氮对金刚石缺陷发光的影响

利用低温显微荧光光谱研究了IIa型、Ib型、Ia型金刚石的缺陷发光性质. 研究发现, 随着氮含量增加, 间隙原子及空位逐渐被氮原子所束缚, 从而使得GR1中心、533.5 nm及580 nm中心等本征缺陷发光减弱, 而氮-空位复合缺陷(NV中心)及523.7 nm中心等氮相关缺陷发光增强. 高温退火后, 间隙原子与空位可以自由移动, IIa型金刚石中出现了NV⁰中心, Ib型金刚石中只剩下了NV中心, Ia型金刚石中氮原子之间发生团聚, 出现了H3中心及N3中心. 另外, 氮作为施主原子, 有利于负电荷缺陷的形成, 如3H 中心、NV^- 中心.     

六方AlN本征缺陷的第一性原理研究

用基于密度泛函理论平面波赝势法首先对六方AlN本征点缺陷(氮空位、铝空位、氮替代铝、铝替代氮、氮间隙、铝间隙)存在时的晶格结构进行优化，得到其稳定结构；然后通过各缺陷形成能的计算可得知其在生长过程中形成的难易程度；最后从态密度的角度对各种本征点缺陷引起的缺陷能级及电子占据情况进行了分析.发现除氮空位外其他本征缺陷在带隙中形成的能级都很深，要得到n型或p型AlN必须要引入外来杂质.计算得到的本征缺陷能级对于分析AlN的一些非带边辐射机理有重要帮助. 关键词： 六方AlN 形成能 缺陷能级 态密度     

金刚石中GR1中心的光致发光特性研究

金刚石中空位存在中性、负电及正电三种状态, 且空位-空位、空位-杂质之间可以形成更多复合缺陷. 利用低温光致发光光谱研究了金刚石经辐照产生的中性空位的发光特性, 对进一步研究其他复合缺陷的发光性能提供了重要的指导意义. 关键词： 金刚石 中性空位 GR1中心     

氧化锌/硅纳米孔柱阵列的结构和光致发光特性研究

以硅纳米孔柱阵列(Si-NPA)为衬底、用化学气相沉积法制备了具有规则阵列结构特征的ZnO/Si-NPA纳米复合体系，并对其结构和光致发光性质进行了表征. 实验结果显示，组成ZnO/Si-NPA表面阵列的每个柱子均呈现层壳结构. 不同于衬底Si-NPA的红光和蓝光发射，ZnO/Si-NPA在紫外光区和蓝绿光区呈现出两个强的宽发光峰. 分析表明，紫外光发射应归因于ZnO晶体的带边激子跃迁；而蓝绿光发射则来自于ZnO晶体本征缺陷所形成的两类深能级复合中心上载流子的辐射跃迁.     

金刚石集群NV色心的光谱特征及浓度定量分析

金刚石NV-色心具有优越的光致发光特性,可实现高灵敏度物理量探测。其中,NV-色心的浓度是影响其宏观领域物理量探测灵敏度的重要因素之一。分析了金刚石在NV-色心制备过程中产生的发光缺陷,研究了不同的电子注入剂量与NV-色心浓度的关系。首先,对金刚石进行电子辐照并高温真空退火,制备了NV-色心;然后,利用拉曼光谱仪测试了金刚石在电子辐照前、电子辐照后及退火后三个阶段中的荧光光谱,分析了金刚石在NV-色心制备过程中的光谱特性;最后,对生成的NV-色心的浓度进行了估算,并探究了不同电子注入剂量对NV-色心浓度的影响规律。结果表明,金刚石经电子注入后生成了524.7,541.1,578和648.1 nm发光中心。其中,HPHT合成金刚石经电子注入后普遍存在524.7 nm中心。电子注入后的金刚石经高温(≥800 ℃)真空(≥10-7 Pa)退火后,空位自由移动,不稳定的缺陷消失,当空位靠近氮原子时被束缚而形成氮空位色心。对于氮含量100 ppm的金刚石,当电子注入产生的空位含量小于120 ppm(2.1×1019 cm-3)时,NV-色心浓度与电子注入生成空位的含量的关系符合Boltzmann分布。该研究为利用氮含量100 ppm的金刚石实现定量NV-色心浓度的制备提供了参考依据,为NV-色心在宏观物理量精密测量的应用奠定了基础。     

Sr_2MgSi_2O_7中本征缺陷和镧系离子的热力学稳定性和转变能级（英文）

利用基于标准PBE0泛函的杂化密度泛函理论计算了Sr_2MgSi_2O_7中本征缺陷、缺陷复合对及镧系离子的缺陷形成能、热力学转变能级以及光跃迁能级,以研究它们在Sr_2MgSi_2O_7∶Eu~(2+),Dy~(3+)的热致发光和长余辉发光过程中所起的作用。PBE0计算的形成能结果表明,缺陷V_O、Sr_(Mg)、Mg_(Sr)和Sr_(Mg)-Mg_(Sr)较容易在还原气氛下制备的Sr_2MgSi_2O_7材料中生成。基于PBE0计算的基质带隙(7.18 eV)和缺陷形成能,获得了上述较易形成的缺陷与复合对以及镧系离子的热力学转变能级和光跃迁能级。根据理论计算结果与实验所确定的陷阱深度的直接对比,电中性及带一个负电荷的氧空位与Dy~(3+)离子可以作为该材料中的电子陷阱,从而有助于其热致发光和长余辉发光。本研究的目的是利用第一性原理研究方法深入理解Sr_2MgSi_2O_7∶Eu~(2+),Dy~(3+)的热致发光和长余辉发光机理,从而作为实验研究手段的一种有效补充。     

CVD金刚石中的氮对等离子体刻蚀的影响

采用非对称磁镜场电子回旋共振等离子体分别对沉积过程中掺氮和未掺氮的化学气相沉积金刚石膜进行了刻蚀研究, 结果表明: 掺氮制备的金刚石膜的刻蚀主要集中在晶棱处, 经过4h刻蚀后其表面粗糙度由刻蚀前的4.761 μm下降至3.701 μm, 刻蚀对金刚石膜的表面粗糙度的影响较小; 而未掺氮制备的金刚石膜的刻蚀表现为晶面的均匀刻蚀, 晶粒坍塌,刻蚀4h后其表面粗糙度由刻蚀前的3.061 μm下降至1.083 μm. 刻蚀导致表面粗糙度显著降低. 上述差别的主要原因在于金刚石膜沉积过程中掺氮导致氮缺陷在金刚石晶棱处富集, 晶棱处电子发射加强, 引导离子向晶棱运动并产生刻蚀, 从而加剧晶棱的刻蚀. 而未掺氮金刚石膜,其缺陷相对较少且分布较均匀 ,刻蚀时整体呈现为 (111) 晶面被均匀刻蚀继而晶粒坍塌的现象. 关键词： 掺氮 金刚石膜 刻蚀 非对称磁镜场     

金刚石薄膜电致发光研究

报道了金刚石薄膜电致发光现象.为进一步提高金刚石薄膜蓝区电致发光强度,分别采用了硼氮双掺杂法和稀土掺杂法制备出了金刚石薄膜电致发光器件,并采用低电容率的本征金刚石薄膜和氧化硅薄膜为绝缘层的夹层式器件结构.研究结果显示:采用稀土铈掺杂可以有效地提高金刚石薄膜蓝区电致发光强度,其蓝区最大电致发光强度可达3.5 cd/m2;采用低电容率绝缘膜的夹层式结构,能有效地提高电子进入发光层时的能量,并有助于提高器件发光的稳定性和发光寿命.     

三维有序大孔ZrO2的制备及其光学性质

以聚苯乙烯(PS)微球作为模板剂,采用溶胶-凝胶及煅烧处理等方法制备了三维有序大孔ZrO2材料。通过X射线衍射(XRD)以及扫描电镜(SEM)对其结构和形貌进行了表征。结果表明所制备的ZrO2材料为孔径约为180 nm的高度有序、堆叠紧密的三维有序大孔结构(3DOM)。对3DOM ZrO2的光谱分析表明:在宽禁带的ZrO2材料中存在着本征缺陷发光(氧空位缺陷)和杂质缺陷(主要杂质为TiO2)发光,掺杂浓度与基质的晶相结构对两种发光起到了至关重要的作用。对发光过程提出了简单的机理模型。     

彩色金刚石中过渡金属离子的谱学研究

过渡金属镍、钴和铁是高温高压法合成金刚石的常用触媒,已有研究表明：采用镍、钴作触媒所合成的金刚石中存在镍、钴离子,部分天然金刚石含有镍离子;镍、钴离子以替代方式或间隙形式进入金刚石的晶格,并能与杂质氮形成复合体。为了探寻彩色金刚石中过渡金属离子存在的谱学标志,确定镍、钴离子在彩色金刚石中的赋存状态,文章对6颗彩色天然与合成金刚石进行了扫描电镜-能谱、显微红外光谱、光致发光谱、电子顺磁共振谱(EPR)等测试研究。结果表明天然与合成的样品都具有与镍、钴有关的发光中心与EPR结构：包括西澳的蓝灰色天然金刚石中与镍有关的884.6 nm等发光中心,以及天然变色金刚石中与钴有关的发光中心。对各种谱学测试结果的综合分析,得出样品中存在镍、钴离子并与杂质氮形成各种Ni-N或Co-N复合体的结论,其中在天然金刚石中发现钴离子在该领域研究中尚属首次。     

Photoluminescence of SiV centers in CVD diamond particles with specific crystallographic planes

We prepared the isolated micrometer-sized diamond particles without seeding on the substrate in hot filament chemical vapor deposition. The diamond particles with specific crystallographic planes and strong silicon-vacancy(SiV) photoluminescence(PL) have been prepared by adjusting the growth pressure. As the growth pressure increases from 2.5 to 3.5 kPa,the diamond particles transit from composite planes of {100} and {111} to only smooth {111} planes. The {111}-faceted diamond particles present better crystal quality and stronger normalized intensity of SiV PL with a narrower bandwidth of 5 nm. Raman depth profiles show that the SiV centers are more likely to be formed on the near-surface areas of the diamond particles, which have poorer crystal quality and greater lattice stress than the inner areas. Complex lattice stress environment in the near-surface areas broadens the bandwidth of SiV PL peak. These results provide a feasible method to prepare diamond particles with specific crystallographic planes and stronger SiV PL.     

高温高压下掺硼宝石级金刚石单晶生长特性的研究

本文在5.1—5.6 GPa,1230—1600℃的压力、温度条件下,以FeNiMnCo作为触媒,进行单质硼添加宝石级金刚石单晶的生长研究.借助于有限元法,对触媒内的温度场进行模拟.研究得到了FeNiMnCo-C-B体系下,金刚石单晶生长的P-T相图.该体系下合成金刚石单晶的最低压力、温度条件分别为5.1 GPa,1230℃左右.研究发现,在单晶同一{111}扇区内部,硼元素呈内多外少的分布规律.有限元模拟结果给出,该分布规律是由在晶体生长过程中,{111}扇区的增长速度逐渐减小所致.{111}晶向的晶体生长实验结果表明,硼元素优先从{111}次扇区进入晶体.研究发现,这是该扇区增长速度相对较快,硼元素扩散逃离可用时间短导致的.另外,同磨料级掺硼金刚石单晶生长相比,对于温度梯度法生长掺硼宝石级金刚石单晶,由于晶体的增厚速度较慢,即使硼添加量相对较高,也可以实现表面无凹坑缺陷的优质金刚石单晶的生长.     

Studying the effect of hydrogen on diamond growth by adding C10H10Fe under high pressures and high temperatures

In this paper, hydrogen-doped industrial diamonds and gem diamonds were synthesized in the Fe–Ni–C system with C₁₀H₁₀Fe additive, high pressures and high temperatures range of 5.2–6.2?GPa and 1250–1460°C. Experimental results indicate similar effect of hydrogen on these two types of diamonds: with the increasing content of C₁₀H₁₀Fe added in diamond growth environment, temperature is a crucial factor that sensitively affects the hydrogen-doped diamond crystallization. The temperature region for high-quality diamond growth becomes higher and the morphology of diamond crystal changes from cube-octahedral to octahedral. The defects on the {100} surfaces of diamond are more than those on the {111} surfaces. Fourier transform infrared spectroscopy (FTIR) results indicate that the hydrogen atoms enter into the diamond crystal lattice from {100} faces more easily. Most interestingly, under low temperature, nitrogen atoms can also easily enter into the diamond crystal lattice from {100} faces cooperated with hydrogen atoms.     

Picosecond-laser-induced structural modifications in the bulk of single-crystal diamond

Arrays of through laser-graphitized microstructures have been fabricated in type IIa single-crystal 1.2-mm-thick diamond plates by multipulse laser irradiation with 10-ps pulses at λ=532 nm wavelength. Raman and photoluminescence (PL) spectroscopy studies of the bulk microstructures have evidenced the diamond transformation to amorphous carbon and graphitic phases and the formation of radiation defects pronounced in the PL spectra as the self-interstitial related center, the 3H center, at 504 nm. It is found that the ultrafast-laser-induced structural modifications in the bulk of single-crystal diamond plates occur along {111} planes, known as the planes of the lowest cleavage energy and strength in diamond.     

First-principle study of native defects in CuScO2 and CuYO2

This paper studies the electronic structure and native defects in transparent conducting oxides CuScO2 and CuYO2 using the first-principle calculations. Some typical native copper-related and oxygen-related defects, such as vacancy, interstitials, and antisites in their relevant charge state are considered. The results of calculation show that, CuMO2（M = Sc, Y） is impossible to show n-type conductivity ability. It finds that copper vacancy and oxygen interstitial have relatively low formation energy and they are the relevant defects in CuScO2 and CuYO2. Copper vacancy is the most efficient acceptor, and under O-rich condition oxygen antisite also becomes important acceptor and plays an important role in p-type conductivity.     

Growth of nano-crystalline diamond on single-crystalline diamond by CVD method

Nanocrystalline (NC) diamond films are grown by chemical vapor deposition on various single crystal diamond faces. Under conditions of NC diamond growth, the growing filmmorphology is reduced to two planes: {100} and {111}. The {100} planes are smooth and homoepitaxial layerby-layer growth occurs on them, whereas the NC film formed by twin crystalliteswith sizes of several tens and hundreds nanometers grows on {111} planes. Nitrogen impurity sharply increases the diamond growth rate.     

高能电子照射对金刚石中缺陷电荷状态的影响

金刚石经电子辐照后会形成大量的点缺陷, 而这些缺陷很多都是带有电荷的. 提出一种用于研究缺陷电荷状态的新思路, 即利用扫描电子显微镜(SEM)的高能电子照射辐照区域, 通过比较SEM 照射前后的低温光致发光光谱, 为缺陷电荷状态的确定提供了一些依据. 关键词： 金刚石 点缺陷 电荷状态     

The origin of blue photoluminescence from nc-Si/SiO2 multilayers

Intensive blue photoluminescence (PL) was observed at room temperature from the nanocrystalline-Si/SiO$_{2}$ (nc-Si/SiO$_{2})$ multilayers (MLs) obtained by thermal annealing of SiO/SiO$_{2}$\,MLs for the first time. By controlling the size of nc-Si formed in SiO sublayer from 3.5 to 1.5 nm, the PL peak blueshifts from 457 to 411 nm. Combining the analysis of TEM, Raman and absorption measurement, this paper attributes the blue PL to multiple luminescent centres at the interface of nc-Si and SiO$_{2}$.     

Enhanced interface properties of diamond MOSFETs with Al_2O_3 gate dielectric deposited via ALD at a high temperature

The interface state of hydrogen-terminated(C–H) diamond metal–oxide–semiconductor field-effect transistor(MOSFET) is critical for device performance. In this paper, we investigate the fixed charges and interface trap states in C–H diamond MOSFETs by using different gate dielectric processes. The devices use Al_2O_3 as gate dielectrics that are deposited via atomic layer deposition(ALD) at 80℃ and 300℃, respectively, and their C–V and I–V characteristics are comparatively investigated. Mott–Schottky plots(1/C~2–VG) suggest that positive and negative fixed charges with low density of about 1011 cm~(-2) are located in the 80-℃-and 300-℃ deposition Al_2O_3 films, respectively. The analyses of direct current(DC)/pulsed I–V and frequency-dependent conductance show that the shallow interface traps(0.46 e V–0.52 e V and0.53 e V–0.56 e V above the valence band of diamond for the 80-℃ and 300-℃ deposition conditions, respectively) with distinct density(7.8 × 10~(13) e V~(-1)·cm~(-2)–8.5 × 10~(13) e V-1·cm~(-2) and 2.2 × 1013 e V~(-1)·cm~(-2)–5.1 × 10~(13) e V~(-1)·cm~(-2) for the80-℃-and 300-℃-deposition conditions, respectively) are present at the Al_2O_3/C–H diamond interface. Dynamic pulsed I–V and capacitance dispersion results indicate that the ALD Al_2O_3 technique with 300-℃ deposition temperature has higher stability for C–H diamond MOSFETs.     

White light luminescence from annealed thin ZnO deposited porous silicon

In this study, photoluminescence (PL) properties of annealed ZnO thin films deposited onto a porous silicon (PS) surface by rf-sputtering were investigated. A huge blue shift of luminescence from the ZnO deposited onto the PS surface and a broadband luminescence (white luminescence) across most of the visible spectrum were obtained after the heat treatment at 950 °C in air. The results of Fourier Transform Infrared Spectroscopy (FTIR) analysis suggested that the porous silicon surface was oxidized after ZnO deposition and the broadband luminescence was due to the conversion of Si-H bonds to Si-O-Si bonds on the PS surface. The underlying mechanisms of the broadband PL were discussed by using oxygen-bonding model for the PS and native defects model for ZnO. The experimental results suggested that the heat treatment provides a relatively easy way to achieve white luminescence from thin ZnO deposited porous silicon.