铜蒸气激光器等离子体阻抗动态特性研究

 给出了铜蒸气激光器放电电路各参数的表达式及取值。与铜蒸气激光器动力学模型相结合,讨论了铜蒸气激光器动力学过程中由于放电管内等离子体参数的变化引起等离子体阻抗动态演变过程,并与采用固定等离子体参数的等离子体阻抗进行了比较。     

短管螺旋波放电中等离子体参数测量和模式转化研究

对长度为45 cm的短放电管螺旋波放电等离子体进行了Langmuir探针、原子发射光谱以及集成电荷耦合检测器(ICCD)检测诊断,研究螺旋波等离子体的放电特性.Langmuir探针数据显示电子密度在射频功率增加过程中出现两次大幅增长,由此确认了放电模式的转换及螺旋波放电模式的出现.发射光谱测量结果与Langmuir探针测量的电子密度数据一致,发现Ar原子和Ar离子的谱线强度与放电模式变化有着密切相关性.而通过对不同放电模式的ICCD测量,获得射频功率吸收因放电模式转变而变化的方式,认为放电模式转换时电子行为和能量传递方式也发生着变化.     

高频感应等离子体流动模型与微型电推进器流场特性分析

微型射频离子推力器具有结构简单、工作寿命长、推力动态范围大、性能调节响应灵敏等特点,是国际微电推进领域的研究热点之一.射频离子推力器电离室内的感性耦合放电等离子体特性和推力器的性能密切相关.为此,文章建立了低气压、小尺寸微型射频离子推力器电离室内感性耦合等离子体流体模型,开展了电磁场、流场、化学反应浓度场的多物理场耦合仿真分析,并研究了等离子体放电特征参数随推进剂工质气压、放电吸收功率、射频频率以及线圈匝数等因素的变化规律.结果表明,推进剂工质气压、放电吸收功率是调节微型射频离子推力器性能的主要因素,该研究为综合调控微型射频离子推力器的工作性能奠定了良好的基础.      

基于电参数的日光灯放电的等离子体特性的研究

利用数字示波器对电压电流的测量数据,通过各种电参数计算和谐波分析,研究了气体放电的等离子体一维壁稳弧通道模型,并对放电管的负载性质进行了讨论.     

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N2-Ar射频放电等离子体广泛应用于微电子工业的刻蚀、氮化物薄膜的制备及金属表面氮化等技术领域。开发了N2-Ar混合气体容性耦合射频放电PIC/MC自洽模型,模型主要描述了e-,N2+,N+,Ar+等主要带电粒子的行为分布。等离子体的碰撞过程分别考虑了带电粒子(e-,N2+,N+,Ar+)与基态中性N2分子和Ar原子的21种碰撞反应过程。模拟结果表明,在纯N2及N2-Ar混合气体容性耦合射频放电中,各种带电粒子的数密度都在等离子体区达到最大值,且氮分子离子为主要粒子;在N2容性耦合射频放电中,加入10%氩气时,N+平均能量有所增加,在射频电极处两种氮离子(N2+,N+)高能粒子所占比例增加。本研究对认识N2-Ar射频放电等离子体过程微观机理具重要意义。     

磁镜场对射频等离子体中离子能量分布的影响

运用阻碍栅极型能量分析器,在不同磁镜场参数下测量了低温等离子体中离子的能量分布. 结果表明,在放电管中心处离子能量分布,随磁镜场强度的增加而向低能方向偏移,但离子能量分布宽度却没有明显的变化;而随着磁镜比的增加离子能量分布却向高能方向偏移,并且离子能量分布宽度也将变宽.由此可见,磁镜场参数对离子能量分布有很大影响. 关键词： 磁镜场 辉光放电 低温等离子体 离子能量分布     

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通过测量大气压介质阻挡放电等离子体辐射信号,建立偶极子辐射模型,利用快速傅立叶变换,计算了大气压介质阻挡放电等离子体中离子速度分布。计算结果表明,速度分布偏离麦克斯韦分布,并且随着放电过程的进行,离子速度及相对离子数进行有规律的变化。     

气体脉冲放电等离子体阻抗的参量研究

在纯净氦气条件下，对高频纵向脉冲放电的等离子体动态阻抗进行了实验研究.测量了放电等离子体阻抗随放电电压、频率以及气体压强之间的变化关系，表明等离子体阻抗随频率和电压的增加而下降，随气压的升高而增大.定性分析了这些宏观参量与等离子体阻抗变化之间的关系，拟合出等离子体阻抗随电压、频率、气压变化的经验公式，并对数值模拟与实验结果进行了比较研究. 关键词： 等离子体阻抗 气体脉冲放电     

大气压介质阻挡射流放电离子速度分布的测量

通过测量大气压介质阻挡放电等离子体辐射信号,建立偶极子辐射模型,利用快速傅立叶变换,计算了大气压介质阻挡放电等离子体中离子速度分布。计算结果表明,速度分布偏离麦克斯韦分布,并且随着放电过程的进行,离子速度及相对离子数进行有规律的变化。     

碰撞效应对入射到射频偏压电极上离子能量分布和角度分布的影响

考虑了离子与中性粒子的弹性碰撞和电荷交换碰撞效应,建立了一套描述射频等离子体鞘层动力学特性的自洽模型,并利用MonteCarlo模拟方法研究了入射到电极上的离子的能量分布和角度分布.数值结果表明:随着放电气压增加,入射到电极上离子的能量分布逐渐地由双峰分布变成单峰分布,而且低能离子的数目也逐渐地增加.入射到电极上的离子呈小角分布,而且放电气压等参数对角度分布的影响不是太明显. 关键词： 射频放电 等离子体 离子 鞘层     

Power absorption corresponding to ion losses in parallel-plate RFdischarges

A simple model of a symmetric parallel-plate RF discharge is studied to illustrate how such discharges may absorb power from an RF power supply in order to sustain DC power losses corresponding to the steady acceleration of ions through the sheaths. The motions of the sheath boundaries over one period are derived assuming that the current density varies sinusoidally. One finds that the sheath thickness increases discontinuously at one sheath whenever the plasma contacts the opposing electrode. This implies that the external power supply delivers an electron pulse from the electrode at higher potential to the electrode at lower potential, so that some power is being absorbed in a pulsed fashion. The power absorbed by the discharge is also calculated for the portions of the RF cycle where the current varies sinusoidally. It is found that power is supplied by the discharge in this phase of the RF cycle, with the energy coming from the deflating sheaths. It is further shown that the sum of the pulsed power absorption and smooth power generation, averaged over one RF period, is equal to the DC ion power losses arising from ions falling through the time-averaged sheath potentials     

Plasma characteristics and broadband electromagnetic wave absorption in argon and helium capacitively coupled plasma

A one-dimensional self-consistent calculation model of capacitively coupled plasma(CCP) discharge and electromagnetic wave propagation is developed to solve the plasma characteristics and electromagnetic wave transmission attenuation.Numerical simulation results show that the peak electron number density of argon is about 12 times higher than that of helium, and that the electron number density increases with the augment of pressure, radio frequency(RF) power, and RF frequency. However, the electron number density first increases and then decreases as the discharge gap increases. The transmission attenuation of electromagnetic wave in argon discharge plasma is 8.5-d B higher than that of helium. At the same time, the transmission attenuation increases with the augment of the RF power and RF frequency, but it does not increase or decrease monotonically with the increase of gas pressure and discharge gap. The electromagnetic wave absorption frequency band of the argon discharge plasma under the optimal parameters in this paper can reach the Ku band. It is concluded that the argon CCP discharge under the optimal discharge parameters has great potential applications in plasma stealth.     

Ion Bombardment Secondaty Electron Maintenance of Steady RF Discharge

The results of both theoretical and experimental study of a steady E-type RF discharge, in which ionization is controlled by fast electrons generated in RF sheaths near the electrodes (y regime), are presented. It is shown that the transition of an RF discharge into the ? regime is of a threshold nature and is accompanied by a sharp increase in plasma density and a decrease in electron temperature. The suggested theoretical model of an RF discharge in the ? regime satisfactorily describes experiments carried out in a wide range of frequencies, RF voltages, and gas pressures.     

大气压脉冲调制射频氩气放电等离子体特性的数值研究

基于等离子体流体理论,建立了大气压脉冲调制射频氩气放电的一维流体模型。通过数值模拟的方 法研究了放电参数(放电电极间距、射频频率)对氩等离子体特性的影响。研究结果表明：当电压固定时,随着电 极间距的增加,等离子体区逐渐增大,最大电子密度也增加,在 0.20cm 达到最大值后略有降低;放电电流密度 与输入功率密度随着电极间距的增加而增加;鞘层区电子温度随着电极间距的增加而降低;在脉冲开启前期,等 离子体区电子温度随着电极间距的增加而增加,但当脉冲开启后期,电极间距对等离子体区电子温度影响较小。 不同射频频率下最大电子密度随电极间隙的增加而减小,也具有一个最优值。      

Different modes of capacitively coupled radio-frequency discharge in methane

Two different modes of capacitively coupled radio-frequency (RF) discharge in methane at gas pressures between 0.01 and 1.00 Torr are examined by numerical simulation based on a combined approach. It is shown that transition between volume-dominated and active-sheath modes is caused by variation of discharge current or gas pressure. Hysteretic behavior is revealed as the discharge current density is varied along the growing-and falling-current branches of the current-density curve. A phase diagram representing the domains of different discharge modes is obtained in wide current and pressure ranges.     

Effects of nonlocal electron kinetics and transition from αto γ regime in an RF capacitive discharge in nitrogen

The electron kinetics and regime of operation of asymmetrically coupled RF (27-MHz) nitrogen discharges in two vessels with different interelectrode gaps over the range of 0.20-0.35 torr gas pressure are studied in terms of the electron energy distribution function (EEDF). The latter is measured by means of a computer-controlled data acquisition system, a Langmuir probe with cross-modulation second derivative technique applied. The experiments are performed with an axial resolution along the RF electric field and accompanied with a measurement of electrical discharge characteristics. The effects of local and nonlocal plasma response are considered. The transition between α and γ discharge regimes is registered by measuring the EEDF and its moments' changes with the increase of the RF discharge current density     

A self-consistent particle model for the simulation of RF glowdischarges

A self-consistent particle model of an argon RF glow discharge has been developed. Electric field and charged-particle density profiles determined from simulations with the RF glow discharge model are consistent with results obtained from continuum models. The average ion energy is found to vary greatly between the bulk of the discharge and sheaths, contrary to the assumption that the ion energy is uniform, as is assumed in some continuum models. The accuracy of the particle cross sections and collision representation used in the model is verified with a simplified DC model which calculates swarm parameters. Electron swarm parameters determined with this model are in excellent agreement with experimental data taken from the literature     

容性耦合射频氩等离子体放电诊断研究及仿真模拟

针对中等气压、中等功率下射频容性耦合(CCRF)等离子体的放电特性,采用基于流体模型的COMSOL软件仿真,建立一维等离子体放电模型,以Ar为工作气体,研究同一气压时不同射频输入功率下等离子体电子温度和电子密度的分布规律。同时依据仿真模型设计制作相同尺寸的密闭玻璃腔体和平板电极,实验测量了不同射频输入功率时放电等离子体的有效电流电压及发射光谱,进而计算等离子体的电子温度及电子密度;利用玻耳兹曼双线测温法,得到光谱法下等离子体的电子温度及电子密度。结果表明:当气体压强为250 Pa、输入功率为100~450 W时,等离子体电压电流呈线性关系,电子密度随功率的增大而增大,而电子温度并未随功率的变化而有明显变化,其与功率无关。运用仿真模拟验证了实验的准确性,通过比较,三种方法所得的结果相近。通过结合等效回路法、光谱法和数值模拟仿真法初步诊断出中等气压下等离子体的放电参数,提出了结合三种方法作为实验研究的方法,使实验结果更具说服力,证明其方法的可靠性,也为进一步的等离子体特性研究提供依据。     

Impedance model of helical resonator discharge

Modeling and measurement results of the RF input impedance of a helical resonator discharge are given. A simple microstrip transmission line model is used to extract an equivalent circuit of a helical resonator discharge. The transmission line model consists of a grounded cylinder for RF shielding, a helical copper coil for RF heating, and a high density plasma. Transmission line parameters for an experimental helical resonator discharge chamber are extracted, and the results are compared with the measured results. The measured transmission line parameters for the experimental reactor are the characteristic impedance of 200 Ω, the attenuation constant of 6×10^-3 Np/m, and the wave number of 0.36 rad/m, which have good agreement with the calculated values     

Properties of inductively coupled plasma source with helical coil

This paper presents modeling and experimental results of the voltage, current, and density profiles of a helical resonator plasma source. The source has a 5/4-wavelength (λ) helical resonator structure with the helical coil short-circuited at one end and open circuited at the other end. When the radio frequency (RF) tap for power feeding was located at an odd multiple of λ/4 from the short-circuited end, the observed voltage, current, and plasma density were higher in the short-circuited section than those in the open-circuited section. The opposite property was observed with the RF tap at an even multiple of λ/4. A microstrip transmission line model was used to explain the experimental results. The model accurately predicted the RF voltage and current profiles. After calculation of RF voltage and current, the plasma density was solved numerically. The difference between the calculated and measured plasma density was within a factor of two. The changes on the density profile indicate that the transport properties of plasma can be adjusted with the RF tap position