引入Si掺杂层调控InGaAs/GaAs表面量子点的光学特性

在InGaAs/GaAs表面量子点(SQDs)的GaAs势垒层中引入Si掺杂层,以研究Si掺杂对InGaAs/GaAs SQDs光学特性的影响。荧光发光谱(PL)测量结果显示,InGaAs/GaAs SQDs的发光强烈依赖于Si掺杂浓度。随着掺杂浓度的增加, SQDs的PL峰值位置先红移后蓝移; PL峰值能量与激光激发强度的立方根依赖关系由线性向非线性转变;通过组态交互作用方法发现SQDs的PL峰位蓝移减弱;时间分辨荧光光谱显示了从非线性衰减到线性衰减的转变。以上结果说明Si掺杂能够填充InGaAs SQDs的表面态,并且改变表面费米能级钉扎效应和SQDs的荧光辐射特性。本研究为深入理解与InGaAs SQDs的表面敏感特性关联的物理机制和载流子动力学过程,以及扩大InGaAs/GaAs SQDs传感器的应用提供了实验依据。     

垒层温度对InGaN量子点/量子阱复合结构内量子效率的影响

使用金属有机化学气相沉积(metal organic chemical vapor deposition, MOCVD)方法生长了三个具有不同垒层温度的InGaN/GaN量子阱。由于高密度V型坑的形成,完整的量子阱结构被破坏,转变成了InGaN量子点(quantum dots, QDs)/量子阱(quantum well, QW)复合结构。通过变功率光致发光谱和变温光致发光谱,分析了在不同的垒层温度下量子限制斯塔克效应(quantum confined Stark effect, QCSE)、非辐射复合中心密度和载流子局域化效应的变化。结果表明:在较低的垒层温度下,QCSE较弱,因为在较低的温度下,V型坑的深度较深,应力释放较明显,残余应变较低;非辐射复合中心密度也随着温度的升高而逐渐增大;样品的内量子效率(internal quantum efficiency, IQE)随着垒层生长温度的升高而降低。QCSE的增强和非辐射复合中心密度的增大是垒层生长温度升高时内量子效率下降的主要因素。     

R面、C面蓝宝石上生长的InGaN多层量子点的发光性质研究

采用表面钝化和MOCVD低温生长在蓝宝石(0001)面(即C面)和蓝宝石(1102)面(即R面)上形成了InGaN量子点,并构成了该量子点的多层结构.原子力显微镜测试的结果表明单层InGaN量子点平均宽约40nm,高约15nm;而多层量子点上层的量子点则比单层的InGaN量子点大.R面蓝宝石衬底上生长的InGaN量子点和C面蓝宝石衬底上生长的InGaN量子点相比,其PL谱不仅强度高,而且没有多峰结构.这是由于在C面蓝宝石衬底上生长的InGaN/GaN多层量子点沿生长方向[0001]存在较强的内建电场,而在R面蓝宝石衬底上得到的多层量子点沿着生长方向[1120]没有内建电场.InGaN量子点变温光致发光(PL)谱研究发现量子点相关的峰有快速红移现象,这是量子点系统所特有的PL谱特征.用在R面蓝宝石上生长的InGaN量子点作有源层有望避免内建电场的影响,得到高量子效率且发光波长稳定的发光器件.     

裂纹对Si衬底GaN基LED薄膜应力状态的影响

本文通过XRD和PL等分析方法研究了在Si衬底生长的GaN基LED外延薄膜n型GaN层和InGaN阱层的应力状态,以及裂纹对其应力状态的影响.XRD结果表明:在Si衬底生长的GaN基LED外延薄膜n型GaN层受到张应力,在受到一定的外加应力后会以裂纹及裂纹增生的方式释放.随着裂纹数量的增加,n型GaN层受到的张应力逐渐减小,但仍处于张应力状态;n型GaN层张应力的减小使得InGaN阱层受到的压应力增大.PL分析进一步表明:InGaN阱层受到的压应力增大使得量子限制Stark效应更加明显,禁带宽度减小,发光波长表现为红移.     

半导体GaAs—Ga0.65Al0.35As多量子阱的光谱性质及实现激光制冷的可能

我们利用光致发光(PL)和激发光谱(PLE)技术研究了GaAs量子阱的光谱性质,在GaAs量子阱的光致发光中观察到上转换发光,首次提出GaAs量子阱结构可能实现激光制冷,探索了GaAs量子阱结构的发光机理。     

InGaAlP/InGaP多量子阱中的红外向可见光的上转换

利用808nm激光二极管泵浦的Nd:YAG晶体发出的1064nm皮秒激光器实现了InGaAlP多量子阱材料的红外1064nm向可见光波长660nm、625nm、580nm的上转换,并且通过条纹相机收集的时间分辨表征了此材料的上转换激发态的寿命.波长1064nm向625nm的上转换激发态寿命约为5ns,而1064nm向660nm的上转换激发态寿命约为7ns.通过双光子原理解释了此现象.     

双周期厚度调制的多量子阱的透射谱

采用传输矩阵方法,研究了一维双周期厚度调制的多量子阱的透射谱.当量子阱的宽度被周期性地调制时,在原来的单一周期势的禁带中出现了一些窄带,落在这些窄带内的电子具有较强的局域性.     

低温热解法制备非晶ZnO纳米粉末研究

报导了一种简单而有效的制备非晶ZnO纳米粉末的方法,即固态低温热解法.并用透射电镜、选区电子衍射、X射线衍射、X射线光电子能谱对所制得的粉末进行了表征.结果表明在160℃下灼烧乙酸锌和碳酸氢钠所得到的ZnO粉末是非晶态.PL谱表明非晶ZnO纳米粉末同样具有较强的紫外发射,其峰值波长为380nm,我们认为这是由于量子尺寸效应造成的.     

MOCVD生长GaAsP/InGa(Al)P/GaAs大功率808nm张应变量子阱激光器材料

设计了808 nm高功率GaAsP/InGaAlP/GaAs半导体激光器,采用无铝张应变量子阱和非对称宽波导结构,通过优化金属有机物气相沉积(LP-MOCVD)生长条件,提高了外延材料的生长质量,有效提升了激光器转化效率和输出功率。制作了200μm条宽、1500μm腔长的激光器器件,室温连续条件(CW)测试其阈值电流为650 mA,斜率效率高达到1.35 W/A,输出功率在11 W以上,激射波长808.5 nm@5A,水平和垂直发散角分别为8°和30°,较小的发散角有效的提高了输出光功率密度。     

等离子体增强分子束外延生长ZnO薄膜及光电特性的研究

利用等离子体辅助分子束外延设备(P-MBE)在蓝宝石(Al2O3)衬底上外延生长ZnO薄膜,研究了不同生长温度对结晶质量的影响.随着生长温度的升高,X射线摇摆曲线(XRC)半高宽从0.88°变窄至 0.29°,从原子力显微镜(AFM)图像中发现薄膜中晶粒从20nm左右增大至200nm,室温光致发光(PL)谱中显示了一个近带边的紫外光发射(UVE)和一个与深中心有关的可见光发射.随着生长温度升高,可见光发射逐渐变弱,薄膜的室温载流子浓度由1.06×1019/cm3减少到7.66×1016/cm3,表明在高温下生长的薄膜中锌氧化学计量比趋于平衡,高质量的ZnO薄膜被获得.通过测量变温光谱,证实所有样品在室温下PL谱中紫外发光都来自于自由激子发射;随着生长温度的变化UVE峰位蓝移与晶粒尺寸不同引起的量子限域效应相关.     

(Gd,Lu)3Al5O12∶Tb3+,Eu3+透明陶瓷制备与发光性能

通过简单的化学沉淀法制备了纳米前驱体,结合真空烧结工艺,制备了一系列镥稳定钆铝石榴石{(Gd, Lu)₃Al₅O₁₂∶Tb,Eu}透明陶瓷。将透明陶瓷加工成1 mm厚的圆片,对透明陶瓷样品进行了X射线衍射、光致发光、透过率和衰减时间等表征。高温烧结过后,陶瓷样品仍保持稳定的石榴石相。选定313 nm作为透明陶瓷的激发波长,可获得最强的荧光发射。此外,通过对不同样品进行紫外可见荧光测试,获得了由绿光到红光的可调节发射。在313 nm激发,543 nm和591 nm的监测波长下,透明陶瓷样品均具有Eu³⁺的毫秒级衰减时间。     

Molecular beam epitaxy of GaN/AlxGa1−xN superlattices for 1.52 – 4.2 μm intersubband transitions

High-quality superlattice structures of GaN/AlGaN were grown on (0 0 0 1) sapphire substrates by molecular beam epitaxy. The threading dislocation density was reduced by growing low-temperature AlN layers in between the high-temperature GaN. In addition, in situ monitoring of the growth rate was achieved using pyrometric interferometry. Cross-sectional transmission electron microscopy of the superlattice structures revealed abrupt interfaces between GaN/AlGaN and excellent layer uniformity. We observed intersubband absorption at wavelengths as short as 1.52 μm in the GaN/AlGaN material system. A range of intersubband absorption peaks was observed between 1.52 and 4.2 μm by varying the well thickness and barrier Al content. In addition, the distribution of the built-in electric field between the well and barrier layers was also found to affect the intersubband transition wavelength.     

Flux Bridgman growth and the influence of annealing temperatures on PL properties of ZnO single crystals

Transparent ZnO crystals were obtained by the flux Bridgman method from high temperature solution of 22 mol% ZnO‐78 mol% PbF₂ system. The influence of annealing temperatures on the photoluminescence (PL) of ZnO crystal was investigated. An ultraviolet emission peak at about 379 nm was observed in PL spectra and the peak position has a weak blueshift for annealed samples. A green band centered at 523 nm appeared in the annealed samples and its intensity enhanced with the increase of annealing temperatures, while the intensity of the ultraviolet peak decreased considerably. However, the ultraviolet emission peak became the strongest after annealing at 1000 °C. This phenomenon was considered to be associated with oxygen vacancy and F^‐ impurities induced by the PbF₂ flux. The results show that high temperature annealing in air seems helpful for improving the PL properties of ZnO crystal. (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Cr,Nd:GSAG晶体生长、光谱及LD泵浦激光性能研究

Cr,Nd:GSAG是一种性能优良的激光晶体,但是关于它的LD泵浦激光性能的研究很少.用提拉法生长了Cr,Nd:GSAG晶体,测定了它的化学成分、结构,初步测试了它的激光性能.晶体的(111)面X射线摇摆曲线半高全宽为0.055°.采用Rietveld方法精修X射线粉末衍射谱得到了Cr,Nd:GSAG晶体的原子结构参数、温度因子等.Cr,Nd:GSAG的最强吸收峰位于808.6nm处,吸收截面为3.38×10-20cm2.808nm光激发下,Cr,Nd:GSAG的最强发射峰位于1060nm,发射截面为6.04×10-20cm2,并测得激光上能级4F3/2的荧光寿命为274μs.利用808nm连续波LD泵浦实现了1060nm的激光输出,在输入功率为8.88W时,最大输出功率为0.513W,斜效率为6.73;,光-光转换效率为5.78;.此外还讨论了Cr,Nd:GSAG晶体中的Cr3+与Nd3+之间的能量传递机理.     

载气流量对氧化锌纳米棒阵列的影响

本文研究了在金属有机化学气相沉积法(MOCVD)生长过程中,锌(Zn)源和氧(O)源载气流量的改变对ZnO纳米棒阵列的影响.通过改变源材料载气的流量,得到了直径从150 nm到20 nm范围、均一性明显改善的ZnO纳米棒.采用扫描电子显微镜(SEM),X射线衍射图谱(XRD),拉曼光谱(Raman)和光致荧光光谱(PL)等测试手段对样品的形貌结构和光学特性进行了表征.SEM和XRD结果表明当Zn源和O源的载气流量均为1 SLM时,所得的纳米棒直径最均匀,排列整齐,垂直于衬底生长,且结晶度最好.PL谱显示纳米棒的紫外带边峰发生了蓝移,可能与表面效应的增加有关.     

Characterization of GaInN/GaN layers for green emitting laser diodes

An enhancement of radiative recombination in GaInN/GaN heterostructures is being pursued by a reduction of defects associated with threading dislocations and a structural control of piezoelectric polarization in the active light-emitting regions. First, in conventional heteroepitaxy on sapphire substrate along the polar c-axis of GaN, green and deep green emitting light-emitting diode (LED) wafers are being developed. By means of photoluminescence at variable low temperature and excitation density, internal quantum efficiencies of 0.18 for LEDs emitting at 530 nm and 0.08 for those emitting at 555 nm are determined. Those values hold for the high current density of 50 A/cm² of high-power LED lamps. In bare epi dies, we obtain efficacies of 16 lm/W. At 780 A/cm² we obtain 22 lm when measured through the substrate only. The 555 nm LED epi material under pulsed photoexcitation shows stimulated emission up to a wavelength of 485 nm. This strong blue shift of the emission wavelength can be avoided in homoepitaxial multiple quantum well (MQW) and LED structures grown along the non-polar a- and m-axes of low-dislocation-density bulk GaN. Here, wavelength-stable emission is obtained at 500 and 488 nm, respectively, independent on excitation power density opening perspectives for visible laser diodes.     

Ho~(3+)/Yb~(3+)∶8YSZ纳米粉体制备及发光性能研究

通过化学共沉淀法制备Ho~(3+)/Yb~(3+)共掺杂的氧化钇稳定的氧化锆(8YSZ)纳米粉体。研究了煅烧温度对Ho~(3+)/Yb~(3+)共掺杂8YSZ纳米粉体荧光光谱和上转换发光性能的影响。结果表明:在448 nm波长激发光激发下,Ho~(3+)/Yb~(3+)∶8YSZ纳米粉体有一个549 nm的绿光发射峰,随着煅烧温度的升高,Ho~(3+)/Yb~(3+)∶8YSZ纳米粉体的荧光强度先升高后降低。980 nm波长激光激发下,Ho~(3+)/Yb~(3+)∶8YSZ纳米粉体在450~750 nm范围内有一个中心波长在539 nm的绿光发射峰和一个中心波长在650 nm的红光发射峰,随着煅烧温度的升高,纳米粉体的颗粒尺寸增大的同时,其上转换发光强度也逐渐增大。     

N型掺杂ZnSe/BeTe Ⅱ型量子阱中空间间接带电激子跃迁发光的直接证据

本文研究了N型掺杂ZnSe/BeTe/ZnSe Ⅱ型量子阱空间间接发光谱的外加电场依赖性。实验结果表明,其发光谱只显示了一个线性偏振度较低的发光峰。这是由于掺杂电子屏蔽了Ⅱ型量子阱中的内秉电场,并使得两个ZnSe阱层具有相同的势。同时该发光谱具有反玻耳兹曼(inverse-Boltzmann)分布,并且线型和线性偏振度在整个栅极电压变化范围内没有显示明显改变。然而,其光谱积分强度却显著地依赖栅极电压的极性变化:在正栅极电压范围内(7~0 V)其光谱积分强度几乎是一个常数,但随着负栅极电压的增加(-1~-7 V),其光谱积分强度却显著降低。这些行为显示了该样品的空间间接发光谱具有负的带电激子的特征。这个常数的光谱积分强度被解释为掺杂层对外加电场的屏蔽,而这个显著降低的光谱积分强度则被归因于外加电场对掺杂电子的排斥(致使激光激发区域内的电子浓度降低),从而导致了负带电激子数量的减少。此外,本文也初步探讨了该空间间接带电激子的可能构成模型。     

Well width study of InGaN multiple quantum wells for blue–green emitter

InGaN/GaN multiple quantum well structures emitting in the blue/green wavelength region were grown by metal organic vapor phase epitaxy. By reducing the quantum well growth time the influence of the quantum well thicknesses between 3.8 and 1.1 nm on the indium incorporation and the distribution of indium in the quantum wells in growth direction were investigated. X-ray diffraction measurements show that the average indium mole fraction in the quantum wells decreases with reducing quantum well width due to a delay in the indium incorporation at the barrier/well interface. Quantitative analysis reveals a segregation length of about 2 nm as a measure of the graded region in growth direction. Cathodoluminescence imaging reveals that the spatial variation of the wavelength is reduced with decreasing quantum well thickness down to 1.7 nm. Reducing the width of the quantum well further results in an increase of the spatial wavelength variation.