on the rate of Ge deposition. Within the temperature range 350–500 °C, with Ge deposition rates of the order of 10⁻³ bilayers/min, the Ge wetting layer is formed by the multilayer growth mechanism. Therefore, the arrays of Ge islands with the densities of 10⁹–10¹² cm⁻², depending on the rate of Ge deposition, appear directly on the Si surface during the evolution of the wetting layer. The height of Ge islands is limited by 3 bilayers. The lateral dimensions depend on the coverage of Ge and on the growth temperature. A series of lines related to the quantization of the phonon spectrum along the growth direction [1 1 1] was observed in the spectra of Raman scattering by optical phonons of Ge nanoislands.     

Multilayer planar structures prepared from chalcogenide thin films of As–Se and Ge–Se systems and polymer thin films using thermal evaporation and spin-coating techniques

We report the preparation of multilayers based on polyamide–imide polymer and As–Se or Ge–Se chalcogenide thin films. Chalcogenide films of As–Se and Ge–Se systems were deposited using a thermal evaporation method periodically alternating with spin-coated Polyamide–imide films. Fifteen layers of PAI + As–Se system and nineteen layers of PAI + Ge–Se system were coated. Optical properties of prepared multilayers have been established using UV–vis–NIR and Ellipsometric spectroscopy. Both, PAI + As–Se and PAI + Ge–Se multilayer systems, exhibited the high-reflection bands centered around 830 nm and 1350 nm, respectively. The shift of the band position of PAI + Ge–Se multilayers to lower energies was caused by higher thickness of Ge–Se films. The bandwidth of reflection band of 8 PAI + 7 As–Se multilayer was ～90 nm while bandwidth of PAI + Ge–Se system decreased to ～70 nm because Ge–Se films have 0.1 lower refractive index against As–Se films. Design of 1D-photonic crystals based on alternating chalcogenide and polymer films is a new opportunity for application of chalcogenide thin films as optical materials for near-infrared region.     

Study of Ge epitaxial growth on Si substrates by cluster beam deposition

Ge epitaxial layers with reasonable quality were grown on Si (1 1 1) substrates by cluster beam deposition (CBD) process. Molecular dynamics study of the low energy Ge clusters deposition process utilizing the Stillinger–Weber two- and three-body interaction potentials was carried out to compare the experimental results. Both experimental and simulation results prove that the substrate temperature plays a dominant role in the epitaxial growth of Ge films in CBD process. The influence mechanisms of temperature are discussed.     

Impact of amorphous Ge thin layer at the amorphous Si/Al interface on Al-induced crystallization

We investigated the impact of an amorphous Ge (a-Ge) thin layer inserted at the amorphous Si (a-Si)/Al interface on Al-induced crystallization. In situ observation of the growth process clarified that the nucleation rate is drastically reduced by insertion of a-Ge, which led to increase in the average size of crystal grains. This was interpreted as resulting from decrease in the driving force of crystallization, mainly due to the larger solubility of Ge in Al than that of Si in Al. The obtained films were SiGe alloys with lateral distribution of Ge content, and its origin is discussed based on the two-step nucleation process.