Tin-related shallow donor in indium selenide

Hall-effect measurements in indium selenide samples doped with different amounts of tin are reported. The temperature dependance of free-electron concentration is interpreted through a single-donor single-acceptor model from which the ionisation energy of the tin related shallow donor (22 meV) and the compensation ratio are obtained. At low temperature the electron concentration departs from activated behaviour and tends to be constant. This can be interpreted through the existance of two-dimensional subbands related to interlayer planar aggregates of donor impurities that are located in energy below the tin-related donor level.     

DX centers in selectively Si-doped GaAs---AlAs superlattices

DX center has been characterized in four GaAs---AlAs superlattices grown by MBE at 580°C. The structures are uniformly Si-doped or selectively Si-doped in the AlAs layers or in the middle of the GaAs layers or on both sides of the interfaces. Deep level transient spectroscopy measurements (DLTS) put in evidence one dominant electron trap, with an activation energy for thermal emission of about 0.42eV for all the superlattices. This defect shows a thermally activated capture cross section and a large concentration except for the case where the only GaAs layers are doped. For the first time, a study of the capture reveals a capture activation energy of 0.36-0.37 eV, which allows us to locate the DX level nearly 60 meV below the conduction miniband. From these results, we show that the observed DX center is related to silicon in the AlAs layers. For the case when the AlAs barriers are not doped, the DX level is due to the Si diffusion from the middle of the wells towards the barriers, the Si atoms having diffused during the growth.     

In0.49Ga0.51P中缺陷的俘获行为

利用深能级瞬态谱（ＤＬＴＳ）和瞬态光电阻率谱（ＴＰＲＳ）研究了利用金属有机物化学汽相沉淀（ＭＯＣＶＤ）生长的未有意掺杂的Ｉｎ０．４９Ｇａ０．５１Ｐ中缺陷对载流子的俘获过程和发射过程．利用ＤＬＴＳ测量观测到了一个激活能为０．３７ｅＶ的缺陷,该缺陷的俘获势垒值介于１８０ｍｅＶ到２４０ｍｅＶ之间．该缺陷的俘获势垒值的大的分布被解释为缺陷周围原子重组的微观波动．在研究中发现研究这些缺陷的俘获过程比发射过程更有效,俘获势垒为０．０６ｅＶ和０．４０ｅＶ的两个缺陷在俘获过程中被观测到,而在发射过程中并没有观测到     

Photoluminescence study of aligned ZnO nanorods grown using chemical bath deposition

The photoluminescence study of self-assembled ZnO nanorods grown on a pre-treated Si substrate by a simple chemical bath deposition method at a temperature of 80 °C is hereby reported. By annealing in O₂ environment the UV emission is enhanced with diminishing deep level emission suggesting that most of the deep level emission is due to oxygen vacancies. The photoluminescence was investigated from 10 K to room temperature. The low temperature photoluminescence spectrum is dominated by donor-bound exciton. The activation energy and binding energy of shallow donors giving rise to bound exciton emission were calculated to be around 13.2 meV, 46 meV, respectively. Depending on these energy values and nature of growth environment, hydrogen is suggested to be the possible contaminating element acting as a donor.     

The Meyer-Neldel rule in the processes of thermal emission and hole capture in Ge/Si quantum dots

The hole thermal-emission rates and the cross sections for hole capture to the bound states in Ge quantum dots in Si are determined by admittance spectroscopy. The capture cross sections and the activation energies for emission rate are found to be related to each other by the Meyer-Neldel rule with a characteristic energy of 27±3 meV, which does not depend on the quantum-dot size. It is established that the capture cross section changes with temperature following the activation law. The experimental data are evidence of a unified multiphonon mechanism for the activation processes of hole transitions from the Ge quantum dots to the Si valence band and hole capture back into the quantum dots.     

Investigation of Mn incorporation in fifteen-period InGaAs/GaAs quantum well system

A ferromagnetic ordering with a Curie temperature of 50 K of fifteen layer of InGaMnAs/GaAs multi quantum wells (MQWs) structure grown on high resistivity (100) p-type GaAs substrates by molecular beam epitaxy (MBE) was found. It is likely that the ferromagnetic exchange coupling of sample with Curie temperature of 50 K is hole-mediated resulting in Mn substituting In or Ga sites. Temperature and excitation power dependent PL emission spectra of InGaMnAs MQWs sample grown at temperature of 170 °C show that an activation energy of Mn ion on the first quantum confinement level in InGaAs quantum well is 36 meV and impurity Mn is partly ionized. It is found that the activation energy of 36 meV of Mn ion in the QW is lower than the activation energy of 110 meV for a substitutional Mn impurity in GaAs. These measurements provide strong evidence that an impurity band existing in the bandgap due to substitutional Mn ions and it is the location of the Fermi level within the impurity band that determines Curie temperature.     

Donor states in tellurium-doped silicon

Hall effect and conductivity measurements are performed on Te-doped silicon in the temperature range 30KT800K. A Hall equipment suited for high temperatures up to 800 K has been constructed. The temperature dependence of the free electron concentration is analyzed for Te-doped silicon including one double-donor and several monovalent donor species. A deep level with an electrical activation energy of 200 meV is determined from the saturation of the free electron concentration at temperatures above 400 K. This level represents the first ionization stage of the Te double-donor. The second ionization stage is estimated to have an activation energy of 440 meV. The maximum electrically active Te concentration obtained is 5×10¹⁶cm^–3. Three different shallow donor states are resolved in the low-temperature range. The concentrations of these shallow donors are partially sensitive to a subsequent heat-treatment.     

Acceptor levels in indium selenide. An investigation by means of the Hall effect,deep-level-transient spectroscopy and photoluminescence

Acceptor levels related to I, II, IV, and V group impurities in indium selenide are studied by means of the Hall effect, deep-level-transient spectroscopy (DLTS) and photoluminescence. Activation energies for hole concentrations in the range from 200 to 300 meV have been measured. A reversible change of sign of the Hall voltage has been observed below 215 K. This behaviour can be explained through a model in which acceptor levels are assumed to be shallow and interlayer planar precipitates of ionized shallow donors create potential wells that behave as deep donors and in which a low concentration of bidimensional free electrons can exist. This model also explains the capacitance-voltage characteristics of both ITO/p-InSe and Au/p-InSe barriers. DLTS results are coherent with this model: hole traps in high concentration located about 570 meV above the valence band are detected. Photoluminescence also confirms the shallow character of acceptor levels. A broad band whose intensity is related to p conductivity appears in the PL spectra of low resistivity p-InSe. The shape and temperature dependence of this band can be explained through self-activated photoluminescence in a complex center in which the ground acceptor level must be at about 50 meV above the valence band.     

Shallow energy levels induced by γ rays in standard and oxygenated floating zone silicon

Shallow defect levels in floating zone (FZ) and diffusion oxygenated FZ (DOFZ) silicon, before and after irradiation with a ⁶⁰Co γ-source up to 300 Mrad, have been studied by thermally stimulated currents (TSC) and deep level transient spectroscopy (DLTS) in the temperature range 4.2–110 K. Besides vacancy oxygen (VO) and interstitial-substitutional carbon (C_iC_s) emissions, several TSC peaks have been observed. A trap with an activation energy of 11 meV has been observed at 6 K only in irradiated DOFZ. Two hole traps at 80 meV and 95 meV have been observed both in irradiated FZ and DOFZ, while a trap at 100 meV, related to an interstitial-oxygen (IO₂) complex, has been revealed only in irradiated DOFZ. A TSC peak close to 24 K has been resolved into two components, whose concentrations are independent of irradiation fluence: a trap at 55 meV and a level which remains charged after emission at 80 meV. Our measurements confirm the formation, only in DOFZ, of a radiation induced donor at 230 meV. It appears to be responsible for the improved radiation hardness of oxygenated Si together with the suppression of deep acceptors, since no shallower radiation-induced donors have been detected in DOFZ samples. PACS 71.55.Cn; 29.40.Wk; 61.80.Hg; 61.82.Fk     

AlGaAs∶Sn中DX中心电子俘获势垒的精细结构

采用定电容电压法,测量了n型Al026Ga074As∶Sn中DX中心电子热俘获瞬态,以及不同俘获时间后的电子热发射瞬态;并对瞬态数据进行数值Laplace变换,得到其Laplace缺陷谱(LDS).通过分析LDS谱,确定了电子热俘获和热发射LDS谱之间的对应关系,从而得到热俘获系数对温度依赖关系,以及与Sn相关的DX中心部分电子热俘获势垒的精细结构;通过第一原理赝势法计算表明,Sn附近的AlGa原子的不同配置是电子热俘获势垒精细结构产生的主要原因     

Observation of a donor-acceptor pair recombination in the edge emission of ZnSe crystal by electro-luminescence

An injection type electro-luminescence in ZnSe crystal has been studied by using ZnSe-SnO₂ hetero-junction at 20°K. In the emission peak observed around 2·70 eV, a clear energy shift toward the higher energy side with increasing injection current density has been found at low temperatures, which could be associated with the D-A pair (donor-acceptor pair) recombination process. The energy sum of the donor and acceptor activation is estimated to be larger than 137 meV. In the higher temperature region, this emission line turns out due to the ‘free-to-bound’ recombination, and the related acceptor ionization energy is considered to be ～120 meV. By taking into consideration the energies of bound exciton emission, the exciton localization energies and the related donor and acceptor ionization energies are evaluated.     

微纳跨尺度ZnO结构的紫外发射机理研究

利用气相输运的方法在Si(100)衬底上生长了ZnO的微纳跨尺度结构.扫描电镜照片可以明显地看到样品表面为椎顶六角微米柱-纳米棒的复合结构.样品在室温下的光致发光谱出现了很强的紫外发射峰,没有观察到与杂质或缺陷相关的深能级发射,表明样品有很好的光学质量.通过详细的研究样品的紫外发射谱与温度(83—307K)的依赖关系,发现在室温下样品的近带边发射包含两个部分,分别与自由激子发射和自由载流子到施主(受主)的跃迁(FB跃迁)相关,这个施主(受主)束缚态的离化能为124.6meV. 关键词： ZnO微纳跨尺度结构 光致发光谱 自由载流子到施主(受主)的跃迁 自由激子发射     

硅中金受主能级在单轴应力下瞬态电容的研究

用恒定温度下瞬态电容法研究了硅中金受主能级在沿〈100〉,〈110〉,〈111〉晶向单轴应力作用下的能级移动。考虑到硅的导带在单轴应力下的分裂,导出了单轴应力下深中心中电子发射率的公式。根据该式和发射率的实验数据以及切变畸变势常数Ξ_u,求出了金受主能级激活能随应力的改变。在实验应力范围内(0—9kbar),激活能与应力成线性关系。当应力平行于〈110〉〈111〉晶向时,激活能随应力改变的斜率分别为α_<110>=-3.2±0.6meV/kbar,α_<111>=-0.3±0.6meV/kbar;当应力平行于〈100〉晶向,若取Ξ_u=9.2eV,α_<100>=-5.8±0.8meV/kbar,若取Ξ_u=11.4eV,α_<100>=-5.3±0.8meV/kbar,α表现出强烈的各向异性。进一步确定了金受主能级相对于零压力下导带底的绝对移动的压力系数。若取Ξ_u=9.2eV,这些系数分别为S_<100>=-1.3±0.8meV/kbar,S_<110>=0.7±0.6meV/kbar,S_<111>=-0.7±0.6meV/kbar。如取Ξ=11.4eV,则S_<100>=-3.5±0.8meV/kbar,S_<110>=0.0±0.6meV/kbar,S_<111>=-1.0±0.6meV/kbar。同一组的三个绝对移动值之间的偏离都超过了实验误差这一事实,说明了金中心具有立方对称性,同时中性金与带负电的金的基态都是非简并的可能性很小。 关键词：     

Thermal quenching of photoluminescence in GeSe2 glass,thin films and crystals

Investigations were carried out on the temperature dependence of the photoluminescence intensity and the emission band characteristics in GeSe₂ glasses, evaporated thin films and crystals at T >80 K, paying special attention to the fatigue taking place 20–50 s from the onset of excitation. From the temperature dependence of the initial and quasi-steady-state values of the PL intensity an activation energy 295?30 meV at T >210 K was deduced for the glass whereas two activation energies E₁=56±2 meV and E₂=96±3 meV were deduced for the crystalline GeSe₂. The strong fatigue observed in the evaporated thin films was attributed to their loose structure. The fast fatigue in the crystal was considered to result from the recombination of quasi-excitons through radiative and non-radiative channels. A configuration coordinate diagram involving a stable and a metastable state is proposed as a means of explaining this type of fatigue. The temperature dependence of the PL intensity is discussed in terms of a recently proposed model.     

Si中Pt的复合行为

本文在不同本底掺杂浓度的n-Si与p-Si的扩Pt深扩散结样品中,利用暗电容瞬态法观察到了零偏压偏置结的耗尽区内,在E_F以上kT范围的深能级处的电子发射与俘获瞬态过程。这类瞬态行为满足该处不同起始条件的深能级的电子变化率方程的解。本文并对发射瞬态的产生提出了一种机理,认为它的存在是与深扩散结的结构密切有关,至于俘获瞬态则与不同杂质的俘获特性密切有关。 关键词：     

双异质结AlxGa1-xAs/GaAs发光管中与氧有关能级的测量

用DLTS和单次脉冲瞬态电容技术研究了液相外延生长的双异质结AlxGa1-xAs/GaAs发光管,掺Si的n-Al0.05Ga0.95As有源层中的深能级。着重分析了一个与氧有关的电子陷阱,其发射激活能为EC-ED=0.29eV。我们发现该电子陷阱随正向注入脉冲宽度tp的增加DLTS峰向低温移动,即在确定的温度下发射率随tp的增加而增加。用DLTS首次测得该能级的俘获瞬态谱,发现俘获峰随反向撤空脉冲宽度tR的增加向低温端移动,即在确定的温度下俘获率随tR的增加而增加,并且俘获激活能从△Eσ=0.28eV变化到0.26eV,用位形坐标图讨论了引起变化的原因。     

Energy levels from lattice defects in AgGaS2

The luminescence of single crystals of AgGaS₂ from shallow centers is studied. As-grown crystals and crystals annealed in S, Ga, or in vacuum, were used. We show that the S vacancy causes a donor level at 50 meV (probably due to a charge state of V_S) and that the cation vacancy (perhaps Ag) introduces an acceptor level at 110 meV. Two other levels are found: a donor level at 30 meV and an acceptor level at 200 meV. Their origin is unknown.     

Efficient above-band-gap light emission in germanium Invited Paper

We report an above-band-gap radiative transition in the photoluminescence spectra of single crystalline Ge in the temperature range of 20-296 K. The temperature-independence of the peak position at ～0.74 eV is remarkably different from the behavior of direct and indirect gap transitions in Ge. This transition is observed in n-type, p-type, and intrinsic single crystal Ge alike, and its intensity decreases with the increase of temperature with a small activation energy of 56 meV. Some aspects of the transition are analogous to Ⅲ-Ⅴ semiconductors with dilute nitrogen doping, which suggests that the origin could be related to an isoelectronic defect.     

自支撑Ag掺杂ZnO花状纳米线阵列及其光学性质

利用简单、温和的二步水浴法制备一种大面积自支撑、可自由迁移的Ag掺杂ZnO花状纳米线阵列。通过场发射扫描电子显微镜（FESEM）、元素能谱（EDS）、X射线衍射谱（XRD）、室温和变温光致发光谱（PL）等一系列表征手段对所制备的自支撑Ag掺杂ZnO纳米线阵列进行了研究。研究结果显示：这种自支撑纳米材料具有良好的晶体质量和光学性质,在低温（85 K）下显示出A⁰X和FA为主导的受主相关发射峰,通过理论公式计算受主结合能为118 meV。在变温光致发光光谱中,FA发射峰位随温度的变化符合理论模型。     

Effects of photoexcitation on the current transport mechanism in amorphous indium selenide thin films

The effect of photoexcitation on the current transport mechanism in amorphous indium selenide thin films was studied by means of dark and illuminated conductivity measurements as a function of temperature. Analysis of the dark electrical conductivity in the temperature range 110–320 K reveals behaviour characteristic of carriers excited to the conduction band and thermally assisted variable-range hopping (VRH) at the Fermi level above 280 K and below 220 K, respectively. In the temperature range 220–280 K, a mixed conduction mechanism was observed. A conductivity activation energy of ～300 meV (above 280 K), a density of localised states (evaluated assuming a localisation length of 5 Å) of 1.08 × 10²¹ cm^?3 eV^?1, an average hopping distance of 20.03 Å (at 120 K) and an average hopping energy of 27.64 meV have been determined from the dark electrical measurements. When the sample was exposed to illumination at a specific excitation flux and energy, the values of the conductivity activation energy, the average hopping energy and the average hopping range were significantly decreased. On the other hand, the density of localised states near the Fermi level increased when the light flux was increased. Such behaviour was attributed to a reversible Fermi level shift on photoexcitation.