同轴三层纳米电缆NiO@SiO2@TiO2的制备与表征

采用静电纺丝技术, 通过改进实验装置, 成功地制备出了NiO@SiO₂@TiO₂同轴三层纳米电缆. 采用差热-热重(TG-DTA)分析、X射线衍射(XRD)分析、傅立叶变换红外光谱(FTIR)分析、扫描电子显微镜(SEM)分析和透射电子显微镜(TEM)等分析技术对样品进行表征, 结果表明, 所得产物为NiO@SiO₂@TiO₂同轴三层纳米电缆, 内层为NiO, 直径大约为40～50 nm|中间层为SiO₂, 厚度大约为40～45 nm|外层为TiO₂, 厚度大约为45～50 nm. 对NiO@SiO₂@TiO₂同轴三层纳米电缆的形成机理进行了讨论.     

多孔TiO2层厚度对钙钛矿太阳能电池性能的影响

制备了基于不同厚度(100～500 nm)多孔TiO₂层的钙钛矿太阳能电池, 并用SEM、XRD、紫外-可见吸收谱、电压-电流曲线、电化学阻抗谱进行了表征. 研究发现, 多孔TiO₂薄膜厚度对电池性能有很大影响, 即随着多孔TiO₂薄膜厚度的增加, 短路电流略有提高, 而开路电压和填充因子呈下降趋势;但同时, 较厚的多孔TiO₂薄膜可有效减弱滞回现象. 进一步采用电化学阻抗谱和暗态电流-电压曲线研究了载流子复合. 电化学阻抗谱表明, 膜厚增加会增大载流子复合但不会改变二极管理想因子. 通过拟合暗态电流-电压曲线得到反向饱和电流, 随着膜厚增加, 反向饱和电流会增大, 从而加剧了载流子复合. 通过优化多孔TiO₂薄膜厚度, 基于150 nm多孔TiO₂薄膜钙钛矿电池的认证效率达到15.56%.     

TiO2光致亲水性及其在免处理版材中的应用研究

用溶胶-凝胶法制备了SiO₂和TiO₂薄膜,并涂覆于玻璃基片上,研究了TiO₂薄膜在紫外光照射下其超亲水性能的变化与光照时间的关系,分析了SiO₂薄膜对覆于其上的TiO₂薄膜的耐摩擦性能的影响.结果表明:TiO₂薄膜经紫外光照射后,疏水性急剧降低,显示亲水性能,与水的接触角可达到5°以下;当其覆膜于载玻片上后,具有良好的耐摩擦性和耐候性;TiO₂薄膜的超亲水性使其有望成为一种新型的环保可重复利用的印刷版材.     

SiO2@Fe2O3核-壳结构催化剂的制备及表征

采用优化的Stöber法制备了平均粒径为230 nm的单分散球形SiO₂颗粒,并以此为内核,通过水解沉积法制备了不同壳层厚度的核-壳结构SiO₂@Fe₂O₃催化剂。采用扫描电子显微镜(SEM)、透射电子显微镜(TEM)、N₂物理吸附和X射线衍射分析(XRD)等手段对催化剂进行表征,探讨了不同制备条件对SiO₂@Fe₂O₃催化剂形貌的影响。结果表明,通过水解沉积法制备的SiO₂@Fe₂O₃催化剂具有明显的核-壳结构,并且保持了原始SiO₂核的球形形貌,Fe₂O₃纳米粒子通过-OH的氢键作用连接在SiO₂表面,形成了2~10 nm厚的Fe₂O₃均匀连续包覆层。     

液相沉积法制备光催化TiO2/SiO2复合薄膜及其表征

通过液相沉积法在较低的温度下制备了TiO₂/SiO₂复合薄膜,利用UV-Vis、XRD和SEM等表征手段对薄膜的透明性、物相和表面形貌进行了表征;并在紫外光照下,通过薄膜对罗丹明B水溶液的光催化降解实验,评价了沉积薄膜的光催化活性.实验结果表明,在室温下制备的液相沉积膜具有较好的光催化活性.     

TiO2-PTPAT纳米核/壳结构复合膜的制备及电致变色性能

通过水热法在氟掺杂氧化锡(FTO)导电玻璃基底上制备了垂直生长的二氧化钛(TiO₂)纳米棒阵列, 以TiO₂纳米棒阵列为模板采用电化学聚合法, 原位制备了TiO₂-聚三[2-(4-噻吩)苯]胺(PTPAT)纳米核/壳结构的复合薄膜, 相比于纯PTPAT薄膜, TiO₂-PTPAT复合薄膜显示出更好的电致变色(EC)性能. PTPAT薄膜在600 nm波长下的对比度为28%, 在1100 nm波长下的对比度为60%, 其褪色时间为3.86 s, 着色时间为5.52 s; TiO₂- PTPAT复合薄膜在600 nm波长下的对比度为43%, 在1100 nm波长下的对比度为79%, 其褪色时间为3.35 s, 着色时间为4.43 s, 表明核/壳复合结构薄膜的光学对比度和响应时间性能更加优异. 将PTPAT薄膜和TiO₂-PTPAT复合薄膜作为电致变色层组装成固态EC器件, 基于复合薄膜的器件具有更好的循环稳定性和更高的耐受电压. 复合薄膜在保持PTPAT薄膜原有的EC性能的基础上, 由于有序生长的纳米阵列结构的引入增加了薄膜的比表面积, 为电致变色过程中离子的掺杂和脱掺杂提供了更多有序通道, 从而加快了离子扩散速度. TiO₂阵列的引入也改善了聚合物薄膜与透明导电电极之间的界面结合情况, 从而提升了器件的稳定性.     

TiOx/SiO2复合载体上高分散Au催化剂的CO氧化性能

负载型Au催化剂中金与载体间存在相互作用,载体性质能够影响Au纳米颗粒分散度及稳定性.本文通过表面溶胶-凝胶(SSG)法制备了TiO_x/SiO₂复合载体,以期增加氧化物载体表面配位不饱和度从而使其具有较高的金属分散性,并利用低能离子散射(LEIS)谱、X射线光电子能谱(XPS)、X射线衍射(XRD)、透射电子显微镜(TEM)及N₂物理吸附(BET)等手段对载体及催化剂进行表征分析.实验表明TiO_x/SiO₂复合载体表面TiO_x分散性良好,没有形成明显的TiO₂晶相,且与SiO₂间形成Ti―O―Si键.与Au/TiO₂相比, Au/TiO_x/SiO₂催化剂中Au纳米颗粒的分散性更好,因而CO氧化活性显著提高. TiO_x/SiO₂复合载体上的TiO₂膜是Au的主要表面键合位,导致Au与载体间相互作用增强,从而使得Au纳米颗粒抗烧结能力提高,同时催化剂反应稳定性得到改善.     

表面敏化TiO2基复合薄膜的能带结构与光致电荷转移的研究

采用离子束溅射方法制备出TiO₂/ITO, Zr^4＋掺杂的TiO₂(TiO₂-Zr)/ITO和ZrO₂/TiO₂/ITO复合薄膜. 利用表面敏化方法制备出(1,10-邻菲咯啉)₂(3,4,5-三氟苯基)咪唑并[5,6-f]邻菲咯啉钌混配配合物[Rup₂O](p＝1,10-邻菲咯啉, O＝(3,4,5-三氟苯基)咪唑并[5,6-f]邻菲咯啉)/TiO₂/ITO, Rup₂O/TiO₂-Zr/ITO和Rup₂O/ZrO₂/TiO₂/ITO表面敏化TiO₂基复合薄膜. 表面光电压谱(SPS)表明, 表面敏化TiO₂基复合薄膜在400～600和350 nm产生的SPS响应峰的峰高比与TiO₂基复合薄膜的结构密切相关. 利用电场诱导表面光电压谱(EFISPS)确定了复合薄膜的能带结构, 其结果分析表明, 400～600 nm的SPS响应峰主要源于Rup₂O分子的中心离子Ru 4d能级到配体邻菲咯啉p₁^*和配体咪唑并邻菲咯啉p₂^*跃迁|TiO₂禁带内Zr^4＋掺杂能级的存在减小了光生载流子的复合, 增加导带光生电子的数量|ZrO₂/TiO₂异质结构的存在有利于光生电子向ITO表面的转移, 从而导致400～600 nm和350 nm SPS响应峰的峰高比的增加, 意味着光致电荷转移效率的提高.     

荧光素掺杂的溶胶凝胶SiO2/甲基硅油复合薄膜的制备和光谱特性

采用溶胶-凝胶(Sol-Gel)法制备了掺杂荧光素(FL)的SiO₂/甲基硅油(MSO)复合薄膜,并且测定了这种薄膜的光谱特性.实验表明,荧光素掺杂的SiO₂薄膜在350nm~450nm波长范围内激发,在520nm附近有最强的荧光发射峰;与常规SiO₂膜相比较,SiO₂/甲基硅油(MSO)复合薄膜的荧光发射强度可增加50%;在70℃下的加速老化实验表明,常规SiO₂薄膜20天后开始出现严重的荧光猝灭现象,而复合膜放置一个月后荧光强度仅下降了15%.     

吸附相反应技术制备纳米TiO2/SiO2复合材料

以SiO₂表面形成的吸附层为反应器,在载体表面制备了纳米TiO₂粒子.溶剂置换实验直接给出了吸附层的存在以及吸附层作为纳米反应器的实验证据,TEM,XRD和电子能谱分析表明,载体表面形成一层比较均匀的纳米粒子.初步探讨了温度和反应物浓度对产物分布的影响,分析了各种现象产生的可能成因.     

Preparation and characterization of crack-free sol–gel based SiO2–TiO2 hybrid nanoparticle film

Owing to the diverse potential applications of hybrid silica–titania thin films, the synthesis and characterization of these films have been carried out with a special focus on application as a medium index layer for multilayered functional coatings. For synthesis, tetraethylorthosilicate and titanium tetraisopropoxide were chosen as precursors for the formation of silica-titania hybrid thin films/nano-composites through an in situ sol–gel process. These films were sequentially obtained on Cu substrate utilizing spin coating. The hybrids were characterized by field emission scanning electron microscope, energy-dispersive X-ray spectroscopy (EDX), X-ray diffraction, atomic force microscopy and Fourier transform infrared spectroscopy (FTIR). Field emission scanning electron microscope morphology displayed a smooth, densified and crack- free layer of silica-titania hybrid nanoparticles in the range of 20–71 nm after calcinations at low temperature of 300ºC for 1 h. X-ray diffraction pattern confirms the phases of titania with higher crystallinity and phase transformation at low temperature. The prepared films were uniform with low 8.852 nm RMS value. The stoichiometry of films was confirmed by EDX results. The FTIR spectroscopy indicated the establishment of heterogeneous chemical bonding between the Ti and Si surfaces through oxygen.     

In situ monitoring of atomic layer deposition in nanoporous thin films using ellipsometric porosimetry

Ellipsometric porosimetry (EP) is a handy technique to characterize the porosity and pore size distribution of porous thin films with pore diameters in the range from below 1 nm up to 50 nm and for the characterization of porous low-k films especially. Atomic layer deposition (ALD) can be used to functionalize porous films and membranes, e.g., for the development of filtration and sensor devices and catalytic surfaces. In this work we report on the implementation of the EP technique onto an ALD reactor. This combination allowed us to employ EP for monitoring the modification of a porous thin film through ALD without removing the sample from the deposition setup. The potential of in situ EP for providing information about the effect of ALD coating on the accessible porosity, the pore radius distribution, the thickness, and mechanical properties of a porous film is demonstrated in the ALD of TiO(2) in a mesoporous silica film.     

Precise Size Control over Ultrafine Rutile Titania Nanocrystallites in Hierarchical Nanotubular Silica/Titania Hybrids with Efficient Photocatalytic Activity

Hierarchical‐structured nanotubular silica/titania hybrids incorporated with particle‐size‐controllable ultrafine rutile titania nanocrystallites were realized by deposition of ultrathin titania sandwiched silica gel films onto each nanofiber of natural cellulose substances (e.g., common commercial filter paper) and subsequent flame burning in air. The rapid flame burning transforms the initially amorphous titania into rutile phase titania, and the silica gel films suppress the crystallite growth of rutile titania, thereby achieving nano‐precise size regulation of ultrafine rutile titania nanocrystallites densely embedded in the silica films of the nanotubes. The average diameters of these nanocrystallites are adjustable in a range of approximately 3.3–16.0 nm by a crystallite size increment rate of about 2.4 nm per titania deposition cycle. The silica films transfer the electrons activated by crystalline titania and generate catalytic reactive species at the outer surface. The size‐tuned ultrafine rutile titania nanocrystallites distributed in the unique hierarchical networks significantly improve the photocatalytic performance of the rutile phase titania, thereby enabling a highly efficient photocatalytic degradation of the methylene blue dye under ultraviolet light irradiation, which is even superior to the pure anatase‐titania‐based materials. The facile stepwise size control of the rutile titania crystallites described here opens an effective pathway for the design and preparation of fine‐nanostructured rutile phase titania materials to explore potential applications.     

Preparation of nearly monodisperse multiply coated submicrospheres with a high refractive index

Nearly monodisperse SiO2/TiO2/SiO2 multiply coated submicrospheres with nearly monodisperse silica submicrospheres as cores, thick titania layers, and thin silica skin were prepared to increase the refractive index of complex submicrospheres while keeping their near monodispersity and perfect surface properties. Nearly monodisperse colloidal silica submicrospheres as cores with a diameter of 200 nm were synthesized by a seeding technique on the basis of the hydrolysis of tetraethyl orthosilicate (TEOS) in an aqueous ethanol solution with ammonia as catalyst. On the basis of the hydrolysis of tetrabutyl orthotitanate, a procedure combining continuous feeding with multistep coating was determined to prepare titania coatings about 40 nm thick and increase the refractive index of the complex submicrospheres. The hydrolysis of TEOS was still used to get the outmost silica coating about 10 nm thick on titania coated silica submicrospheres to eliminate random aggregation caused by the TiO2 surface properties of the TiO2/SiO2 complex submicrospheres during the final fabrication of photonic crystals.     

Atomic layer deposition of metal-oxide thin films on cellulose fibers

Abstract

Atomic layer deposition (ALD) is a vapor-phase technique capable of producing inorganic thin films with precise control over the thickness of the film. The ALD method offers high precision in the design of advanced 3D nanostructures. In this article, silica and alumina thin films have been grown over fibers of cellulose by the ALD process. The morphology and the chemical composition of the fabricated thin films are characterized, as well as their thermal durability through elevated temperatures. Moreover, XPS is used to confirm the phases of the alumina nanofilms and to further understand the deposition process on the cellulose microfibers.     

Preparation of silica-on-titania patterns with a wettability contrast

The preparation of patterned inorganic surfaces consisting of silica (SiO2) and titania (TiO2) is described. The approach is based on a combination of standard photolithography and plasma-enhanced chemical vapor deposition. Silicon wafers coated with a titania layer (40 nm) were patterned by use of a positive photoresist and then a thin silica layer (10-40 nm) was plasma-deposited. The photoresist was removed by decomposition at 800 degrees C. The inorganic patterned surfaces possessed excellent high-temperature resistance. Since the silica patches were effectively dehydroxylated during the thermal treatment, the patterns consisted of moderately hydrophobic (silica) and hydrophilic (titania) domains with a significant wettability contrast (40 degrees for water). The surface was further hydrophobized with a self-assembled monolayer of fluoroalkylsilane (FAS) and exposed to UV light. The FAS layer was locally oxidized on the TiO2 patches and the wettability contrast was maximized to 120 degrees (the highest possible value on smooth surfaces).     

Low‐Temperature Route to Crystalline Titania Network Structures in Thin Films

A low temperature route to crystalline titania nanostructures in thin films is presented. The synthesis is performed by the combination of sol‐gel processes, using a novel precursor for this kind of application, an ethylene glycol‐modified titanate (EGMT), and the structure templating by micro‐phase separation of a di‐block copolymer. Different temperatures around 100 °C are investigated. The nanostructure morphology is examined with scanning electron microscopy, whereas the crystal structure and thin film compositions are examined by scattering methods. Optoelectronic measurements reveal the band‐gap energies and sub‐band states of the titania films. An optimum titania thin film is created at temperatures not higher than 90 °C, regarding sponge‐like morphology with pore sizes of 25–30 nm, porosity of up to 71 % near the sample surface, and crystallinity of titania in the rutile phase. The low temperature during synthesis is of high importance for photovoltaic applications and renders the resulting titania films interesting for future energy solutions.     

Superior Photostability and Photocatalytic Activity of ZnO Nanoparticles Coated with Ultrathin TiO2 Layers through Atomic‐Layer Deposition

Atomic‐layer deposition (ALD) is a thin‐film growth technology that allows for conformal growth of thin films with atomic‐level control over their thickness. Although ALD is successful in the semiconductor manufacturing industry, its feasibility for nanoparticle coating has been less explored. Herein, the ALD coating of TiO₂ layers on ZnO nanoparticles by employing a specialized rotary reactor is demonstrated. The photocatalytic activity and photostability of ZnO nanoparticles coated with TiO₂ layers by ALD and chemical methods were examined by the photodegradation of Rhodamine B dye under UV irradiation. Even though the photocatalytic activity of the presynthesized ZnO nanoparticles is higher than that of commercial P25 TiO₂ nanoparticles, their activity tends to decline due to severe photocorrosion. The chemically synthesized TiO₂ coating layer on ZnO resulted in severely declined photoactivity despite the improved photostability. However, ultrathin and conformal ALD TiO₂ coatings (≈0.75–1.5 nm) on ZnO improved its photostability without degradation of photocatalytic activity. Surprisingly, the photostability is comparable to that of pure TiO₂, and the photocatalytic activity to that of pure ZnO.     

Direct generation of silica nanowire-based thin film on various substrates with tunable surface nanostructure and extreme repellency toward complex liquids

We report our new achievement on the direct generation of linear polyethylenimine@silica hybrid and silica thin films on various substrates, which is composed of 10 nm nanowire silica structure with tunable micro/nano hierarchical surface morphology. We found that a process for the rapid and controlled self-assembly of crystalline template layer of linear polyethylenimine on substrate surface is critical for the formation of ultrathin silica nanowire structure and micro/nano hierarchical morphology, since the template linear polyethylenimine layer directly promotes the hydrolytic condensation of alkoxysilanes. Templated silica mineralization on the self-assembled linear polyethylenimine layer was confirmed by the studies of X-ray photoelectron spectroscopy (XPS) and thin film X-ray diffraction (XRD). The surface of silica nanostructure and hierarchy could be well controlled by simply adjusting the conditions for LPEI assembly, such as the polymer concentrations and substrate surface property. After a simple fluorocarbon modification, the hierarchical silica nanowire thin film demonstrated robust and reliable super-repelling property toward a series of aqueous liquids (such as commercial inkjet (IJ) ink, soy source, milk). Comparative studies clearly confirmed the critical importance of surface hierarchy for enhancing super-repelling property. Moreover, we found that the forcibly formed dirty sports (both wet and dry) from the complexly composed liquids on the super-antiwetting surface could be easily and completely cleaned by simple water drop flow. We expect these tailored nanosurfaces would have the potentials for practical technological applications, such as liquid transferring, self-cleaning, microfluid, and biomedical-related devices.     

Preliminary studies in the electrodeposition of PbSe/PbTe superlattice thin films via electrochemical atomic layer deposition (ALD)

This paper concerns the electrochemical growth of compound semiconductor thin film superlattice structures using electrochemical atomic layer deposition (ALD). Electrochemical ALD is the electrochemical analogue of atomic layer epitaxy (ALE) and ALD, methods based on nanofilm formation an atomic layer at a time, using surface-limited reactions. Underpotential deposition (UPD) is a type of electrochemical surfaced-limited reaction used in the present studies for the formation of PbSe/PbTe superlattices via electrochemical ALD. PbSe/PbTe thin-film superlattices with modulation wavelengths (periods) of 4.2 and 7.0 nm are reported here. These films were characterized using electron probe microanalysis, X- ray diffraction, atomic force microscopy (AFM), and infrared reflection absorption measurements. The 4.2 nm period superlattice was grown after deposition of 10 PbSe cycles, as a prelayer, resulting in an overall composition of PbSe0.52Te0.48. The 7.0 nm period superlattice was grown after deposition of 100 PbTe cycle prelayer, resulting for an overall composition of PbSe0.44Te0.56. The primary Bragg diffraction peak position, 2theta, for the 4.2 superlattice was consistent with the average (111) angles for PbSe and PbTe. First-order satellite peaks, as well as a second, were observed, indicating a high-quality superlattice film. For the 7.0 nm superlattice, Bragg peaks for both the (200) and (111) planes of the PbSe/PbTe superlattice were observed, with satellite peaks shifted 1 degrees closer to the (111), consistent with the larger period of the superlattice. AFM suggested conformal superlattice growth on the Au on glass substrate. Band gaps for the 4.2 and 7.0 nm period superlattices were measured as 0.48 and 0.38 eV, respectively.