BP神经网络电子束扫描均匀度校正系统

 电子束的扫描均匀度是工业辐照电子直线加速器的重要技术指标，该校正系统利用人工神经网络中的误差反向传播法可以对扫描电流波形进行校正，以克服扫描磁场引起的电子束形状变化、位置改变等造成的电子束分布的不均匀性，从而使扫描曲线的归一化均方偏差达到1.8%。     

电子直线加速器磁控管频率稳定的自适应线性神经元方法

 电子直线加速器电子束能量的稳定与否取决于功率源工作频率的稳定性,磁控管在短时间内的散谱和轻微跳谱造成稳频系统的控制精度下降,最后电子束的扫描均匀度下降。引入自适应线性神经元方法(ADALINE)和噪声对消技术以消除对工作频率长期稳定性的影响,从而保证了电子束的扫描均匀度。     

辐照直线加速器电子束扫描控制

 在工业辐照电子直线加速器的扫描线圈内通以准三角波电流能使电子束在扫描方向分布均匀。系统的扫描电流周期和调制器的主脉冲同步, 可消除扫描均匀性中出现的拍频现象。根据速调管调制器主振脉冲频率、扫描宽度和电子束的束斑大小可以定出辐照床的最高运动速度以实现高效率的辐照。     

加速器注入器中电子束束剖面直径变化过程的测量

介绍了变像管扫描相机对直线感应加速器注入器中的电子束束剖面直径的应用。获得了由注入器产生电子束 (电流 2～ 3kA)经 0 5mm厚石英玻璃产生的契伦柯夫辐射的扫描像。对拍摄到的扫描像进行了图像处理和数据分析 ,得到了电子束直径随时间变化的曲线图     

DG型电子加速器自校正扫描系统的研制

为了提高DG型电子加速器束流扫描均匀度、解决束流中心偏移、提升束流引出效率,开发了一种既可实现X,Y两相互垂直方向均匀扫描又可以实现束流中心自动对中调节的扫描系统。介绍了扫描磁铁及其电源参数的选取依据,阐述了将扫描磁铁和束流校正线圈进行整体式设计的扫描系统扫描电流成形方式及自动对中电路信号调制过程,包括为提高加速器运行安全性而设计的连锁保护信号。产业化现场使用事实已证明,该系统设计完全达到了设计要求,具有优良的扫描均匀度和长时间工作稳定可靠性。     

用黑白电视机研究磁场对电荷的作用

磁场对通电导体有磁场力的作用 ,而电流实际上是运动的电荷 ,由此自然想到磁场是否对运动电荷有作用 .为了检验这个问题 ,我们利用黑白电视机来做一些实验 .打开黑白电视机 ,小心取下显像管 ,让同学们认识电子枪和荧光屏 .电子枪是由阴极和阳极组成的 ,通电可以发射电子 ,电子束打到荧光屏上某点 ,该点发光 .拿去磁环和偏转线圈 ,拔掉行扫描电压线和场扫描电压线 .给电视通上电流 ,电子枪被点亮 ,发射电子 ,电子束不受到其它的作用力 ,沿直线打在荧光屏上 ,荧光屏中央出现一个亮点 .取一个Ｕ型磁铁 ,让显像管的颈部处于Ｕ型磁铁匀强磁场里 ,…     

高效强流径向分离腔振荡器研究

根据同轴虚阴极的结构特点,提出了一种紧凑型径向分离腔振荡器,该径向分离腔的特点是输入电子束的电流可以很大,从而可以得到较高的微波输出功率. 综合考虑影响微波输出的各种因素,在电子束为410kV,电流为35kA的条件下,模拟得到的平均功率大于50GW,频率为146GHz,电子束功率效率达到348%. 关键词： 径向分离腔 高功率微波 同轴虚阴极 电子束分布     

高效强流径向分离腔振荡器研究

根据同轴虚阴极的结构特点，提出了一种紧凑型径向分离腔振荡器，该径向分离腔的特点是输入电子束的电流可以很大，从而可以得到较高的微波输出功率. 综合考虑影响微波输出的各种因素，在电子束为410kV，电流为35kA的条件下，模拟得到的平均功率大于50GW，频率为146GHz，电子束功率效率达到348%.     

电子束曝光机偏转系统及可动物镜分析

电子束大扫描场偏转系统设计中 ,像差的确定是一个必须解决的实际问题。以SDS 3电子束曝光机的磁复合偏转系统为基础 ,以双通道扫描原理进行扫描 ,分析了像差与电子束主轨迹的关系。给出了可动物镜的条件 ,并利用这一条件分析电子束最佳轨迹的结构和方法。并使用计算机辅助设计研究电子束曝光机聚焦偏转系统的结构。由该电子束曝光机试验结果表明 ,复合系统结构简单紧凑 ,像差小而可以不用动态校正。采用矢量描写电子轨迹 ,以积分式表示像差。以 0 .0 0 5rad半张角 ,5× 10 -5的高压纹波 ,5 0mm的像距 ,10mm× 10mm扫描场的边脚处 ,使动态校正前的总像差为 0 .0 3μm。     

电子束电流对介质切伦科夫脉塞色散关系的影响

采用等离子体流体理论,从线性扰动方程出发,研究了电子束电流大小对介质切伦科夫脉塞中束波相互作用色散关系的影响,得到了当等离子体返回电流能有效中和与不能有效中和电子束电流两种情形下色散关系和波的增长率,并讨论了电子束电流对束波相互作用色散关系和波增长率的影响。研究表明,等离子体返回电流能有效中和与不能有效中和电子束电流两种情况下有着不同的色散关系和波的增长率。在波导参数和背景等离子体参数固定的情况下,电子束电流并不是越大越好,电子束电流过大不利于提高器件效率,它们之间存在最佳匹配关系。     

Beam analysis of scanning electron microscope according to the mirror effect phenomenon

In a scanning electron microscope the influence of electronic beam parameters on the electron-mirror images has been investigated. A simple theoretical model for scanning electron beam behavior in terms of beam and surface potentials is presented. The derived expression relates the scanning beam parameters and parameters of an irradiation region. Influence of a beam (the size and current), scanning potential, working distance, trapped charge and the irradiated area on electron mirror images are defined. Results show that the electron beam current has a considerable effect on the deduced mirror images in comparison with the other beam parameters. So it could be adapted for adjusting the phenomena of mirror effect. Moreover, the trapped charges have been calculated and the results examined in comparison with experimental data.     

HIRFL装置主动式点扫描束流配送系统的Monte Carlo模拟优化

为获得适用于HIRFL 装置主动式点扫描束流配送系统配送的碳离子束,利用Monte Carlo (MC) 工具SHIELD-HIT12A 研究了配送距离和微型脊形过滤器结构周期对治疗室等中心处束斑半高宽(FWHM) 和剂量平坦度的影响。模拟研究发现:束流配送距离越短,束斑FWHM越小,但剂量平坦度越差;微型脊形滤器结构周期是影响剂量平坦度的关键因素,周期越小,剂量平坦度越好。通过模拟研究得出:在HIRFL装置重离子治疗终端将真空窗设置在距等中心距离小于125 cm 时,采用结构周期为2 mm微型脊形过滤器可以满足主动式点扫描照射对束斑FWHM和剂量平坦度的要求。To obtain carbon ion beams suitable for the active spot scanning beam delivery system at the Heavy Ion Research Facility in Lanzhou (HIRFL), the Monte Carlo program SHIELD-HIT12A was used to study the influences of beam delivery distance and structure period of mini ridge filter on full width at the half maximum (FWHM) of beam spot and dose flatness at the isocenter of the treatment room. The present simulation study shows that the shorter was the beam delivery distance, the smaller was the FWHM of beam spot, but the worse was the dose flatness. The structure period of mini ridge filter was a key factor to account for the dose flatness at the isocenter. The smaller was the structure period of mini ridge filter, the better was the dose flatness. Based on the simulation results, we conclude that 2 mm structure period for a mini ridge filter statisfies the requirements on the FWHM of beam spot and dose flatness at the isocenter for the active spot scanning beam delivery system at HIRFL when the distance between the vacuum window and the isocenter is set shorter than 125 cm in the nozzle.     

Dosimetric measurements and Monte Carlo simulation for achieving uniform surface dose in pulsed electron beam irradiation facility

A prototype pulsed electron beam irradiation facility for radiation processing of food and medical products is being commissioned at our centre in Indore, India. Analysis of surface dose and uniformity for a pulsed beam facility is of crucial importance because it is influenced by various operating parameters such as beam current, pulse repetition rate (PRR), scanning current profile and frequency, scanning width and product conveying speed. A large number of experiments are required to determine the harmonized setting of these operating parameters for achieving uniform dose. Since there is no readily available tool to set these parameters, use of Monte Carlo methods and computational tools can prove to be the most viable and time saving technique to support the assessment of the dose distribution. In the present study, Monte Carlo code, MCNP, is used to simulate the transport of 10 MeV electron beam through various mediums coming into the beam path and generate an equivalent dose profile in a polystyrene phantom for stationary state. These results have been verified with experimentally measured dose profile, showing that results are in good agreement within 4%. The Monte Carlo simulation further has been used to optimize the overlapping between the successive pulses of a scan to achieve ±5% dose uniformity along the scanning direction. A mathematical model, which uses the stationary state data, is developed to include the effect of conveyor speed. The algorithm of the model is discussed and the results are compared with the experimentally measured values, which show that the agreement is better than 15%. Finally, harmonized setting for operating parameters of the accelerator are derived to deliver uniform surface dose in the range of 1–13 kGy/pass.     

Hydrogen diffusion in steels under electron bombardment

We report on the results of measurement of the coefficients of hydrogen diffusion through metal membranes in the course of their simultaneous hydrogen saturation and bombardment with electrons (energy 30 keV, current density from 3 to 30 µA/cm²) both in a broad and in a narrow beam. It is found that the time of hydrogen discharge from the membrane is determined by the parameters of the electron beam, its periodicity and duration, and also depends on the structure of the phase state of the metal membrane. It is shown that the diffusion coefficient increases when a narrow electron beam in the scanning regime is used. Analysis of the hydrogen yield as a function of time is carried out on a mass spectrometer connected to a vacuum chamber containing an electron gun, a beam sweep oscillator, and an electrolytic cell. The hydrogen diffusion coefficients under the action of a scanning electron beam are 15 times larger than under the same conditions without irradiation.     

Femtosecond laser highly-efficient plane processing based on an axicon-generated donut-shaped beam

A simple technique is proposed for highly-efficient plane processing fully based on femtosecond laser beam shaping. The laser intensity distribution is transformed from a Gaussian to a donut shape. As the donut-shaped focus seems like a flat top from the side view, a plane with a high level of flatness is obtained directly by scanning once.By applying it to polishing experiments, the surface roughness can be improved significantly. The influence of scanning speed, laser pulse energy, and scanning times on the roughness is also discussed. Moreover, the scanning width can be flexibly controlled in a wide range.     

SEM扫描云纹法的相移技术研究

提出一种扫描电镜(SEM)扫描云纹法的相移新技术,通过SEM系统控制电镜电子束扫描线移动,对获取的云纹图像实现0-2π范围内的四步相移,从而获得了更高的位移测量灵敏度。同时对SEM扫描云纹法的测量原理以及相移实验技术的原理进行了详细的阐述。并将该技术应用到电子封装试件栅的相移分析中。实验结果证明了该方法的可行性,该方法为微米云纹法的条纹处理提供了一种新途径。     

Enhancing the accelerated beam current in the booster synchrotron by optimizing the transport line beam propagation

In this paper, we present the results of transverse beam emittance and twiss parameter measurement of an electron beam, delivered by a 20 MeV microtron which is used as a pre-injector system for a booster synchrotron in the Indus Accelerator Facility at RRCAT Indore. Based on these measured beam parameters, beam optics of a transport line was optimized and its results are also discussed in this paper. This beam transport line is used to transport the electron beam from the 20 MeV microtron to the booster synchrotron. The booster synchrotron works as a main injector for Indus-1 and Indus-2 synchrotron radiation facilities. To optimize the beam optics of a transport line for proper beam transmission through the line as well as to match the beam twiss parameters at the beam injection point of another accelerator, it is necessary to know the transverse beam emittance and twiss parameters of the beam coming from the first one. A MATLAB-based GUI program has been developed to calculate the beam emittance and twiss parameters, using quadrupole scan method. The measured parameters have been used for beam transport line optimization and twiss parameters matching at booster injection point. After this optimization, an enhancement of ～50% beam current has been observed in the booster synchrotron.     

Beam distribution reconstruction simulation for electron beam probe

An electron beam probe(EBP) is a detector which makes use of a low-intensity and low-energy electron beam to measure the transverse profile, bunch shape, beam neutralization and beam wake field of an intense beam with small dimensions. While it can be applied to many aspects, we limit our analysis to beam distribution reconstruction.This kind of detector is almost non-interceptive for all of the beam and does not disturb the machine environment.In this paper, we present the theoretical aspects behind this technique for beam distribution measurement and some simulation results of the detector involved. First, a method to obtain a parallel electron beam is introduced and a simulation code is developed. An EBP as a profile monitor for dense beams is then simulated using the fast scan method for various target beam profiles, including KV distribution, waterbag distribution, parabolic distribution,Gaussian distribution and halo distribution. Profile reconstruction from the deflected electron beam trajectory is implemented and compared with the actual profile, and the expected agreement is achieved. Furthermore, as well as fast scan, a slow scan, i.e. step-by-step scan, is considered, which lowers the requirement for hardware, i.e. Radio Frequency deflector. We calculate the three-dimensional electric field of a Gaussian distribution and simulate the electron motion in this field. In addition, a fast scan along the target beam direction and slow scan across the beam are also presented, and can provide a measurement of longitudinal distribution as well as transverse profile simultaneously. As an example, simulation results for the China Accelerator Driven Sub-critical System(CADS) and High Intensity Heavy Ion Accelerator Facility(HIAF) are given. Finally, a potential system design for an EBP is described.