乙烯和乙炔基在Ni(110)表面上吸附结构的研究

采用平面波赝势方法，利用基于从头计算的软件包，对乙烯和乙炔基在Ni(110)表面上吸附的问题进行了计算. 在低覆盖度时，孤立的乙烯分子的吸附能比密集时高，乙烯分子的C-C 轴大致沿衬底的Ni原子链方向(即沿［110］晶向)，C-C轴与衬底Ni(110)表面有12°的倾斜角，乙烯分子的C—C键的键长为 0.147nm. 乙烯分子中接近顶位的C原子与衬底中距离最近的Ni原子为0.199nm. 在高覆盖度时，乙烯分子在Ni(110)表面上形成c(2×4)再构，每个表面二维元胞中有两个乙烯分子，每个乙烯分子的吸附位置与低覆盖度时相似，而C—C键长比低覆盖度时要短. 乙炔基是乙烯在Ni(110)表面上分解的产物. 关于乙炔基的计算结果表明：乙炔基的两个C原子的间距为0.131nm，比乙烯分子中C原子的间距更短. 与乙烯分子相比，乙炔基的吸附位置更靠近顶位. H原子与吸附在顶位上的C原子相连接，C—H键也大致沿衬底的Ni原子链方向，与Ni表面呈45°的倾斜角. 关键词： 乙烯和乙炔基 平面波赝势方法 吸附几何结构     

氯原子在Cu(111)表面的吸附结构和电子态

密度泛函理论(DFT)总能计算研究了不同覆盖度下氯原子在Cu(111)表面的吸附结构和表面电子态。计算结果表明,清洁Cu(111)表面自由能 为15.72 ,表面功函数φ为4.753eV。在1/4ML和1/3ML覆盖度下,每个氯原子在Cu(111)表面fcc谷位的吸附能分别等于3.278eV/atom和3.284eV/atom。在1/2ML覆盖度下,两个紧邻氯原子分别吸附于fcc和hcp谷位,氯原子的平均吸附能为2.631eV/atom。在1/3ML覆盖度下,fcc和hcp两个位置每个氯原子吸附能的差值约为2meV/atom,与正入射X光驻波实验结合蒙特卡罗方法得到结果(<10meV/atom)基本一致。在1/4ML、1/3ML和1/2ML覆盖度下,吸附后Cu(111)表面的功函数依次为5.263eV、5.275eV和5.851eV。吸附原子和衬底价轨道杂化形成的局域表面电子态位于费米能级以下约1.2eV、3.6eV和4.5eV等处。吸附能和电子结构的计算结果表明,氯原子间的直接作用和表面铜原子紧邻氯原子数目是决定表面结构的两个重要因素。     

H2S在Cr(111)面上吸附与解离的第一性原理研究

采用了第一性原理研究了H₂S在Cr(111)面的吸附解离过程，利用吸附能、吸附构型和偏态密度图(PDOS)研究了H₂S及其解离产物在Cr(111)面上的吸附情况，都偏向倾斜吸附在Cr(111)面.同时研究了HS/H和S/H共吸附情况，得到共吸附物质在Cr(111)面上有明显的相互作用.最后使用线性同步和二次同步变换方法确定了解离反应的过渡态，了解到第一、二步解离的活化能分别为1.65 eV、0.82 eV,H₂S分子在Cr(111)面上的解离过程是放热反应，反应能为-2.90 eV.     

Ni(111)表面C原子吸附的密度泛函研究

基于密度泛函理论的第一性原理计算,对过渡金属Ni晶体与Ni (111)表面的结构和电子性质进行了研究, 并探讨了单个C原子在过渡金属Ni (111)表面的吸附以及两个C原子在Ni(111)表面的共吸附. 能带和态密度计算表明, Ni晶体及Ni (111)表面在费米面处均存在显著的电子自旋极化. 通过比较Ni (111)表面各位点的吸附能,发现单个C原子在该表面最稳定的吸附位置为第二层Ni原子上方所在的六角密排洞位, 吸附的第二个C原子与它形成碳二聚物时最稳定吸附位为第三层Ni原子上方所在的面心立方洞位. 电荷分析表明,共吸附时从每个C原子上各有1.566e电荷转移至相邻的Ni原子, 与单个C原子吸附时C与Ni原子间的电荷转移量(1.68e)相当. 计算发现两个C原子共吸附时在六角密排洞位和面心立方洞位的磁矩分别为0.059μ_B和 0.060μ_B,其值略大于单个C原子吸附时所具有的磁矩(0.017μ_B).     

多重散射团簇理论对CO/NiO(100),NO/NiO(100)吸附系统的分析与比较

用多重散射团簇(MSC)理论对CO/NiO(100)和NO/NiO(100)吸附系统的C1s近边X射线吸收精细结构(NEXAFS)和N1sNEXAFS谱进行了详细的计算和分析.理论计算表明CO/NiO(100)是弱物理吸附,CO分子与表面的多极静电相互作用很弱,σ共振不依赖C—O键长的变化,MSC方法分析表明,CO是以C原子朝下,吸附在衬底的Ni—O键桥上,可靠性因子计算显示C原子的吸附位置距Ni原子009nm,CO分子中C原子距衬底的吸附高度为031±001nm,CO分子倾斜角不大于25°.理论计算证实     

Cu(100)表面c(2×2)-N原子结构与吸附行为研究

用密度泛函理论的总能计算研究了金属铜(100)面的表面原子结构以及氮原子的c(2×2)吸附状态.研究结果表明：在Cu(100) c(2×2)-N表面系统中，氮原子处于四度配位的空洞(FFH)位置，距离最表面铜原子层的垂直距离为0.20?，最短的Cu—N键长度为1.83?.结构优化的计算否定了被吸附物导致的表面再构模型，即c(2×2)元胞的两个铜原子在垂直于表面方向发生相对位移，一个铜原子运动到氮原子之上的模型.该吸附表面的功函数约为4.65eV, 氮原子的平均吸附能为4.92 eV(以孤立氮原子为能量参考点).计算结果还说明，Cu—N杂化形成的表面局域态的位置在费米面以下约1.0 eV附近出现，氮原子和第一层以及第二层铜原子均有不同程度的杂化作用.该结果为最近有关该表面的STM图像的争论提供了判据性的第一性原理计算结果. 关键词： Cu(100) c(2×2)-N 表面吸附态 密度泛函总能计算     

H在Ni表面的扩散性质及表面缺陷的影响-嵌入原子法(EAM)计算研究

本文用原子集团模型和嵌入原子方法,计算研究了H在Ni(100),(110)和(111)表面上的扩散特性,其扩散激活能分别是0.152eV;0.343eV和0.142eV。Ni(100)面上的吸附Ni原子和Ni原子空位,分别是在其表面上扩散的H原子的一种陷阱和位垒;Ni(100)面上的台阶,将使通过此台阶的H原子的扩散势垒增高,激活能增大,且引起扩散的各向异性。     

c(2×2)O吸附Cu(001)表面结构、电子态与STM图像的研究

用投影子缀加波和CP分子动力学方法研究了贵金属Cu(001)面的表面结构、弛豫以及O原子的c(2×2)吸附状态. 研究结果得出在这种吸附结构中，O原子与衬底Cu原子之间的垂 直距离约为0069nm，Cu—O键长为0.194nm，功函数约为5.29 eV；吸附O原子形成金属性能带结构，由于Cu—O的杂化作用,在费米能以下约6.7 eV处出现了局域的表面态.用Tersoff-Hamann途径计算了该表面的扫描隧道显微镜图像，并讨论了与实验结果之 间的关系. 关键词： Cu(001)-c(2×2)/O 电子态 STM图像     

三氧化钨表面氢吸附机理的第一性原理研究

采用基于密度泛函理论的第一性原理平面波超软赝势方法,在广义梯度近似下,研究了立方WO_3,WO_3(001)表面结构及其氢吸附机理.计算结果表明立方晶体WO_3理论带隙宽度为0.587 eV.WO_3(001)表面有WO终止(001)表面和O终止(001)表面两种结构,表面结构优化后W—O键长和W—O—W键角改变,从而实现表面弛豫;WO终止(001)表面和O终止(001)表面分别呈现n型半导体特征和p型半导体特征.分别计算了H原子吸附在WO终止(001)表面和O终止(001)表面的H—O_(2c)—H,H—O_(2c)…H—O_(2c),H—O_(1c)—H和H—O_(1c)…H—O_(1c)四种吸附构型,其中H—O_(1c)—H吸附构型的吸附能最小,H—O键最短,H失去电子数最多,分别为-3.684 eV,0.0968 nm和0.55e,此吸附构型最稳定.分析其吸附前后的态密度,带隙从吸附前的0.624 eV增加到1.004 eV,价带宽度基本不变.H的1s轨道电子与O的2p,2s轨道电子相互作用,在-8和-20 eV附近各形成了一个较强的孤立电子峰,两个H原子分别与一个O_(1c)原子形成化学键,最终吸附反应生成了一个H_2O分子,同时产生了一个表面氧空位.     

Cu(100)(2~(1/2)×22~(1/2))R45°-O的表面结构与电子态的密度泛函研究

用第一性原理的总能计算研究了Cu(100))面的表面结构、弛豫以及氧原子的(2×22)吸附状态.计算给出了Cu(100)(2×22)R45°-O吸附表面的结构参数,并得到了上述结构下氧吸附的Cu(100)表面氧原子和各层Cu原子的电子态密度.计算得到的吸附表面功函数为4.58eV,与清洁Cu(100)表面功函数(~4.53eV)几乎相同.吸附氧原子与最外层铜原子之间的垂直距离约为0.02nm,其能带结构体现出一定的金属性,同时由于Cu-O的杂化作用在费米能以下约6.4eV附近出现了局域的表面态.可以认为,在Cu(100)(2×22)R45°的氧吸附表面结构下,吸附氧原子和衬底之间的结合主要来源于表面最外层铜原子与氧原子的相互作用.     

Ni与钇稳定的氧化锆(111)表面相互作用以及界面活性的第一性原理研究

采用基于密度泛函理论的第一性原理方法, 系统研究了Ni原子在钇稳定的氧化锆(YSZ)(111)和富氧的YSZ(YSZ+O)(111)表面不同位置的吸附, 以及CO和O₂分子在Ni₁(单个镍原子)/YSZ和Ni₁/YSZ+O表面吸附的几何与电子结构特征. 结果表明: 1) 单个Ni原子倾向于吸附在O原子周围, 几乎不吸附在Y原子周围, 且Ni原子在氧空位上吸附最稳定; 2)和YSZ相比, 单个Ni原子在YSZ+O表面易发生氧化现象, Ni原子失去1.06 e电子, 被氧化成了Ni⁺, 吸附能力更强; 3)被氧化的Ni催化活性大幅下降, 大大减弱了表面对O₂和CO等燃料气体的吸附作用.     

Sulfur at nickel-alumina interfaces: Molecular orbital theory

An atom superposition and electron delocalization molecular orbital study has been made of surface atomic layer relaxations in Ni(110) and Ni(111), the binding of p(2 × 2)S to Ni(111), S on Ni(100), and the binding of A1₂O₃ to clean Ni(111) and p(2 × 2)S covered Ni(111). Surface Ni atom relaxations for three-layer thick cluster models are calculated to be close to the experimental results and S heights of 1.68 Å on Ni(111) and 1.40 Å on Ni(100) are also in close agreement with experimental determinations, which indicates cluster models are suitable for determining surface properties. Al³⁺ in the basal plane of Al₂O₃ are predicted to support a low-lying surface state band in the O2p---A13s3p band gap. These orbitals are found to participate in strong Al---Ni bonds and Al---S bonds of intermediate strength at the interfaces with Ni(111) and p(2 × 2) S-covered Ni(111). Should such bonds form, they are expected to be too few in number to lead to strong adhesion. The strongest Al₂O₃---Ni bonding is predicted to occur when the Ni surface is oxidized. In this case, though Ni---O bonds are relatively weak, their number is high. It is concluded from the structure models that are studied that the segregation of impurity S in Ni to the interface will markedly decrease the adhesion of protective Al₂O₃ films that grow on NiAl based alloys.     

The interaction of ultrathin films of Ni and Pd with W(110): an XPS study

The interaction of ultrathin films of Ni and Pd with W(110) has been examined using X-ray photoelectron spectroscopy (XPS) and the effects of annealing temperature and adsorbate coverage (film thickness) are investigated. The XPS data show that the atoms in a monolayer of Pd or Ni supported on W(110) are electronically perturbed with respect to the surface atoms of Pd(100) and Ni(100). The magnitude of the electronic perturbations is larger for Pd than for Ni adatoms. Our results indicate that the difference in Pd(3d_5/2) XPS binding energies between a pseudomorphic monolayer of Pd on W(110) and the surface atoms of Pd(100) correlates with the variations observed for the desorption temperature of CO (i.e., the strength of the Pd---CO bond) on these surfaces. A similar correlation is seen for the Ni(2p_3/2) XPS binding energies of Ni/W(110) and Ni(100) and the CO desorption temperatures from the surfaces. The shifts in XPS binding energies and CO desorption temperatures can be explained in terms of: (1) variations that occur in the Ni---Ni and Pd---Pd interactions when Ni and Pd adopt the lattice parameters of W(110) in a pseudomorphic adlayer; and (2) transfer of electron density from the metal overlayer to the W(110) substrate upon adsorption. Measurements of the Pd(3d_5/2) XP binding energy of Pd/W(110) as a function of film thickness indicate that the Pd---W interaction affects the electronic properties of several layers of Pd atoms.     

XPS investigation of preferential sputtering of S from MoS2 and determination of MoSx stoichiometry from Mo and S peak positions

The preferential sputtering of S from bulk MoS₂ standard samples exposed to 3 keV Ar⁺ ion bombardment has been studied by XPS. The MoS_x stoichiometry decreases from MoS₂ to MoS_1.12 with a concomitant reduction in the Mo 3d_5/2 binding energy from 229.25 to 228.35 eV. The altered layer extends to a depth of 3.8 nm and is proposed to consist of a single amorphous MoS_x phase in which Mo has a varying number of nearest neighbour S atoms. Using peak positions alone it is possible to determine the MoS_x stoichiometry to an accuracy of x±0.1 from a plot of MoS_x stoichiometry against (Mo 3d_5/2–S 2p_3/2) binding energy. The results are of strong current interest for coating analysis applications as MoS₂ is a compound capable of providing low friction properties when incorporated into hard coatings.     

铁电晶体PbxBa1-xNb2O6和掺Li,Na的PbxBa1-xNb2O6的结构和电弹张量的测定

用提拉法从熔体中生长出Pb_0.37Ba_0.63Nb₂O₆和Pb_0.30Ba_0.533Na_0.306Li_0.028Nb₂O₆两种铁电单晶。用X射线衍射方法分析了两种单晶的结构,结果表明,室温时两种晶体都属于四方晶系点群4mm。测定晶格参数得PBN晶体的a=12.493?和c=3.98?;掺Li,Na的PBN晶体的a=12.493?和c=3.970?。测定了两种晶体全部各52个电弹张量的分量,结果表明PBN晶体具有优良的压电性,其中压电系数d₁₅=108×10^-12C/N。这种晶体很有希望用作与厚度切变模式有关的压电换能器材料。掺Li,Na的PBN晶体的介电常数显著降低,而铁电居里点有明显的提高。 关键词：     

Adsorption and co-adsorption of CH<Subscript>3</Subscript> and H on flat and defective nickel (111) surfaces

We use a periodic density functional theory (DFT) code to study the adsorption of CH₃ and H, as well as their co-adsorption on a Ni(111) surface with and without Ni ad-atom, at a surface coverage of 0.25 monolayer (ML). We systematically investigate the site preference for CH₃ and H. Then we combine CH₃ and H in many co-adsorbed configurations on both surfaces. Methyl and hydrogen adsorption on a flat Ni(111) surface favours the hollow site over the top site. The presence of a Ni ad-atom stabilizes the adsorption of CH₃ better than a flat surface, while hydrogen is more stable on a flat Ni(111) surface. When H and CH₃ are co-adsorbed at nearest Ni neighbours on the (111) surface, their interaction is always repulsive. However, the dissociative adsorption of CH₄ is stabilised when the fragments are infinitely separated. For the co-adsorbed fragments CH₃ and H, in the presence of an ad-atom, the repulsive interaction is lowered, so that the dissociative form of CH₄ is locally stable.     

过渡族金属掺杂Al(111)表面对氢分子催化分解的影响

为了探求过渡金属催化剂对催化合成储氢材料NaAlH₄效果的影响, 本文采用第一性原理方法研究了多种金属原子取代Al (111)表面铝原子形成的合金表面对氢的催化分解的影响. 计算结果表明, Sc, V, Fe, Ti原子掺杂的表面对氢分子分解具有催化作用. H₂在对应的掺杂表面催化分解所需要的活化能分别为0.54 eV, 0.29 eV, 0.51 eV, 0.12 eV. H原子在Sc, V, Ti掺杂表面扩散需要的活化能分别为0.51 eV, 0.66 eV, 0.57 eV. 同时, 过渡金属掺杂在Al表面时倾向于分散分布, 增加掺杂表面的掺杂原子个数, 掺杂表面的催化效果体现为单个掺杂过渡金属原子的催化效果. 本研究将为金属掺杂Al (111)表面催化加氢合成NaAlH₄提供理论参考.     

A density-functional theory investigation on disorption of O2 on Sn(111) and its comparison with initial oxidation on the X(111) (X=Si,Ge, Sn,Pb) surfaces

The first-principles calculations are performed to investigate the adsorption of O₂ molecules on an Sn(111) 2×2 surface. The chemisorbed adsorption precursor states for O₂ are identified to be along the parallel and vertical channels, and the surface reconstructions of Sn(111) induced by oxygen adsorption are studied. Based on this, the adsorption behaviours of O₂ on X(111) (X=Si, Ge, Sn, Pb) surfaces are analysed, and the most stable adsorption channels of O₂ on X(111) (X=Si, Ge, Sn, Pb) are identified. The surface reconstructions and electron distributions along the most stable adsorption channels are discussed and compared. The results show that the O₂ adsorption ability declines gradually and the amount of charge transferred decreases with the enhancement of metallicity.     

N2H4在NiFe(111)合金表面吸附稳定性和电子结构的第一性原理研究

采用基于色散校正的密度泛函理论进行了第一性原理研究, 详细分析了肼(N₂H₄)在Ni₈Fe₈/Ni(111)合金表面稳定吸附构型的吸附稳定性和电子结构及成键性质. 通过比较发现, 肼分子以桥接方式吸附在表面的两个Fe原子上是最稳定的吸附构型, 其吸附能为-1.578 eV/N₂H₄. 同时发现, 肼分子在这一表面上吸附稳定性的趋势为: 桥位比顶位吸附更有利, 且在Fe原子上比在Ni原子上的吸附作用更强. 进一步分析了不同吸附位点上稳定吸附构型的电子结构、电荷密度转移以及电子局域化情况. 结果发现: 相同吸附位点的电子态密度图基本一致, 并且N原子的p轨道和与之相互作用的表面原子的d轨道之间存在态密度上的重叠; 吸附后电荷密度则主要从肼分子转移到表面原子之上; 在电子局域化函数切面图中也发现吸附后电子被局域到肼分子的N原子和相邻的表面原子之间. 这些电子结构的表征都充分说明肼分子与表面原子之间通过电荷转移形成了强烈的配位共价作用.