铝和银在铱（111）宽范围吸附的稳定性、原子构型及电子特性研究

利用第一性原理密度泛函理论研究了铝和银在铱的111面的宽范围吸附特性。基于密度泛函理论计算了覆盖度在0.11ML到2.00ML的结构稳定性、原子构型及平均结合能。对于铝原子在铱111面的吸附,最稳定的结构是铝原子覆盖度为0.5ML位于密堆六方空位（hcp-hollow）,相应的结合能为-4.68eV;对于亚层铝原子的吸附,最稳定结构是铝原子覆盖度为1.00ML时位于octahedral位置,相应的结合能为-5.28eV。对于覆盖度为2.00ML的满覆盖度混合结构的表层及亚层吸附,最稳定结构是Al位于六方密堆及八方密堆位置,相应的结合能为-4.70eV。这意味着当铝原子以满覆盖度吸附在铱的111面上时,趋向于在铱的111面的亚层形成化学键,而非吸附于表层。相比于铝吸附在铱111面,银的吸附特性呈现出很大的不同,面心位置更为稳定,在覆盖度为0.25ML时其结合能为3.89eV,略微高出密堆六方位置处3.88eV的结合能。     

铝和银在铱（111）宽范围吸附的稳定性、原子构型及电子特性研究

利用第一性原理密度泛函理论研究了铝和银在铱的111面的宽范围吸附特性。基于密度泛函理论计算了覆盖度在0.11ML到2.00ML的结构稳定性、原子构型及平均结合能。对于铝原子在铱111面的吸附,最稳定的结构是铝原子覆盖度为0.5ML位于密堆六方空位（hcp-hollow）,相应的结合能为-4.68eV;对于亚层铝原子的吸附,最稳定结构是铝原子覆盖度为1.00ML时位于octahedral位置,相应的结合能为-5.28eV。对于覆盖度为2.00ML的满覆盖度混合结构的表层及亚层吸附,最稳定结构是Al位于六方密堆及八方密堆位置,相应的结合能为-4.70eV。这意味着当铝原子以满覆盖度吸附在铱的111面上时,趋向于在铱的111面的亚层形成化学键,而非吸附于表层。相比于铝吸附在铱111面,银的吸附特性呈现出很大的不同,面心位置更为稳定,在覆盖度为0.25ML时其结合能为3.89eV,略微高出密堆六方位置处3.88eV的结合能。     

甲基和羟基在Ir(111)表面吸附的密度泛函理论研究

在超原胞近似和slab模型基础上,采用周期性密度泛函理论,在0.11覆盖度（ML）下,对甲基与羟基在Ir(111)表面的吸附进行了研究,得到了甲基和羟基在Ir(111)表面不同吸附位置的吸附能和吸附构型,计算了它们的振动频率,同时分析了甲基和羟基共吸附于Ir(111)表面的情况。结果表明,甲基和羟基在Ir(111)表面的最稳定吸附位置都是top位,甲基是碳端向下吸附,羟基是通过氧端向下倾斜吸附。通过频率分析发现吸附后CH3中C-H键的对称伸缩振动、反对称伸缩振动以及剪切振动频率均发生了红移,而羟基中的O-H键的振动频率发生蓝移现象。通过计算对比发现甲醇分解为甲基和羟基过程是一个放热反应,从热力学角度来说该反应是可行的。     

第一性原理计算Ni原子吸附在Al(111)表面原子结构和电子态

利用密度泛函理论和广义梯度近似研究镍吸附在Al(111)表面。在覆盖率为0.25ML下,分析了Ni吸附在Al(111)表面的面心立方洞位、六角密排洞位、顶位和桥位四个高对称位的原子结构和吸附能。比较不同高对称位的吸附能发现,六角密排洞位的吸附能最大,是5.76 eV,是最稳定的吸附位置。详细讨论了两个最低能量结构-三重洞位的电子结构、功函数、表面偶极距和Ni-Al键的特性。在费米能级附近,Ni-3d和Al-3s,3p轨道产生杂化,形成金属间化合键。由于吸附导致双金属体系表面偶极距和功函数的变化。我们发现：Ni原子与Al(111)表面原子间成建主要是共价键,没有表现出明显的静电荷跃迁,相应的产生非常小的表面偶极距。与面心立方洞位相比,六角密排洞位在费米能级附近产生较低的态密度,在键态附近产生较大的杂化。     

Al吸附在Pt,Ir和Au的(111)面的低覆盖度研究

应用密度泛函理论,系统研究了Al原子在Pt(111),Ir(111)和Au(111)表面的桥位、顶位、三重面心立方(fcc)洞位和六角密排(hcp)洞位这四个典型位置的吸附情况. 主要计算了三吸附体系的几何结构、平均结合能和差分电荷密度,并系统讨论了相关原子的密立根电荷布居数和投影态密度.研究发现,对于Pt(111)和Ir(111)表面,Al原子在hcp洞位最稳定,但是对于Au(111)表面,Al原子在fcc洞位最稳定. 关键词： 吸附 密度泛函理论 结合能 电子结构     

Aluminium adsorption on Ir(1 1 1) at a quarter monolayer coverage: A first-principles study

We present an ab initio density-functional study for aluminium adsorption on Ir(1 1 1) at high symmetry sites, namely, the fcc-, hcp-hollow, top and bridge sites. In each case, we calculate the atomic geometry, average binding energy, work function, and surface dipole moment at the coverage of 0.25 monolayer. We find the favourable structure to be Al at threefold hcp-hollow site, with a corresponding binding energy of 4.46 eV. We present and compare the electronic properties of the two lowest energy structures, i.e., at the threefold hollow sites and discuss the nature of the Al-Ir bond and binding site preference. In particular, we observe a large hybridization of Al-3s, 3p and Ir-5d states near Fermi level, forming an inter-metallic bonds. This results in a significant electron transfer from the Al atoms to the Ir(1 1 1) substrate, inducing an outward pointing surface dipole moment and a large decrease in the work function of 1.69 eV for Al in the hcp-hollow site. Compared to the fcc-hollow site, adsorption in the hcp-hollow site results in a lower density-of-states at the Fermi level, as well as a greater hybridization in the bonding states.     

氯原子在Cu(111)表面的吸附结构和电子态

密度泛函理论(DFT)总能计算研究了不同覆盖度下氯原子在Cu(111)表面的吸附结构和表面电子态。计算结果表明,清洁Cu(111)表面自由能 为15.72 ,表面功函数φ为4.753eV。在1/4ML和1/3ML覆盖度下,每个氯原子在Cu(111)表面fcc谷位的吸附能分别等于3.278eV/atom和3.284eV/atom。在1/2ML覆盖度下,两个紧邻氯原子分别吸附于fcc和hcp谷位,氯原子的平均吸附能为2.631eV/atom。在1/3ML覆盖度下,fcc和hcp两个位置每个氯原子吸附能的差值约为2meV/atom,与正入射X光驻波实验结合蒙特卡罗方法得到结果(<10meV/atom)基本一致。在1/4ML、1/3ML和1/2ML覆盖度下,吸附后Cu(111)表面的功函数依次为5.263eV、5.275eV和5.851eV。吸附原子和衬底价轨道杂化形成的局域表面电子态位于费米能级以下约1.2eV、3.6eV和4.5eV等处。吸附能和电子结构的计算结果表明,氯原子间的直接作用和表面铜原子紧邻氯原子数目是决定表面结构的两个重要因素。     

Au(111)表面甲基联二苯丙硫醇盐单层膜的原子结构

利用第一性原理研究了甲基联二苯丙硫醇盐(BP3S)单体、虚拟Au表面BP3S的分子链和单层膜及BP3S/Au(111)吸附系统的原子结构.计算表明BP3S单体呈对称结构,两苯环夹角为35°±10°.首先BP3S单体在虚拟Au(111)表面自组装成稳定的单一分子链.然后在虚拟Au(111)表面,分子链错位排列自组装成两种稳定的单层膜.在虚拟Au(111)-(3~(1/2)×7~(1/2))和Au(111)-(3~(1/2)×13~(1/2))表面,分子链与虚拟表面夹角分别为60°和30°.最后把两种稳定的单层膜吸附在Au(111)表面的四个吸附位,计算表明只有桥位和顶位稳定,且桥位的吸附能比顶位的吸附能低.比较吸附前后BP3S单层膜的结构变化,可知其变化不大,这说明吸附系统的结构参数主要取决于单层膜内的相互作用,衬底对其的影响不大.     

Pd与CeO2(111)面的相互作用的第一性原理研究

采用基于广义梯度近似的投影缀加平面波(projector augmented wave) 赝势和具有三维周期性边界条件的超晶胞模型，用第一性原理计算方法，计算并分析了Pd在CeO₂(111)面上不同覆盖度时的吸附能，价键结构和局域电子结构. 考虑了单层Pd和1/4单层Pd两种覆盖度吸附的情况. 结果表明：1)在单层吸附时，Pd的最佳吸附位置是O的顶位偏向Ce的桥位；在1/4单层吸附时，Pd最易在O的桥位偏向次层O的顶位吸附.2) 单层覆盖度吸附时，吸附原子Pd之间的作用较强；1/4单 关键词： 三元催化剂 Pd 2')" href="#">CeO₂ 吸附 密度泛函理论     

Ag(111)和Au(111)上铋的初始生长行为

半金属铋(Bi)的表面合金具有的Rashba效应,和其具体结构性质有重要关联.本文结合扫描隧道显微镜(STM)和密度泛函理论(DFT),系统地研究了Bi原子在Ag(111)和Au(111)上的不同初始生长行为.在室温Ag(111)上,连续的Ag₂Bi合金薄膜会优先在Ag台阶边缘形成;在570 K Ag(111)上,随着覆盖度增加到0.33分子层(ML),Bi优先取代配位数低的台阶边原子并从单原子随机分布转变为长程有序的Ag₂Bi合金相;随着覆盖度增加,Ag₂Bi通过退合金过程转变成p×3^1/2结构的Bi膜.Bi在室温和570 K的Au(111)上的生长行为一致:在覆盖度低于0.40 ML时,Bi会优先吸附在配位为5的Au原子上,并以单原子和团簇的形式分别分散在Au(111)的密堆积区域和鱼骨纹重构的拐角处;随着覆盖度增加到0.60 ML,无序的Bi会逐渐转变成长程有序的((37)^1/2×(37)^1/2)相;Bi的吸附会导致Au(111)表面应力逐步释放.Bi在Ag(111)和Au(111)上的不同生长行为表明,Bi原子与衬底之间的相互作用起着关键作用.     

Adsorption of O and CO on Ir(100) from first principles

The adsorption of O and CO on Iridium (100) surface with different coverages (Θ = 1.0, 0.5, 0.25 monolayer (ML)) is studied using density functional theory (DFT). The most energetically preferred site of adsorption for O is found to be the bridge site. However, the top site is the preferred one for CO at coverages of 0.25 ML and 0.5 ML. Oxygen adsorbed on the bridge site at 0.25 ML and 0.5 ML coverages causes a row pairing. A missing row reconstruction appears in the case of 0.25 ML coverage. We find that the adsorption of O (CO) on Ir(100) surface causes disruptions of Ir–Ir bonds in the metal, which reduces (increases) the Ir–Ir bond length.     

First-principles study of Ar adsorptions on the （111） surfaces of Pd, Pt, Cu, and Rh

In the present paper we give a detailed report on the results of our first-principles investigations of Ar adsorptions at the four high symmetry sites on M （111） （M =Pd, Pt, Cu, and Rh） surfaces. Our studies indicate that the most stable adsorption sites of Ar on Pd （111） and Pt （111） surfaces are found to be the fcc-hollow sites. However, for Ar adsorptions on Cu （111） and Rh （111） surfaces, the most favorable site is the on-top site. The density of states （DOS） is analyzed for Ar adsorption on M （111） surfaces, and it is concluded that the adsorption behavior is dominated by the interaction between 3s, 3p orbits of Ar atoms and the d orbit of the base metal atoms.     

Dynamical LEED analyses of the clean and the NO-adsorbed Ir(111) surface

The adsorption structure of nitric oxide (NO) on Ir(111) was studied by thermal desorption spectroscopy (TDS) and dynamical analyses of low-energy electron diffraction (LEED). At the saturation coverage at about 100 K, a 2 × 2 pattern was observed by LEED and two peaks appeared at 365 and 415 K in TDS. No change in the LEED I–V curves was observed by annealing at 280 K, which means that the NO-saturated surface was retained at this temperature. On the contrary, partial desorption and changes of the LEED I–V curves were observed by annealing at 360 K. Combined with previous vibrational studies, it is suggested that one adsorption species is not affected, while another species is partially desorbed and the rest of them are dissociated by annealing at 360 K. Dynamical analyses of LEED were performed for the 280 K-annealed and the 360 K-annealed surfaces, which correspond to the NO-saturated and the NO-dissociated Ir(111) surfaces, respectively. These revealed that NO occupies the atop, fcc-hollow and hcp-hollow sites (atop-NO + fcc-NO + hcp-NO) for the NO-saturated Ir(111) surface with the saturation coverage of 0.75 ML. For the 360 K-annealed surface, the atop-NO is not affected but the fcc-NO and the hcp-NO are partially desorbed as NO and partially dissociated to N and O, both of which occupy the fcc-hollow site on the surface.     

N2H4在NiFe(111)合金表面吸附稳定性和电子结构的第一性原理研究

采用基于色散校正的密度泛函理论进行了第一性原理研究, 详细分析了肼(N₂H₄)在Ni₈Fe₈/Ni(111)合金表面稳定吸附构型的吸附稳定性和电子结构及成键性质. 通过比较发现, 肼分子以桥接方式吸附在表面的两个Fe原子上是最稳定的吸附构型, 其吸附能为-1.578 eV/N₂H₄. 同时发现, 肼分子在这一表面上吸附稳定性的趋势为: 桥位比顶位吸附更有利, 且在Fe原子上比在Ni原子上的吸附作用更强. 进一步分析了不同吸附位点上稳定吸附构型的电子结构、电荷密度转移以及电子局域化情况. 结果发现: 相同吸附位点的电子态密度图基本一致, 并且N原子的p轨道和与之相互作用的表面原子的d轨道之间存在态密度上的重叠; 吸附后电荷密度则主要从肼分子转移到表面原子之上; 在电子局域化函数切面图中也发现吸附后电子被局域到肼分子的N原子和相邻的表面原子之间. 这些电子结构的表征都充分说明肼分子与表面原子之间通过电荷转移形成了强烈的配位共价作用.     

First-principle study of Mg adsorption on Si（111） surfaces

We have carried out first-principle calculations of Mg adsorption on Si(111) surfaces. Different adsorption sites and coverage effects have been considered. We found that the threefold hollow adsorption is energy-favoured in each coverage considered, while for the clean Si(111) surface of metallic feature, we found that 0.25 and 0.5 ML Mg adsorption leads to a semiconducting surface. The results for the electronic behaviour suggest a polarized covalent bonding between the Mg adatom and Si(111) surface.     

H2O在Al(111)表面吸附的量子化学研究

用量子化学从头算方法,以原子族Ａｌ１０模拟表面,研究了水在Ａｌ（１１１）表面上不同吸附拉的吸附情况,计算得到了稳定的吸附构型和结合能,结果表明：顶位是其最佳吸附位,而且水在表面能以两种取向被吸附,距表面较远时,Ｈ端靠近表面,然后跨过一能垒到达最佳吸附位,此时氧端靠近表面。在吸附过程中,水向表面转移电荷,导致表面功函降低,在氧原子不加极化函数进,水分子的二次轴垂直于表面时能量最低;当考虑中氧的ｄ轨道     

XPS studies of adatom-adatom interactions: I/Ag(111) and I/Cu(111)

We have studied submonolayer adsorption, at room temperature, of iodine on the (111) faces of silver and copper, using LEED and XPS. In both systems the √3 × √3 LEED pattern appears at ～0.2 monolayer (ML) coverage; no other superlattice pattern was observed. The $\text{I}\text{4}\text{d}{}_{\mathrm{<mtext>5</mtext><mtext>2</mtext>}}$ core electron binding energy in both cases decreases by ～0.15 eV between very dilute coverage and 0.33 ML. The leveling-off of the binding energy for I/Ag(111) for coverages >0.2 ML is shown to be a unique experimental manifestation of an indirect, substrate-mediated adatom-adatom interaction, an attraction of several meV between next-nearest neighbor iodine atoms. The more nearly linear decrease in the I binding energy on Cu(111) is shown to imply a significantly weaker next-nearest neighbor interaction on this surface. The appearance of the √3 × √3 LEED pattern at low coverages on Cu is shown to be consistent with short-range order produced merely by a size effect, that is, by nearest neighbor exclusion. These conclusions are reached with the help of Monte Carlo calculations of a triangular lattice gas.     

Ni(111)表面C原子吸附的密度泛函研究

基于密度泛函理论的第一性原理计算,对过渡金属Ni晶体与Ni (111)表面的结构和电子性质进行了研究, 并探讨了单个C原子在过渡金属Ni (111)表面的吸附以及两个C原子在Ni(111)表面的共吸附. 能带和态密度计算表明, Ni晶体及Ni (111)表面在费米面处均存在显著的电子自旋极化. 通过比较Ni (111)表面各位点的吸附能,发现单个C原子在该表面最稳定的吸附位置为第二层Ni原子上方所在的六角密排洞位, 吸附的第二个C原子与它形成碳二聚物时最稳定吸附位为第三层Ni原子上方所在的面心立方洞位. 电荷分析表明,共吸附时从每个C原子上各有1.566e电荷转移至相邻的Ni原子, 与单个C原子吸附时C与Ni原子间的电荷转移量(1.68e)相当. 计算发现两个C原子共吸附时在六角密排洞位和面心立方洞位的磁矩分别为0.059μ_B和 0.060μ_B,其值略大于单个C原子吸附时所具有的磁矩(0.017μ_B).     

过渡族金属掺杂Al(111)表面对氢分子催化分解的影响

为了探求过渡金属催化剂对催化合成储氢材料NaAlH₄效果的影响, 本文采用第一性原理方法研究了多种金属原子取代Al (111)表面铝原子形成的合金表面对氢的催化分解的影响. 计算结果表明, Sc, V, Fe, Ti原子掺杂的表面对氢分子分解具有催化作用. H₂在对应的掺杂表面催化分解所需要的活化能分别为0.54 eV, 0.29 eV, 0.51 eV, 0.12 eV. H原子在Sc, V, Ti掺杂表面扩散需要的活化能分别为0.51 eV, 0.66 eV, 0.57 eV. 同时, 过渡金属掺杂在Al表面时倾向于分散分布, 增加掺杂表面的掺杂原子个数, 掺杂表面的催化效果体现为单个掺杂过渡金属原子的催化效果. 本研究将为金属掺杂Al (111)表面催化加氢合成NaAlH₄提供理论参考.     

Adsorption and co-adsorption of CH<Subscript>3</Subscript> and H on flat and defective nickel (111) surfaces

We use a periodic density functional theory (DFT) code to study the adsorption of CH₃ and H, as well as their co-adsorption on a Ni(111) surface with and without Ni ad-atom, at a surface coverage of 0.25 monolayer (ML). We systematically investigate the site preference for CH₃ and H. Then we combine CH₃ and H in many co-adsorbed configurations on both surfaces. Methyl and hydrogen adsorption on a flat Ni(111) surface favours the hollow site over the top site. The presence of a Ni ad-atom stabilizes the adsorption of CH₃ better than a flat surface, while hydrogen is more stable on a flat Ni(111) surface. When H and CH₃ are co-adsorbed at nearest Ni neighbours on the (111) surface, their interaction is always repulsive. However, the dissociative adsorption of CH₄ is stabilised when the fragments are infinitely separated. For the co-adsorbed fragments CH₃ and H, in the presence of an ad-atom, the repulsive interaction is lowered, so that the dissociative form of CH₄ is locally stable.