氧化锌/硅纳米孔柱阵列的结构和光致发光特性研究

以硅纳米孔柱阵列(Si-NPA)为衬底、用化学气相沉积法制备了具有规则阵列结构特征的ZnO/Si-NPA纳米复合体系，并对其结构和光致发光性质进行了表征. 实验结果显示，组成ZnO/Si-NPA表面阵列的每个柱子均呈现层壳结构. 不同于衬底Si-NPA的红光和蓝光发射，ZnO/Si-NPA在紫外光区和蓝绿光区呈现出两个强的宽发光峰. 分析表明，紫外光发射应归因于ZnO晶体的带边激子跃迁；而蓝绿光发射则来自于ZnO晶体本征缺陷所形成的两类深能级复合中心上载流子的辐射跃迁.     

一种自支撑金纳米薄膜的制备、结构和氮吸附特性

以一种新的硅微米/纳米结构复合体系——硅纳米孔柱阵列作为还原性衬底，采用浸渍技术制备出一种自支撑的金纳米薄膜，并对其表面形貌和结构进行了表征.实验表明，金纳米薄膜的制备过程是一个自终止过程.当硅纳米孔柱阵列被耗尽后，浸渍溶液中Au³⁺的还原反应将自行终止；同时，所形成的金纳米薄膜自动与衬底脱离并成为一种自支撑薄膜.薄膜的形成机理被归因于硅纳米孔柱阵列所具有的高的表面活性和还原性.用能量弥散x射线谱对薄膜表面化学成分分析的结果表明，如此制备的金纳米薄膜具有很强的氮吸附和氮储存能力.这一特性有可能在气体传感器、空气分离和氮纯化以及氮化合物的膜合成器等技术领域得到应用. 关键词： 自支撑金纳米薄膜 硅纳米孔柱阵列 浸渍技术     

硅纳米孔柱阵列及其四氧化三铁复合薄膜的湿敏电容特性研究

报道了硅纳米孔柱阵列（Si-NPA），Fe₃O₄复合的Si-NPA（Fe ₃O₄/Si-NPA）两种薄 膜材料的制备方法并对其形貌和结构进行了表征，研究了其电容湿度传感特性.结果表明，S i-NPA，Fe₃O₄/Si-NPA均为微米/纳米结构复合体系.当环境相对湿 度从11％上升到95％ 时，采用100 Hz的信号频率进行测试，以Si-NPA和Fe₃O₄/Si-NPA 为电介质材料制成的湿 敏元件的电容增加值分别为起始值的1500％和5500％；采用1000 Hz的信号频率测试时，则 分别为起始值的800％和12000％，显示出两种材料较高的湿度灵敏性和较强的绝对电容输出 信号强度.同时，在升湿和降湿过程中，Si-NPA，Fe₃O₄/Si-NPA都 具有较快的响应速度 ，其响应时间分别为15 s，5 s和20 s，15 s.文章结合材料的形貌和结构特性对其物理机理 进行了分析.上述结果表明，Si-NPA无论是直接作为湿度薄膜传感材料还是作为复合薄膜湿 度传感材料的衬底都具有很好的前景. 关键词： 硅纳米孔柱阵列 3O₄')" href="#">Fe₃O₄ 湿度电容传感特性     

纳米硅结构薄膜光致发光的温度依赖特性

综合考虑纳米硅结构薄膜的特殊性质,如量子限制效应、光学带隙和光跃迁振子强度对纳米硅粒径的依赖特性以及光学带隙和光辐射的温度依赖特性等,给出了一个解析表达式来分析具有一定粒径分布的纳米硅结构薄膜的光致发光(PL)强度分布,其中选取了两种纳米硅的粒径分布,即高斯分布和对数正态分布。结果表明,随着平均粒径和粒径分布偏差的减小,纳米硅薄膜的PL谱峰蓝移。随着环境温度的升高,纳米硅结构薄膜的PL谱峰红移且相对发光强度减弱。纳米硅结构薄膜光辐射拟合的结果与实验数据的比较分析表明,该模型能够很好地解释纳米硅结构薄膜在不同温度下的PL特性。     

利用胶体小球掩蔽刻蚀技术制备的半导体纳米阵列的场电子发射特性

利用胶体小球掩蔽刻蚀技术,制备了单晶硅纳米阵列,利用原子力显微镜观察了硅阵列的表面形貌,实验结果表明,硅柱阵列具有高密度和较好的均匀性。同时研究了单晶硅纳米阵列的场电子发射特性。为了提高样品的场发射性能,在所制备的单晶硅有序纳米阵列上生长了一层非晶碳薄膜。与单晶纳米硅柱阵列相比,覆盖有非晶碳膜的样品的场电子发射特性有了明显的改善,表现在场发射的开启电场下降,同时场发射增强因子得到增加。结果表明非晶碳膜确实能够降低电子发射的表面有效势垒,从而增强了场电子发射特性。     

氮化硅薄膜中纳米非晶硅颗粒的键合结构及光致发光

采用螺旋波等离子体化学气相沉积技术以N₂/SiH₄/H₂为反应气体制备了镶嵌有纳米非晶硅颗粒的氢化氮化硅薄膜,通过改变N₂流量实现了薄膜从红到蓝绿的可调谐光致发光.傅里叶红外透射和紫外-可见光吸收特性分析表明,所生长薄膜具有较高的氢含量,N₂流量增加使氢的键合结构发生变化,非晶硅颗粒尺寸减小,所对应的薄膜的光学带隙逐渐增加和微观结构有序度减小.可调光致发光(PL)主要来源于纳米硅颗粒的量子限制效应发光,随N₂流量增加,PL的谱线展宽并逐渐增强. 关键词： 傅里叶红外透射谱 光吸收谱 纳米硅粒子镶嵌薄膜 光致发光     

银/硅纳米孔柱阵列活性基底的SERS效应研究

以硅纳米孔柱阵列(Si-NPA)为衬底,采用浸渍法制备出一种具有规则表面形貌特征的银/硅纳米孔柱阵列(Ag/Si-NPA),并以R6G为探测目标材料,对其表面增强拉曼(SERS)效应进行了研究。结果表明,对于R6G浓度低至10-15M,Ag/Si-NPA均能表现出清晰的特征SERS峰。随着浓度的降低,R6G的荧光淬灭,所测拉曼光谱的基线降低,但特征峰峰位基本保持不变。在低浓度10-15M时得到的SERS光谱,理论上证明为单分子光谱。此外,Ag/Si-NPA活性基底具有较好的稳定性,在长达28天的自然老化过程中,Ag/Si-NPA能够保持对R6G较高的探测水平,光谱具有较好的信噪比和分辨率。Ag/Si-NPA是一种理想的SERS活性基底。     

卤化硅烯结构、电子和光学性质的第一性原理研究

二维硅烯的商业用途通常受到其零带隙的抑制,限制了其在纳米电子和光电器件中的应用.利用基于密度泛函理论的第一性原理计算,单层硅烯的带隙通过卤原子的化学官能化被成功打开了,并综合分析了卤化对单层硅烯的结构,电子和光学性质的影响.研究结果表明卤化使结构变得扭曲,但保持了良好的稳定性.通过HSE06泛函,全功能化赋予硅烯1.390至2.123 eV的直接带隙.键合机理分析表明,卤原子与主体硅原子之间的键合主要是离子键.最后,光学性质计算表明,I-Si-I单层在光子频率为10.9 eV时达到最大光吸收,吸收值为122000 cm^-1,使其成为设计新型纳米电子和光电器件的有希望的候选材料.     

用巯基乙酸作稳定剂制备CdSe纳米晶的光学性质

以巯基乙酸为稳定剂制备了CdSe纳米晶，通过尺寸选择沉淀得到2nm到3nm之间不同尺寸的纳米晶，利用室温光吸收，光致发光（PL）和光致发光激发（PLE）谱来研究了CdSe纳米团簇的光学性质。紫外－可见吸收谱给了具有清晰激光特征的尖锐吸收边，这表明样品的尺寸分布很窄。光致发光研究表明，样品有两个发射带，一个具有较高能量位于吸收边，来自电子－空穴对从最低激发态能级弛豫后的辐射复合，另一个低能发射带归属于基质与纳米晶界面存在的俘获中心。PLE谱中有2个吸收带，分别是S－S和P－P跃迁。最后还给出了不同激发能量下的发光特性。     

氢化硅薄膜光吸收近似特性研究

利用等离子体化学气相沉积系统在直流电压源和射频源的双重激励下,以康宁7059玻璃为衬底制备了氢化硅薄膜．过测定氢化硅薄膜Raman光谱,对薄膜微结构进行了表征;建立氢化硅薄膜的光吸收模型,计算出薄膜的光吸收系数和光学带隙,和实验结果基本一致,说明该模型符合实验结果;并利用该模型计算的光吸收系数和光学带隙,结合AMPS软件对设计的太阳电池结构进行了模拟,给出的I-V特性曲线变化趋势与实验结果基本符合,同时对实验结果与模拟结果存在差异的原因进行了分析,并给出合理解释． 关键词： 氢化硅薄膜 光吸收系数 光吸收模型     

Electronic band structure and optical properties of silicon nanoporous pillar array

Silicon nanoporous pillar array (Si-NPA) is fabricated by hydrothermally etching single crystal silicon (c-Si) wafers in hydrofluoric acid containing ferric nitrate. Microstructure studies disclosed that it is a typical micron/nanometer structural composite system with clear hierarchical structures. The optical parameters of Si-NPA were calculated by general light-absorption theory and Kramers–Kronig relations based on the experimental data of reflectance and the variations compared with the counterparts of c-Si were analyzed. The features of the electronic band structure deduced from the optical measurements strongly indicate that Si-NPA material is a direct-band-gap semiconductor and possesses separated conduction sub-bands which accords with conduction band splitting caused by silicon nanocrystallites several nanometers in size. All these electronic and optical results are due to the quantum confinement effect of the carriers in silicon nanocrystallites.     

Multipeak-structured photoluminescence mechanisms of as-prepared and oxidized Si nanoporous pillar arrays

Silicon dominates the electronic industry, but its poor optical properties mean that it is not preferred for photonic applications. Visible photoluminescence (PL) was observed from porous Si at room temperature in 1990, but the origin of these light emissions is still not fully understood. This paper reports that an Si nanocrystal, silicon nanoporous pillar array (Si-NPA) with strong visible PL has been prepared on a Si wafer substrate by the hydrothermal etching method. After annealing in O₂ atmosphere, the hydride coverage of the Si pillar internal surface is replaced by an oxide layer, which comprises of a great quantity of Si nanocrystal (nc-Si) particles and each of them are encapsulated by an Si oxide layer. Meanwhile a transition from efficient triple-peak PL bands from blue to red before annealing to strong double-peak blue PL bands after annealing is observed. Comparison of the structural, absorption and luminescence characteristics of the as-prepared and oxidized samples provides evidence for two competitive transition processes, the band-to-band recombination of the quantum confinement effect of nc-Si and the radiative recombination of excitons from the luminescent centres located at the surface of nc-Si units or in the Si oxide layers that cover the nc-Si units because of the different oxidation degrees. The sizes of nc-Si and the quality of the Si oxide surface are two major factors affecting two competitive processes. The smaller the size of nc-Si is and the stronger the oxidation degree of Si oxide layer is, the more beneficial for the luminescent centre recombination process to surpass the quantum confinement process is. The clarification on the origin of the photons may be important for the Si nanoporous pillar array to control both the PL band positions and the relative intensities according to future device requirements and further fabrication of optoelectronic nanodevices.     

Microstructure and blue photoluminescence enhancement of silicon nanoporous pillar array embedded in ferroelectric barium strontium titanate

A silicon nanoporous pillar array (Si-NPA) with micrometer/nanometer hierarchical structure was fabricated by hydrothermal etching, followed by spin-coating barium strontium titanate (BST) on Si-NPA substrate. The photoluminescence (PL) spectra of the Si-NPA and BST/Si-NPA thin film were investigated. The emission band of freshly prepared Si-NPA located at 630 nm, and a blueshift at 425 nm as well as degradation in intensity after annealing at 600 °C for 1 h was observed, which might be explained by a quantum confinement effect model. BST ferroelectric material provided a static-electric field and induced the excited carriers in Si-NPA to migrate toward the opposite direction and recombine in an interfacial oxide layer. Therefore, BST enhanced blue emission of Si-NPA as well as passivated Si-NPA.     

Photocatalytic Properties of TiO2/Si-NPA Nano Composite Systems

A new composite system is fabricated by depositing the TiO2 film on a silicon nanoporous pillar array （Si-NPA） and annealing at 500℃ using the spin coating method. Such a composite system exhibits a uniform morphology with the micron-dimension pillar array. Photocatalytic properties are investigated based on the degradation of methyl orange dye solution, and the results show that the photocatalytic efficiency of such a nano-composite system is 1.7 times that of the TiO2/glass system. The enhancement of photocatalytic efficiency is attributed to the large surface area of the TiO2/Si-NPA system.     

Low-bias visible photodetection realized by graphite nanostructures grown on silicon nanoporous pillar array

A graphite nanostructure (nano-graphite) with the morphology of nanoparticles and nanowires which are composed of graphite nanocrystallites (nc-graphite) was grown on silicon nanoporous pillar array (Si-NPA) by a simple chemical vapor deposition method. The structural characterizations disclosed a complex interface configuration made of nc-graphite, nc-Ni (pre-deposited on Si-NPA as catalyst for nc-graphite growth), nc-NiO₂, and nc-Si. The designed nano-graphite/Si-NPA exhibits strong light absorption and sensitive photoresponsivity under low-bias potential in the visible region of 400–800 nm. For example, it shows a switching ratio of 75, a photoresponsivity of ~?0.16 AW^?1 and a rise/fall time of 12.24/5.66 s with an ultralow bias of 0.1 mV under the visible illumination of 5 mWcm^?2. The high switching ratio and responsivity were ascribed to the complexity of the interface nanostructures and the formation of a thick and compact graphite nanofilm. The results illustrate that nano-graphite/Si-NPA might be a promising candidate material for fabricating high-performance low-power Si-based visible photodetectors.     

碳纳米管/硅纳米孔柱阵列的场发射性能

"通过热化学气相沉积的方法将碳纳米管生长到硅纳米孔柱阵列衬底上．采用场发射扫描电子显微镜、透射电子显微镜、高分辨透射电子显微镜、拉曼光谱和X射线能谱对所制备的样品形貌、组成进行了分析．结果发现：所制备产物为一种具有面积大、准周期性的碳纳米管/硅巢状阵列复合结构．能谱分析表明碳纳米管仅含有碳元素．对样品进行场发射性能测试表明该结构开启电压为1.3 MV/m,当外加电压为4.26 MV/m,发射电流为5 mA/cm2．由FN公式计算相应的场增强因子约为1.1￡104．碳纳米管/硅纳米孔柱阵列好的场发射性能被归     

Growth process and mechanism of a multi-walled carbon nanotube nest deposited on a silicon nanoporous pillar array

A large scale nest array of multi-walled carbon nanotubes (NACNTs) was grown on silicon nanoporous pillar array (Si-NPA) by thermal chemical vapor deposition. Through observing its macro/micromorphology and structure, ascertaining the catalyst component and its locations at different growth time by hiring field emission scanning electron microscopy, transmission electron microscopy (TEM), high-resolution TEM, and selected area electron diffraction, the growth process was deduced. Its thermal properties were also investigated by using a thermogravimetric analyzer. Our experiments demonstrated that the CNTs growth by means of root-growth mechanism at the initial growth stage, then a continuous growth process with its tip open is suggested, finally, a schematic growth model of NACNT/Si-NPA was presented.     

Preparation, structural and electrical properties of zinc oxide grown on silicon nanoporous pillar array

Polycrystalline thick film of zinc oxide (ZnO) is grown on a unique silicon substrate with a hierarchical structure, silicon nanoporous pillar array (Si-NPA), by using a vapour phase transport method. It is found that as-grown ZnO film is composed of closely packed ZnO crystallites with an average size of $\sim$10\,\mu$m. The film resistivity of ZnO/Si-NPA is measured to be $\sim$8.9\Omega\cdot$\,cm by the standard four probe method. The lengthwise $I$-$V$ curve of ZnO/Si-NPA heterostructure is measured. Theoretical analysis shows that the carrier transport across ZnO/Si-NPA heterojunction is dominated by two mechanisms, i.e. a thermionic process at high voltages and a quantum tunnelling process at low voltages.     

Optical properties of silicon microcolumn grown by nanosecond pulsed laser irradiation

We have investigated the optical properties of silicon pillars formed by cumulative nanosecond pulsed excimer laser irradiation of single-crystal silicon in vacuum created under different repetition rates. The changes in optical characteristics of silicon pillar were systematically determined and compared as the number of KrF laser shots was increased from 1 to 15,000.The results show that silicon pillar PL curves exhibit a blue band around 430 nm and an ultraviolet band peaking at 370 nm with the vanishing of the green emission at 530 nm. A correlation between the intensity of the blue PL band and the intensity of the Si-O absorption bands has been exploited to explain such emission, whereas, the origin of the ultraviolet band may be attributed to different types of defects in silicon oxide.