ZnO：V薄膜后退火处理前后的微结构与发光特性

利用溶胶-凝胶(Sol-gel)法在单晶硅(100)衬底上分别制备了ZnO:V薄膜和纯ZnO薄膜。为进一步研究后退火对ZnO:V薄膜结构和发光性质的影响,在两段式快速退火后又在800℃下进行了后退火处理。X射线衍射的结果表明:后退火处理前,钒(V)的掺入使ZnO结晶质量变差,而800℃退火处理后,从ZnO的衍射峰中可以看出,相对于无V杂样品其结晶质量变好。扫描电子显微镜形貌图中可以看出制备的样品薄膜颗粒大小均匀,薄膜致密度较高。光致发光(PL)谱的研究表明:ZnO:V薄膜在800℃退火处理后,紫外和绿带发光峰均增强,但紫外发光峰增强得更多;与同样条件下制备的纯ZnO薄膜的PL谱比较,发现V掺杂后样品的紫外激子复合发光峰的强度明显增强且峰位发生蓝移,而缺陷引起的绿带发光峰的强度降低。     

ZnO∶V薄膜后退火处理前后的微结构与发光特性

利用溶胶-凝胶(Sol-gel)法在单晶硅(100)衬底上分别制备了ZnO∶V薄膜和纯ZnO薄膜。为进一步研究后退火对ZnO∶V薄膜结构和发光性质的影响,在两段式快速退火后又在800℃下进行了后退火处理。X射线衍射的结果表明:后退火处理前,钒(V)的掺入使ZnO结晶质量变差,而800℃退火处理后,从ZnO的衍射峰中可以看出,相对于无V杂样品其结晶质量变好。扫描电子显微镜形貌图中可以看出制备的样品薄膜颗粒大小均匀,薄膜致密度较高。光致发光(PL)谱的研究表明:ZnO∶V薄膜在800℃退火处理后,紫外和绿带发光峰均增强,但紫外发光峰增强得更多;与同样条件下制备的纯ZnO薄膜的PL谱比较,发现V掺杂后样品的紫外激子复合发光峰的强度明显增强且峰位发生蓝移,而缺陷引起的绿带发光峰的强度降低。     

生长在p-GaAs衬底上的ZnO基异质结二极管电致发光(英文)

利用等离子体辅助分子束外延在p型砷化镓衬底上制备了ZnO异质结发光二极管。实验表明:GaAs与ZnO之间的氧化镁绝缘层能够有效改善器件光电性能,I-V特性的研究表明该器件具有良好的整流特性,开启电压为3 V,电致发光光谱由一个紫外发光峰和一个可见发光带构成,其来源分别为ZnO层中近带边缺陷以及深能级缺陷相关的辐射复合。     

聚苯胺/ZnO纳米线薄膜材料作为发光层的柔性光电器件 及其发光机理

综合氧化锌纳米线(ZnO NWs)的光学活性与聚苯胺(PANI)的空穴传输特性,设计并制备了一种聚合物/ZnO纳米线电致发光材料,并对其发光特性进行了研究。通过高分子络合软模板法,将有序的单晶ZnO NWs均匀生长在覆有铟锡氧化物(ITO)涂层的柔性聚乙烯对苯二甲酸乙二醇酯(PET)衬底上并嵌入PANI薄膜,获得了电致发光薄膜材料和有机/无机异质结实验器件ITO/(ZnO NWs-PANI)。有机/无机异质结器件电致发光可调,在相对低的开启电压下呈现室温蓝紫外发光,并且ZnO NWs表面覆盖PANI增加了蓝紫外发光的强度和稳定性;而无PANI的ZnO NWs阵列具有450 nm处的缺陷发射峰,这可能是电子从扩展态锌间隙Zn_i到价带的跃迁引起的。这些结果表明,基于PANI/ZnO纳米线的复合材料在柔性光电器件方面的应用极具潜力。     

磁控溅射制备ZnO薄膜的受激发射特性的研究

用射频磁控反应溅射法在二氧化硅衬底上制备ZnO薄膜。得到了在不同温度下ZnO薄膜的吸收与光致发光。观测到了纵光学波 (LO)声子吸收峰与自由激子吸收峰 ;室温 (30 0K)下 ,PL谱中仅有自由激子发光峰。这些结果证实了ZnO薄膜具有较高的质量。探讨了变温ZnO薄膜的发光特性。研究了ZnO薄膜的受激发射特性。     

衬底位置对化学气相沉积法制备的磷掺杂p型ZnO纳米材料形貌和特性的影响

采用化学气相沉积方法,在无催化剂的条件下,通过改变衬底位置在Si(100)衬底上制备出了高取向的磷掺杂ZnO纳米线和纳米钉.测试结果表明,当衬底位于反应源上方1.5 cm处时,所制备的样品为钉状结构,而当衬底位于反应源下方1 cm处时样品为线状结构.对不同形貌磷掺杂ZnO纳米结构的生长机理进行了研究.此外,在ZnO纳米结构的低温光致发光谱中观测到了一系列与磷掺杂相关的受主发光峰.还对磷掺杂ZnO纳米结构/n-Si异质结I-V曲线进行了测试,结果表明,该器件具有良好的整流特性,纳米线和纳米钉异质结器件的开启电压分别为4.8和3.2 V.     

ZnO纳米线二极管发光器件制备及特性研究

运用液相法生长成ZnO纳米线薄膜，并利用肖特基型异质结的发光原理，构造成功肖特基型ZnO纳米线二极管发光器件.在大于6V直流电压驱动下，观察到近紫外波段392nm处和可见光波段525nm的发射谱带.从单向导电特性及ZnO纳米线材料的能带结构等方面探讨了该种器件的电致发光机理.     

CVD法制备p-ZnO薄膜/n-Si异质结发光二极管及其性能研究

利用简单的化学气相沉积方法, 首先在n-Si衬底上生长Sb掺杂p-ZnO薄膜, 并在此基础上制作了p-ZnO/n-Si异质结发光二极管．对制备的Sb掺杂ZnO薄膜 在800 ℃下进行了热退火处理, 发现退火后样品的晶体质量和表面形貌都得到明显提高, 并且薄膜呈现的电导类型为p型, 载流子浓度为9.56× 10¹⁷ cm^-3. 此外, 该器件还表现出良好的整流特性, 正向开启电压为4.0 V, 反向击穿电压为9.5 V. 在正向45 mA的注入电流条件下, 器件实现了室温下的电致发光. 这说明较高质量的ZnO薄膜也可以通过简单的化学气相沉积方法来实现, 这为ZnO基光电器件的材料制备提供了一种简单可行的方法. 关键词： CVD p-ZnO 异质结 电致发光     

氧气压强对PLD制备MgZnO薄膜光学性质的影响(英文)

使用准分子脉冲激光沉积(PLD)方法在Si(100)基片上制备了高度c轴取向的MgZnO薄膜。分别使用SEM、XRD、XPS、PL谱和吸收谱表征了薄膜的形貌、结构、成分和光学性质。实验发现氧气压强对MgZnO薄膜的结构和光学性质有重要影响。当氧气压强由5 Pa增大到45 Pa时,薄膜的PL谱紫外峰蓝移了86meV,表明氧气压强的增大提高了MgZnO薄膜中Mg的溶解度。在15 Pa氧气压强下制备的薄膜显示了独特、均匀的六角纳米柱状结构,其PL谱展示了优异的发光特性,具有比其他制备条件下超强的紫外发射和微弱的可见发光。500~600 nm范围内的绿光发射,我们讨论其机理可能源于深能级中与氧相关的缺陷。使用PLD得到纳米柱状结构表明:优化制备条件,可望使用PLD制备ZnO纳米阵列的外延衬底;可使用PLD技术开发基于ZnO纳米结构的高效发光器件。     

电泳沉积法制备的Zn_(1-x)Cu_xO薄膜的结构及阻变性能

采用电泳沉积法在FTO导电玻璃基片上制备Zn_(1-x)Cu_xO薄膜,并对其微观结构、光致发光谱、伏安特性、保持特性和转换电压分布进行探讨。PL谱表明,Cu掺杂在禁带中引入深受主能级,降低氧空位浓度,导致ZnO薄膜的紫外发光、蓝光发光和绿光发光峰强度降低。所得薄膜的晶粒细小、致密、均匀,具有稳定的双极性阻变特性,开关比R_(off)/R_(on)最高达到10~5,其低阻态(LRS)和高阻态(HRS)的阻变机理分别符合欧姆定律和空间电荷限制传导理论。器件经100次循环测试后开关比无明显变化,呈现出较为良好的抗疲劳特性。Cu掺杂对LRS影响不大,但显著改善了HRS的分散性以及转换电压V_(SET)的分散性。当Cu掺杂量x=0.04时,器件表现出良好的综合性能:R_(off)≈10~6Ω,R_(off)/R_(on)≈10~4,V_(SET)介于0.4~3.03 V之间。     

Effect of S- and Sn-doping to the optical properties of ZnO nanobelts

In this study, the optical properties of S- and Sn-doped ZnO nanobelts, grown by thermal evaporation, were investigated. The sulfur and tin contents in the nanobelts were about 12% and 8% (atomic), respectively. The average widths of the S- and Sn-doped ZnO nanobelts were 73 and 121 nm, respectively. Room temperature photoluminescence (PL) spectroscopy exhibits significantly different optical properties for the two types of nanobelts. The PL result of the S-doped ZnO nanobelts shows the broad visible emission with no detectable ultraviolet (UV) peak, while the PL result of the Sn-doped sample shows two emission bands, one related to UV emission with a strong peak at 376 nm that is blue-shifted by 4 nm in comparison to pure ZnO nanobelts, and another related to green emission with a weak peak. A weak peak in the UV region at 383 nm appeared after annealing the S-doped ZnO nanobelts at 600 °C. Additionally, the annealed S-doped nanobelts show a stronger peak in the visible emission region in comparison to that observed prior to annealing. The Sn-doped ZnO nanobelts are also affected by annealing, as the UV emission peak is blue-shifted to 372 nm after annealing.     

The fabrication and characterization of ZnO UV detector

ZnO films were deposited on GaAs substrates by radio frequency (rf) magnetron sputtering followed by an ambient-controlled heat treatment process for arsenic doping. In Hall measurements, the As-doped ZnO films showed the characteristics of p-type semiconductor. The ZnO thin film p–n homojuctions were then fabricated to investigate the electrical properties of the films. The p–n homojunctions exhibited the distinct rectifying current–voltage (I–V) characteristics. The turn-on voltage was measured to be 3.0 V under the forward bias. When ultraviolet (UV) light (λ = 325 nm) was irradiated on the p–n homojunction, photocurrent of 2 mA was detected. Based on these results, it is proposed that the p–n homojunction herein is a potential candidate for UV photodetector and optical devices.     

退火温度对ZnO薄膜结构和发光特性的影响

采用反应射频磁控溅射法在 Si(100)基片上制备了高c轴择优取向的ZnO薄膜，研究了退火温度对ZnO薄膜的晶粒尺度、应力状态、成分和发光光谱的影响，探讨了ZnO薄膜的紫外发光光谱和可见发光光谱与薄膜的微观状态之间的关系.研究结果显示,在600—1000℃退火温度范围内，退火对薄膜的织构取向的影响较小，但薄膜的应力状态和成分有比较明显的变化.室温下光致发光光谱分析发现，薄膜的近紫外光谱特征与薄膜的晶粒尺度和缺陷状态之间存在着明显的对应关系；而近紫外光谱随退火温度升高所呈现的整体峰位红移是各激子峰相对比例变 关键词： ZnO薄膜 退火 光致发光 射频反应磁控溅射 可见光发射     

Electroluminescence from a ZnO homojunction device grown by pulsed laser deposition

A ZnO homojunction light emitting device was grown on n+ GaAs substrate by pulsed laser deposition. As-doped ZnO film by diffusion of As from the substrate was used for the p-type side and Al-doped ZnO film for the n-type side of the device. A distinct electroluminescence emission consisting of a dominant emission peak at ∼2.5 eV and a weak shoulder centered at ∼3.0 eV was observed at room temperature. The I-V characteristic of the ZnO homojunction showed a good rectifying behavior with a turn-on voltage of ∼4.5 V and a reverse breakdown voltage of ∼9 V.     

LiGaO2衬底上ZnO外延膜的结构与光学特性

采用磁控溅射法在(001),(100)及(010)LiGaO2衬底上制备了ZnO薄膜,通过X射线衍射(XRD)、原子力显微镜(AFM)、透过光谱以及光致发光谱(PL)对薄膜的结构、形貌及光学性质进行了表征.结果表明LiGaO2衬底不同晶面上制备的ZnO薄膜具有不同的择优取向,在(001)、(100)及(010)LiGaO2上分别获得了[001]、[1100]及[1120]取向的ZnO薄膜;不同取向的ZnO薄膜表面形貌差异较大;薄膜在可见光波段具有较高的透过率;在ZnO薄膜的光致发光谱中只观察到了位于378 nm的紫外发射峰,而深能级发射几乎观察不到,(1100)取向的薄膜紫外发射峰强度最大,半高宽也最小,薄膜光致发光件质的差异丰要和晶粒尺寸有关.     

Study of Au/ZnO nanorods Schottky light-emitting diodes grown by low-temperature aqueous chemical method

High quality vertically aligned ZnO nanorods (NRs) were grown by low-temperature aqueous chemical technique on 4H-n-SiC substrates. Schottky light-emitting diodes (LEDs) were fabricated. The current-voltage (I–V) characteristics of Schottky diodes reveal good rectifying behavior. Optical properties of the ZnO nanorods (NRs) were probed by cathodoluminescence (CL) measurements at room temperature complemented with electroluminescence (EL). The room-temperature CL spectra of the ZnO NRs exhibit near band edge (NBE) emission as well as strong deep level emission (DLE) centered at 690 nm. At room temperature the CL spectra intensity of the DLE was enhanced with the increase of the electron beam penetration depth due to the increase of defect concentration at the interface and due to the conversion of self-absorbed UV emission. We observed a variation in the DLE along the nanorod depth. This indicates a relatively lower structural quality near the interface between ZnO NRs and n-SiC substrate. The room-temperature CL spectra of SiC show very weak emission, which confirms that most of the DLE is originating from the ZnO NRs, and SiC has a minute contribution to the emission.     

原子层沉积制备氧化锌纳米薄膜的光学性质研究

采用原子层沉积技术(ALD),以二乙基锌和水为前驱体,在衬底温度分别为110和190 ℃的条件下制备了致密的氧化锌纳米薄膜。采用X射线光电子能谱,荧光光谱和椭偏仪等表征手段对薄膜的成分和光学性质进行了研究。结果表明,随着沉积温度的增加,氧化锌薄膜内—OH含量降低,说明氧化锌薄膜生长过程中的化学反应更加完全;另外,沉积温度增加后,薄膜在365 nm处的激子发射峰出现了明显的增强,同时可见光区的荧光发射峰消失,表明薄膜内的缺陷态减少。随着成膜质量的提高,氧化锌薄膜的电子迁移率从25提高至32 cm2·(V·S)-1。椭偏测量的拟合结果表明,在375～800 nm的波长范围内,氧化锌薄膜的折射率逐渐从2.33降至1.9,呈现出明显的色散现象;另外,不同温度下制备的氧化锌薄膜光学带隙均为3.27 eV左右,这说明沉积温度对薄膜的带隙没有明显影响。     

六角锥状ZnO纳米结构的生长机理、结构及光学性能(英文)

利用醋酸锌[Zn(CH3COO)2·2H2O]和六次甲基四胺(C6H12N4)以一定比例配置成反应溶液,通过水热合成法制备了六角锥状ZnO纳米结构。同时,使用了扫描电子显微镜(SEM)、X射线衍射和选区电子衍射(SAED),对样品的形貌与结构进行了分析。结果表明,样品形貌成六角锥状结构,并且在[002]方向择优生长。通过对样品的光学性能测试,由PL光谱分析可知,样品在379nm处有一个较强的紫外发光峰,并且在可见光区域产生了一些较弱的可见光发射峰,表明制备的六角锥状ZnO纳米结构的晶体质量不是很好。除此之外,对六角锥状ZnO的生长机理也进行了讨论。     

Excellent UV absorption in spin-coated thin films of oleic acid modified zinc oxide nanorods embedded in Polyvinyl alcohol

The aim of the study is to investigate the optical properties of spin-coated, highly transparent nanocomposite films of oleic acid modified ZnO (Zinc oxide) nanorods embedded in Polyvinyl alcohol (PVA) matrix. Pristine and oleic acid (OA) modified ZnO nanorods have been prepared by wet chemical synthesis and are characterized by X-ray diffraction, FESEM, TEM and FT–IR spectroscopy techniques. The optical properties of ZnO/PVA films are studied using UV–visible absorption and Photoluminescence (PL) spectroscopy. The results show that the optical absorption of the films in the UV region is quite high and more than 95% absorption is observed in films prepared from OA modified ZnO nanorods. The excellent UV absorption at around 300 nm offers prospects of applications of these films as efficient UV filters in this wavelength region. The PL spectrum of pristine ZnO nanorods shows almost white light emission whereas OA modified ZnO nanorods have a more intense peak centered in the blue region. The PL emission of OA modified ZnO/PVA film shows appreciable increase in intensity compared to the film obtained with pristine ZnO. The surface modification of ZnO by the polymer matrix removes defect states within ZnO and facilitates sharp near band edge PL emission at 364 nm.     

Characterization and optical property of ZnO nano-, submicro- and microrods synthesized by hydrothermal method on a large-scale

In the present paper, well-dispersed ZnO nano-, submicro- and microrods with hexagonal structure were synthesized by a simple low temperature hydrothermal process from zinc nitrate hexahydrate without using any additional surfactant, organic solvent or catalytic agent. The phase and structural analysis were carried out by X-ray diffraction (XRD), the morphological analysis was carried out by field emission scanning electron microscopy (FESEM) and the optical property was characterized by room-temperature photoluminescence (PL) spectroscopy. The results revealed the high crystal quality of ZnO powder with hexagonal (wurtzite-type) crystal structure and the formation of well-dispersed ZnO nano-, submicro- and microrods with diameters of about 50, 200 and 500 nm, and lengths of 300 nm, 1 μm and 2 μm, respectively, on a large-scale just using the different temperatures. Room-temperature PL spectrum from the ZnO nanorods reveals a strong UV emission peak at about 360 nm and no green emission band at ∼530 nm. The strong UV photoluminescence indicates the good crystallization quality of the ZnO nanorods. Room-temperature PL spectra from the ZnO submicro- and microrods reveal a weak UV emission peak at ∼400 nm and a very strong visible green emission at 530 nm, that is ascribed to the transition between V_oZn_i and valence band.