微米光栅加速度计的加工与性能研究

介绍了一种以微米衍射光栅为敏感元件的微机电加速度计敏感头的加工和性能。硅质量块底部加工有铝反射膜,透明玻璃基底上制作有金微米光栅,中间为空气腔,经硅玻璃阳极键合,构成敏感头的核心敏感部件。光源透过透明基底,照射在光栅上,在反射场内会产生一系列衍射级次,且各级次衍射光强与外界加速度之间呈函数关系。完成了微米光栅加速度计敏感头的加工,搭建了实验测试平台,完成了加速度计的灵敏度以及静电驱动性能测试。为未来新型集成式微米光栅加速度计设计和加工提供参考。     

微米光栅加速度计的加工与性能研究（英文）

介绍了一种以微米衍射光栅为敏感元件的微机电加速度计敏感头的加工和性能。硅质量块底部加工有铝反射膜,透明玻璃基底上制作有金微米光栅,中间为空气腔,经硅玻璃阳极键合,构成敏感头的核心敏感部件。光源透过透明基底,照射在光栅上,在反射场内会产生一系列衍射级次,且各级次衍射光强与外界加速度之间呈函数关系。完成了微米光栅加速度计敏感头的加工,搭建了实验测试平台,完成了加速度计的灵敏度以及静电驱动性能测试。为未来新型集成式微米光栅加速度计设计和加工提供参考。     

白光LED用新型MgAl2O4/Ce∶YAG透明陶瓷的发光性能

采用金属醇盐法制备MgAl2O4前驱体,通过高温煅烧2～4 h得到纯相MgAl2O4粉体,再将其与YAG∶Ce荧光粉均匀混合,利用热压烧结并结合热等静压处理得到MgAl2O4/Ce∶YAG透明陶瓷。利用X射线衍射、紫外-可见分光光度计等测试手段对样品进行表征。样品由MgAl2O4和YAG两相组成,在340 nm和475 nm有两个激发峰。发射光谱在533 nm有一宽峰,属于Ce3+的5d→4f特征跃迁发射。该透明陶瓷封装蓝光芯片所得白光LED器件在35 mA驱动下的发光效率为133.47 lm.W-1,其寿命及色温稳定性优于采用传统方式封装的白光LED。实验结果表明MgAl2O4/Ce∶YAG透明陶瓷是一种可用于白光LED的新型荧光材料。     

Nd:YAG陶瓷的烧结性能研究

采用注浆成型和真空烧结制备了Nd:YAG激光透明陶瓷,研究了烧结温度和时间对致密化过程的影响。研究结果表明:在1050~1300℃之间坯体发生明显的收缩生成YAM和YAP相;在1300~1420℃,生成YAG相。随着烧结温度的增加,陶瓷中气孔含量减少,晶粒尺寸长大。在1700~1800℃烧结20h能够获得完全致密的Nd:YAG陶瓷样品。     

Ce∶YAG透明陶瓷的制备及性能研究

以高纯Al_2O_3、Y_2O_3和CeO_2为原料,采用固相法制备Ce∶YAG(掺铈钇铝石榴石)透明陶瓷,研究了稀土离子掺杂浓度以及烧结温度对陶瓷样品光学性能的影响。结果表明:陶瓷片透过率随着烧结温度的升高而增大,1750℃烧结获得的0.5%Ce∶YAG陶瓷片的透过率高达81.7%。Ce∶YAG陶瓷片的激发峰和发射峰分别位于350nm和530nm处,在白光LED领域具有极大的应用价值。     

光谱仪用平场凹面光栅的凸面母光栅的消像差设计思路

平场全息凹面光栅是光谱仪中的核心元件之一,其成像质量和衍射效率直接影响了光谱仪的分辨率和光能利用率。利用凸面母光栅复制制作凹面光栅,便于在凸面基底上进行离子束刻蚀以获得高的衍射效率。为了保证复制的凹面光栅具有高的成像质量,文章提出一种全息凸面光刻胶光栅的消像差设计方法,优化中考虑了凸面基底对记录光束的折射效应以及由基底折射率所引入的附加光程。通过将“光程函数级数展开法”和ZEMAX光学设计软件相结合,采用粗精两步优化的方法,显著提高了优化的效率和成功率。ZEMAX对比仿真结果显示,复制得到的凹面光栅与传统直接采用全息法制作的凹面光栅的成像质量是相当的。     

计算凹面闪耀光栅衍射效率的通用方法

为使凹面光栅的衍射能量更多地集中在所需要的级次上,提出了利用机械刻划的方法在凹面基底上制作变刻槽角度的凹面闪耀光栅,并利用菲涅耳-基尔霍夫衍射公式推导了同时在主截面和非主截面内计算凹面闪耀光栅衍射效率的理论方法,弥补了以往只在主截面内考虑衍射效率的不足,最后利用Matlab仿真软件模拟了衍射效率随波长的变化曲线,并对比了在不同制作和使用参数下衍射效率峰值的变化规律,为今后凹面光栅的设计和制作提供了参考价值。     

刻线误差与面型误差对平面光栅光谱性能影响的二维快速傅里叶变换分析方法

光栅刻线误差与基底面型误差影响平面光栅衍射波前、分辨本领、鬼线、卫线及杂散光等光谱性能,研究光栅性能指标与光栅刻线误差及基底加工误差之间的因果关系,对提高光栅质量极为重要。根据光栅衍射中产生的源于刻线误差与面型误差的光程差,推导出了在光栅锥面衍射情况下的光栅刻线误差、基底面型误差、入射角θ、衍射级次m与衍射波前关系的数学表达式,得到构建非理想光栅衍射波前的理论模型。以理论模型为依据,采用干涉仪测量光栅对称级次衍射波前,实现在测量结果中对光栅刻线误差与基底面型误差的分离,并基于二维快速傅里叶变换分析光栅衍射波前,考察了刻线误差与面型误差对光栅性能指标的影响。借助此方法通过重构的光栅衍射波前,分析光栅分辨本领、鬼线等光谱性能,还可以反演光栅全表面刻线误差与面型误差的大小,为光栅基底加工、光栅制造和使用技术提供理论依据。     

MgAl2O4/Ce∶YAG透明陶瓷的制备及光学性能

采用金属醇盐法制备MgAl2O4前躯体,通过高温煅烧2～4h得到纯相MgAl2O4粉体,再将其与YAG∶Ce荧光粉均匀混合,利用热压烧结并结合热等静压处理得到MgAl2O4/Ce∶YAG透明陶瓷。利用XRD,SEM,EDS和荧光光谱仪对样品进行物相和光学性能分析。实验表明样品由MgAl2O4和YAG两相组成,YAG晶粒均匀地分散在MgAl2O4基质中。样品在340和475nm有两个激发峰。发射光谱在533nm处有一宽峰,属于Ce3+的5d→4f特征跃迁发射,其荧光寿命为59.74ns。结果表明,MgAl2O4/Ce∶YAG透明陶瓷是一种可用于白光LED的新型荧光材料。     

透明Nd:YAG激光陶瓷的研究与应用进展

综述了近年来,特别是近两年来国内外透明Nd:YAG激光陶瓷的研究与应用情况,重点对我国的透明Nd:YAG激光陶瓷研究近况进行了分析,指出了透明Nd:YAG激光陶瓷是目前陶瓷研究的热点。提出了透明Nd:YAG激光陶瓷研究中尚存在的问题和我国在此领域中与国外研究的巨大差距。分析指出:我国研究透明Nd:YAG激光陶瓷的各个院所之间,应该强强联合,优势互补,对该领域的理论和制备工艺进行更为深入的研究。     

Formation of positive and negative anisotropic holographic gratings depending on recording energy in photoreactive liquid crystalline copolymer films

Anisotropic diffractive gratings formed by birefringent molecular alignment are fabricated by a holographic technique using a photo-cross-linkable liquid crystalline copolymer (PLCCP). Depending on the exposure energy used for holographic recording, bright or dark regions of the interference fringe can be chosen for the molecular-aligned region, analogous to positive- and negative-type photoresist processing in photolithography. In conjunction with simultaneously generated surface relief gratings, the anisotropic refractive index modulation inherent in the PLCCP film exhibits different diffraction properties depending on the incident beam polarization. The anisotropic refractive index grating profiles are quantitatively presented for two cases determined by the exposure energy, based on the Fourier analysis of diffractive optics. The selection of different grating formations selected by varying only the exposure energy could provide a strategy for the fabrication of functionalized diffractive optical elements.     

Holographic grating recorded by He–Ne laser operating at 632.8 nm in polymer film containing push–pull azo dye

Holographic gratings were optically recorded by two beams from a He–Ne laser operating at 632.8 nm in poly (methyl methacrylate) (PMMA) film containing push–pull azo dye. The holographic characteristics of the recorded gratings were dependent on the polarization direction of the recording beams and the relationship between the diffractive signals and the power density of recording beams was investigated. The formation of holographic gratings accompanied by 532 nm (double-frequency of Nd:YAG laser) irradiation was studied in detail. It was found that the effect of 532 nm laser to the holographic grating lay in two aspects. The acceleration effect of 532 nm laser to the formation of holographic grating is predominant when the power density of 532 nm laser is low. While at relatively high power density of 532 nm laser, the erasure is the main factor to the holographic grating. Moreover, the holographic grating was probed by 532 nm laser at low power density and the dependence of the first order diffractive signal on the recording beam power density was also presented.     

掺半导体玻璃波导的导波功率限制

首次利用阳极氧化法在掺半导体玻璃上制备了两端带有抛物耦合喇叭的4微米条宽沟道波导,用光栅耦合器将波长0.532微米的YAG倍频激光耦合进波导中,实现了输出光的功率限制.     

Optoacoustic technique for thickness measurement of submicron metal coatings

The new nondestructive method for thickness measurement of submicron metal coatings on transparent substrate is developed. The method is based on the optoacoustic (OA) transformation in the system, where the coating is covered by an optically transparent liquid. Theoretical treatment of the problem consists of two steps. At the first step laser-induced thermal field in the system is calculated, taking into account the large thermal conductivity of the metal film and partial heat diffusion into the liquid. At the second step the system of wave equations for scalar potential of vibration velocities is solved. Heat sources, determined at the first step, are free form of wave equations. Three chrome coatings of different thickness (approximately 0.2, 0.3, and 0.6 μm) deposited on the quartz substrate are tested experimentally. Two different organic liquids (acetone and ethanol) are used to cover chrome coatings. Nanosecond diode-pumped Nd:YAG laser operated at the main harmonic is used to perform OA transformation (laser pulse duration is τ _L = 12 ns, the laser energy is about 0.2 mJ). Two detection modes are used. In forward mode laser pulse irradiates the film from the side of the substrate and in backward mode—from the side of the liquid. Detection of induced ultrasonic pulses is performed by the wide-band piezoelectric transducer in the liquid in both cases. The thickness of the coatings is determined by the least squares fitting of the theoretical dependencies of spectral transfer functions of OA transformation to experimental data. It is demonstrated, that the developed technique can be used for measurement of metal coatings thickness within the range from 50 nm to 5 μm with the error about 50 nm.     

体积相位全息光栅的设计与制备

本文指出全息干版薄膜在曝光后处理过程中的收缩性和折射率变化对制备全息光栅的周期、倾斜度、布喇格入射角及衍射角的影响问题,并根据实验数据对光栅设计进行修正,再结合Kogelnik衍射方程及折射率调制度和曝光量的线性关系,在实验中基本上能准确设计出指定周期、倾斜度和衍射效率的全息光栅。     

激光烧蚀制备分布反馈式有机激光器件

采用激光烧蚀的方法结合激光全息技术,直接在高分子聚合物MEH-PPV薄膜表面烧蚀光栅结构,制备了分布反馈式有机激光器。这一方法具有工艺简单、光栅参数的可控性和重复性好等优点。器件MEH-PPV的膜厚是400 nm。利用波长为355 nm的Nd-YAG纳秒激光器进行单脉冲烧蚀,获得的光栅周期和光栅高度分别为370 nm和 100 nm。利用飞秒激光放大器作为泵浦源激射DFB激光器件,得到激射阈值约为182 μJ·cm^-2·pulse^-1,光谱的波峰约在609 nm处,半高宽为4.2 nm。通过改变两光束的夹角获得了周期为360, 370, 380, 390 nm的光栅,它们对应的激光波峰分别为602.91, 609.24, 613.26, 619.01 nm。     

激光直写方法制作透明导电金属网栅

介绍了利用激光直写光刻技术在200mm×200mm基片上制作线宽为5μm,周期为350μm的红外透明导电金属网栅的工艺过程,对激光直写光刻技术和机械刻划掩模接触光刻制作金属网栅结构的两种方法进行了比较,给出了激光直写制作金属网栅的优点.     

Laser-induced plasma-assisted ablation of fused quartz using the fourth harmonic of a Nd+:YAG laser

+ :YAG laser (266 nm) is reported. With the assistance of plasma resulting from laser irradiation on a metal target, the fused-quartz substrate is easily etched by the 266-nm laser beam in spite of the fact that the substrate is transparent to this wavelength. In contrast, no ablation takes place without the metal target, but damage is generated on the substrate surface. The ablated region is observed by optical microscopy and scanning probe microscopy (SPM), which reveal a fine grating structure (line spacing of 20 μm) without any severe damage. A series of experiments on the dependence of the ablation rate and the threshold laser fluence on ablation parameters, such as laser fluence, the number of pulses, and the distance between the fused quartz and the metal target is performed. On the basis of the results, three possible mechanisms of direct plasma interaction, plasma heating, and metal film deposition are discussed. Received: 27 February 1998/Accepted: 5 June 1998