| 激光直写方法制作透明导电金属网栅 |
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| 引用本文： | 李凤友,卢振武,谢永军,曹召良,高劲松,孙连春,赵晶丽.激光直写方法制作透明导电金属网栅[J].光子学报,2002,31(10):1270-1272. |
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| 作者姓名： | 李凤友 卢振武 谢永军 曹召良 高劲松 孙连春 赵晶丽 |
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| 作者单位： | 中国科学院长春光机与物理研究所应用光学国家重点实验室,吉林,长春,130022 |
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| 基金项目： | 应用光学国家重点实验室基金，青年创新基金资助项目 |
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| 摘 要： | 介绍了利用激光直写光刻技术在200mm×200mm基片上制作线宽为5μm,周期为350μm的红外透明导电金属网栅的工艺过程,对激光直写光刻技术和机械刻划掩模接触光刻制作金属网栅结构的两种方法进行了比较,给出了激光直写制作金属网栅的优点.
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| 关 键 词： | 激光直写光刻 掩模 金属网栅 电磁屏蔽 |
| 收稿时间： | 2002/1/5 |
| 修稿时间： | 2002年1月5日 |
TRANSPARENT CONDUCTIVE METALLIC FILM MESH FABRICATED BY LASER DIRECT WRITING TECHNIQUE |
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| Li Fengyou,Lu Zhenwu,Xie Yongjun,Cao Zhaoliang,Gao Jingsong,Sun Lianchun,Zhao Jingli State Key Lab of Applied Optics,Changchun Institute of Optics,Fine Mechanics and Physics,Chinese Academy of Science,Jilin,Changchun.TRANSPARENT CONDUCTIVE METALLIC FILM MESH FABRICATED BY LASER DIRECT WRITING TECHNIQUE[J].Acta Photonica Sinica,2002,31(10):1270-1272. |
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| Authors: | Li Fengyou Lu Zhenwu Xie Yongjun Cao Zhaoliang Gao Jingsong Sun Lianchun Zhao Jingli State Key Lab of Applied Optics Changchun Institute of Optics Fine Mechanics and Physics Chinese Academy of Science Jilin Changchun |
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| Institution: | Li Fengyou,Lu Zhenwu,Xie Yongjun,Cao Zhaoliang,Gao Jingsong,Sun Lianchun,Zhao Jingli State Key Lab of Applied Optics,Changchun Institute of Optics,Fine Mechanics and Physics,Chinese Academy of Science,Jilin,Changchun 130022 |
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| Abstract: | A film-taped metallic mesh with linewidth 5μm and period 350μm,which is transparent for infrared and shielding electromagnetic wave,is made on the 200mm×200mm IR substrate by using the laser direct writing (LDW) photolithography and coating technology.The characteristics of the mesh structure made by LDW technique are compared with that by the contact photolithography through the mask made by the mechanical cutting method.The advantages in fabricating the mesh film by LDW are presented. |
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| Keywords: | LDW photolithography Mask Metal mesh Shielding of electromagnetic wave |
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