弱散射屏的像面散斑自相关函数特性的实验研究

在对随机弱散射屏进行表面参数的原子力显微镜测量和建立了门积分取样平均的随机光强自相关函数测量系统的基础上,对弱散射屏在严格像面和离焦像面上产生的散斑自相关函数进行了测量。发现在严格像面上,散斑平均颗粒的大小随表面粗糙度增加而减小,且光强自相关函数次极大的相关间隔宽度随粗糙度增加而减小;而次极大的超伏随粗糙度的增大而增大;在离焦像面上,离焦量的增加使光强的自相关函数下降变得平滑,并使极小值点和次极大点变得不明显或者消失。     

粗糙波面中心点亮度比像质评价准则

建立了兼含粗糙与波面像差影响的中心点亮度比公式及其像质评价准则，根据粗糙波面中心点亮度比的大小，把像质标准划分为“极佳”“良好”和“不理想”等三个等级，粗糙度公差范围为λ／２０～λ／８０。     

锥柱复合目标激光距离多普勒像分析模型

激光距离多普勒成像技术在航天和国防应用领域受到极大的关注.文章建立了锥柱复合目标的激光距离多普勒像分析模型,包括底面的贡献.该模型能分析锥柱复合目标的几何参量、表面粗糙度、姿态、角速度和脉冲宽度等因素对激光距离多普勒像的影响,并能退化到圆柱和圆锥的激光距离多普勒像分析模型,也能退化到平面波下的多普勒谱分析模型.分析了几何参量和姿态对距离多普勒像的影响.计算结果表明,锥柱复合目标距离多普勒像能体现出目标的几何形状和姿态信息.理论和测量相结合,该分析模型能用来进行圆柱、圆锥及锥柱复合目标物理和几何参量的识别,其解析表达式对于多普勒速度计和激光雷达应用有着重要的意义.     

基于激光散斑成像的零件表面粗糙度建模

表面粗糙度是衡量机械表面加工水平的重要参数. 通过构建一套激光散斑成像采集系统, 获取了不同表面加工类型和不同粗糙度值的零件表面激光散斑图像. 应用Tamura纹理特征理论提取图像的纹理粗糙度、对比度、方向度特征, 并分析了这三个特征与表面粗糙度的关系. 发现了纹理粗糙度特征与表面粗糙度的单调关系, 推导出平磨、外磨、研磨三种表面加工工艺的粗糙度值与图像纹理粗糙度特征的数学函数关系, 实现了表面粗糙度的测量. 同时, 利用Tamura纹理特征与加工工艺的依赖关系, 建立了基于贝叶斯网络的工艺识别推理模型, 推理出了零件表面加工工艺. 通过为多种加工类型表面建立粗糙度测量模型, 为粗糙度测量提供了新思路. 实验证明所提的粗糙度测量模型能以较高的准确率识别出零件表面加工类型并测量出其表面粗糙度值.     

衍射元件表面粗糙度对衍射效率的影响

基于多层衍射光学元件的位相延迟表达式,提出了单点金刚石车削影响下的多层衍射光学元件衍射效率和带宽积分平均衍射效率的数学模型,并给出了相应的分析表达式.以基底材料分别是硒化锌和硫化锌构成的多层衍射光学元件在近红外波段(1.4~2.5m)的应用为例进行分析.结果表明表面粗糙度会导致多层衍射光学元件衍射效率和带宽积分平均衍射效率的明显降低,从而降低了混合成像光学系统的成像质量.因此,单点金刚石车削衍射元件时,要根据使用需求制定合理的表面粗糙度加工误差.     

变孔径像面散斑平均光强标定随机表面的理论与实验

采用随机表面的高斯相关模型和统计光学原理,推导出弱散射体在4f系统中的像面上光强的表达式.在此基础上提出了均方偏差粗糙度和横向相关长度的标定方法,该方法用理论结果对实验测量的像面散斑平均光强随滤波孔半径的关系曲线进行拟合,同时测量出被测样品表面的两个统计量.实验上制作了高斯相关随机表面样品,对其表面参数进行了测量,与AFM所测结果符合得较好,这表明该方法具有较高的精度. 关键词： 弱散射体 像面散斑 平均光强     

粗糙表面涂覆目标的太赫兹波散射特性研究

对具有涂覆层目标的太赫兹波段粗糙表面的散射特性进行了研究. 考虑到表面粗糙度的影响, 可先对反射系数进行修正, 再利用反射系数对等效电磁流进行修正, 得到粗糙涂覆表面的等效电磁流, 然后在物理光学方程的基础上得到粗糙表面涂覆目标的雷达散射截面; 最后进行图形电磁学可视化计算, 并采用Visual C++对模型进行OpenGL显示, 提取像素面元的有效信息对所得理论进行了仿真分析, 研究了不同入射角度、不同频率、不同介质、不同粗糙度和不同涂层厚度下的太赫兹波电磁散射特性, 得到了一些有参考价值的结论.     

粗糙平板微通道流动和传热的数值模拟

以粗糙平行平板微通道为研究对象,以三角形锯齿状粗糙元模拟固体表面的粗糙度,采用CFD流体固体共轭传热技术数值研究了绝对粗糙度和相对粗糙度对平行平板微通道流动和传热特性的影响,着重分析了粗糙度和流体速度对水力入口段长度和热力入口段长度的影响规律,同时研究了相对粗糙度对微通道转捩雷诺数的影响,为进一步揭示微微通道的流动和传热机理提供了依据.     

基于偏振摄影技术和MATLAB实现对物体表面粗糙度的检测

本文将偏振摄影技术与Matlab结合实现了对物体表面粗糙度的检测.对照片进行镜面反射和漫反射的分离,当表面粗糙度增大时,经过特定光学器具后镜面反射与漫反射的减少量的比值降低,从而实现对物体表面粗糙度的检测.通过实验得到了样本的粗糙度,并对其可靠性进行了检测,确认了该项技术的可行性.对应于整体的粗糙度和小面积的破损程度可以通过改变数据处理区域大小来实现,较大区域的截取能够体现整体的粗糙度,较小的区域能够检测破损的程度.     

非均匀地表空气动力学有效粗糙度的统计特征

利用基于大气边界层Monin-Obukhov相似理论、通量守恒和质量守恒原理设计的非均匀地表空气动力学有效粗糙度计算方案, 研究了3种不同地表类型情况下有效粗糙度的统计特征, 并分析了大气层结稳定度和粗糙变率对有效粗糙度的影响. 结果表明, 有效粗糙度总是大于面积加权平均粗糙度, 大部分情况下有效拖曳系数比平均拖曳系数大10%以上; 有效粗糙度虽然和大气层结稳定度有关, 但对粗糙变率更敏感, 粗糙变率加倍将使有效粗糙度相对变化百分比达到加倍前的4倍, 有效拖曳系数相对变化百分比达到加倍前的3倍. 因此, 非均匀下垫面的数值模式中, 不能简单地采用面积加权平均粗糙度, 需要采用能表示下垫面非均匀性综合效应的有效粗糙度. 关键词： 非均匀性 有效粗糙度 粗糙变率 层结稳定度     

Investigation of interface roughness cross-correlation properties of optical thin films from total scattering losses

The interface roughness and interface roughness cross-correlation properties affect the scattering losses of high-quality optical thin films. In this paper, the theoretical models of light scattering induced by surface and interface roughness of optical thin films are concisely presented. Furthermore, influence of interface roughness cross-correlation properties to light scattering is analyzed by total scattering losses. Moreover, single-layer TiO₂ thin film thickness, substrate roughness of K9 glass and ion beam assisted deposition (IBAD) technique effect on interface roughness cross-correlation properties are studied by experiments, respectively. A 17-layer dielectric quarter-wave high reflection multilayer is analyzed by total scattering losses. The results show that the interface roughness cross-correlation properties depend on TiO₂ thin film thickness, substrate roughness and deposition technique. The interface roughness cross-correlation properties decrease with the increase of film thickness or the decrease of substrates roughness. Furthermore, ion beam assisted deposition technique can increase the interface roughness cross-correlation properties of optical thin films. The measured total scattering losses of 17-layer dielectric quarter-wave high reflection multilayer deposited with IBAD indicate that completely correlated interface model can be observed, when substrate roughness is about 2.84 nm.     

二氧化锆薄膜表面粗糙度的研究

采用电子束蒸发工艺,利用泰勒霍普森相关相干表面轮廓粗糙度仪,研究了不同基底粗糙度、不同二氧化锆薄膜厚度以及不同的离子束辅助能量下所沉积的二氧化锆薄膜的表面粗糙度。结果表明：随着基底表面粗糙度的增加,二氧化锆薄膜表面粗糙度呈现出先缓慢增加,当基底的粗糙度大于10nm后呈现快速增加的趋势;随着二氧化锆薄膜厚度的增加,其表面均方根粗糙度（RMS）先减小后增大;随着辅助沉积离子能量的增加,其表面粗糙度呈现出先减小后增加的趋势。     

Measurements of roughness noise

Experiments have been performed on the roughness noise produced by a two-dimensional turbulent wall jet boundary layer flowing over short fetches of sandpaper roughness. A range of rough surface sizes were studied from hydrodynamically smooth through fully rough. Velocity measurements were made to document the form of the wall jet boundary layer and the influence of the roughness upon it. Acoustic measurements showed background noise levels to be very low so that the sound produced by the rough surfaces could be clearly detected with signal to noise ratios as large as 20 dB. Even hydrodynamically smooth roughness was found to produce noise, conclusively indicating the presence of scattering as a source mechanism. Variations of the roughness noise spectra with flow speed and roughness size are found to be inconsistent with any simple parameter scaling. Boundary layer wall pressure fluctuation measurements made within the roughness fetches reveal a spectral form quite different than the roughness noise, and fluctuation levels some 50-70 dB higher. Despite these differences the wall pressure and roughness noise are found to be very simply related, at least at lower frequencies (<6 kHz). The roughness noise spectrum varies closely as the product of the wall pressure spectrum, the frequency squared, and the mean-square roughness height. This is the scaling predicted by scattering theory and implies a major simplification to the problem of roughness noise prediction for stochastic surfaces.     

Application of an acoustic backscatter technique for characterizing the roughness of porous soil

An acoustic backscatter technique proposed by Oelze et al. [J. Acoust. Soc. Am. 109, 1826-1832 (2001)] was used to characterize the roughness of porous soil surfaces. Roughness estimation errors are minimized when the effective flow resistivity of the porous soil is high, e.g., above 300,000 mks Rayls/m. Four soil plots were constructed by roughening soil with farming implements. Three plots were sealed using Saran powder dissolved in methyl ethyl ketone (MEK) and then covered to prevent further weathering. A fourth plot was left in the open and exposed to rainfall, which also acted to seal the surface and further change the roughness. In sealing the surface the effective flow resistivity of the surface was increased above 300,000 mks Rayls/m, which is typical for weathered agricultural surfaces. The roughness power spectra of the soil surfaces were measured by acoustic backscatter and alternatively by a laser profiler. Regression analysis was used to approximate each roughness power spectrum versus roughness wave number with a best-fit line. The best-fit line was used to calculate the rms height and the correlation length of the rough surface by integrating the approximate roughness power spectrum over a range of roughness wave number values. The range of roughness wave number values defines the roughness length scales used in the statistical calculations. High-roughness wave numbers correspond to smaller length scales of roughness and low-roughness wave numbers correspond to larger length scales of roughness. Over certain ranges of roughness wave number values the statistics from the acoustic backscatter and laser profiler measurements is in good agreement. However, as the low-cutoff roughness wave number is decreased and the high-cutoff roughness wave number is increased, agreement between the laser and acoustic techniques diminishes.     

二氧化钛薄膜表面粗糙度研究

为了探究二氧化钛(TiO₂)薄膜表面粗糙度的影响因素, 利用离子束辅助沉积电子束热蒸发技术对不同基底粗糙度以及相同基底粗糙度的K9玻璃完成二氧化钛(TiO₂)光学薄膜的沉积。采用TalySurf CCI非接触式表面轮廓仪分别对镀制前基底表面粗糙度和镀制后薄膜表面粗糙度进行测量。实验表明, TiO₂薄膜表面粗糙度随着基底表面的增大而增大, 但始终小于基底表面粗糙度, 说明TiO₂薄膜具有平滑基地表面粗糙的作用; 随着沉积速率的增大, 薄膜表面粗糙度先降低后趋于平缓; 对于粗糙度为2 nm的基底, 离子束能量大小的改变影响不大, 薄膜表面粗糙度均在1.5 nm左右; 随着膜层厚度的增大, 薄膜表面粗糙度先下降后升高。     

粗糙度对大高宽比槽道内流动影响的数值模拟

基于确定表面粗糙结构形状的PML模型模拟表面粗糙度对大高宽比小槽道内流动特性的影响,并与3-D模拟结果对比,结果较为一致.基于该模型对不同的流速和不同的粗糙度进行模拟,结果表明:表面粗糙度导致槽道内出现速度线性分布的流动底层.Re数相同时,单位长度压降与相对粗糙度成二次方关系.粗糙单元高度相同时,压降随Re线性增加.     

Effect of substrate morphology on the roughness evolution of ultra thin DLC films

The effect of substrate roughness on growth of ultra thin diamond-like carbon (DLC) films has been studied. The ultra thin DLC films have been deposited on silicon substrates with initial surface roughness of 0.15, 0.46 and 1.08 nm using a filted cathodic vacuum arc (FCVA) system. The films were characterized by Raman spectroscope, transmission electron microscope (TEM) and atomic force microscopy (AFM) to investigate the evolution of the surface roughness as a function of the film thickness. The experimental results show that the evolution of the surface morphology in an atomic scale depends on the initial surface morphology of the silicon substrate. For smooth silicon substrate (initial surface roughness of 0.15 nm), the surface roughness decreased with DLC thickness. However, for silicon substrate with initial surface roughness of 0.46 and 1.08 nm, the film surface roughness decreased first and then increased to a maximum and subsequently decreased again. The preferred growth of the valley and the island growth of DLC were employed to interpret the influence of substrate morphology on the evolution of DLC film roughness.     

Spectral emissivity of type E235B low carbon structural steel with different roughnesses

A self-built experimental apparatus was employed to study the spectral emissivity of type E235B low carbon structural steel in the wavelength range 2–15 μm at different temperatures by energy comparison method. The surface roughness and topography of the steel E235B were determined by a roughness tester and a scanning electron microscopy, respectively. And then, the spectral emissivity of steel E235B with six different roughnesses was measured before and after oxidation. The measurement results showed that the spectral emissivity increased with the increasing temperature and surface roughness before oxidation. The effect of roughness on the spectral emissivity is different at different wavelength and temperature ranges. However, the oscillatory behavior of the spectral emissivity was observed after oxidation. To explore the possible reasons for emissivity variation, the changes of surface roughness and optical roughness were investigated after oxidation. It is found that both the surface roughness and optical roughness increased after oxidation. Although the optical roughness can be used as one of the parameters to evaluate the effect of surface roughness on the spectral emissivity, it is insufficient to describe the effect of surface morphology on the spectral emissivity.     

随机粗糙微通道内流动特性研究

采用计算流体动力学的方法, 研究了微通道内气体在速度滑移和随机表面粗糙度耦合作用下的流动特性. 其中, 利用二阶速度滑移边界条件描述气体的边界滑移, 利用分形几何学建立随机粗糙表面. 研究发现, 综合考虑二阶速度滑移边界条件和随机表面粗糙度在较大的平均Knudsen数范围内 (0.025-0.59) 得到的计算结果与实验数据符合得很好, 而一阶速度滑移边界条件只在平均Knudsen数较小时(<0.1)符合实验结果. 随机表面粗糙度对气体在边界处的滑移有显著影响, 相对粗糙度越大, 速度滑移系数越小. 并针对计算结果, 给出了滑移系数与相对粗糙度近似满足的关系. 随机粗糙表面对气体流动过程中的压强、速度、Poiseuille数也有显著影响. 关键词： 随机表面粗糙度 二阶速度滑移边界条件 分形 微通道