高质量全息光栅的制作

全息光栅由感光版记录高斯光束干涉条纹制得 ,干涉条纹的不等宽性降低了光栅品质。制取高质量全息光栅的关键是要用均匀平面波作光源。在分析干涉区内光强分布的基础上 ,给出了制作等周期正弦全息光栅的两种方法 :限制曝光区大小的方法和高斯光束强度均匀化的方法。     

全息光栅干涉条纹三维锁定系统的设计

全息曝光系统中干涉条纹的稳定性直接影响光栅掩模质量。研究了参考干涉条纹的特性,提出一种光栅相位、倾斜度和周期的检测方法。为提高光栅曝光系统的稳定性,设计了一套全息光栅干涉条纹三维锁定系统。利用摄像机对参考干涉条纹进行检测,利用微电机和压电陶瓷对光路进行微调,可实现对光栅相位、倾斜度和周期的有效控制。实验结果表明,三维锁定系统可有效提高干涉条纹的稳定性,缩短光栅曝光前的静台稳定时间,提高光栅曝光对比度,可为大口径全息光栅曝光质量的提高提供技术支持。     

基于菲涅耳双棱镜分波前干涉装置的全息光栅制作实验

不同于传统全息光栅制作教学实验中的分振幅干涉光路,提出了利用准平行相干光源照射菲涅耳双棱镜实现分波前干涉制作全息光栅的方法.利用菲涅耳双棱镜分波前光路分别演示了单个双棱镜制作一维全息光栅和2个棱脊正交菲涅耳双棱镜制作二维全息光栅.实验过程中可通过多种方法对干涉条纹间距和光栅常量进行估算,丰富了干涉实验内容和光栅制作实验内容.     

平面全息光栅刻线密度的倍频式调整方法

刻线密度准确与否直接影响光栅色散及给定波长的衍射方向,进而影响光谱仪器结构设计.为了提高全息光栅刻线密度的制作精度,提出了平面全息光栅刻线密度的倍频式调整方法.将给定刻线密度的基准光栅放在干涉场曝光区域内,调节光束干涉角,干涉场曝光光束经基准光栅衍射后,根据调整光栅刻线密度的不同选择不同的衍射级次相互叠加形成莫尔条纹,...     

平行光束入射双棱镜的干涉研究

本文理论推导出了两相干平行光束在交叉区域的干涉条纹计算公式,测量两相干平行光束的夹角和干涉条纹的间距可以得到入射光波波长的结论.利用多光束光纤激光器作为光源,在分光计上放置双棱镜获得两相干平行光束进行实验.结合电荷耦合器件(CCD)和液晶显示器,用望远镜的自准直目镜测量两相干平行光束的夹角,用测微目镜测量干涉条纹的间距.提高了实验数据的精确度,降低了实验的难度,实现了对传统双棱镜干涉实验的拓展创新.     

用于透明平板平行度和均匀性测量的单元件干涉仪

提出了一种基于单元件干涉的用于检测透明介质平整度和均匀性的干涉仪.该干涉仪的核心元件是一个菱形分光棱镜.激光光源的平面波光束的一半光束透过待测样品,另一半光束直接透过空气,然后分别入射到菱形分光棱镜的两垂直面并在分光面相遇、相干.通过旋转待测样品改变相干的两束光光程差,从而使干涉条纹发生移动.形成的相干光被分光板分成两束,一束进入光电探测器用于探测干涉条纹移动数的整数部分,另一束则进入电荷耦合探测器用于采集干涉条纹图来计算干涉条纹移动数的小数部分.通过计算条纹移动数反推出光程差的变化量,再结合折射率或样品厚度信息则可以计算出样品厚度或折射率的分布,从而检测出透明介质的平行度和均匀性.模拟仿真和光学实验均证明了本方法的可行性、准确性和稳定性.     

部分相干同步辐射照射下光栅分数塔尔博特效应

基于高斯谢尔光束的相干模式分解理论和波动光学,建立了部分相干同步辐射硬X射线光束通过光学器件的传播模型。模拟了微聚焦X射线光束照射下光栅的分数塔尔博特效应,得到了聚焦光束的光强分布和相干特性变化,并分析了散焦光束入射下的光栅自成像。然后通过模拟准直光束入射下的光栅塔尔博特效应,得到了不同传播距离处自成像条纹的变化情况,分析了影响光栅自成像条纹形状的因素。通过光栅衍射条纹测量同步辐射相干度,发现对矩形相位光栅来说,应该对衍射图样进行傅里叶分解,求出各级傅里叶系数随传播距离的变化曲线,从而得到入射光束相干特性。     

利用马赫-曾德干涉光路制作二维全息光栅

全息光栅是一种重要的分光元件,而全息光栅的制作实验也是目前国内很多高校开设的一个综合性设计性实验。利用马赫-曾德干涉光路进行全息光栅的制作。通过改变全息记录光束的夹角以及旋转全息干板进行多次曝光的方式,制作了具有不同光栅常数的二维全息光栅结构。通过光栅衍射光斑,可以验证各种二维光栅结构的存在。     

一种制作投影灰度正弦光栅的新方法

针对传统方法难以制作结构光三维投影测量设备的灰度正弦光栅元件,并以Ronchi光栅代替从而影响测量准确度,提出了一种制作灰度按正弦分布的光栅模板的新方法.通过对银盐全息干板透过率特性曲线的理论分析,指出在对比度为一的正弦干涉条纹下曝光不能得到线性记录和变换的原因,并提出了采用均匀非相干光预曝光提供偏置点来实现线性记录的新方法.实验表明,采用空间滤波法能够获得对称双光束正弦干涉条纹记录,并准确控制正弦干涉条纹曝光在干板的线性区域,可以达到线性记录并获得尽可能高的反衬度.     

一种制作投影灰度正弦光栅的新方法

针对传统方法难以制作结构光三维投影测量设备的灰度正弦光栅元件,并以Ronchi光栅代替从而影响测量准确度,提出了一种制作灰度按正弦分布的光栅模板的新方法.通过对银盐全息干板透过率特性曲线的理论分析,指出在对比度为一的正弦干涉条纹下曝光不能得到线性记录和变换的原因,并提出了采用均匀非相干光预曝光提供偏置点来实现线性记录的新方法.实验表明,采用空间滤波法能够获得对称双光束正弦干涉条纹记录,并准确控制正弦干涉条纹曝光在干板的线性区域,可以达到线性记录并获得尽可能高的反衬度.     

基于单一分光棱镜干涉仪的双通路定量相位显微术

仅仅使用一个单独的分光棱镜(BS),实现了一种用于生物细胞三维成像的双通路定量相位显微术.不同于传统的使用方法,将BS倾斜放置,使中央半反射层与入射光光轴之间存在一个非常小的角度.这样基于BS的分光特性,经过BS后的透射光束和反射光束将会叠加在一起并形成干涉.调节样品位置,利用相机拍摄同时获得了存在π相移的双通路干涉图.这种离轴干涉模式,只需要记录单幅干涉图就可以获得真实的相位信息,方法结构简单,易于操作,适用于微小透明样品的三维形貌测量.     

干涉条纹相位锁定系统分析及其控制

干涉条纹的相位变化与干涉条纹中某一固定点的光强密切相关,基于这一原理,通过对干涉场光强分析,提出并设计了一种用于干涉条纹相位锁定的控制系统.光电探测器检测干涉条纹中固定目标点的光强,并以该光强电压作为反馈控制信号,利用声光调制器对干涉系统中两束高斯光束中的一束进行实时频率调制,将光强电压控制在一个固定值,实现干涉条纹的相位锁定.构建了条纹锁定控制系统控制对象的理论模型,通过实验进行了验证,并基于该模型的特点设计了条纹锁定控制器.实验结果表明:在400Hz的控制频率下,干涉条纹相位漂移不超过±0.04个条纹周期,满足干涉光刻的曝光需求.     

Digital moiré fringe measurement method for alignment in imprint lithography

Accurate layer-to-layer alignment, which is of prime importance for the fabrication of multilayer nanostructures in integrated circuits, is one of the main obstacles for imprint lithography. Current alignment measurement techniques commonly involve an image detection process for coarse alignment followed by a grating interference process for fine alignment. Though this kind of two-level alignment system is reasonable for measurement, when it is used in real imprint lithography, it is inconvenient because of the existence of a complex loading system that needs space for alignment. In this study, we propose a fine alignment method using only image detection using grating images and digital moiré fringe technology. In this method, though the gratings are also selected as alignment marks for accurate measurement, they do not interfere with the physics. The grating images captured from the template and wafer are used to measure angular displacement and to form parallel digital moiré fringes. The relative linear displacement between the template and wafer is determined by detecting the spatial phase of parallel digital moiré fringes. Owing to the magnification effect of digital moiré fringes, this method is capable of generating accurate measurements. According to the experimental results, this digital moiré fringe technique is accurate to less than 10 nm. In addition, without a complex grating interference system, this method has the advantage of being easy to operate.     

改变写入Bragg波长的干涉条纹运动的扫描式Talbot干涉仪

一种干涉条纹运动的扫描式Talbot干涉仪被用于改变光纤Bragg光栅的写入Bragg波长。在系统中,光纤光栅是由来自相位掩模的±1级衍射光经平面镜反射后在远场形成紫外干涉条纹写入的,其中,相位掩模被用作±1级衍射光的分束器。值得注意的是通过干涉条纹的运动来扫描写入光纤光栅,有效降低了Talbot干涉仪对写入光源相干性的要求。     

Reducing the stray light of holographic gratings by shifting the substrate a short distance in the direction parallel or perpendicular to the exposure interference fringes

This research proposes a simple and practical method to make low-stray-light gratings, where the substrate shifts about a 1 mm distance in the direction parallel or perpendicular to the exposure interference fringes. When the substrate shifts, a reference grating next to the substrate is used to adjust in real time the phase of the exposure interference fringes relative to the substrate. Shifting eliminates the exposure defects and therefore decreases the stray light of gratings. Several gratings are successfully made by using this method, which have straighter grooves,smoother surfaces, and lower stray light than gratings made in conventional interference lithography.     

Single-element interferometer

A very simple and stable interferometer using a single optical element - a beam-splitter cube - is presented. The device resembles a two-arm interferometer in which the arms are together in one collimated beam, and the two beam halves interfere with the help of the beam-splitter cube. The proposed device produces simultaneously two interferograms with a relative phase-shift of π (rad). Since the period of straight interference fringes can be stably controlled, the device has potential application in spatial-carrier interferometry and for flexible writing of fiber Bragg gratings.     

Phase shifting SEM moiré method

A new phase shifting scanning electron microscope (SEM) moiré method is proposed in this paper. The phase shifting technique is realized in four steps from 0 to 2π by shifting electron beam in the y-axis direction controlled by the SEM system. It is successfully applied to determine the residual strain of a deformed holographic grating with a frequency of 1200 lines/mm in an electronic package. As a further application, it is used to measure the virtual strain of a MEMS structure with a 5000-line/mm grating and to determine the phase distribution of a SEM moiré formed with a 6000-line/mm grating fabricated by electron beam lithography. The experiments show the feasibility of this method. It provides a new way for disposal of fringes pattern in sub-micro moiré method.     

Shape identification using phase shifting interferometry and liquid-crystal phase modulator

A phase shifting technique using a Michelson interferometry system is presented and applied to surface contour measurement. Hyperbolic fringes are produced by the interference of two spherical wavefronts expanded from a beam expander. The fringe pattern is projected on an object surface and the deformed grating image is captured by a CCD camera for subsequent analysis by a PC. Phase variation is achieved by a liquid-crystal device incorporated in the Michelson interferometry system. Results obtained using the proposed method for objects of various shapes and sizes compared well with those from a conventional profilometer.     

Identifying a dot-matrix hologram with the fringe-overlapping phenomena of grating dots

Dot-matrix holograms created by two-beam writers contain many grating dots. Because the phase difference between two laser beams for interference cannot be controlled accurately, the fringe positions of grating dots are randomly determined. Therefore, fringe positions are a good kind of tool to identify dot-matrix holograms. In this paper, a number difference between two special fringes of a target grating dot is used to identify a dot-matrix hologram. The two special fringes are determined by three grating dots with parallel fringes. The first special fringe is corresponding to a fringe pair with the best matching for the fringes of the target grating dot and the fringes of the second grating dot. The second special fringe is corresponding to a fringe pair with the best matching for the fringes of the target grating dot and the fringes of the third grating dot. An experiment has proved the proposed method practical and feasible. Because reproducing a grating dot with a specified fringe number difference is difficult, the proposed method is excellent for anti-counterfeiting.     

Dynamic generation of plasmonic Moiré fringes using phase-engineered optical vortex beam

Dynamic generation of plasmonic Moiré fringes using a phase engineered optical vortex (OV) beam is experimentally demonstrated. Owing to the unique helical phase carried by an OV beam, the initial phase of surface plasmon polaritons (SPPs) emanating from a metallic grating can be adjusted dynamically by changing the phase hologram displayed on a spatial light modulator. Plasmonic Moiré fringes are readily achieved by overlapping two SPP standing waves with certain angular misalignment, excited by the positive and negative topological charge components, respectively, of a cogwheel-like OV beam. The near-field scanning optical microscopy measurement result of SPP distributions has shown a good agreement with the numerical predictions.