Annealing effects of highly homogeneous a-Si1−xCx:H

We report the effect of annealing on the properties of amorphous hydrogenated silicon carbide thin films. The samples were deposited onto different substrates by plasma enhanced chemical vapor deposition at temperatures between 300 and 350 °C. The gaseous mixture was formed by silane and methane, at the ‘silane starving plasma regime’, and diluted with hydrogen. Rutherford backscattering and Fourier transform infrared spectrometry were used, respectively, to determine the atomic composition and chemical bonds of the samples. The film’s structure was analyzed by means of X-ray absorption fine structure and X-ray diffraction. For temperatures higher than 600 °C, amorphous silicon carbide films annealed under inert atmosphere (Ar or N₂) clearly changed their structural and compositional properties due to carbon loss and oxidation, caused by the presence of some oxygen in the annealing system. At 1000 °C, crystallization of the films becomes evident but only stoichiometric films deposited on single crystalline Si[1 0 0] substrates presented epitaxial formation of SiC crystals, showing that the crystallization process is substrate dependent. Films annealed in high-vacuum also changed their structural properties for annealing temperatures higher than 600 °C, but no traces of oxidation were observed or variations in their silicon or carbon content. At 1200 °C the stoichiometric films are fully polycrystalline, showing the existence of only a SiC phase. The XANES signal of samples deposited onto different substrates and annealed under high-vacuum also show that crystallization is highly substrate dependent.     

Step annealing effects on the structural and optical properties of InAs quantum dots grown on GaAs

The effects of multi-step rapid thermal annealing (RTA) for the self-assembled InAs quantum dots (QDs), which were grown by a molecular beam epitaxy (MBE), were investigated through photoluminescence (PL) and transmission electron microscopy (TEM). Postgrowth multi-step RTA was used to modify the structural and optical properties of the self-assembled InAs QDs. Postgrowth multi-step RTAs are as follows: one step (20 s at 750 °C); two step (20 s at 650 °C, 20 s at 750 °C); three step (30 s at 450 °C, 20 s at 650 °C, 20 s at 750 °C). It is found that significant narrowing of the luminescence linewidth (from 132 to 31 meV) from the InAs QDs occurs together with about 150 meV blueshift by two-step annealing, compared to as-grown InAs QDs. Observation of transmission electron microscopy (TEM) shows the existence of the dots under one- and two-step annealing but the disappearance of the dots by three-step annealing. Comparing with the samples under only one-step annealing, we demonstrate a significant enhancement of the interdiffusion in the dot layer under multi-step annealing.     

Colour of silicate sol-gel glasses containing CuO

Glasses with compositions xCuO·(100 − x)SiO₂ and 5R_nO·xCuO. (95−x)SiO₂, where R = Li, Na, Ca and X = 0.25–10, were prepared by the sol-gel method. Samples were thermally treated between 60 °C and 1000 °C in oxidizing and reducing atmospheres. Copper incorporation was studied by spectrophotometry, X-ray diffraction and TEM.

All the samples are transparent and present a bluegreen colour at 600 °C in oxidizing atmosphere. The obtained results prove that copper is mainly incorporated as Cu²⁺.

At higher temperatures all the samples present -cristobalite, the samples containing Li₂O or CaO also show -quartz as crystalline phases.

In reducing atmosphere particle segregation takes place, producing in some cases opaque materials. Under specific conditions, transparent ruby glasses were obtained.     

Defect passivation by hydrogen reincorporation for silicon quantum dots in SiC/SiOx hetero-superlattice

The SiC/SiO_x hetero-superlattice (HSL) consisting of alternating near-stoichiometric SiC barrier layers for the electrical transport and silicon rich SiO_x matrix layers for the quantum dot formation is a promising approach to the realization of silicon quantum dot (Si–QD) absorbers for 3rd generation solar cells. However, additional defect states are generated during post deposition annealing needed for the Si–QD formation causing an increase in sub-band gap absorption and a decrease in PL intensity. Proper passivation of excess defects is of major importance for both the optical and electrical properties of the SiC/SiO_x HSL Si–QD absorber. In this work, we investigate the effectiveness of the hydrogen reincorporation achieved with hydrogen plasma in a plasma-enhanced chemical vapor deposition (PECVD) reactor, hydrogen dissociation catalysis in hot-wire chemical vapor deposition (HWCVD) reactor and annealing in forming gas atmosphere (FGA). Both the HSL samples and single layer reference samples are tested. The passivation quality of the hydrogen reincorporation was examined by comparing electrical and optical properties measured after deposition, after annealing and after passivation. In addition, the formation of Si–QDs in SiC/SiO_x HSL was evaluated using high resolution transmission electron microscopy. We demonstrated that hydrogen can be successfully reincorporated into the annealed HSL sample and its single layer reference samples. FGA passivation is most effective for SiO_1.2 single layers and HSL samples. Passivation with PECVD appeared to be only effective for SiC single layers.     

RF plasma treatment of porous silicon

The effect of oxygen and hydrogen rf plasmas on the photoluminescence (PL) spectra of porous silicon (PS) was studied. PS samples were prepared from p-type, (100) oriented silicon wafers with a resistivity of 0.03 Ω cm by electrochemical anodization in an ethanol-containing solution. The plasma treatments were carried out in a planar reactor for 150 min, whereas the samples were placed on the ground electrode and heated to 250°C. The PL was excited by the 548 nm line of Hg lamp and measured using a monochromator and lock-in amplifier. Both hydrogen and oxygen plasma treatments led to a decrease in PL intensity. The decrease was with a factor of 5 after hydrogen and 2.5 after oxygen plasma treatment. It was established by means of Auger electron spectroscopy (AES) that both plasma treatments led to an increase in the oxygen content and to a decrease in the carbon content on the PS surface. However, no direct correlation between the AES data and the PL intensity could be established. We suggest that the appearance of plasma-induced electronic defects, rather than the change in the surface chemistry, accounts for the PL quenching.     

Investigation of defects in low-temperature-grown GaAs using optical transient spectroscopy

Optical transient current spectroscopy (OTCS) has been used to investigate defects in the low-temperature-grown GaAs after postgrowth rapid thermal annealing (RTA). Two samples A and B were grown at 220°C and 360°C on (0 0 1) GaAs substrates, respectively. After growth, samples were subjected to 30 s RTA in the range of 500–800°C. Before annealing, X-ray diffraction measurements show that the concentrations of the excess arsenic for samples A and B are 2.5×10¹⁹ and 1×10¹⁹ cm⁻³, respectively. It is found that there are strong negative decay signals in the optical transient current (OTC) for the annealed sample A. Due to the influence of OTC strong negative decay signals, it is impossible to identify deep levels clearly from OTCS. For a comparison, three deep levels can be identified for sample B before annealing. They are two shallower deep levels and the so-called As_Ga antisite defect. At the annealing temperature of 600°C, there are still three deep levels. However, their structures are different from those in the as-grown sample. OTC strong negative decay signals are also observed for the annealed sample B. It is argued that OTC negative decay signals are related to arsenic clusters.     

HRTEM and ELNES analysis of polycarbosilane-derived Si–C–O bulk ceramics

A series of analyses by high-resolution transmission electron microscopy (HRTEM) and electron energy-loss spectroscopy (EELS) has been carried out to investigate the nanostructure and the chemical bonding of Si–C–O bulk ceramics prepared by pyrolysis of oxygen-controlled polycarbosilane (PCS). HRTEM revealed that the Si–C–O ceramics with higher oxygen content tended to keep an amorphous microstructure. EELS allowed the examination of energy-loss, near-edge-structures (ELNES) that detected clear transition signals of the chemical bonding around Si atoms from Si–C bonding to Si–O bonding with an increase of oxygen content. The microstructure of the PCS-derived Si–C–O bulk ceramics is characterized as a function of oxygen content.     

Electronic traps in mixed Si1−xGexO2 films

Thermally stimulated luminescence (TSL) and infrared (IR) spectroscopy were measured in plasma grown Si_1−xGe_xO₂ (x=0, 0.08, 0.15, 0.25, 0.5) with different thicknesses (12–40 nm). A comparison with the TSL properties of thermally grown SiO₂ and GeO₂ was also performed. A main IR absorption structure was detected, due to the superposition of the peaks related to the asymmetric O stretching modes of (i) Si–O–Si (at ≈1060 cm⁻¹) and (ii) Si–O–Ge (at 1001 cm⁻¹). Another peak at ≈860 cm⁻¹ was observed only for Ge concentrations, x>0.15, corresponding to the asymmetric O stretching mode in Ge–O–Ge bonds. A TSL peak was observed at 70°C, and a smaller structure at around 200°C. The 70°C peak was more intense in all Ge rich layers than in plasma grown SiO₂. Based on the thickness dependence of the signal intensity we propose that at Ge concentrations 0.25x0.5 TSL active defects are localised at interfacial regions (oxide/semiconductor, Ge poor/Ge rich internal interface, oxide external surface/atmosphere). Based on similarities between TSL glow curves in plasma grown Si_1−xGe_xO₂, thermally grown GeO₂ and SiO₂ we propose that oxygen vacancy related defects are trapping states in Si_1−xGe_xO₂ and GeO₂.     

An adventure in disordered semiconductors: The localisation of the quantum wave function

Several man-made structures of silicon have been fabricated with properties differing from that found in ‘natural’ silicon. In particular, porous Si prepared by electrochemistry methods, consists of finely divided silicon and exhibits a strong photoluminescence. Because of the confinement of the wave function in the small particles of Si, a huge blue shift of the photoluminescence is observed with reducing particle size. The situation is quite different for porous silicon made from amorphous Si. Because of the disorder, the wave function is strongly localised and there is no confinement of the wave function: indeed, no shift of the photoluminescence is observed with a decrease in the size of the particles.     

Analysis of precursor residues in lithium aluminosilicate gels using XPS and RGA

Lithium aluminosilicate gels of composition 15 mol% lithia-2 mol% alumina-83 mol% silica were prepared by adding nitrates to tetraethyl-orthosilicate (TEOS) and going through the sol-gel process. Samples were prepared in thin film and bulk form. Dried and outgassed samples were studied with X-ray photoelectron spectroscopy (XPS) d residual gas analysis (RGA). XPS spectra show similar species in both thin film and bulk samples, but different relative quantities of each species. Some oxidation of organic groups by nitrate is evident in bulk samples which were heated to 70°C during the drying process. In both thin film and bulk samples, the O 1s spectra indicate oxygens associated with a silicate network and higher binding energy species such as - -O-. The C 1s spectra of bulk gels heated to 140° and 350°C in vacuum show some organics are vaporized at low temperature, while the oxidized-organic residues are decomposed to CO₂ at high temperature. These species are also observed with residual gas analysis at the corresponding temperatures.     

Substrate temperature dependence of microcrystalline silicon growth by PECVD technique

Undoped hydrogenated silicon films have been prepared from a gas mixture of silane and hydrogen, varying substrate temperature from 180–380 °C in an ultrahigh vacuum system using RFPECVD technique. XRD and Raman measurements enable us to know that the films are microcrystalline throughout the substrate temperature range. Bond formation of the SiH films at different substrate temperature is studied through different characterisation techniques like Fourier transform infrared spectroscopy and hydrogen evolution study. The infrared absorption spectroscopy and hydrogen evolution study reveal two types of growth: the formation of a void rich material at low T_s (∼180 °C) and a compact material at comparatively higher T_s.     

Erbium-activated silica xerogels: spectroscopic and optical properties

Silica-based sol–gel glasses activated by Er³⁺ ions are attractive materials for integrated optics (IO) devices such as frequency upconverters and optical amplifiers. Monolithic erbium-activated silica xerogels with erbium content ranging from 0 up to 40 000 ppm were prepared by the sol–gel technique. Samples were densified by thermal treatment in air at 950°C for 120 h. The densification degree and the relative content of hydroxyl groups were studied by Raman spectroscopy. Refractive indices were measured at 632.8 and 543.5 nm by a prism coupling technique. Green to blue and violet upconversion luminescence upon continuous-wave excitation at 514.5 nm was observed for all samples. Emission at 1.5 μm, characteristic of the ⁴I_13/2→⁴I_15/2 transition of Er³⁺ ions, was observed at room temperature for all samples upon continuous-wave excitation at 980 nm. For the 5000 Er/Si ppm-doped xerogel, a photoluminescence was observed and a lifetime of 8 ms for the metastable ⁴I_13/2 level was measured.     

Optimisation of low-temperature silicon epitaxy on seeded glass substrates by ion-assisted deposition

Using single crystalline Si wafer substrates, ion-assisted deposition (IAD) has recently been shown [J. Crystal Growth 268 (2004) 41] to be capable of high-quality high-rate epitaxial Si growth in a non-ultra-high vacuum (non-UHV) environment at low temperatures of about 600 °C. In the present work the non-UHV IAD method is applied to planar borosilicate glass substrates featuring a polycrystalline silicon seed layer and carefully optimised. Using thin-film solar cells as test vehicle, the best trade-off between various contamination-related processes (seed layer surface as well as bulk contamination) is determined. In the optimised IAD process, the temperature of the glass substrate remains below 600 °C. The as-grown Si material is found to respond well to post-growth treatments (rapid thermal annealing, hydrogenation), enabling respectable open-circuit voltages of up to 420 mV under 1-Sun illumination. This proves that the non-UHV IAD method is capable of achieving device-grade polycrystalline silicon material on seeded borosilicate glass substrates.     

Room-temperature luminescence study on the effect of Mg activation annealing on p-GaN layers grown by MOCVD

An Mg-doped p-GaN layer was grown by the metalorganic chemical vapor deposition method. The dissociation extent of hydrogen-passivated Mg acceptors in the p-GaN layer through Mg activation annealing was estimated by using room-temperature cathodoluminescence (CL) spectroscopy. The CL measurement revealed that the CL spectra intensities tend to increase with increasing the activation annealing temperature. The sample annealed at 925 °C showed the most intense emission and the narrowest width among the emission peaks. Consequently, it was the most excellent dissociation extent of Mg–H complexes caused by the Mg activation annealing. The hole concentration under this optimum condition was 1.3×10¹⁷ cm⁻³ at room temperature. The photoluminescence (PL) measurement showed a 2.8 eV band having characteristically a broad peak in heavily Mg-doped GaN at room temperature. By analyzing the PL results, we learned that this band was associated with the deep donor–acceptor pair (DAP) emission rather than with the emission caused by the transition from the conduction band to deep acceptor level. The four emission peaks in the resolved 2.8 eV band were emitted by transiting from deep donor levels of 0.14, 0.26, 0.40, and 0.62 eV below the conduction band to the shallow Mg acceptor level of 0.22 eV above the valence band.     

High-quality ZnO thin films prepared by two-step thermal oxidation of the metallic Zn

In this paper, we report the preparation of nanocrystalline ZnO thin films on Si (1 0 0) substrates using a simple method, in which a resistive thermal evaporation of Zn and a two-step annealing process were employed. The aim of the first annealing step in an oxygen ambient at 300°C for 2 h is to form ZnO layers on the surface of the Zn films to prevent the diffusion of the metallic Zn from the films during the high-temperature annealing process. To obtain high-quality ZnO films, a high-temperature annealing step was performed at temperature in the range of 600–900°C. The effects of the annealing temperature on the photoluminescence (PL) and orientation of ZnO nanocrystalline thin films were studied. A very strong near-band-edge emission around 375 nm with a full-width at half-maximum of 105 meV and a relatively weak emission around 510 nm related to deep-level defects were observed, which indicated that high-quality ZnO films have been obtained.     

On the role of hydrogen in a-Si

Samples of a-Si sputtered in a hydrogen enriched argon atmosphere were prepared under various hydrogen partial pressures and deposition temperatures and successfully doped with lithium. A decrease of the electrical conductivity and a shift of the absorption edge to the higher energy were observed and ascribed to the diminishing number of the localized states in the band gap due to the presence of hydrogen.     

Kinetics of the photoinduced evolution of the nanostructured porous silicon photoluminescence

In this work we show that the illumination level used during porous silicon preparation is a key factor determining the subsequent photoinduced evolution of the photoluminescence spectra. The post-preparation evolution results from the combination of at least two effects. One of them is ruled by the size changes of the silicon nanostructure due to photo-oxidation, and dominates for samples prepared under low illumination levels. On the other hand, for samples prepared under high illumination levels the post-preparation evolution is dominated by a quenching effect, resulting from photoinduced dangling bonds generation in the hydrogen-rich surface of the nanostructure. The kinetics of dangling bond creation is similar to that found in the Staebler–Wronski effect for hydrogenated amorphous silicon.     

Metastable effects in silicon thin films: Atmospheric adsorption and light-induced degradation

The effects of exposure to atmosphere (ageing) and light-soaking on coplanar dark- and photo-conductivity of silicon films of varying crystallinity are examined. Dark conductivity generally increases on ageing in films with significant amorphous fraction and decreases in largely crystalline films, and may be reversed by annealing under vacuum at 130 °C consistent with adsorption and desorption of atmospheric components. Thinner films are more strongly affected by ageing. Boron doping appears to compensate charge introduced by ageing, though there are disagreements in detail. In comparison with ageing, moderate light-soaking affects dark conductivity in transitional microcrystalline silicon films only slightly. Both processes change the majority carrier mu–tau product in line with shifts in Fermi level position.     

Growth of nanowires from annealing SiBONC nanopowders

Silicon carbide (SiC) nanowires were prepared by the gas pressure annealing of SiBONC powders, which were synthesized by pyrolysis of a polymeric precursor. The yield, morphology and composition of the nanowires were influenced by the Si/B ratio in the original ceramic powders, annealing temperature and atmosphere. Annealing temperatures between 1500 and 1600 °C and Si/B molar ratios between 70:30 to 60:40 were suitable for growth of the nanowires. When annealing in an argon (Ar) atmosphere, the SiC nanowires contained little oxygen (O); and the diameters ranged from 20 to 200 nm. Then annealing in a nitrogen (N₂) atmosphere, the nanowires were thicker and rougher, and consisted of a relatively high level of nitrogen. Varied shapes and morphologies of the nanowires were observed for different synthesis conditions. The present novel method makes possible the large-scale fabrication of β-SiC nanowires.     

Physical properties of Ag-doped cadmium telluride thin films fabricated by closed-space sublimation technique

Cadmium telluride (CdTe) thin films were prepared by the closed-space sublimation (CSS) technique, using CdTe powder as evaporant onto substrates of water-white glass. In the next step, the annealed films at 450 °C for 30 min were dipped in AgNO₃–H₂O solution at room temperature. These films were again annealed at 450 °C for 1 h to obtain silver-doped samples. The samples were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), electrically i.e. DC electrical resistivity as well as photo resistivity by van der Pauw method at room temperature, dark conductivity, activation energy analysis as a function of temperature by two-probe method under vacuum, and spectrophotometry. The electron microprobe analyzer (EMPA) results showed an increase of Ag content composition in the samples by increasing the immersion time of films in solution. The Hall measurements indicated the increase in mobility and carrier concentrations of CdTe films by doping of Ag. A significant change in the shape and size of the CdTe grains were observed.