B、N单掺杂3C-SiC电子结构和光学性质的第一性原理研究

采用第一性原理的密度泛函理论赝势平面波方法,计算了未掺杂与B、N单掺杂3C-SiC的电子结构和光学性质.结果表明:掺杂改变了3C-SiC费米面附近的电子结构;B掺杂使得禁带宽度减小,价带顶上移,费米能级进入价带,形成p型半导体;N掺杂使得禁带宽度减小,导带底下移,费米能级进入导带,形成n型半导体.B、N掺杂均提高了3C-SiC在低能区的折射率、消光系数和吸收系数,增强了对红外光谱的吸收.     

Al-N共掺杂3C-SiC介电性质的第一性原理计算

采用基于密度泛函理论的第一性原理平面波超软赝势法,建立了未掺杂,Al,N单掺杂和Al-N共掺杂3C-SiC的4种超晶胞模型,并分别对模型进行了几何结构优化,对比研究了其能带结构,态密度分布和介电常数.计算结果表明:Al掺杂会增大SiC的晶格常数,而N对SiC的晶格影响很小.Al掺杂会导致费米能级进入价带,使3C-SiC成为p型半导体,且带隙宽度略为加宽.N掺杂后的SiC其导带和价带均向低能端发生移动,带隙稍有减小.本征3C-SiC几乎不具备微波介电损耗性能.但是可以通过进行Al掺杂或N掺杂加以改善,Al掺杂后的效果尤为突出.计算发现Al-N共掺杂后的3C-SiC材料在8.2—12.4 GHz范围内其微波介电损耗性能急剧下降,与实验结果相符合,并对这一结果进行了讨论分析.     

La掺杂3C-SiC电子结构和光学性质的第一性原理研究

采用基于密度泛函理论的第一性原理计算方法,对未掺杂及稀土材料La掺杂3C-SiC的电子结构和光学性质进行理论计算.计算结果表明,La掺杂引起3C-SiC晶格体积增大,掺杂体系能量更小,掺杂体系的结构更稳定;未掺杂3C-SiC是直接带隙半导体,其禁带宽度为1.406 eV,La掺杂后带隙宽度下降为1.161 eV,La掺杂3C-SiC引入了3条杂质能级,能量较高的1条杂质能级与费米能级发生交叠,另外2条杂质能级都在费米能级以下价带顶之上,La掺杂引起3C-SiC吸收谱往低能区移动,未掺杂3C-SiC的静态介电常数为2.66,La掺杂引起静态介电常数增加为406.01,La掺杂3C-SiC是负介电半导体材料.     

3C-SiC材料p型掺杂的第一性原理研究

采用基于第一性原理的密度泛函理论平面波超软赝势法,研究了SiC材料p型掺杂的晶体结构和电子结构性质,得到了优化后体系的结构参数,掺杂形成能,能带结构和电子态密度,计算得到掺杂B,Al,Ga在不同浓度下的禁带宽度.结果表明:随着掺杂B原子浓度的增大,禁带宽度随之减小;而随着掺杂Al,Ga原子浓度的增大,禁带宽度随之增大;在相同浓度下,掺杂Ga的禁带宽度大于掺杂Al,掺Al禁带宽度大于掺B. 关键词： SiC 电子结构 掺杂 第一性原理软件     

Al、N共掺杂实现p-型ZnS的第一性原理研究

 采用基于密度泛函理论的第一性原理平面波超软赝势方法,计算了闪锌矿ZnS、N掺杂以及Al、N共掺杂ZnS晶体的电子结构,分析了N掺杂以及Al和N共掺杂ZnS晶体的能带结构、电子态密度以及Mulliken电荷分布。计算结果表明：N掺杂ZnS在能带中引入了深受主能级,N原子的2p态在价带顶提供了空穴载流子,载流子局域于价带顶附近;Al和N共掺使得受主能级变宽,非局域化特征明显,提高了掺杂浓度和系统的稳定性,更加有利于获得p-型ZnS。     

Al和N共掺p型Zn1-xMgxO电子结构的第一性原理计算

采用密度泛函理论下的第一性原理平面波超软赝势方法,对Zn1-xMgxO超晶胞和掺杂Al,N后的Zn1-xMgxO超晶胞分别进行了优化计算.结合广义梯度近似计算了Al和N共掺杂后Zn1-xMgxO的能带结构、电子态密度和Mulliken电荷布居分布.计算表明:掺入N原子的2p态电子为Zn1-xMgxO价带顶提供空穴载流子,使Zn1-xMgxO价带顶向高能方向移动;掺入Al原子的3p态电子则与N原子的2p态电子在费米能级附近发生轨道杂化,使费米能级处价带能级展宽,Al和N共掺杂可获得p型Zn1-xMgxO.     

Co-Cr共掺杂金红石型TiO_2电子结构和光学性质的第一性原理研究

基于密度泛函理论,采用第一性原理赝势平面波方法计算了Co、Cr单掺杂以及Co-Cr共掺杂金红石型TiO2的能带结构、态密度和光学性质.计算结果表明:纯金红石的禁带宽度为3.0eV,Co掺杂金红石型TiO2的带隙为1.21eV,导带顶和价带底都位于G点处,仍为直接带隙,在价带与导带之间出现了由Co 3d和Ti 3d轨道杂化形成的杂质能级;Cr掺杂金红石型TiO2的直接带隙为0.85eV,在价带与导带之间的杂质能级由Cr 3d和Ti 3d轨道杂化轨道构成,导带和价带都向低能级方向移动;Co-Cr共掺杂,由于电子的强烈杂化,使O-2p态和Ti-3d态向Co-3d和Cr-3d态移动,使价带顶能级向高能级移动而导带底能级向低能方向移动,极大地减小了禁带的宽度,也是共掺杂改性的离子选择依据.掺杂金红石型TiO2的介电峰、折射率和吸收系数峰都向低能方向移动;在E2.029eV的范围内,纯金红石的ε2、k和吸收系数为零,掺杂后的跃迁强度都大于未掺杂时的跃迁强度,Co-Cr共掺杂的跃迁强度大于Co掺杂及Cr掺杂,说明Co、Cr共掺杂更能增强电子在低能端的光学跃迁,具有更佳的可见光催化性能.     

Ge，Al掺杂锰硅化合物Mn4Si7的第一性原理计算

基于密度泛函理论（DFT）的第一性原理计算方法,对本征Mn4Si7以及Ge,Al单掺杂和共掺杂Mn4Si7的晶体结构,能带结构,态密度以及光学性质进行了计算和分析.计算结果表明：本征态Mn4Si7的禁带宽度为0.810 eV,为直接带隙半导体材料,掺杂后晶体结构稍微变化,禁带宽度减小,且共掺杂时禁带宽度最小,电导率最好.Al以及Ge,Al共同掺杂时会产生杂质能级.掺杂后光子能量向低能级方向移动,光电导率,光吸收,反射系数都有所增大,说明掺杂改善了Mn4Si7的光学性质,从而可以提高光伏发电效率.     

钴铝共掺3C-SiC电子结构和磁性的第一性原理计算

采用基于密度泛函理论的第一性原理计算方法,分别计算了不同Co原子比例单掺杂、Al原子单掺杂和Co-Al共掺杂3C-SiC的电子结构和磁性参数.结果表明:随着掺杂Co原子比例的增大,单个Co原子对体系总磁矩贡献的平均值反而减小.由电子态密度分析掺杂3C-SiC体系中的磁性来源,主要是由Co-3d以及Co原子附近的C-2p电子轨道的自旋极化产生的. Al单掺3C-SiC时体系中每个原子的平均磁矩和体系总磁矩均为0,即Al单掺杂体系不具有磁性.而Co-Al共掺杂得到的体系总磁矩比单掺等量Co时要大约0. 09μB,即Co-3d与Al-3p电子轨道发生轨道杂化,使得Co-Al共掺杂可以增大Co原子对体系总磁矩的贡献.     

Ge,Al掺杂锰硅化和物Mn4Si7的第一性原理计算

基于密度泛函理论(DFT)的第一性原理计算方法,对本征Mn₄Si₇以及Ge, Al单掺杂和共掺杂Mn₄Si₇的晶体结构,能带结构,态密度以及光学性质进行了计算和分析.计算结果表明:本征态Mn₄Si₇的禁带宽度为0.810 eV,为直接带隙半导体材料,掺杂后晶体结构稍微变化,禁带宽度减小,且共掺杂时禁带宽度最小,电导率最好.Al以及Ge, Al共同掺杂时会产生杂质能级.掺杂后光子能量向低能级方向移动,光电导率,光吸收,反射系数都有所增大,说明掺杂改善了Mn₄Si₇的光学性质,从而可以提高光伏发电效率.     

Cr和C共掺TiO_2的电子结构和光学性质的研究

利用第一性原理计算,研究了Cr与C共掺锐钛矿型TiO_2的能带的结构,态密度和光学性质.我们构建了两种不等价的Cr与C紧邻共掺体系:CrC_1-TiO_2和CrC_2-TiO_2.CrC_1-TiO_2体系在价带上方出现了主要由C-2p轨道和Cr-3d轨道耦合成的子带.同时,由于姜-泰勒变形效应,Cr-3d轨道的t_(2g)轨道进一步分裂的成Cr-3d_(yz)轨道在导带底形成附加带,有效带隙较纯TiO_2相比变窄了0.84eV.CrC_2-TiO_2体系带隙中有深带隙态存在,由于深间隙态的存在,价带顶到深带隙的能量宽度为0.84eV,电子从价带顶转移到导带底的所需要的能量将大大减小.最后,我们对纯TiO_2和Cr与C紧邻共掺TiO_2的光学特性进行了计算.结果显示Cr与C共掺TiO_2的光学吸收谱都有很好的可见光区域分布,大大提高了太阳光的利用率.     

First-principles study on electronic and optical properties of S,N single-doped and S-N co-doped ZnO

The electronic and optical properties of undoped, N single-doped, S single-doped, and S-N co-doped ZnO were systematically investigated by first-principles calculations. The lattice parameters of S single-doped and S-N co-doped ZnO clearly increased. After N-doping, a strongly localized impurity energy level of N was formed near the Fermi level at the top of valence band (VB). In S-N co-doped ZnO, the localization of N weakened, and the Fermi level went deeper into the VB, indicating that the acceptor energy level of N formed in S-N co-doped system became shallower due to the effect of 3p state of S. Therefore, S-N co-doping is beneficial to obtain p-type ZnO with a higher hole concentration than N single-doping. Compared with undoped ZnO, the static dielectric constant, absorption coefficient, refractive index, energy loss function, and reflectivity of N single-doped, S single-doped, and S-N co-doped ZnO exhibited an increase in low-energy area.     

Modulation of electronic structure properties of C/B/Al-doped armchair GaN nanoribbons

ABSTRACT

The electronic structures of C/B/Al-doped armchair GaN nanoribbons (aGaNNRs) are systematically studied by using density functional theory. We find that the original aGaNNRs are direct band gap semiconductors and that the gaps monotonically decrease with increasing widths. Interestingly, the B- or Al-doped aGaNNRs are also direct-band gap semiconductors with a slightly larger gap than their undoped aGaNNRs, while the C-doped aGaNNRs display metallic characteristics with an impurity state across the Fermi level in band structures. The semiconducting or metallic behaviours of C/B/Al-doped aGaNNRs can be explained by the orbital coupling between the extrinsic atom and primary Ga, N in their partial density of states. Our results show a useful way to modulate the band gaps of aGaNNRs.

Using the density-functional theory, we performed a theoretical research to study the electronic structures of C/B/Al-doped armchair gallium nitride nanoribbons. The calculated band structures show that the perfect and original aGaNNRs are direct semiconductors regardless of ribbon widths, and gaps monotonically decrease with increasing the widths. The B/Al-doped aGaNNRs are semiconductors with a slightly larger gap, while metallic behavior presents in C-doped aGaNNRs with an impurity band across the EF. The results show a useful way to modulate the band gaps of aGaNNRs.     

第一性原理研究B掺杂Mn_4Si_7的电子结构和光学性质

采用基于密度泛函理论的第一性原理计算方法,对未掺杂及B掺杂Mn_4Si_7的电子结构和光学性质进行理论计算.研究结果表明,未掺杂Mn_4Si_7是间接带隙半导体,其禁带宽度为0.786 eV,B掺杂后其禁带宽度下降为0.723 eV. B掺杂Mn_4Si_7是p型半导体材料.未掺杂Mn_4Si_7在近红外区的吸收系数达到10~5 cm~(-1),B掺杂引起Mn_4Si_7的折射率、吸收系数、反射系数及光电导率增加.     

Effects of annealing on structural,optical and electrical properties of Al-doped ZnO thin films

Transparent conducting oxide (TCO) thin films such as SnO2, In2O3, and Cd2SnO4, have been used extensively as sensor devices, surface acoustic wave devices, coating to heat glass windows and transparent electrodes for solid state display devices, solar cells[1,2] because of their high optical transparency in the visible range, infrared reflec-tance and low d.c. resistivity. Although SnO2 film was developed early, nowadays Sn-doped In2O3 (ITO) films are the predominant TCO thin film in …     

N-S共掺杂金红石相TiO2电子结构与光学性质的第一性原理研究

采用基于第一性原理的平面波超软赝势方法研究N和S单掺杂以及N和S共掺杂金红石相TiO2的能带结构,态密度和光学性质.结果表明:N掺杂导致禁带宽度减小为1.43 eV,并且在价带上方形成了一条杂质能带;S掺杂导致费米能级上移靠近导带,直接带隙减小为0.32 eV;N和S共掺杂导致能带结构中出现了两条杂质能带,靠近导带的一条杂质能级距离导带底约0.35 eV,靠近价带的一条杂质能级距离价带顶约0.85 eV,杂质能级主要由N原子的2p轨道和S原子的3p轨道组成.N和S掺杂后不但使TiO2的吸收带产生红移,而且在可见光区具有较大的吸收系数,光催化活性增强.     

Enhanced hardness in B-doped ZnO thin films on fused quartz substrates by pulsed-laser deposition

B-doped ZnO thin films have been fabricated on fused quartz substrates using boron-ZnO mosaic target by pulsed-laser deposition technique, and the mechanical properties have been studied by nanoindentation continuous stiffness measurement technique and transmission electron microscope (TEM). Nanoindentation measurement revealed that the hardness of B-doped ZnO films, 9.32 ± 0.90 to 12.10 ± 1.00 GPa, is much greater than that of undoped ZnO films and very close to that of traditional semiconductor Si. The mean transmittance (%) is larger than 81% in the visible range (380-780 nm) for all the films, and the Hall effect measurement showed that the carrier density is around 2 × 10²⁰ cm⁻³ and the resistivity lower than 3 × 10⁻³ Ω cm. TEM characteristics show undoped thin films have more amorphous area between grains while the B-doped ZnO films have thin grain boundaries. We suggest that the grain boundaries act as the strain compensation sites and the decrease in thickness of grain boundaries enhances the hardness of the B-doped ZnO films.