稀土永磁薄膜材料

简要地介绍在纳米复合稀土永磁薄膜材料、各向异性稀土永磁薄膜材料方面的进展.在纳米复合稀土永磁薄膜材料中实现磁性交换耦合和剩磁增强效应,系统地研究了其结构与磁性的关系.制备成功高磁能积的各向异性稀土永磁薄膜材料,比较了Ti 或Mo 缓冲层对Nd-Fe-B薄膜的表面形貌、磁畴结构和磁性能的影响.发现薄膜的表面形貌强烈地依赖于缓冲层的厚度.由于它极大地影响薄膜的成分,溅射速率被证明是控制薄膜的显微结构、表面形貌和磁性能的一个重要因素.在微磁学模型的基础上,通过分析从5到300 K的矫顽力温度依赖关系.研究了各向异性Pr-Fe-B薄膜的矫顽力机制.在晶粒表面,由于磁各向异性的降低和局域退磁场的提高导致的反转畴的形核被确定为控制各向异性Pr-Fe-B薄膜的磁化反转过程的首要机制.     

磁性材料的磁结构、磁畴结构和拓扑磁结构

首先简要地介绍了磁性材料中磁结构、磁畴结构和拓扑磁结构以及相互之间的关系. 一方面, 磁畴结构由材料的磁结构、内禀磁性和微结构因素决定; 另一方面, 磁畴结构决定了材料磁化和退磁化过程以及技术磁性. 拓扑学与材料物理、材料性能的联系越来越紧密. 最近的研究兴趣集中在一些拓扑磁性组态, 如涡旋、磁泡、麦纫、斯格米子等. 研究发现这些拓扑磁结构的拓扑性质与磁性能密切相关. 然后从尺寸效应、缺陷、晶界三个方面介绍国际学术界在磁结构、磁畴结构和拓扑磁结构方面的进展. 最后介绍了在稀土永磁薄膜材料的微观结构、磁畴结构和磁性能关系、交换耦合纳米盘中的拓扑磁结构及其动力学行为方面的工作. 通过对文献的评述, 得到以下结论: 开展各向异性纳米复合稀土永磁材料的研究对更好地利用稀土资源具有重要的意义. 可以有目的地改变材料的微结构, 可控地进行磁性材料的磁畴工程, 最终获得优秀的磁性能. 拓扑学的概念正在应用于越来越多的学科领域, 在越来越多的材料中发现拓扑学的贡献. 研究磁畴结构、拓扑磁性基态或者激发态的形成规律以及动力学行为对理解量子拓扑相变以及其他与拓扑相关的物理效应是十分重要的. 也会帮助理解不同拓扑学态之间相互作用的物理机制及其与磁性能之间的关系, 同时拓展拓扑学在新型磁性材料中的应用.     

铁基纳米复合永磁材料的相成分与磁性

纳米复合永磁材料由于具有高剩磁，高磁能积，高矫顽力和相对低的稀土含量等优点而有可能成为新一代价格低谦粘结永磁体，文章介绍了纳米复合永磁材料的磁特性，着重讨论了Ｆｅ３Ｂ基纳米材料相成分与磁性的关系，并证明其永磁性并非来源于Ｎｄ２Ｆｅ１４Ｂ永磁相，最后介绍了纳米复合永磁材料的最新进展。     

Nd28Fe66B6/Fe50Co50双层纳米复合膜的结构和磁性

利用磁控溅射法制备了Nd28F66B6/Fe50Co50双层纳米复合磁性薄膜,研究了其结构和磁性.经873K退火处理15min后,利用x射线衍射仪测定薄膜晶体结构,采用俄歇电子能谱仪估算薄膜厚度和超导量子干涉仪测量其磁性.磁性测量表明,1)该系列薄膜具有垂直于膜面的磁各向异性.从起始磁化曲线和小回线的形状特征可知,矫顽力机制主要是由畴壁钉扎控制.2)对于固定厚度(10nm)层的硬磁相Nd-Fe-B和不同厚度(dFeCo=1-100nm)层软磁相FeCo双层纳米复合膜,剩磁随软磁相FeCo厚度的增加快速增加,而矫顽力则减少.当dFeCo=5nm时,最大磁能积达到160×103A/m.磁滞回线的单一硬磁相特征说明,硬磁相Nd-Fe-B层和软磁相FeCo层之间的相互作用使两相很好地耦合在一起.剩磁和磁能积的提高是由于两相磁性交换耦合所致.     

Nd28Fe66B6/Fe50Co50双层纳米复合膜的结构和磁性

利用磁控溅射法制备了Nd₂₈Fe₆₆B₆/Fe_{50Co50 双层纳米复合磁性薄膜，研究了其结构和磁性.经873K退火处理15min 后，利用x射线衍射仪测定薄膜晶体结构，采用俄歇电子能谱仪估算薄膜厚度和超导量子干 涉仪测量其磁性.磁性测量表明，1)该系列薄膜具有垂直于膜面的磁各向异性.从起始磁化曲 线和小回线的形状特征可知，矫顽力机制主要是由畴壁钉扎控制.2)对于固定厚度（10nm） 层的硬磁相Nd-Fe-B和不同厚度（dFeCo=1—100nm）层软磁相FeCo双层纳米复合 膜,剩磁随软磁相FeCo 厚度的增加快速增加，而矫顽力则减少.当dFeCo=5nm 时 ，最大磁能积达到160×１０^３A/m.磁滞回线的单一硬磁相特征说明，硬磁相Nd -Fe-B层和软磁相FeCo层之间的相互作用使两相很好地耦合在一起.剩磁和磁能积的提高是由 于两相磁性交换耦合所致. 关键词： Nd-Fe-B/FeCo双层纳米复合膜 交换耦合 磁性增强}     

纳米复合永磁材料的有效各向异性与矫顽力

研究了纳米Nd2Fe14B/α-Fe复合永磁材料中晶粒交换耦合相互作用对有效各向异性的影响和变化规律.结果表明：晶粒之间的交换耦合作用使材料的有效各向异性Keff随晶粒尺寸的减小而下降、随软磁性相成分的增加而降低. 当晶粒尺寸 减小到4nm时，Keff值减小为其各自通常各向异性常数值的1/3—1/4.有效各向异性的变化特点与矫顽力的变化规律基本相同.纳米复合永磁材料矫顽力的降低主要由于有效各向异性的减小而引起. 关键词： 纳米复合永磁材料 交换耦合相互作用 有效各向异性 矫顽力     

纳米复合永磁材料中软磁性相交换硬化的研究

本文就纳米复合永磁材料中软磁相被交换硬化问题,从一维模型和三维模拟计算进行了分析研究. 一维和三维各向异性样品研究表明,在相同微结构下,当硬磁相的各向异性降低时,除矫顽力降低外,在磁矩全部反转之前退磁曲线是一样的. 因此,硬磁相各向异性的降低不会导致最大磁能积(BH)_max增大和剩磁增加. 对于三维各向同性样品的模拟计算表明,降低硬磁相的各向异性会使剩磁和(BH)_max都明显降低. 因此,增强硬磁相的各向异性并增大硬磁相晶粒尺寸是提高 关键词： 纳米复合永磁 矫顽力 剩磁 磁能积     

永磁学进展

回顾了３０年来永磁材料的发展。细长单畴微粉的开发，令人扫兴。铝镍钴的发展，已到顶峰，很难利用形状各向异性发展更高性能永磁材料。人们的注意力转到具有高磁晶各向异性的稀土－过渡族化合物，因而涌现三代稀土永磁，而且还在发展中，讨论了所需内秉磁性以及为获得高永磁性而必须创造的条件。最后介绍了新近提出的交换耦合复合永磁。     

Nd-Ce-Fe-B纳米复合薄膜的磁性及交换耦合作用

采用磁控溅射技术制备了具有永磁特征的Nd-Ce-Fe-B多层纳米复合薄膜,并对其进行了退火处理.通过改变退火温度,研究其对薄膜磁性能和晶体结构的影响.结果表明,随着退火温度的提高薄膜磁性能逐渐增大,但当温度达到695℃以上时,薄膜的磁性能急剧下降.当退火温度为675℃时,薄膜的矫顽力Hci=10.1 kOe(1Oe=79.5775 A/m),垂直于薄膜表面方向的剩余磁化强度4πM_(r⊥)=5.91 kG(1 G=10~3/(4π)A/m).薄膜的X射线衍射结果表明,磁性薄膜具有较好的c轴取向.通过对薄膜磁化反转过程的研究,发现随着外加磁场的增大,M_(rev)的极小值向M_(irr)减小的方向移动,这与畴壁弯曲模型类似,表明在薄膜中存在较强烈的局部钉扎作用,而剩余磁化强度曲线表明这种钉扎作用在薄膜矫顽力机制中并不占支配作用.此外,薄膜的Henkel曲线结果表明在薄膜中存在较强的交换耦合作用,在经过685℃退火的薄膜中磁相互作用更加显著.     

相分布和晶粒尺寸对Nd2Fe14B/ɑ-Fe纳米复合永磁材料矫顽力的影响

本文采用统计平均方法研究了软、硬磁性晶粒尺寸及相分布对Nd2Fe14B/α-Fe纳米复合永磁材料矫顽力的影响。计算结果表明：对于单相纳米硬磁材料，磁体矫顽力随着硬磁性晶粒尺寸的减小而降低；对于软、硬两磁性相组成的Nd2Fe14B/a-Fe纳米复合永磁材料，两相的随机分布将导致磁体矫顽力随硬磁性晶粒尺寸的减小呈现极大值。本文的计算结果还表明当硬磁性晶粒尺寸大于软磁性晶粒的最佳尺寸时(15nm)，具有多层膜结构的Nd2Fe14B/a-Fe纳米复合永磁材料将比两相随机分布时具有更大的矫顽力。     

外加磁场对磁控溅射制备氮化硅陷光薄膜的影响

在基底与靶材之间放置磁性强弱不同的永久磁铁来研究外加磁 场对磁控溅射制备氮化硅陷光薄膜的影响. 通过X射线衍射、原子力显微镜 (AFM) 以及紫外分光光度计分别测试了外加磁场前后所制备薄膜的组织结构、表面形貌和光学性能. 结果表明, 外加磁场后, 氮化硅薄膜依然呈现非晶结构; 但是表面形貌发生明显改变, 中心磁场1.50 T下, 薄膜表面为特殊锥状尖峰结构"类金字塔"的突起, 而且这些突起颗粒垂直于基底表面; 在 可见光及近红外范围内, 中心磁场1.50 T 下的薄膜样品平均透射率最大, 平均透射率达到90% 以上, 比未加磁场的样品提高了近1 倍, 具有很好的陷光特性. 关键词： 外加磁场 磁控溅射 氮化硅薄膜 陷光效应     

Effect of nanoparticle size on magnetic damping parameter in Co92Zr8 soft magnetic films

Co₉₂Zr₈(50 nm)/Ag(x) soft magnetic films have been prepared on Si (111) substrates by oblique sputtering at 45°. Nanoparticle size of Co₉₂Zr₈ soft magnetic films can be tuned by thickening Ag buffer layer from 9 nm to 96 nm. The static and dynamic magnetic properties show great dependence on Ag buffer layer thickness. The coercivity and effective damping parameter of Co₉₂Zr₈ films increase with thickening Ag buffer layer. The intrinsic and extrinsic parts of damping were extracted from the effective damping parameter. For x=96 nm film, the extrinsic damping parameter is 0.028, which is significantly larger than 0.004 for x=9 nm film. The origin of the enhancement of extrinsic damping can be explained by increased inhomogeneity of anisotropy. Therefore, it is an effective method to tailor magnetic damping parameter of thin magnetic films, which is desirable for high frequency application.     

Magnetic properties and characterization of CoCrM/TiCr/Si films produced by pulsed laser deposition

A series of nanogranular CoCrM/TiCr thin films have been fabricated by pulsed-laser deposition on Si(1 1 1) substrates at 450–500 °C. The crystal structure and magnetic properties of these films were investigated. The transmission electron microscope images with selected area diffraction and X-ray diffraction showed that the structure of as-prepared films is dependent on laser energy and deposition temperature. It was found that the microstructure of CoCrM/TiCr films consisted of fine dispersive crystal grains, while the preferential c-axis orientation of films deteriorated when the thickness of CoCr-alloy layer increased along with metal doping into the CoCr films. The magnetic properties of CoCrM/TiCr films formed on Si are strongly dependent on the thickness of magnetic layer, grain structure, and grain shape. Enhancement of coercivity and squareness of the laser-deposited film is probably due to the improvement in the magnetocrystalline anisotropy energy and the reduction in the thickness of magnetic layer.     

Effect of film morphology on the magnetic properties for Nd-Fe-B thin films

The microstructure and magnetic properties of Nd-Fe-B thin films with a particulate structure were investigated. The nominal thickness of the Nd-Fe-B layer (t_N) was varied from 2 to 50 nm on a (0 0 1) Mo buffer layer. The films were grown with their c-axis perpendicular to the plane, and the morphology of the film with t_N=2 nm was shown to be particulate from an atomic force microscope image. The slope of the initial magnetization curve became steeper by increasing the t_N value in the initial magnetization curve, indicating that the film morphology composed of single domain particles changed to that of multi-domain particles with growth. The film with t_N=8 nm, which had a structure consisting of a mixture of single and multiple domain particles, showed the maximum value of the coercivity measured in the direction perpendicular to the film plane (H_c) as 19.5 kOe.     

Effect of CoSi2 buffer layer on structure and magnetic properties of Co films grown on Si（001） substrate

Buffer layer provides an opportunity to enhance the quality of ultrathin magnetic films.In this paper,Co films with different thickness of Co Si2buffer layers were grown on Si(001)substrates.In order to investigate morphology,structure,and magnetic properties of films,scanning tunneling microscope(STM),low energy electron diffraction(LEED),high resolution transmission electron microscopy(HRTEM),and surface magneto-optical Kerr effect(SMOKE)were used.The results show that the crystal quality and magnetic anisotropies of the Co films are strongly affected by the thickness of Co Si2buffer layers.Few Co Si2monolayers can prevent the interdiffusion of Si substrate and Co film and enhance the Co film quality.Furthermore,the in-plane magnetic anisotropy of Co film with optimal buffer layer shows four-fold symmetry and exhibits the two-jumps of magnetization reversal process,which is the typical phenomenon in cubic(001)films.     

Effects of underlayer materials and substrate temperatures on the structural and magnetic properties of Nd2Fe14B films

Thin films of Nd_2Fe_{14}B were fabricated on heated glass substrates by dc magnetron sputtering. Different material underlayers (Ta, Mo, or W) were used to examine the underlayer influence on the structural and magnetic properties of the NdFeB films. Deposited on a Ta buffer layer at 420℃, the 300 nm thick NdFeB films were shown to be isotropic. But when the substrate temperature T_s was elevated to 520℃, the Nd_2Fe_{14}B crystallites of (00l) plane were epitaxially grown on Ta (110) underlayer. In contrast, Mo (110) buffer layer could not induce any preferential orientation in NdFeB film irrespective of the substrate temperature or film thickness. The W buffer layer was found to be most effective for the nucleation of Nd_2Fe_{14}B crystallites with c-axis alignment perpendicular to the film plane when T_s<490℃. But at T_s=490℃ the magnetic layer became isotropic. The maximum coercivity obtained was about 995 kA/m for the 100nm film deposited on W underlayer at 490℃. These variations were tentatively explained in terms of the lattice misfit between the underlayer and the magnetic layer, combined with the considerations of underlayer morphologies.     

Thickness induced magnetic anisotropic properties of Tb-Fe-Co thin films

The influence of Tb₂₅Fe₆₁Co₁₄ thin film thicknesses varying from 2 to 300 nm on the structural and magnetic properties has been systematically investigated by using of X-ray diffraction, scanning electron microscopy, transmission electron microscopy, magnetization, and magneto-optic Kerr effect microscopy measurements. Thin film growth mechanism is pursued and controlled by ex-situ X-ray refractometry measurements. X-ray diffraction studies reveal that the Tb₂₅Fe₆₁Co₁₄ films are amorphous regardless of thin films thicknesses. The magnetic properties are found to be strongly related to thickness and preferred orientation. With an increase in film thickness, the easy axis of magnetization is reversed from in-plane to out-of-plane direction. The change in the easy axes direction also affects the remanence, coercivity and magnetic anisotropy values. The cause for the magnetic anisotropy direction change from in-plane to out-of-plane can be related to the preferred orientation of the thin film which depends on the large out-of-plane coercivity and plays an important role in deciding the easy axes direction of the films. According to our results, up to the 100 nm in-plane direction is dominated over the whole system under major Fe-Fe interaction region, after that point, the magnetic anisotropy direction change to the out-of-plane under major Tb-Fe/Tb-Co interaction region and preferred orientation dependent perpendicular magnetic anisotropic properties become more dominated with 2.7 kOe high coercive field values.     

Magnetic anisotropy properties of CoZrNb thin films deposited on PET substrate by magnetron sputtering

Soft magnetism and magnetic anisotropy properties of CoZrNb thin films deposited on polyethylene terephthalate (PET) substrate by magnetron sputtering were investigated. As the film thickness increases, the coercivity of films decreases from 7 to 4 Oe. It exhibits an in-plane uniaxial magnetic anisotropy as the thickness of CoZrNb thin films increases. An easy axis is observed in CoZrNb films along the direction transverse to the rolling direction of the polymer web.     

各向同性纳米结构Fe-Pt薄膜的结构和磁性

采用直流溅射和热处理技术制备了两个各向同性的纳米结构Fe-Pt永磁合金薄膜系列,并研究了它们的结构和磁性.研究表明,在富Fe双相纳米结构Fe-Pt永磁合金薄膜中,仅由硬磁的FePt相与软磁的Fe₃Pt相组成;在同一系列中,随Fe层厚度的增加,饱和磁极化强度和剩磁明显增大.由Kelly-Henkel图研究指出,在上述Fe-Pt纳米结构永磁合金薄膜中,磁相互作用主要由近邻纳米晶粒间的铁磁交换相互作用控制. 关键词： 磁性薄膜 纳米结构 矫顽力