霍尔推进器壁面材料二次电子发射及鞘层特性

霍尔推进器放电通道等离子体与壁面相互作用形成鞘层,不同壁面材料的二次电子发射对推进器鞘层特性具有重要影响,本文针对推进器壁面鞘层区域建立二维物理模型,研究了氮化硼(BN)、碳化硅(SiC)和三氧化二铝(Al_2O_3)三种不同壁面材料的二次电子发射特性,在改进SiC材料二次电子发射模型的基础上,采用粒子模拟方法,讨论了壁面二次电子发射系数与电子温度和磁场强度的关系,研究了三种材料(BN,SiC和Al_2O_3)的鞘层特性,结果表明:修正的二次电子发射模型拟合曲线与实验曲线几乎一致;在相同电子温度下,三种材料(BN,SiC和Al_2O_3)的二次电子发射系数和壁面电子数密度依次增大,而鞘层电场和鞘层电势降依次减小,BN材料具有合适的二次电子发生射系数,使得霍尔推进器能在低电流下稳态工作。     

霍尔推进器中磁化二次电子对鞘层特性的影响

为进一步研究霍尔推进器壁面二次电子发射对推进器性能的影响,采用流体模型数值模拟了二次电子磁化效应的等离子体鞘层特性.得到二次电子磁化鞘层的玻姆判据.讨论了不同的磁场强度和方向、二次电子发射系数以及不同种类等离子体推进器的鞘层结构.结果表明:随器壁二次电子发射系数的增大,鞘层中粒子密度增加,器壁电势升高,鞘层厚度减小;鞘层电势及粒子密度随着磁场强度和方位角的增加而增加;而对于不同种类的等离子体,壁面电势和鞘层厚度也不同.这为霍尔推进器的磁安特性实验提供了理论解释. 关键词： 霍尔推进器 磁鞘 二次电子     

电子温度各向异性对霍尔推力器BN绝缘壁面鞘层特性的影响

建立多价态多组分等离子体一维流体鞘层模型,引入电子温度各向异性系数并考虑出射电子速度分布,研究了电子温度各向异性对霍尔推力器中的BN绝缘壁面鞘层特性和近壁电子流的影响.分析结果表明,相比于纯一价氙等离子体鞘层参数,推力器中的多价态氙等离子体鞘层电势降略有降低,电子壁面损失增加,临界二次电子发射系数减小.推力器中的电子温度各向异性现象可以显著地加大出射电子能量系数,进而降低鞘层电势降,增强电子壁面相互作用.数值结果表明,空间电荷饱和机制下电子温度各向异性对鞘层空间电势分布影响显著. 关键词： 霍尔推力器 电子温度各向异性 空间电荷饱和鞘层     

霍尔推进器中振荡鞘层对电子与壁面碰撞频率的影响研究

利用二维粒子模拟方法研究振荡鞘层对近壁电导的影响.研究结果表明,当二次电子发射系数大于1时,鞘层处于振荡状态.在振荡鞘层状态下,电子与壁面的碰撞通量沿平行与壁面方向剧烈的周期性振荡,振荡的波长为电子静电波波长量级,电子与壁面的碰撞频率高出经典鞘层状态下电子与壁面碰撞频率1—2个数量级,此时的碰撞频率对通道中电流的贡献不可忽略.振荡鞘层相对与经典鞘层增大了电子与壁面的碰撞频率,但是振荡鞘层的存在,仍然会使一部分慢电子无法穿越鞘层的势垒而打到壁面. 关键词： 霍尔推进器 振荡鞘层 二次电子     

壁面二次电子发射对霍尔推力器放电通道绝缘壁面双鞘特性的影响

为进一步揭示霍尔推力器放电通道绝缘壁面鞘层的特性, 利用考虑了壁面二次电子分布函数的一维稳态流体鞘层模型, 研究了壁面二次电子发射对近壁双鞘特性的影响. 分析结果表明, 由于壁面发射的二次电子对近壁鞘层中的电子密度有增加作用, 存在一个临界二次电子发射系数σ_dc使得: 当σ≤σ_dc时, 鞘层为单层的正离子鞘结构; 当σ>σ_dc时, 鞘层表现为双层的正离子鞘和电子鞘相连结构, 连接点对应于垂直于壁面方向上电势分布的拐点. 然而, 当σ进一步增大到0.999时, 鞘层转变为三层的正离子鞘-电子鞘-正离子鞘交替结构. 数值结果表明: 随着σ的增加, 电子鞘与离子鞘的连接点向远离壁面的方向移动, 电子鞘的厚度逐渐增加; 随着壁面出射电子能量系数a的增加, 近壁区鞘层的厚度也逐渐增加. 关键词： 霍尔推力器 双鞘 壁面二次电子发射     

二次电子分布函数对绝缘壁面稳态鞘层特性的影响

由于缺乏详细的理论计算和实验结果,在研究绝缘壁面稳态流体鞘层特性时,通常假设壁面出射的总二次电子服从单能分布(0)、半Maxwellian分布等.在单能电子轰击壁面的详细二次电子发射模型基础上,采用Monte Carlo方法统计发现:当入射电子服从Maxwellian分布时,绝缘壁面发射的总二次电子服从三温Maxwellian分布.进而,采用一维稳态流体鞘层模型进行对比研究,结果表明:二次电子分布函数对鞘边离子能量、壁面电势、电势及电子/离子密度分布等均具有明显影响;总二次电子服从三温Maxwellian分布时,临界空间电荷饱和鞘层无解,表明随着壁面总二次电子发射系数的增加,鞘层直接从经典鞘层结构过渡到反鞘层结构.     

电子的非广延分布对等离子体鞘层中二次电子发射的影响

采用一维流体模型研究了非广延分布电子对等离子体鞘层中二次电子发射的影响.通过数值模拟,研究了非广延分布电子对考虑二次电子发射的等离子体鞘层玻姆判据、器壁电势、器壁二次电子临界发射系数以及等离子体鞘层中二次电子密度分布的影响.研究结果发现,当电子分布偏离麦克斯韦分布(q=1,广延分布)时,非广延参量q的改变对器壁二次电子发射有着重要的影响.不论电子分布处于超广延(q 1),还是处于亚广延状态(q 1),随着非广延参量q的增加,都会出现鞘边临界马赫数跟着减小,同时对于随着二次电子发射系数的增加,临界马赫数跟着增加.器壁电势随着参量q的增加而增加.器壁二次电子临界发射系数则随着非广延参量的增加而减小,并且等离子体中所含的离子种类质量数越大,非广延参量的变化对器壁二次电子临界发射系数的值影响越小.此外,随着非广延参量的增加,鞘层厚度减小,鞘层中二次电子数密度增加.通过对数值模拟结果分析,发现电子分布处于超广延分布状态对等离子体鞘层中二次电子发射特性的影响要比电子处于亚广延分布状态要更明显.     

二次电子发射和负离子存在时的鞘层结构特性

 建立了包括电子、离子、器壁发射二次电子以及负离子多种成分的等离子体无碰撞鞘层的基本模型,讨论了二次电子发射和负离子对1维稳态等离子体鞘层结构的影响,并且分析了多种成分等离子体鞘层内的二次电子和负离子的相互作用。结果表明：二次电子发射系数的增加和负离子含量的增加,都将导致鞘层的厚度有所减小;二次电子发射系数超过临界发射系数之后,鞘层不再是离子鞘。随着器壁材料二次电子发射系数的增加,鞘层中的负离子密度分布也逐渐增加;负离子的增加,导致二次电子临界发射系数有所增加。另外,在等离子体鞘层中二次电子发射和负离子的存在,也影响着鞘层中电子的放电特性与器壁材料的腐蚀。     

Hall推力器内饱和鞘层下电子与壁面碰撞频率特性

利用二维粒子模拟方法研究Hall推力器内电子与壁面的碰撞频率.研究发现,饱和鞘层状态下的电子与壁面的碰撞频率较经典鞘层下大大增加,甚至高出经典鞘层状态下电子与壁面碰撞频率两个数量级,这样饱和鞘层状态下电子与壁面的碰撞频率对近壁电流的贡献将不容忽略.进一步分析造成饱和鞘层状态下电子与壁面碰撞频率增加的原因后认为,饱和鞘层状态下电子与壁面碰撞频率的增加是鞘层电势降过低和壁面发射的二次电子回流造成的. 关键词： 饱和 鞘层 碰撞 频率     

微腔等离子体放电过程的数值研究

采用2维自洽完全流体模型,数值研究了阳极为通孔的高气压微腔放电结构中等离子体参数的变化过程。模拟结果获得了当氩气压强为13.3 kPa时,放电中的电势分布、等离子体密度分布、径向电场分布和电子温度分布等重要参数的演化过程。模拟结果表明在放电过程中,阴极附近的电场由轴向电场逐步转变为径向电场,等离子体密度最大值位于放电腔中间处,并随时间推移由阳极附近向阴极附近移动,电子温度的最大值出现在阴极环形鞘层区域。     

Characteristics of wall sheath and secondary electron emission under different electron temperatures in a Hall thruster

In this paper, a two-dimensional physical model is established in a Hall thruster sheath region to investigate the influences of the electron temperature and the propellant on the sheath potential drop and the secondary electron emission in the Hall thruster, by the particle-in-cell(PIC) method. The numerical results show that when the electron temperature is relatively low, the change of sheath potential drop is relatively large, the surface potential maintains a stable value and the stability of the sheath is good. When the electron temperature is relatively high, the surface potential maintains a persistent oscillation, and the stability of the sheath reduces. As the electron temperature increases, the secondary electron emission coefficient on the wall increases. For three kinds of propellants(Ar, Kr, and Xe), as the ion mass increases the sheath potentials and the secondary electron emission coefficients reduce in sequence.     

Surface‐Driven Asymmetry and Instability in the Acceleration Region of Hall Thruster

It has been shown experimentally that the channel wall material has a substantial effect on the behaviour of Hall discharges. For this reason, the radial profile inside the Hall thruster SPT‐100 is investigated in detail. This is done by a one‐dimensional fully kinetic self‐consistent Particle‐in‐Cell model between the two walls in the acceleration region of the channel. A detailed Monte Carlo probabilistic model for secondary electron emission is implemented as boundary module. Using the local field approximation, two different operative conditions (axial electric field E_z =100 V/cm and 300 V/cm) have been simulated. For high discharge voltage case, a strong radial asymmetry and a stream instability propagating all along the radial domain are detected, while in the low voltage case a stable classical situation is recovered. The critical parameters for triggering this unstable regime are the electron azimuthal drift energy and the induced secondary electron emission, while the saturation mechanism is the increasing of the temperature of the initially cold secondary‐electrons. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

One-dimensional solution to the stable, space-charge-limited emission of secondary electrons from plasma-wall interactions

Numerical solutions to the stable, space-charge-limited emission of secondary electrons from plasma-wall interaction are found based on one-dimensional plasma moment equations that assume cold ions, Maxwellian electrons and cold secondary electrons. The numerical method finds a range of plasma parameters that permit stable emission of secondary electrons in the absence of normal electric fields to the wall. These solutions were not obtained with previous method that solves only for the marginally stable plasma sheath. Range of the ion Mach number at the sheath edge, the floating wall potential relative to the plasmas, and secondary electron emission coefficients corresponding to the vanishing normal electric fields are found for hydrogen, argon and xenon plasmas. The results show that a relatively small range of secondary electron emission coefficient exists to allow stable sheaths structures along with larger ranges of ion injection speed at the sheath edge and floating potential of the emitting wall.     

Numerical study on discharge characteristics influenced by secondary electron emission in capacitive RF argon glow discharges by fluid modeling

A one-dimensional(1D) fluid model of capacitive RF argon glow discharges between two parallel-plate electrodes at low pressure is employed. The influence of the secondary electron emission on the plasma characteristics in the discharges is investigated numerically by the model. The results show that as the secondary electron emission coefficient increases,the cycle-averaged electric field has almost no change; the cycle-averaged electron temperature in the bulk plasma almost does not change, but it increases in the two sheath regions; the cycle-averaged ionization rate, electron density, electron current density, ion current density, and total current density all increase. Also, the cycle-averaged secondary electron fluxes on the surfaces of the electrodes increase as the secondary electron emission coefficient increases. The evolutions of the electron flux, the secondary electron flux and the ion flux on the powered electrode increase as the secondary electron emission coefficient increases. The cycle-averaged electron pressure heating, electron Ohmic heating, electron heating, and ion heating in the two sheath regions increase as the secondary electron emission coefficient increases. The cycle-averaged electron energy loss increases with increasing secondary electron emission coefficient.     

Near-wall conductivity effect under a space-charge-saturated sheath in the Hall thruster

In this paper, we adopt the modified Morozov secondary electron emission model to investigate the influence of the characteristic of a space-charge-saturated sheath near the insulated wall of the Hall thruster on the near-wall conductivity, by the method of two-dimensional (2D) particle simulation (2D+3V). The results show that due to the sharp increase of collision frequency between the electrons and the wall under the space-charge-saturated sheath, the near-wall transport current under this sheath is remarkably higher than that under a classical sheath, and equals the near-wall transport current under a spatially oscillating sheath in order of magnitude. However, the transport currents under a space-charge-saturated sheath and a spatially oscillating sheath are different in mechanism, causing different current density distributions under the above two sheaths, and a great influence of channel width on the near-wall transport current under a space-charge-saturated sheath.     

Heat flow through a plasma sheath in the presence of secondary electron emission from plasma‐wall interaction

The formation of a plasma sheath in front of a negative wall emitting secondary electron is studied by a one‐dimensional fluid model. The model takes into account the effect of the ion temperature. With the secondary electron emission (SEE ) coefficient obtained by integrating over the Maxwellian electron velocity distribution for various materials such as Be, C, Mo, and W, it is found that the wall potential depends strongly on the ion temperature and the wall material. Before the occurrence of the space‐charge‐limited (SCL ) emission, the wall potential decreases with increasing ion temperature. The variation of the sheath potential caused by SEE affects the sheath energy transmission and impurity sputtering yield. If SEE is below SCL emission , the energy transmission coefficient always varies with the wall materials as a result of the effect of SEE , and it increases as the ion temperature is increased. By comparison of with and without SEE , it is found that sputtering yields have pronounced differences for low ion temperatures but are almost the same for high ion temperatures.