1064 nm和532 nm纳秒激光同时辐照熔石英损伤规律的研究

利用Nd: YAG激光器研究基频(1064 nm)与倍频(532 nm)单独辐照和同时辐照下熔石英的损伤规律,对损伤几率进行了测试,获得损伤几率曲线与典型损伤形貌。研究结果表明:双波长同时辐照下的初始损伤阈值总是小于单波长辐照下的初始损伤阈值;基频光中加入定量倍频光后,熔石英对基频光的吸收效率提高;并且双波长同时辐照下,熔石英损伤密度增大;原因主要是熔石英表面缺陷对不同波长吸收机制的差异。     

Comparative study of UV absorption changes induced in germanosilicate glass by high-intensity femtosecond pulses at 267, 400 and 800 nm

We investigated UV absorption changes induced in 3.5 mol% Ge-doped fused silica at high-intensity (∼10¹¹-10¹³ W/cm²) femtosecond (130 fs) irradiation at 267, 400 and 800 nm. We have shown that the induced spectra in the region 190-300 nm are similar in all three cases. At 800 nm irradiation, in addition to the UV absorption changes, we observed small-scale damage due to self-focusing. This damage appears when the incident pulse fluence value of about 1 J/cm² (pulse intensity of about 7.5 × 10¹² W/cm²) is overcome, while the threshold for the induced absorption changes is twice lower.     

高功率脉冲电子束辐照SiO$lt;sub$gt;2$lt;/sub$gt;的光学和激光损伤性能

研究了不同剂量的60 kW高功率脉冲电子束辐照对高纯熔石英玻璃的微观结构、光学性能和激光损伤特性的影响规律. 光学显微图像表明, 辐照后熔石英样品由于热效应导致表面破裂, 裂纹密度和尺寸随辐照剂量增加而增大, 采用原子力显微镜分析表面裂纹的微观形貌, 裂纹宽度约1 um, 同时样品表面分布着大量尺寸约0.1–1μm的碎片颗粒. 吸收光谱测试表明, 所有样品均在394 nm处出现微弱的吸收峰, 吸收强度随着电子束辐照剂量增大呈现先增加后减小的趋势. 荧光光谱测试发现辐照前后样品均有3个荧光带, 分别位于460, 494和520 nm, 荧光强度随辐照剂量的变化趋势与吸收光谱一致. 利用355 nm激光研究了不同剂量电子束辐照对熔石英激光损伤阈值的影响, 结果表明熔石英的损伤阈值随着辐照剂量的增加而降低. 在剂量较低时, 导致熔石英激光损伤阈值下降的原因主要是色心缺陷; 剂量较高时, 导致损伤阈值降低的原因主要是样品表面产生的大量微裂纹和碎片颗粒对激光的调制和吸收. 关键词： 熔石英 电子束辐照 色心 激光损伤阈值     

真空环境中紫外脉冲激光对熔石英抗损伤能力的影响

在10-3Pa的高真空环境下,利用355nm的紫外脉冲激光以低于石英基片零概率损伤阈值的能量密度对其进行重复多次的全口径扫描,目的是为了研究石英基片在接受不同剂量的紫外激光辐照后其抗损伤能力的变化和原因.通过辐照过程中损伤点的扩展程度以及辐照后的抗损伤测量表明,高真空环境下紫外脉冲激光辐照后的石英基片抗损伤能力明显降低,降低的幅度更多的与其接受激光辐照的次数有关,辐照能量密度的影响相对较小;通过荧光及X射线光电子能谱(XPS)检测发现,紫外脉冲激光辐照后石英基片表面氧缺位的增加是导致其抗损伤能力下降的主要原因,其程度也直接与接受辐照的紫外脉冲激光剂量相关.     

Production of defects in ZBLAN, ZBLAN:Tm and ZBLAN:Cr glasses by ultra-short pulses laser interaction

In this work we have studied pure and thulium- and chromium-doped ZBLAN glasses irradiated by ultra-short laser pulses. A Ti:sapphire CPA system was used, producing a 500 Hz train of pulses, centered at 830 nm, with 375 μJ of energy and 50 fs of duration (FWHM). The beam was focused by a 20 mm lens, producing a converging beam with a waist of 12 μm. The absorption spectra before and after laser irradiation were obtained showing production of color centers in pure, thulium-doped and chromium-doped ZBLAN glasses. A damage threshold of 9.56 T W/cm² was determined for ZBLAN.     

Diamond-like phase formation in an amorphous carbon films prepared by periodic pulsed laser deposition and laser irradiation method

Diamond-like carbon (DLC) films were fabricated by pulsed laser ablation of a liquid target. During deposition process the growing films were exited by a laser beam irradiation. The films were deposited onto the fused silica using 248 nm KrF eximer laser at room temperature and 10⁻³ mbar pressure. Film irradiation was carried out by the same KrF laser operating periodically between the deposition and excitation regimes. Deposited DLC films were characterized by Raman scattering spectroscopy. The results obtained suggested that laser irradiation intensity has noticeable influence on the structure and hybridization of carbon atoms deposited. For materials deposited at moderate irradiation intensities a very high and sharp peak appeared at 1332 cm⁻¹, characteristic of diamond crystals. At higher irradiation intensities the graphitization of the amorphous films was observed. Thus, at optimal energy density the individual sp³-hybridized carbon phase was deposited inside the amorphous carbon structure. Surface morphology for DLC has been analyzed using atomic force microscopy (AFM) indicating that more regular diamond cluster formation at optimal additional laser illumination conditions (∼20 mJ per impulse) is possible.     

基于激光近场和图像分割技术的复合波长诱导熔石英损伤实验研究

在复合波长(波长分别为1053、527、351nm)情况下,利用激光近场对熔石英样品进行损伤实验。设计了一种基于激光近场辐照的损伤阈值定义方法,并利用带有灰度抑制的分水岭标记算法对损伤图像进行损伤区域提取,通过对比损伤图像与相应光束近场能量分布,计算出损伤区域与非损伤区域临界处的光能量密度,即为熔石英样品的损伤阈值。实验结果表明,复合波长激光诱导熔石英损伤是3种波长激光共同作用的结果,但351nm激光对损伤起主要作用,初始损伤阈值为8.22J/cm2;在复合波长激光多次辐照样品的情况下,熔石英样品后表面的损伤成指数形式增长,损伤增长系数为0.59。     

Upconversion dynamics in Er-doped YAG

Green, blue, violet and ultraviolet upconversion luminescence is reported at room temperature in a YAG: 10.5%Er³⁺ crystal pumped by one-colour (647 nm) and two-colour (647+618 nm) laser excitation. The upconversion mechanism was studied by means of time-resolved luminescence spectroscopy and the energy flow pathways are described. Based on the results it appears that energy transfer upconversion is the dominant contribution to the upconverted luminescence upon 647 nm excitation, and excited state absorption is the dominating mechanism upon 647+618 nm excitation.     

Subpicosecond laser ablation of copper and fused silica: Initiation threshold and plasma expansion

We investigated the subpicosecond laser ablation of copper and fused silica under 100 fs laser irradiation at 800 nm in vacuum by means of fast plume imaging and time- and space-resolved optical emission spectroscopy. We found that, to the difference of copper ablation, the laser-generated plasma from a fused silica target exhibited one “main” component only. The “slow” plasma component, observed during copper ablation and usually assigned to optical emission from nanoparticles was not detected by either plasma fast imaging or optical emission spectroscopy even when fused silica targets were submitted to the highest incident fluences used in our experiments. The characteristic expansion velocity of this unique component was about three times larger than the velocity of the fast plume component observed during copper ablation. The dependence of laser fluence on both plasma expansion and ablation rate was investigated and discussed in terms of ablation efficiency and initiation mechanisms.     

Analysis of material modifications induced during laser damage in SiO2 thin films

The damage mechanisms in silica thin films exposed to high fluence 1064 nm nano-second laser pulses are investigated. The thin films under study are made with different techniques (evaporation and sputtering, with and without ion assistance) and the results are compared. The material morphological, optical and structural modifications are locally analyzed with optical microscopy and profilometry, photoluminescence and absorption microscopies. These observations are made for fluences near and above the laser damage threshold, and also in the case of multiple pulse irradiations. An increase in absorption in and around the damages is observed, as well as the generation of different defects that we spatially resolve with absorption and luminescence mappings.