Delocalization of phonon-plasmon modes in GaAs/AlAs superlattices with tunnel-thin AlAs barriers

The technique of Raman spectroscopy has been used to investigate doped (n-type) and undoped GaAs/AlAs superlattices with AlAs barrier thicknesses from 17 to 1 monolayers. The peak corresponding to the scattering by a two-dimensional plasmon was found in the Raman spectrum of a doped superlattice with relatively thick barriers. The position of the experimental peak corresponded to the value calculated in the model of plasma oscillations in periodic planes of a two-dimensional electron gas. The electron tunneling effects played an increasingly prominent role as the AlAs barrier thickness decreased. The peaks corresponding to the scattering by coupled phonons with three-dimensional plasmons were found in the Raman spectra for a superlattice with an AlAs thickness of 2 monolayers; i.e., the delocalization of coupled modes was observed. In this case, the folding of acoustic phonons was observed in the superlattice under consideration, indicative of its good periodicity, while the localization of optical phonons in GaAs layers was observed in undoped superlattices with an AlAs thickness of 2 monolayers.     

Electrical properties of DX centers in GaAs and AlGaAs

Abstract

The DX center, the lowest energy state of the donor in AIGaAs with x < 0.22, is responsible for the reduced conductivity as well as the persistent photoconductivity observed in this material at low temperature. Extensive studies of the properties of this deep level in Si-doped AIGaAs are reviewed here. Data are presented showing that the characteristics of the DX center remain essentially unchanged when it is resonant with the conduction band (x < 0.22) and that, independent of other compensation mechanisms, the DX center therefore limits the free carrier concentration in Si-doped GaAs to a maximum of about 2 × 10¹⁹ cm^?3. Recent measurements suggesting that the lattice relaxation involves the motion of the Si atom from the substitutional site toward an interstitial site are also presented. Evidence for the negative U model, that the DX level is the two electron state of the substitutional donor, is discussed.     

Interface corrugation effect on the polarization anisotropy of photoluminescence from (311)A GaAs/AlAs short-period superlattices

Studying GaAs/AlAs superlattices containing a quantum-well-wire array revealed photoluminescence polarization anisotropy for samples with GaAs layers less than 21 Å thick. It was found that polarization for a thickness of more than 40 Å was mainly due to valence band anisotropy, whereas polarization for a thickness of less than 21 Å was equally attributable to both valence band anisotropy and anisotropy associated with interface corrugation. For a GaAs layer thickness of less than 21 Å, a blueshift of the Γ electron-Γ heavy hole transition was observed. In this transition, the position of the peak of photoluminescence from the GaAs/AlAs (311)A superlattices containing a quantum-well-wire array is shifted toward higher energies compared to the (311)B and (100) superlattices containing no quantum-well wire with the same GaAs layer thickness. The conclusion was made that a blueshift is observed in GaAs/AlAs superlattices with GaAs layers less than 21 Å thick and a red-shift is observed when the thickness is larger than 43 Å.     

Evidence for interlayer donor–acceptor recombination in type II GaAs/AlAs superlattices

Steady-state and time-resolved photoluminescence of (GaAs)₇(AlAs)₉type II superlattices grown simultaneously by molecular beam epitaxy on (311)A and (100) GaAs substrates, intentionally undoped or uniformly doped with silicon, has been studied. It is shown that at temperatures T >  30 K, the dominant line in the photoluminescence spectra of superlattices is caused by donor–acceptor recombination between the donors located in the AlAs layers and the acceptors in the GaAs layers. The sum of the binding energies of the donors and acceptors in the pairs has been determined. A spectrally-dependent linear polarization of the donor–acceptor line along the direction of the interface corrugation of the superlattice has been discovered in the spectra of (311)A-oriented superlattices.     

Structure and photoluminescence study of type-II GaAs quantum wires and dots grown on nano-faceted (3 1 1)A surface

(3 1 1)A GaAs/AlAs corrugated superlattices (CSLs) and satellite (3 1 1)B and (1 0 0) SLs were studied using Raman spectroscopy, high-resolution transmittance electron microscopy (HRTEM) and photoluminescence (PL). The thickness of GaAs layers was varied from 1 monolayer (ML) to 10 ML, the thickness of AlAs barriers was 10 ML in (3 1 1) direction. The strongest modification of the Raman spectra is found for the case of partial (<1 nm) GaAs filling of the AlAs surface. The calculated and experimental Raman spectra demonstrated a good agreement for both complete (1 nm) and partial (<1 nm) GaAs filling of the AlAs surface. According to Raman and HRTEM data, in the case of partial filling of (3 1 1)A AlAs surface, GaAs forms quantum well wires of finite length (quantum dots). A drastic difference of PL from grown side-by-side (3 1 1)A and (3 1 1)B SLs was observed. A strong room temperature PL in the green–yellow spectral region was observed in GaAs/AlAs (3 1 1)A CSLs containing GaAs type-II quantum dots.     

有源层掺杂剂对Ga1-xAlxAs/GaAs双异质结发光管特性的影响

本文研究了由液相外延技术生长的GaAIAs/GaAs双异质结材料制成的发光管,有源层掺杂剂对器件特性的影响结果表明,器件结构和器件制作工艺相同的GaAIAs/GaAs发光管,有源层掺Si可获得较大的光输出功率,而频响特性<15MHz,波长在8700Å以上;对有源层掺Ge器件,光输出功率低于掺Si器件,而频响特性则>15MHz,波长可控制在8200Å~8500Å.深能级测量表明二者有不同的深能级位置,对掺Si(氧沾污)器件,Ec-ET≈0.29eV,而掺Ge器件ET-Ev≈0.42eV.两种掺杂剂对有源层暗缺陷的影响尚无明显区别.     

Shallow acceptor luminescence in GaAs grown by liquid phase epitaxy

Two pairs of photoluminescence (PL) emission bands between 1.494 and 1.480 eV have been observed at 4.2°K from high purity, undoped GaAs layers grown by liquid phase epitaxy. The PL emission from doped layers grown after incremental Si additions to a single parent melt suggests that Si acceptors are responsible for the lower energy pair of bands near 1.484 eV. The identity of the acceptor species responsible for the higher energy pair near 1.493 eV is presently unknown.     

Raman study of confined TO phonons in GaAs/AlAs superlattices grown on GaAs (311)A and B surfaces

The use of Raman scattering in different polarization geometries makes it possible to observe the splitting of transverse optical (TO) phonon modes confined in GaAs/AlAs superlattices grown on faceted GaAs (311)A surfaces. The frequencies of TO modes with atomic displacements in the direction along the facets were observed to be higher than in the transverse one. Increased splitting, up to 3.5 cm ^− 1, was observed for (311)A superlattices when the average thickness of the GaAs layers was 6 monolayers or less. The splitting was absent in superlattices grown on (311)B surfaces under the same conditions. The effect of splitting is reputed to be caused by corrugation of GaAs/AlAs (311)A interfaces and formation of lateral superlattices or arrays of quantum wires, depending on the GaAs layer thickness.     

Photoluminescence study of Si doped and undoped Chalcopyrite CuGaSe2 thin films

Photoluminescence (PL) characteristics have been studied on undoped and Si-doped CuGaSe₂ single crystal thin films grown on GaAs (001) substrate by migration-enhanced epitaxy. Room temperature PL spectrum of an undoped layer clearly shows free excitonic emission bands related to the minimum band-edge and to the split-off valence band, but no discernible emission has been observed in the low energy area. At 4.2 K, the excitonic emission due to the split-off valence band disappears. Instead, two additional emissions appear at 1.68 and 1.715 eV which are attributed to the bound exciton and band-to-acceptor transition. The Si doping to CuGaSe₂ produces two additional PL bands around 1.61 and 1.64 eV. These PL bands are attributed to the donor acceptor pair emissions due to the doped Si impurity which probably occupies Cu or Ga sites and intrinsic Cu vacancy.     

O2在Si掺杂石墨烯上吸附与活化

采用包含色散力校正的密度泛函理论方法(DFT-D)研究了O2在Si掺杂石墨烯(Si-Gra)上吸附与活化. 研究结果表明: 1) 与纯净石墨烯相比, Si掺杂极大的增强了石墨烯对O2的吸附能力. O2的最稳定吸附构型是以Side-on 模式吸附在掺杂的Si的顶位, 形成O-Si-O三元环. 次稳定吸附构型是与Si及近邻的一个C形成O-Si-C-O四元环结构. 两个吸附构型对应的吸附能分别为-2.40和-1.93 eV; 2) O2有两种分解路径: 直接分解路径(势垒为0.53 eV)和整体扩散后的分解路径(势垒为0.81 eV); 3) 分解之后的两个O原子分别吸附在Si的顶位和相邻碳环的两个碳原子的桥位; 4) 电子结构分析表明吸附的O2从Si-Gra获得较多电荷, 从而被活化. 总之, Si-Gra具有较强的催化氧气还原能力, 是一种潜在的良好的非金属氧还原催化剂.     

O_2在Si掺杂石墨烯上吸附与活化

采用包含色散力校正的密度泛函理论方法(DFT-D)研究了O2在Si掺杂石墨烯(Si-Gra)上吸附与活化.研究结果表明:1)与纯净石墨烯相比,Si掺杂极大的增强了石墨烯对O2的吸附能力.O2的最稳定吸附构型是以Side-on模式吸附在掺杂的Si的顶位,形成O-Si-O三元环.次稳定吸附构型是与Si及近邻的一个C形成O-Si-C-O四元环结构.两个吸附构型对应的吸附能分别为-2.40和-1.93eV;2)O2有两种分解路径:直接分解路径(势垒为0.53eV)和整体扩散后的分解路径(势垒为0.81eV);3)分解之后的两个O原子分别吸附在Si的顶位和相邻碳环的两个碳原子的桥位;4)电子结构分析表明吸附的O2从Si-Gra获得较多电荷,从而被活化.总之,Si-Gra具有较强的催化氧气还原能力,是一种潜在的良好的非金属氧还原催化剂.     

Si掺杂Al_2O_3电子结构的第一性原理计算

本文采用第一性原理对纯Al2O3和Si掺杂的Si0.167Al0.833O1.5,Si0.25Al0.75O1.5晶体体系的能带结构、态密度进行了计算分析.结果发现:随着Si在Al2O3晶体中所占比例的增加,体系能隙变小,在Si0.25Al0.75O1.5晶体体系中能隙已降到2.5 e V,表明该体系为半导体材料;而在掺杂的体系中有数条分散的能带穿过了费米能级,即可以预测该掺杂体系有特别的光电性质;同时对比纯Al2O3和Si掺杂的Si0.167Al0.833O1.5,Si0.25Al0.75O1.5晶体体系的总态密度,发现掺杂体系的价带和导带向低能区域移动.     

Si掺杂Al2O3电子结构的第一性原理计算

本文采用第一性原理对纯Al2O3和Si掺杂的Si 0.167Al0.833O1.5, Si 0.25Al0.75O1.5晶体体系的能带结构、态密度进行了计算分析. 结果发现：随着Si在Al2O3晶体中所占比例的增加,体系能隙变小,在Si 0.25Al0.75O1.5晶体体系中能隙已降到2.5eV,表明该体系为半导体材料;而在掺杂的体系中有数条分散的能带穿过了费米能级,即可以预测该掺杂体系有特别的光电性质;同时对比纯Al2O3和Si掺杂的Si 0.167Al0.833O1.5, Si 0.25Al0.75O1.5晶体体系的总态密度,发现掺杂体系的价带和导带向低能区域移动.     

Study of n type porous GaAs by photoluminescence spectroscopy: Effect of the etching time on the deep levels

Photoluminescence (PL) analysis is used to study porous layers elaborated by electrochemical etching of n⁺ Si-doped GaAs substrate with different etching times. Temperature and power dependence photoluminescence (PL) studies were achieved to characterize the effect of the etching time on the deep levels of the n⁺ Si-doped GaAs. The energy emission at about 1.46 eV is attributed to the band-to-band (B-B) (e-h) recombination of a hole gas with electrons in the conduction band. The emission band is composed of four deep levels due to the complex of (V_AsSi_GaV_Ga), a complex of a (Ga vacancy - donor - As vacancy), a (Si_Ga-V_Ga³⁻) defect or Si clustering, and a (gallium antisite double acceptor-effective mass donor pair complex) and which peaked, respectively, at about (0.94, 1, 1.14, and 1.32 eV). The PL intensity behavior as function of the temperature is investigated, and the experimental results are fitted with a rate equation model with double thermal activation energies.     

Experimental discovery of the anisotropy of phonon-plasmon modes in GaAs/AlAs(100) superlattices

Doped (n-type) GaAs/AlAs superlattices with thicknesses of the GaAs and AlAs layers from 1.7 to 6.8 Å and 13.6 Å, respectively, have been studied by means of Raman spectroscopy. The use of a microattachment for Raman backscattering studies has allowed for the observation of the modes with the wave vector directed both across and along the superlattice layers (in the scattering from the side face of the superlattice). The theoretically predicted anisotropy of mixed phonon-plasmon modes caused by the anisotropy of the electron effective mass in the type II superlattices has been experimentally discovered.     

FIRST-PRINCIPLE SELF-CONSISTENT PSEUDOPOTENTIAL CALCULATION OF THE ELECTRONIC STRUCTURES OF SHORT-PERIOD (GaAs)m(AlAs)n SUPERLATT1CES

With the local density approximation, the band structares of the short-period (GaAs)₁(AlAs)₁ and (GaAs)₂(AlAs)₁ superlattices are calculated by using the first-principle self-consistent pseudopotential method. The results show that the (GaAs)₁(AlAs)₁ superlattice is an indirect semiconductor, and the lowest conduction band state is at point R in the Brillouin zone; the (GaAs)₂(AlAs)₁ superlattice is a direct semiconductor and the lowest conduction band state is at point Γ. The squared matrix elements of transition are calculated. The pressure coefficients of energy gaps of the (GaAs)₁(AlAs)₁ and (GaAs)₂(AlAs)₁ superlattices are calculated and compared with those obtained by hydrostatic pressure experiments.     

Donor-acceptor recombination in type-II GaAs/AlAs superlattices

A study is reported of steady-and nonsteady-state photoluminescence of intentionally undoped and uniformly silicon-doped type-II (GaAs)₇(AlAs)₉ superlattices grown by MBE simultaneously on (311)A-and (100)-oriented GaAs substrates. It has been established that at elevated temperatures (160>T>30 K) the superlattice spectra are dominated by the line due to the donor-acceptor recombination between donors in the AlAs layers and acceptors located in the GaAs layers. The total carrier binding energy to the donor and acceptor in a pair has been determined. Fiz. Tverd. Tela (St. Petersburg) 40, 1734–1739 (September 1998)     

Anisotropy of long-wavelength optical phonons in GaAs/AlAs superlattices

The angular anisotropy of optical phonons in GaAs/AlAs (001) superlattices is investigated by Raman scattering spectroscopy. Scattering configurations allowed for phonons with wave vectors oriented along the superlattice layers and normally to them are used. For phonons localized in GaAs layers, the theoretically predicted mixing of the LO1 longitudinal modes with TO1 transverse modes in which atomic displacements occur along the normal to the superlattice is observed experimentally. These modes possess noticeable angular anisotropy. For transverse modes in which atoms move in the plane of the superlattice, the angular anisotropy is small.     

Effects of Si-doped GaAs layer on optical properties of InAs quantum dots

We have investigated the optical properties of InAs self-assembled quantum dots (SAQDs) with the Si-doped GaAs barrier layer. Two types of samples are fabricated according to the position of the Si-doped GaAs layer. For type A samples the Si-doped GaAs layer is grown below the QDs, whereas for type B samples the Si-doped GaAs layer is grown above the QDs. For both types of samples the excited-state emissions caused by state filling are observed in photoluminescence (PL) spectra at high excitation power densities. The bandgap renormalization of QDs can be found from the shift of the PL peak energy. Particularly, for type A samples the Si atoms act as nucleation centers during the growth of InAs QDs on the Si-doped GaAs layer and affect the density and the size of the QDs. The Si-doped GaAs layer in type A samples has more effects on the properties of QDs, such as state filling and bandgap renormalization than those of type B samples.     

Photoluminescence and the structure of heterointerfaces of (311)A-and (311)B-oriented GaAs/AlAs superlattices

GaAs/AlAs superlattices grown simultaneously on GaAs substrates with the (311)A and (311)B orientations have been studied by photoluminescence and high-resolution transmission electron microscopy with a Fourier analysis of images. A periodic interface corrugation is observed for (311)B superlattices. A comparison of the structure of (311)A and (311)B superlattices indicates that the corrugation occurs in both cases and its period along the $[01\overline 1 ]$ direction is equal to 3.2 nm. The corrugation is less pronounced in (311)B superlattices, wherein it exhibits an additional modulation (long-wavelength disorder) with the characteristic lateral size exceeding 10 nm. The vertical correlation of regions rich in GaAs and AlAs, which is well observed in (311)A superlattices, is weak in (311)B superlattices due to the occurrence of long-wavelength disorder. The optical properties of (311)B superlattices are similar to those of (100) ones and differ radically from those of (311)A superlattices. As distinct from (311)B, strong photoluminescence polarization anisotropy is observed for (311)A superlattices. It is shown that it is the interface corrugation rather than the crystallographic (311) surface orientation that determines the optical properties of (311)A corrugated superlattices with thin GaAs and AlAs layers.