直读光谱法应用于金属合金分析与电镀层厚度测定之间的区别

本文从光谱分析原理比较入手，分析了利用火花原子发射光谱仪（直读光谱仪）进行金属合金分析和金属电镀层厚度测定之间的一系列区别，为火花原子发射光谱分析指出了一个崭新的应用领域。     

磁性ICF靶丸的化学镀工艺制备与表征

 采用化学镀工艺在ICF聚苯乙烯靶丸表面包覆了一层磁性的Ni-P合金镀层，并分别用扫描电子显微镜、能谱仪、X射线衍射仪以及振动样品磁强计对其形貌、组成、结构和磁性能进行了表征。结果表明：通过化学镀工艺制备的Ni-P合金镀层厚度约为4 μm，且为非晶结构，并具有一定的磁性；该磁性ICF靶丸可望用来进行磁悬浮实验研究。最后，对聚苯乙烯靶丸表面磁性涂层的制备机理进行了讨论。     

软X射线掠射筒状反射镜镀镍磷合金的研究

在软X射线掠射光学系统筒状反射镜的加工过程中,根据对反射镜内表面镍磷合金镀层的质量要求,采用镍盐还原法对筒状微晶玻璃反射镜的内表面进行了活化,并对在含有30g/LNiSO4.6H2O、30g/LNaH2PO2.H2O、25g/LNa(CH3COO).4H2O、18g/LC6H8O7、10mg/L添加剂的镀液中沉积镍磷合金镀层的工艺方法进行了探索。对得到的镍磷合金镀层的结合力、抗腐蚀能力等进行了测试。结果表明,采用此法镀制的镍磷合金镀层结合力达到4B级,耐蚀性好,能够满足光学精密抛光的要求。     

非晶态镍钨合金电镀工艺

非晶态镍钨合金由于具有长程无序，短程有序，无晶界、无位错，而具有极为优异的化学、物理和机械性能。非晶态镍钨合金镀层的结构致密，硬度高，耐热性好，尤其在高温下耐磨损、抗氧化，更能显示出其优良的自润滑和耐蚀性能。     

合金镀层的性能和应用

本文主要阐述了国内外合金镀层的性能、应用和发展前景。     

火焰原子吸收光谱法测定钴-镍合金镀层中的钴和镍

利用原子吸收光谱法研究了在氨基磺酸钴-镍镀液中，赫尔槽试片上不同电流密度区合金镀层中钴、镍的含量。实验表明，该方法简便，快捷，结果准确，精密度高。相对标准偏差（RSD）为0.30%-0.62%，加标回收率为97.0%-104.0%。     

高温全息光栅的制作工艺研究

本文提出了应用双镀层光刻法制作高温全息光栅的新工艺。此工艺范围广,制栅对象可选择陶瓷、石英等耐高温的非金属材料,也可选择耐高温合金等金属材料。高温实验结果表明.双镀层高温全息光栅具有较好的抗氧化能力,可作为高温变形测量的基本元件使用。     

阴极电弧离子沉积TiN／Ti镀层腐蚀特性

TiN镀层作为耐磨镀层，半导体工业中的扩散阻挡层，电子装置镀层，射频超导阱结构中的反次级电子倍增效应镀层，装饰和耐腐蚀保护镀层，已经在各个领域中得到广泛的应用。TiN镀层由于有很稳定的化学性能，以及和各种钢基材有较好的结合强度，特别适合用于材料的防腐蚀保护镀层。     

激光诱导击穿光谱对不规则未知镀层样品的分析

传统经典的镀层分析方法分析速度慢,对于不规则镀层样品较难分析,文中在最佳分析条件下,采用激光诱导击穿光谱法对两块不规则未知镀层样品进行分析,镀层分析曲线表明,两块未知镀层样品采用渗锌工艺制备而成,镀层表面的锌、 铁元素是主量元素,少量的铬起钝化作用,镀层界面下则是中低合金钢,用一套中低合金钢标准样品建立校准曲线,准确分析了镀层界面下中低合金钢的化学成分及Cr和Mo元素在镀层表面的含量变化情况,从而对未知不规则镀层样品的化学成分有一个深入的了解。     

金刚石薄膜光学镀层材料的应力特性研究

金刚石膜作为光学镀层时，应力的控制是一项关键技术，本文实验研究了金刚石膜和类金刚石膜作为光学镀层材料时的应力特性，并对此进行了分析。     

辉光放电光谱分析技术在金属材料分析中的应用

本文主要介绍了辉光放电光谱仪的基本原理，分析特点以及在金属材料分析中的应用，并从理论上推导出辉光放电光谱分析技术用于金属材料分析的理论依据。着重介绍了基板分析、深度逐层分析。对磷青铜镀银层逐层分析；渗碳、氮钢板分析；彩涂钢板分析进行了探讨。     

Tin amalgam mirrors: investigation by XRF, SEM-EDS, XRD and EPMA-WDS mapping

Ancient mirrors were constituted by a tin-mercury amalgam layer superimposed to a glass sheet. This was the only one method used until the nineteenth century, when the wet silvering process was invented. The tin amalgam is a binary alloy of tin and mercury constituted by two different phases: a mercury-rich liquid phase and a tin-rich solid phase. The amalgam alteration produces mercury loss and a general growth of the solid crystalline phase. In addition, tin dioxide and monoxide are formed with a consequent decrease of the amalgam adhesion to the glass. These degradation phenomena led to reduction or disappearance of the mirror reflective power. The aim of this study was the characterization of the amalgam layers of eight mirror samples dating during the seventeenth and nineteenth centuries. The samples were analyzed by X-ray diffraction and by a Scanning Electron Microscope with an Energy Dispersive Spectrometer (SEM-EDS), and for the first time on this type of alloy by X-ray Fluorescence and EPMA-WDS (Electron Probe Micro Analysis with Wavelength Dispersive Spectrometry) elemental mapping. The contents of tin, mercury, and some trace elements in the amalgam layers have been determined. The investigation of the superficial patterns of the amalgam by SEM, EPMA-WDS mapping, and SEM-EDS allowed a first understanding of some morphologies and processes of the degradation of the amalgam layer.     

银氧铯光电阴极的长波光谱响应和固溶小胶粒

本文在文献[1,2]的基础上探讨了银氧铯阴极中固溶小胶粒对光电发射的贡献,推导出光电子能量分布和光电流密度、量子产额等公式,并进行了理论计算。理论曲线与实验曲线符合得比较好,从而肯定了这种阴极中的小银胶粒对长波光电发射的作用,并得出它的等效胶粒直径为31?左右。本文还讨论了银氧铯阴极的铯量处理、蒸银敏化和Fowler曲线等问题。 关键词：     

Dissolution behaviour of the barrier layer of porous oxide films on aluminum formed in phosphoric acid studied by a re-anodizing technique

Chemical dissolution of the barrier layer of porous oxide films formed on aluminum foil (99.5% purity) in the 4% phosphoric acid after immersion in 2 mol dm⁻³ sulphuric acid at 50 °C has been studied. The barrier layer thickness before and after dissolution was determined using a re-anodizing technique. A digital voltmeter with a computer system was used to record the change in the anode potential with re-anodizing time. It has been found that the barrier layer material may consist of two or three regions according to the dissolution rate. The barrier oxide contains two layers at 35 V: the outer layer with the highest dissolution rate and the inner layer with low dissolution rate. The barrier oxide contains three layers at 40 V and above it: the outer layer with high dissolution rate, the middle layer with the highest dissolution rate and the inner layer with low dissolution rate. It has been shown that there is a dependence of the dissolution rate on the surface charge of anodic oxide film. Annealing of porous alumina films for 1 h at 200 °C leads to disappearance of layers with different dissolution rates in the barrier oxide. We explained this phenomenon by the absence of the space charge in the barrier oxide of such films.     

Analysis of chemical dissolution of the barrier layer of porous oxide on aluminum thin films using a re-anodizing technique

Chemical dissolution of the barrier layer of porous oxide formed on thin aluminum films (99.9% purity) in the 4% oxalic acid after immersion in 2 mol dm⁻³ sulphuric acid at 50 °C has been studied. The barrier layer thickness before and after dissolution was calculated using a re-anodizing technique. It has been shown that above 57 V the change in the growth mechanism of porous alumina films takes place. As a result, the change in the amount of regions in the barrier oxide with different dissolution rates is observed. The barrier oxide contains two layers at 50 V: the outer layer with the highest dissolution rate and the inner layer with a low dissolution rate. Above 60 V the barrier oxide contains three layers: the outer layer with a high dissolution rate, the middle layer with the highest dissolution rate and the inner layer with a low dissolution rate. We suggest that the formation of the outer layer of barrier oxide with a high dissolution rate is linked with the injection of protons or H₃O⁺ ions from the electrolyte into the oxide film at the anodizing voltages above 57 V.     

低速p/i界面缓冲层对高速沉积微晶硅太阳电池性能的影响

在采用高压高功率的甚高频等离子体增强化学气相沉积(VHF-PECVD)技术高速沉积微晶硅(μc-Si：H)太阳电池过程中,产生的高能离子对薄膜表面的轰击作用会降低薄膜质量和破坏p型掺杂层(p层)与本征层(i层)之间的界面特性.针对该问题提出在电池中引入低速沉积的p/i界面层的方法,即在p层上先低速沉积一薄层本征μc-Si：H薄膜,然后再高速沉积本征μc-Si：H薄膜.实验结果表明,引入低速方法沉积的界面层有效地提高了p/i界面特性和i层微结构的纵向均匀性,而随界面层厚度的增加,i层中的缺陷态先降低后增加, 关键词： μc-Si：H太阳电池 甚高频等离子体增强化学气相沉积 p/i界面层     

Dynamic fracture of the surface of an aluminum alloy under conditions of high-speed erosion

The kinetics of fracture and deformation of the standard aluminum alloy AD1 and a similar alloy subjected to severe plastic deformation by high-pressure torsion under conditions of high-speed erosion has been investigated. It has been shown that, with an increase in the loading rate, the fraction of the brittle component on the fracture surface of the standard material, as well as the thickness of the damaged layer, increases more significantly than that for the material after the severe plastic deformation by high-pressure torsion. A relationship of the surface roughness of the material after the erosion with the loading rate and the thickness of the erosion-damaged layer has been established.     

Synthesis and magnetic states of cobalt in three-layer Co/Ge/Co films

The magnetic properties of three-layer Co-Ge magnetic films have been studied experimentally as a function of technological conditions of their deposition. It has been found that the films deposited at a high deposition rate have a granular structure, and the films obtained at a low deposition rate have an X-ray amorphous structure. Electron microscopy and nuclear magnetic resonance studies have demonstrated that, at the same cobalt layer thickness, the semiconductor granule sizes depend on the average semiconductor layer thickness and correlate with the formation of different cobalt phases (amorphous, cubic, and hexagonal). The thermomagnetic properties of the films have been investigated.     

Picosecond carrier relaxation in type-II ZnSe/BeTe heterostructures

Relaxation of photoexcited carriers in the course of the formation of spatially separated layers of electrons and holes in type-II ZnSe/BeTe heterostructures has been studied based on a high time resolution investigation of fast luminescence kinetics. The hole escape times τ from the ZnSe layer have been measured in structures with different ZnSe layer thicknesses (τ = 2.5, 7.5, and 23 ps for thicknesses d = 10, 15, and 20 nm, respectively). It is shown that the increase in the time τ can be explained by the fact that the escape rate of photoexcited holes from the lowest above-barrier level in the ZnSe layer into the BeTe layer decreases as the thickness of the ZnSe layer increases.     

Combined use of surface and micro-analytical techniques for the study of ancient coins

By means of the combined use of surface and micro-analytical techniques the surface chemical composition of ancient coins and some aspects of their manufacturing techniques and of degradation mechanisms have been elucidated. Two case histories are described concerning silver Roman Republican coins and some coins plated with thin films of silver and gold. In particular, the coinage methods, the silvering and gilding techniques and the origin of the embrittlement of these selected Roman coins have been studied by means of the combined use of selected-area X-ray photoelectron spectroscopy (SA-XPS) and scanning electron microscopy and energy-dispersive spectrometry (SEM+EDS). This innovative approach has been utilised in order to gain further insight into the microchemical structure of the external regions of the coins as well as of the bulk features. The results show the use of mercury to coat a copper or silver core with a thin film of precious metals that could be considered the most important advance in the technology of gilding to be made in antiquity. Furthermore, the microchemical investigation of brittle Roman silver coins has allowed us to identify the origin of this troublesome problem. The microchemical results indicate that brittleness is induced by the presence of a low amount of lead that is retained in supersaturated solution when the cast blank was produced. This latter element segregates at the grain boundaries during the coin production and the subsequent long-term ageing at room temperature, thus inducing the alloy fracturing along the weakened grain boundaries. PACS 68.55.Jk; 68.35.Dv; 68.37.Hk; 68.55.Nq; 81.05.Bx