芯片式微型流通池顺序注射化学发光法测定水中的亚硝酸根

设计了一种芯片式流通池和顺序注射技术联用,基于在酸性介质中NO-₂与H₂O₂反应生成不稳定的过氧亚硝酸, 在碱性环境中猝灭为过氧亚硝酸盐迅速分解产生化学发光的原理,测定了环境水中痕量的亚硝酸根离子浓度;和常规的顺序注射进样方式不同,将流通池作为储存管的一部分,在顺序注射进样条件下可以迅速跟踪捕捉化学发光反应信号;采用阳离子交换树脂进行水样前处理,消除了阳离子的干扰。NO-₂浓度在1×10-6～1×10-4 mol·L-1范围内和发光强度呈线性关系。方法的检测限为6.8×10-7 mol·L-1。对浓度为1×10-5 mol·L-1 的试液,11次重复测量的相对标准偏差为2.7% ,回收率在90%～99% 之间,分析频率为80 h-1。     

A novel surface cleaning method for chemical removal of fouling lead layer from chromium surfaces

Most products especially metallic surfaces require cleaning treatment to remove surface contaminations that remain after processing or usage. Lead fouling is a general problem which arises from lead fouling on the chromium surfaces of bores and other interior parts of systems which have interaction with metallic lead in high temperatures and pressures. In this study, a novel chemical solution was introduced as a cleaner reagent for removing metallic lead pollution, as a fouling metal, from chromium surfaces. The cleaner aqueous solution contains hydrogen peroxide (H₂O₂) as oxidizing agent of lead layer on the chromium surface and acetic acid (CH₃COOH) as chelating agent of lead ions. The effect of some experimental parameters such as acetic acid concentration, hydrogen peroxide concentration and temperature of the cleaner solution during the operation on the efficiency of lead cleaning procedure was investigated. The results of scanning electron microscopy (SEM) showed that using this procedure, the lead pollution layer could be completely removed from real chromium surfaces without corrosion of the original surface. Finally, the optimum conditions for the complete and fast removing of lead pollution layer from chromium surfaces were proposed. The experimental results showed that at the optimum condition (acetic acid concentration 28% (V/V), hydrogen peroxide 8% (V/V) and temperature 35 °C), only 15-min time is needed for complete removal of 3 g fouling lead from a chromium surface.     

Formation of antireflection nanostructure for silicon solar cells using catalysis of single nano-sized silver particle

Antireflection nanostructure was formed by simple wet chemical etching using catalysis of silver (Ag) nanoparticle. Single nano-sized Ag particle dispersion solution was coated onto Si(1 0 0) substrate with polished surface. Then, the samples were soaked in an aqueous etching solution of hydrofluoric acid and hydrogen peroxide. The surface of 9-min-etched Si substrate appeared black, and the reflectivity was reduced to below 5% throughout the entire spectrum from 200 to 1000 nm owing to the formed nanostructure. The absorption was significantly increased after the formation of antireflection structure with 9 min etching, and the conversion efficiency of solar cell with antireflection structure increased from 8.25 to 10.0% owing to the increase of short-circuit current.     

The cleaning of early glasses: investigation about the reactivity of different chemical treatments on the surface of ancient glasses

X-ray photoelectron spectroscopy (XPS) has been used to evaluate the reactivity of different chemical cleaning procedures on the surface of archaeological glasses. Investigations were performed on a series of Roman glass samples coming from Sicilian excavations. The ancient freshly fractured glass samples were subjected to different cleaning protocols such as piranha solution (solution of sulphuric acid and hydrogen peroxide) and EDTA/ammonia and citric acid/ammonia solutions at different pH values. The atomic concentrations of alkaline and alkaline-earth ions, measured using XPS spectra acquired at the surface of all the samples, revealed that, in acid solution, the reactivities of the EDTA and citric acid solutions were higher than that of the piranha solution. Moreover, in alkaline conditions, the reactivities of the chelating agent/ammonia solutions seem to be very high and effective in taking out alkaline and alkaline-earth ions and in destroying the external glassy structure with the formation of a silica gel thin film. PACS  61.43.Fs; 81.65.Cf; 61.66.Fn; 82.80.Pv     

Hydrogen peroxide bleaching of cotton in ultrasonic energy

It is well known that, conventional hydrogen peroxide bleaching process is an important and a specific step for wet processors; however it has some problems such as long time, high energy consumption. On the other hand, using ultrasonic energy in bleaching is an alternative method for the conventional processes.

In this work, 100% cotton materials of different forms such as raw fibre, ring-spun yarns and knitted fabrics produced from these cottons, were treated with hydrogen peroxide in two different concentrations (5 mL/L and 10 mL/L), at three different temperatures (20 °C, 30 °C, 40 °C) and times (20 min, 30 min, 60 min). Whiteness Index of the samples were then measured spectrophotometrically and the overall results were compared.     

电感耦合等离子体发射光谱法测定有机染料油溶红中八个杂质元素

本文提出用电感耦合等离子体发射光谱法 (ICP- AES)同时测定有机染料油溶红产品中 Fe、Al、Cu、Pb、 Zn、 Cr、 Mn、 Ti等八个杂质元素的分析方法。试样前处理采用 H2 SO4、 HNO3分步炭化 ,5 0 0℃灰化 ,灰分用 HCl+ H2 O2 预溶解 ,再用 VHCl∶ VHNO3 =1∶ 1混酸提取。该法检出限 :0 .15 (mg· L- 1 ) Fe;1.7×10 - 2 (mg· L- 1 ) Al;5 .0× 10 - 3 (m g·L- 1 ) Cu;0 .2 0 (mg· L- 1 ) Pb;2 .7× 10 - 2 (mg· L- 1 ) Zn;5 .7×10 - 3 (m g· L- 1 ) Cr;1.3× 10 - 3 (m g·L- 1 ) Mn;2 .1× 10 - 3 (mg· L- 1 ) Ti。精密度 RSD(n =5 ) 0 .8%～ 2 1.5 %。加标回收率 84.6 %～ 118.6 %。     

用水解分离-原子吸收光谱法对锰作形态分析

研究了痕量锰形态分析的水解分离-原子吸收光谱法。依据不同价态锰水解酸度的不同,使以各种形态存在的锰彼此分离以对其进行AAS测定。用NaOH溶液调试样的pH到10,此时以MnO-₄形式存在的高价锰不产生水解沉淀,而低价Mn(Ⅱ)和中价Mn(Ⅳ)产生水解沉淀,对清液中的Mn(Ⅶ)进行AAS测定;然后用pH为5的硫酸溶液溶解沉淀,此条件下Mn(Ⅱ)的沉淀溶解, 从而使Mn(Ⅱ)和Mn(Ⅳ)彼此分离,对清液中的Mn(Ⅱ)进行AAS测定;最后,用pH为1的硫酸溶液溶解Mn(Ⅳ),并沉淀进行AAS测定。从上述测定,可分别求得Mn(Ⅱ), Mn(Ⅳ)和Mn(Ⅶ)含量。该方法的加标回收率分别在93.3%～99.5%,96.7%～103%和98.2%～104%之间,相对标准偏差分别为2.7%,3.2%和3.1%,检出限为0.10 mg·L-1,该法简单,快速,准确。     

提高多层介质膜脉宽压缩光栅阈值的清洗方法

采用HPM溶液（盐酸、双氧水和去离子水的混合液）结合氧等离子体对多层介质膜脉宽压缩光栅进行清洗研究。用X射线光电子能谱检测光栅表面的元素成分及其原子含量的变化。实验结果表明,氧等离子体处理能有效去除光栅表面残留光刻胶和碳氟化合物; 再经HPM溶液清洗,反应离子束刻蚀和氧等离子体处理过程产生的金属污染物被进一步去除。经过上述清洗工艺处理后,光栅一级衍射效率仍保持在95%以上,光栅表面激光诱导损伤阈值达到1.6 J/cm2 (1053 nm, 10 ps)。实验结果说明了氧等离子体和HPM溶液相结合能有效清洗多层介质膜脉宽压缩光栅,并显著提高光栅损伤阈值。     

藏红T褪色光度法测定四溴双酚A的含量

在硫酸介质中,四溴双酚A （TBBP-A）对Fenton反应产生的羟基自由基氧化藏红T的反应具有抑制作用,据此建立了分光光度法测定痕量四溴双酚A的新方法.探讨不同酸介质种类、硫酸溶液用量、FeSO4溶液用量、藏红T用量、过氧化氢用量、加热时间和加热温度等因素对反应体系的影响.在较佳实验条件下,方法的线性回归方程为：△A=-0.0005＋ 2668.1C,相关系数r=0.9929,线性范围为5.0×10-6-3.2×10-4mg/mL,检出限为2.8×10-6mg/mL.将方法应用于实际样品的测定,加标实验回收率在86.7％-107％之间,相对标准偏差（RSD）为4.3％一5.1％.该方法具有操作简便、快速特点,测定结果令人满意.     

Environmentally superior cleaning of diatom frustules using sono-Fenton process: Facile fabrication of nanoporous silica with homogeneous morphology and controlled size

Existing techniques for the preparation of silica structures from diatom cells include cleaning of frustules through baking at high temperature and oxidant cleaning using concentrated sulfuric acid, hydrogen peroxide, nitric acid, or sodium dodecyl sulfate (SDS)/ethylenediaminetetraacetic acid (EDTA). In this study, sono-Fenton (SF) process was examined to prepare nanoporous silica through cleaning diatom frustules, while preserving their structural features. Single colonies of Cyclotella sp. were cultivated in batch mode f/2-enriched seawater. Combination of Fenton process with ultrasonication was found to be more efficient than the sum of individual processes in the removal of organic compounds from Cyclotella sp. structure. The optimized amounts of operational parameters were determined as suspension pH of 3, diatom cell density of 4.8 × 10⁵ cell mL⁻¹, H₂O₂ concentration of 60 mM, Fe²⁺ concentration of 15 mM, ultrasound irradiation power of 400 W and the temperature of 45 °C. The results of energy-dispersive X-ray spectroscopy (EDX) and thermal gravimetry (TG) analyses proved that organic materials covering the cell wall were significantly removed from the frustules through SF process. Scanning electron microscopy (SEM) images showed that after SF treatment, silica nanostructures were produced having uniform pores less than 15 nm in diameter. N₂ adsorption–desorption isotherms demonstrated that almost non-porous structure of diatom frustules became mesoporous during removing the organic matrix. Lipids, amino acids, carbohydrates and organic acids or their oxidized products were identified using GC–MS analysis as the main organic compounds released from diatom cells to the solution after SF treatment. Treated frustules exhibited adsorption capability of 91.2 mg/g for Methylene Blue, which was almost 2.5 times higher than that of untreated frustules (34.8 mg/g).     

Si cleaning method without surface morphology change by cyanide solutions

Hydrogen cyanide (HCN) aqueous solutions can remove copper contaminants from Si surfaces more effectively than hydrochloric acid/hydrogen peroxide mixture (HPM) and sulfuric acid/hydrogen peroxide mixture (SPM). When pH of the HCN solutions is adjusted at 9, Si surface morphology is not changed, while when pH exceeds 10, the Si surfaces are considerably roughed. AFM measurements show that Cu contaminants are present in the form of particles on the bare Si surfaces. XPS measurements show that the particles consist of metallic Cu. The Cu particle height decreases almost linearly with the cleaning time, and the Cu surface concentration decreases exponentially with it. It is concluded that Cu particles gradually dissolve into the HCN aqueous solutions by the direct reaction with cyanide ions at the surface of the Cu particles.     

Investigating the lateral motion of SiGe islands by selective chemical etching

SiGe islands grown by deposition of 10 monolayers of Ge on Si(0 0 1) at 740 °C were investigated by using a combination of selective wet chemical etching and atomic force microscopy. The used etchant, a solution consisting of ammonium hydroxide and hydrogen peroxide, shows a high selectivity of Ge over Si_xGe_1−x and is characterized by relatively slow etching rates for Si-rich alloys. By performing successive etching experiments on the same sample area, we are able to gain a deeper insight into the lateral displacement the islands undergo during post growth annealing.     

HfO2顶层多层介质膜脉宽压缩光栅的Piranha溶液清洗

为了提高HfO2顶层多层介质膜脉宽压缩光栅(PCG)的抗激光损伤性能,使用Piranha溶液(浓硫酸和双氧水的混合液)清洗PCG去除其制作工艺和使用过程中残留在表面的污染物,包括CHF3作为工作气体对HfO2进行反应离子束刻蚀生成的碳氟化合物及金属氟化物.对Piranha溶液的清洗温度、组成成分、清洗时间、清洗遍数等参...     

高压电场作用下乙醇-水溶液体系变化红外光谱分析

本文报道了用红外光谱分析电磁场作用下乙醇 水溶液体系变化情况。分析结果表明 :当乙醇溶液受到 2 0kV·cm- 1 的交变电磁场处理 (5 0Hz)时 ,分子之间的氢键缔合先增大后减少 ;高乙醇含量溶液受到同样强度电场较长时间处理时 ,有乙醇发生氧化反应 ,从红外谱中可看到νCO 峰及ν(OH) (H2 O) 峰的出现 ;经处理后的溶液自然放置 7天再测定 ,其红外谱图基本保持不变。文中对各出现变化的峰进行了分析 ,并对其机理进行了推导     

水稻中的纳米硅及其紫外吸收

为了了解水稻中硅的亚显微结构及其紫外吸收特性,根据强酸不会腐蚀SiO₂玻璃的事实,选择湿消化方法分离水稻中的硅体。以浓硫酸和硝酸混合液分别处理水稻叶片和稻壳,经多级沉降分离出其中的硅体。X射线光电子能谱结果表明硅体距离表面10 nm以内碳相对质量为35.05%,远高于硅体表面(5.88%),说明硅质壁能够阻止强酸进入硅体内部,避免硅体内氧化,保持硅体结构完整和相对独立的理化性质。电镜显示硅体SiO₂结构致密,由1～2 nm的SiO₂凝胶粒子粘聚而成,纳米颗粒相互融合组成排列方向一致的纳米棒,内部还有微米尺度(≤1μm)和纳米尺度(≤1～2 nm)的隙孔。颖壳硅体最大吸收位于285 nm;叶片纳米硅对紫外辐射的吸收极其有限,表明水稻颖壳和叶片硅体对紫外辐射具有不同的抵抗机制。     

冷射流方法脱除单重态氧气流中的水汽

为提高化学氧碘激光性能,分别使用-117 ℃乙醇、-110 ℃氟里昂和-45 ℃质量分数为50%过氧化氢冷射流进行单重态氧气流中的水汽脱除实验。实验结果表明:这3种冷射流的除水效果并不显著,乙醇基本上没有任何脱水效果,氟里昂和过氧化氢仅可以将水汽含量分别降低至原来的约1/5和1/4;乙醇和氟里昂因极易挥发而对气流产生严重干扰,并不适合用于除水;只有难挥发的过氧化氢才是合适的候选。     

ICP-MS测定土壤重金属元素消解方式的探索

为改进湿法消解有机质含量偏高土壤样品的方法,通过电感耦合等离子体质谱（ICP-MS）对比了双氧水-氢氟酸-硝酸（H₂O₂-HF-HNO₃）、盐酸-硝酸-氢氟酸（HCl-HNO₃-HF）、王水-逆王水-硝酸-氢氟酸（NO₂Cl-H₂[(N₃O₈)Cl]-HNO₃-HF）、双氧水-盐酸-硝酸-氢氟酸（H₂O₂-HCl-HNO₃-HF）以及烧失量法-硝酸-氢氟酸（LOI-HNO₃-HF）5种不同消解体系对国家土壤成分分析标准物质GSS-1a-GSS-8a样品中铜（Cu）、铬（Cr）、铅（Pb）、镉（Cd）、镍（Ni）、锌（Zn）等重金属元素的萃取效率。以103Rh作为ICP-MS测定时的内标元素,不同测定元素选择合适的监测模式,结果表明,设定3 ℃·min-1升温速率,选择550 ℃,煅烧恒温时长3 h,冷却后再用硝酸和氢氟酸进行消解时,Cu,Cr,Pb,Cd,Ni和Zn消解效果最好,加标回收率实验结果表明,标准物质测定值与标准值之间无显著差异,加标回收率为91%~105%,表明该方法的准确度和精密度均符合要求,双氧水-氢氟酸-硝酸（H₂O₂-HF-HNO₃）体系和双氧水-盐酸-硝酸-氢氟酸（H₂O₂-HCl-HNO₃-HF）体系中由于双氧水受热分解剧烈,消解液易溅出到电热板上导致测试结果偏低;盐酸-硝酸-氢氟酸（HCl-HNO₃-HF）体系和王水-逆王水（硝酸-氢氟酸（NO₂Cl-H₂[(N₃O₈)Cl]-HNO₃-HF）消解体系的测试结果稳定性较差,可能是Cl-对仪器的测试产生了质谱干扰,且在敞开体系中,Cl-易与Cr6+形成CrO₂Cl₂挥发至空气中,致使Cr元素测试结果偏低,因此在消解土壤样品时最好避免大量Cl-的引入。同时将以上方法也应用到采自于大九湖泥炭地高有机质的土壤样品的对比分析,结果均表明烧失量法-硝酸-氢氟酸消解体系消解的更为彻底,且加酸量少、干扰小,测试结果稳定,因此该方法适宜于对大批量有机物含量偏高的样品进行消解。     

Influence of particles on sonochemical reactions in aqueous solutions

Numerous publications deal with the possible application of ultrasound for elimination of organic pollutants as a tool for water pollution abatement. Most of the experiments were performed in pure water under laboratory conditions. For developing technologies that hold promise it is necessary to investigate the effect of ultrasound in natural systems or waste water where particulate matter could play an important role. In this paper the influence of quartz particles (2-25 microm) on the chemical effects of ultrasound in aqueous system using a high power ultrasound generator (68-1028 kHz, 100 W, reactor volume 500 ml) is reported. In pure water in dependence on particle size, concentration and frequency the formation rate of hydrogen peroxide under Ar/O2 (4:1) shows a maximum using 206 kHz in presence of 3-5 microm quartz particles (4-8 g/l). Under these conditions the yield of peroxide is higher than without quartz. Additionally under N2/O2 (4:1) besides hydrogen peroxide the formation of nitrite/nitrate was measured. Compared to pure water quartz particle depressed the formation of nitrite/nitrate up to 10-fold but not the formation of H2O2. According to the results of H2O2 formation the elimination of organic compounds by sonolysis (206 kHz) and the influence of quartz particles were investigated. As organic compounds salicylic acid, 2-chlorobenzoic acid and p-toluenesulfonic acid were used. The influence of quartz on the oxidation of organic compounds (206 kHz) is similar to that on the formation of H2O2.     

Wet-chemical nanoscale patterning of GaAs surfaces using atomic force microscope lithography

Sub-100 nm V-grooves in GaAs(001) surfaces have been fabricated by patterning a thin photoresist layer with an atomic force microscope (AFM) and subsequent wet-chemical etching. The nanolithography is based on the dynamic ploughing technique. Anisotropic etchants under investigation are bromine–methanol–isopropanol, sulfuric acid–hydrogen peroxide–water, citric acid–hydrogen peroxide–water, and ammonium hydroxide–hydrogen peroxide–water. Along the [11̄0] direction the etched grooves are V-shaped, along [11̄0] the profile is U-shaped. Best results of 50–60-nm wide V-grooves with straight edges and smooth sidewalls are obtained from bromine–methanol–isopropanol, the other etchants form rough grooves. Concerning the reproducibility of the patterning process, the aqueous etch solutions exceed the bromine etchant.     

热处理竹材的化学成分傅里叶变换红外光谱分析

化学热处理是实现可再生木质生物能源中纤维素高效利用及半纤维素糖化转换的关键步骤。通过预处理过程可以快速去除难溶木质素,实现细胞壁中半纤维素的物理化分离,使得植物细胞壁中化学成分发生变化,从而增加木质纤维素的产出量。以硫酸(H₂SO₄)、稀碱(NaOH)及甘油(glycerol)为预处理介质,采用不同的热处理温度(硫酸(H₂SO₄)、稀碱(NaOH)热处理温度为117和135 ℃;甘油(glycerol)热处理温度为117 ℃)),对竹材处理前后的主要化学组分进行对比分析,并通过傅里叶变换红外光谱进一步证实化学热处理前后竹材化学组分的变化,以获得不同的化学热处理介入下竹材化学成分转换的主要变化规律和机理。结果表明：热化学处理后竹材的纤维素产出量明显增加。纤维素得率及木质素的去除率在不同的处理介质条件下的变化规律为,稀碱(NaOH)处理效果优于稀酸(H₂SO₄)和甘油(glycerol);此外,在相同介质条件下135 ℃热处理效果比117 ℃热处理效果显著。对于不同处理条件的半纤维素的降解程度大小变化结果与此相同。通过红外光谱分析可知,热处理后纤维素环状C-O-C不对称伸缩振动峰出现峰值分解,半纤维素的红外吸收特征峰出现明显陡降变化,木质素苯环特征吸收峰明显减弱,证明纤维素产出量明显增加,半纤维素降解趋势明显,木质素去除效果良好。傅里叶红外变换光谱分析结果与标准测定结果一致。